Background: Reconstructive surgery is often required for tumors of the oral and maxillofacial region, irrespective of whether they are benign or malignant, the area involved, and the tumor size. Recently, three-dimensional (3D) models are increasingly used in reconstructive surgery. However, these models have rarely been adapted for the fabrication of custom-made reconstruction materials. In this report, we present a case of maxillary reconstruction using a laboratory-engineered, custom-made mesh plate from a 3D model. Case presentation: The patient was a 56-year-old female, who had undergone maxillary resection in 2011 for intraoral squamous cell carcinoma that presented as a swelling of the anterior maxillary gingiva. Five years later, there was no recurrence of the malignant tumor and a maxillary reconstruction was planned. Computed tomography (CT) revealed a large bony defect in the dental-alveolar area of the anterior maxilla. Using the CT data, a 3D model of the maxilla was prepared, and the site of reconstruction determined. A custom-made mesh plate was fabricated using the 3D model (Okada Medical Supply, Tokyo, Japan). We performed the reconstruction using the custom-made titanium mesh plate and the particulate cancellous bone and marrow graft from her iliac bone. We employed the tunneling flap technique without alveolar crest incision, to prevent surgical wound dehiscence, mesh exposure, and alveolar bone loss. Ten months later, three dental implants were inserted in the graft. Before the final crown setting, we performed a gingivoplasty with palate mucosal graft. The patient has expressed total satisfaction with both the functional and esthetic outcomes of the procedure. Conclusion: We have successfully performed a maxillary and dental reconstruction using a custom-made, pre-bent titanium mesh plate.
Lee, Cheol Ho;Kim, Dae Kyung;Han, Kyu Hong;Park, Chang Hee;Kim, Jin Ho;Lee, Seung Eun;Kim, Do Hwan
Journal of Korean Society of Steel Construction
/
v.26
no.5
/
pp.407-418
/
2014
As a continuing work of previously conducted standard tension tests, full-scale flexural tests were conducted in this study to assess the structural performance the CJP groove welded joints connecting thick HSA800 plates. Two welding electrodes were available at the time of this experimental research; one was GMAW-based electrode A and the other FCAW-based electrode B. Three full-scale box-type beam specimens with single bevel- and V-groove CJP welded joints were fabricated from 60mm and 25mm thick HSA800 plates according to the AWS-prequalified groove welded joint details. In designing the specimens, all possible limit states like local and lateral torsional buckling were carefully controlled in order to induce flexural plastic yielding or eventual joint fracture. All the CJP joints made by both welding electrodes showed satisfactory performance and were able to transfer the tensile flange forces higher than that corresponding to the measured tensile strength of HSA800 flange plates. However, it should be noted that, during fabrication, serious concerns about the welding efficiency and workability of the GMAW-based electrode were raised by a certified welder. The fracture occurred at the unbeveled (or vertical) interface between the weldment and the base metal when the GMAW-based electrode was used in the single-bevel joint, implying the possibility of insufficient melting. Thus, the FCAW-based electrode B is again recommended as the choice of welding electrode for HSA800 plates. The limited test data of this study implies that the V-groove CJP joint should be used in favor of the single bevel CJP joint, if possible.
