Etching properties of sapphire substrate using $CH_4$ /Ar inductively coupled plasma
($CH_4$ /Ar 유도 결합 플라즈마를 이용한 Sapphire 기판의 식각 특성)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2008.11a
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- pp.102-102
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- 2008