• 제목/요약/키워드: DC bias voltage

검색결과 274건 처리시간 0.018초

반응성 RF 마그네트론 스퍼터링에 의한 TiNx 상온 성막에 있어서 기판 상의 펄스상 직류 바이어스 인가 효과 (Pulsed DC Bias Effects on Substrate in TiNx Thin Film Deposition by Reactive RF Magnetron Sputtering at Room Temperature)

  • 김세기
    • 한국표면공학회지
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    • 제52권6호
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    • pp.342-349
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    • 2019
  • Titanium nitride(TiN) thin films have been deposited on PEN(Polyethylene naphthalate) substrate by reactive RF(13.56 MHz) magnetron sputtering in a 25% N2/Ar mixed gas atmosphere. The pulsed DC bias voltage of -50V on substrates was applied with a frequency of 350 kHz, and duty ratio of 40%(1.1 ㎲). The effects of pulsed DC substrate bias voltage on the crystallinity, color, electrical properties of TiNx films have been investigated using XRD, SEM, XPS and measurement of the electrical properties such as electrical conductivity, carrier concentration, mobility. The deposition rates of TiNx films was decreased with application of the pulsed DC substrate bias voltage. The TiNx films deposited without and with pulsed bias of -50V to substrate exhibits gray and gold colors, respectively. XPS depth profiling revealed that the introduction of the substrate bias voltage resulted in decreasing oxygen concentration in TiNx films, and increasing the electrical conductivities, carrier concentration, and mobility to about 10 times, 5 times, and 2 times degree, respectively.

The Effect of Initial DC Bias Voltage on Highly Oriented Diamond Film Growth on Silicon

  • Dae Hwan Kang;Seok Hong Min;Ki Bum Kim
    • The Korean Journal of Ceramics
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    • 제3권1호
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    • pp.13-17
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    • 1997
  • It is identified that the diamond films grown o bias-treated (100) silicon showed different surface morphologies and film textures according to the initial applied dc bias voltage at the same growth condition. The highly oriented diamond film (HODF) was successfully grown on -200 V bias-treated silicon substrate in which the heteroepitaxial relation of $(100)_{dimond}//(100)_{si}\; and\; [110]_{diamond}//[110]_{si}$ was identified. On the contrary, the heteroepitaxial relation was considerably disturbed in the samples bias-voltage was a key factor in growing the highly oriented diamond film on (100) silicon substrate. Considering the experimental results, we proposed a new model about heteroepitaxial diamond growth on silicon, in which 9 diamond unit cell are matched with 4 silicon cells and the bond covalency of both atoms is satisfied via the intermediate layer at the interface as well.

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Effect of Bias Magnetic Field on Magnetoelectric Characteristics in Magnetostrictive/Piezoelectric Laminate Composites

  • Chen, Lei;Luo, Yulin
    • Journal of Magnetics
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    • 제20권4호
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    • pp.347-352
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    • 2015
  • The magnetoelectric (ME) characteristics for Terfenol-D/PZT laminate composite dependence on bias magnetic field is investigated. At low frequency, ME response is determined by the piezomagnetic coefficient $d_{33,m}$ and the elastic compliance $s_{33}^H$ of magnetostrictive material, $d_{33,m}$ and $s_{33}^H$ for Terfenol-D are inherently nonlinear and dependent on $H_{dc}$, leading to the influence of $H_{dc}$ on low-frequency ME voltage coefficient. At resonance, the mechanical quality factor $Q_m$ dependences on $H_{dc}$ results in the differences between the low-frequency and resonant ME voltage coefficient with $H_{dc}$. In terms of ${\Delta}E$ effect, the resonant frequency shift is derived with respect to the bias magnetic field. Considering the nonlinear effect of magnetostrictive material and $Q_m$ dependence on $H_{dc}$c, it predicts the low-frequency and resonant ME voltage coefficients as a function of the dc bias magnetic field. A good agreement between the theoretical results and experimental data is obtained and it is found that ME characteristics dependence on $H_{dc}$ are mainly influenced by the nonlinear effect of magnetostrictive material.

Electroreflectance 측정에 의한 Si이 첨가된 $Al_{0.32}Ga_{0.68}As$에서의 $E_1$ 전이에 대한 연구 (A Study on $E_1$Transition in Si-Doped $Al_{0.32}Ga_{0.68}As$by Electroreflectance Measurement)

  • 김동렬;손정식;김근형;이철욱;배인호
    • 한국전기전자재료학회논문지
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    • 제11권9호
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    • pp.687-692
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    • 1998
  • Silicon doped $Al_{0.32}Ga_{0.68}As$ were growth by molecular beam epitaxy. Electroreflectance(ER) spectra of the $E_1$ transition of Schottky barrier Au/n-$Al_{0.32}Ga_{0.68}As$ have been measured at various modulation voltage($V_{ac}$) and dc bias voltage($V_{bias}$). from the $E_1$peak, band gap energy of the $Al_{0.32}Ga_{0.68}As$ is 1.883 eV which corresponds to an Al composition of 32%. As modulation voltage($V_{bias}$) is changed, a line shape at the $E_1$transition does not change, but its amplitude varies linearly. The amplitude of $E_1$signal decrease with increasing the forward dc bias voltage($V_{bias}$), but the line shape does not change. It suggests that the low field theory rather than Franz-Keldysh oscillation is Required to interpret spectra. Also, spectra at the $E_1$transition were broadened with increasing the reverse dc bias voltage($V_{bias}$) which suggests the presence of Field-induced broadening.