Kim, Chong-Myeong;Kim, Ji-Hwan;Kim, Hea-Young;Kim, Woong-Chul
Journal of Technologic Dentistry
/
v.36
no.1
/
pp.1-7
/
2014
Purpose: The aim of this study was analyzed by comparing the effect of glass fiber reinforcement addition on the strength of resin denture base. It was intended to provide a reference data useful for clinical application. Methods: The test specimens (length $64.0{\pm}0.1mm$, width $10.0{\pm}0.1mm$, thickness $1.0{\pm}0.1mm$, $1.5{\pm}0.1mm$, and $2.0{\pm}0.1mm$ respectively) were made. In the experimental groups resin denture base reinforced with glass fiber were fabricated. In the control groups resin denture base were fabricated by conventional method. After specimen fabrication was completed, transverse test was performed using a universal testing machine. Results: The transverse strength value in CON group was $83.08{\pm}9.07MPa$ for 1.0 mm, which ranked the highest in value. On the other hand, the value was $56.07{\pm}5.15MPa$ for 2.0mm, which ranked the lowest in value. And CON+SES group was $119.80{\pm}30.70MPa$ for 1.0mm, which ranked the highest in value. On the other hand, the value was $84.00{\pm}7.97MPa$ for 2.0mm, which ranked the lowest in value. Also, the flexural modulus value in CON group was $2,983.10{\pm}506.92MPa$ for 1.0mm, which ranked the highest in value. On the other hand, the value was $1,257.64{\pm}230.48MPa$ for 2.0mm, which ranked the lowest in value. And CON+SES group was $4,679.41{\pm}1578.29MPa$ for 1.0mm, which ranked the highest in value. On the other hand, the value was $2,512.36{\pm}527.09MPa$ for 2.0mm, which ranked the lowest in value. Conclusion: The reinforced glass fiber increased the strength of resin denture base, effected to reduce the thickness of resin denture base.
The Journal of Korean Institute of Communications and Information Sciences
/
v.29
no.1C
/
pp.102-110
/
2004
In this paper, we propose a VLSI structure of real-time image compression and reconstruction processor using 2-D discrete wavelet transform and implement into a hardware which use minimal hardware resource using ASIC library. In the implemented hardware, Data path part consists of the DWT kernel for the wavelet transform and inverse transform, quantizer/dequantizer, the huffman encoder/huffman decoder, the adder/buffer for the inverse wavelet transform, and the interface modules for input/output. Control part consists of the programming register, the controller which decodes the instructions and generates the control signals, and the status register for indicating the internal state into the external of circuit. According to the programming condition, the designed circuit has the various selective output formats which are wavelet coefficient, quantization coefficient or index, and Huffman code in image compression mode, and Huffman decoding result, reconstructed quantization coefficient, and reconstructed wavelet coefficient in image reconstructed mode. The programming register has 16 stages and one instruction can be used for a horizontal(or vertical) filtering in a level. Since each register automatically operated in the right order, 4-level discrete wavelet transform can be executed by a programming. We synthesized the designed circuit with synthesis library of Hynix 0.35um CMOS fabrication using the synthesis tool, Synopsys and extracted the gate-level netlist. From the netlist, timing information was extracted using Vela tool. We executed the timing simulation with the extracted netlist and timing information using NC-Verilog tool. Also PNR and layout process was executed using Apollo tool. The Implemented hardware has about 50,000 gate sizes and stably operates in 80MHz clock frequency.
An artificial photoreceptor composed of bacteriorhodopsin(bR)/flavin complex Langmuir-Blodgett(LB) films was developed by mimicking the human visual system. bR and flavin molecules were deposited onto solid substrate by LB technique, and the deposition of two molecules was proved by UV/VIS absorption spectroscopy and atomic force microscopy(AFM). Based on AFM images and photocurrent generation from the LB films, the optimal conditions for device fabrication were determined. With a series of light illuminations, the generated photocurrent could be detected, and the response characteristics of two molecules could be clearly distinguished from each other. According to the obtained signal shapes, three distinctive regions could be found in the obtained action spectrum. Using a correlation between the photocurrent generation and the wavelength of the input light, it was possible to organize the basic rules to interpret the wavelength of the input light. It is concluded that the proposed artificial photoreceptor would e applicable to the bioelectronic device for color recognition.
Journal of the Institute of Electronics Engineers of Korea SD
/
v.41
no.6
/
pp.25-31
/
2004
In this paper, we introduce kinetic Monte Carlo (kMC) methods for simulating diffusion process in nano-scale device fabrication. At first, we review kMC theory and backgrounds and give a simple point defect diffusion process modeling in thermal annealing after ion (electron) implantation into Si crystalline substrate to help understand kinetic Monte Carlo methods. kMC is a kind of Monte Carlo but can simulate time evolution of diffusion process through Poisson probabilistic process. In kMC diffusion process, instead of. solving differential reaction-diffusion equations via conventional finite difference or element methods, it is based on a series of chemical reaction (between atoms and/or defects) or diffusion events according to event rates of all possible events. Every event has its own event rate and time evolution of semiconductor diffusion process is directly simulated. Those event rates can be derived either directly from molecular dynamics (MD) or first-principles (ab-initio) calculations, or from experimental data.
The Journal of Korean Institute of Electromagnetic Engineering and Science
/
v.22
no.11
/
pp.1034-1046
/
2011
In this paper, a design and fabrication of 40 W power amplifier for the X-band using load-pull measurement of GaN HEMT chip are presented. The adopted active device for power amplifier is GaN HEMT chip of TriQuint company, which is recently released. Pre-matched fixtures are designed in test jig, because the impedance range of load-pull tuner is limited at measuring frequency. Essentially required 2-port S-parameters of the fixtures for extraction optimal input and output impedances is obtained by the presented newly method. The method is verified in comparison of the extracted optimal impedances with data sheet. The impedance matching circuit for power amplifier is designed based on EM co-simulation using the optimal impedances. The fabricated power amplifier with 15${\times}$17.8 $mm^2$ shows the efficiency above 35 %, the power gain of 8.7~8.3 dB and the output power of 46.7~46.3 dBm at 9~9.5 GHz with pulsed-driving width of 10 usec and duty of 10 %.
Kim, Myung-Chan;Heo, Cheol-Ho;Boo, Jin-Hyo;Cho,Yong-Ki;Han, Jeon-Geon
Proceedings of the Korean Vacuum Society Conference
/
1999.07a
/
pp.211-211
/
1999
Titanium nitride (TiN) thin films have useful properties including high hardness, good electrical conductivity, high melting point, and chemical inertness. The applications have included wear-resistant hard coatings on machine tools and bearings, decorative coating making use of the golden color, thermal control coatings for widows, and erosion resistant coatings for spacecraft plasma probes. For all these applications as feature sizes shrink and aspect ratios grow, the issue of good step coverage becomes increasingly important. It is therefore essential to manufacture conformal coatings of TiN. The growth of TiN thin films by chemical vapor deposition (CVD) is of great interest for achieving conformal deposition. The most widely used precursor for TiN is TiCl4 and NH3. However, chlorine impurity in the as-grown films and relatively high deposition temperature (>$600^{\circ}C$) are considered major drawbacks from actual device fabrication. To overcome these problems, recently, MOCVD processes including plasma assisted have been suggested. In this study, therefore, we have doposited Ti(C, N) thin films on Si(100) and D2 steel substrates in the temperature range of 150-30$0^{\circ}C$ using tetrakis diethylamido titanium (TDEAT) and titanium isopropoxide (TIP) by pulsed DC plamsa enhanced metal-organic chemical vapor deposition (PEMOCVD) method. Polycrystalline Ti(C, N) thin films were successfully grown on either D2 steel or Si(100) surfaces at temperature as low as 15$0^{\circ}C$. Compositions of the as-grown films were determined with XPS and RBS. From XPS analysis, thin films of Ti(C, N) with low oxygen concentration were obtained. RBS data were also confirmed the changes of stoichiometry and microhardness of our films. Radical formation and ionization behaviors in plasma are analyzed by optical emission spectroscopy (OES) at various pulsed bias and gases conditions. H2 and He+H2 gases are used as carrier gases to compare plasma parameter and the effect of N2 and NH3 gases as reactive gas is also evaluated in reduction of C content of the films. In this study, we fond that He and H2 mixture gas is very effective in enhancing ionization of radicals, especially N resulting is high hardness. The higher hardness of film is obtained to be ca. 1700 HK 0.01 but it depends on gas species and bias voltage. The proper process is evident for H and N2 gas atmosphere and bias voltage of 600V. However, NH3 gas highly reduces formation of CN radical, thereby decreasing C content of Ti(C, N) thin films in a great deal. Compared to PVD TiN films, the Ti(C, N) film grown by PEMOCVD has very good conformability; the step coverage exceeds 85% with an aspect ratio of more than 3.
Purpose: The purpose of this study was to observe the microstructural changes of surface in the specimens, performing the shear bond strength testing. The currently most used non-precious alloys are nickel-chromium based alloys with or without beryllium. However, their biocompatibility has been questioned concerning possible damages to the health of the patient and professionals involved in the fabrication of prosthesis caused by long exposure to Ni and Be. An option to nickel-chromium alloys is the cobalt-chromium alloy, an alternative that does not sacrifice the physical properties of the metal porcelain systems. Studies in the animals substantially show that the cobalt-chromium alloys are relatively well tolerated, being therefore more biocompatible than the nickel-chromium alloys. Methods: Non-addition Be to nickel-chromium based alloy(Bellabond plus) and cobalt-chromium alloy which has been widely used(Wirobond C) fused with ZEO light porcelain classified control group and cobalt-chromium alloy which is developing alloy of Alphadent company in Korea(Alphadent alloy) fused with ZEO light porcelain classified experimental group. The specimens of $4mm{\times}4mm{\times}0.5mm$ were prepared as-cast and as-opaque to cast body to analyze the mechanical characteristic change, the microstructure of alloy surface. The phase change was used to observe through XRD analysis and OM/SEM was used to observe the surface of specimens as-cast and as-opaque to cast body. Chemical formation of their elements was measured with EDS. Then hardness was measured with Micro Vicker's hardness tester. Shear bond strength test thirty specimens of $10mm{\times}10mm{\times}2mm$ was prepared, veneered, 3mm high and 3mm in diameter, over the alloy specimens. The shear bond strength test was performed in a universal testing machine(UTM) with a cross head speed of 0.5mm/min. Ultimate shear bond strength data were analyzed with one-way ANOVA and the Scheffe's test (P<0.05). Within the limits of this study, the following conclusions were drawn: The X-ray diffraction analysis results for the as-cast and as-opaque specimens showed that the major relative intensity of Bellabond plus alloy were changed smaller than Wirobond C and Alphadent Co-Cr based alloys. Results: Microstructural analysis results for the opaque specimens showed all the alloys increased carbides and precipitation(PPT). Alphadent Co-Cr based alloy showed the carbides of lamellar type. The Vickers hardness results for the opaque specimens showed Wirobond C and Alphadent Co-Cr based alloys were increaser than before ascast, but Bellabond plus alloy relatively decreased. The mean shear bond strengths (MPa) were: 33.11 for Wirobond C/ZEO light; 25.00 for Alphadent Co-Cr alloy/ZEO light; 18.02 for Bellabond plus/ZEO light. Conclusion: The mean shear bond strengths for Co-Cr and Ni-Cr based alloy were significantly different. But the all groups showed metal-metal oxide modes in shear bond strengths test at the interface.
Journal of the Institute of Electronics Engineers of Korea SD
/
v.45
no.5
/
pp.12-18
/
2008
Ag paste was employed for source and drain electrode of OTFTs and for the data metal lines of OTFT-OLED array on PC(polycarbonate) substrate. We tested two kinds of Ag-pastes such as pastes for 325 mesh and 500 mesh screen mask to examine the pattern ability and electrical performance for OTFTs. The minimum feature size was 60 ${\mu}m$ for 325 mesh screen mask and 40 ${\mu}m$ for 500 mesh screen mask. The conductivity was 60 $m{\Omega}/\square$ for 325 mesh and 133.1 $m{\Omega}/\square$ for 500 mesh. For the OTFT performance the mobility was 0.35 $cm^2/V{\cdot}sec$ and 0.12 $cm^2/V{\cdot}sec$, threshold voltage was -4.7 V and 0.9 V, respectively, and on/off current ratio was ${\sim}10^5$, for both screen masks. We applied the 500 mash Ag paste to OTFT-OLED array because of its good patterning property. The pixel was composed of two OTFTs and one capacitor and one OLED in the area of $2mm{\times}2mm$. The panel successfully worked in active mode operation even though there were a few bad pixels.
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