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교류 순방향 바이어스에 따른 형광 OLED의 전계 발광 특성 (Electroluminescent Characteristics of Fluorescent OLED with Alternating Current Forward Bias)

  • 서정현;주성후
    • 한국표면공학회지
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    • 제50권5호
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    • pp.398-404
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    • 2017
  • In order to study the AC driving mechanism for OLED lighting, the fluorescent OLEDs were fabricated and the electroluminescent characteristics of the OLEDs by AC forward bias were analyzed. In the case of the driving method of OLED by AC forward bias under the same voltage and the same current density, degradation of luminescent characteristics for elapsed time progressed faster than in the case of the driving method by DC bias. These phenomena were caused by the peak voltage of AC forward bias which is ${\sqrt{2}}$ times higher than the DC voltage. In addition, the degradation of the OLED was accelerated because the AC forward bias had come close to the upper limit of the allowable voltage range even though the peak voltage didn't exceed the allowable range of the OLED. However, the fabricated fluorescent OLED showed little degradation of OLED characteristics due to AC forward bias from 0 V to 6.04 V. Therefore, OLED lighting by AC driving will become commercialized if sufficient luminance is realized at a voltage at which the characteristics of the OLED are not degradation by the AC driving method.

Negative bias voltage effect에 따른 Cr-Si-N 박막의 미세구조에 대한 연구 (Influence of negative bias voltage on the microstructure of Cr-Si-N films deposited by a hybrid system of AIP plus MS)

  • 신정호;김광호
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2009년도 춘계학술대회 논문집
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    • pp.130-131
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    • 2009
  • AIP(arc ion plating)방법과 마그네슘 스퍼터링(DC reactive magnetron sputtering) 방법을 결합시킨 하이브리드 코팅 시스템으로 Cr-Si-N 코팅막을 합성하였다. 고분해능 TEM 및 SEM 분석들로부터 negative bias voltage에 따른 미세구조의 영향을 나타내었다. negative bias voltage의 증가에 따라 columnar microstructure가 amorphous microstructure로 변화하였다. bias voltage effect에 의해 Cr-Si-N 코팅막내 입자의 크기가 미세해지고 나노 복합체를 잘 형성하였다.

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Control the growth direction of carbon nanofibers under direct current bias voltage applied microwave plasma enhanced chemical vapor deposition system

  • Kim Sung-Hoon
    • 한국결정성장학회지
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    • 제15권5호
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    • pp.198-201
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    • 2005
  • Carbon nanofibers were formed on silicon substrate which was applied by negative direct current (DC) bias voltage using microwave plasma-enhanced chemical vapor deposition method. Formation of carbon nanofibers were varied according to the variation of the applied bias voltage. At -250 V, we found that the growth direction of carbon nanofibers followed the applied direction of the bias voltage. Based on these results, we suggest one of the possible techniques to control the growth direction of the carbon nanofibers.

Effects of Phase Difference between Voltage loaves Applied to Primary and Secondary Electrodes in Dual Radio Frequency Plasma Chamber

  • Kim, Heon-Chang
    • 반도체디스플레이기술학회지
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    • 제4권2호
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    • pp.11-14
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    • 2005
  • In plasma processing reactors, it is common practice to control plasma density and ion bombardment energy by manipulating excitation voltage and frequency. In this paper, a dually excited capacitively coupled rf plasma reactor is self-consistently simulated with a three moment model. Effects of phase differences between primary and secondary voltage waves, simultaneously modulated at various combinations of commensurate frequencies, on plasma properties are investigated. The simulation results show that plasma potential and density as well as primary self-dc bias are nearly unaffected by the phase lag between the primary and the secondary voltage waves. The results also show that, with the secondary frequency substantially lower than the primary frequency, secondary self·do bias remains constant regardless of the phase lag. As the secondary frequency approaches to the primary frequency, however, the secondary self-dc bias becomes greatly altered by the phase lag, and so does the ion bombardment energy at the secondary electrode. These results demonstrate that ion bombardment energy can be more carefully controlled through plasma simulation.

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수평구동형 정전반발력 마이크로액추에이터 (Laterally-Driven Electrostatic Repulsive-Force Microactuator)

  • 이기방;조영호
    • 대한기계학회논문집A
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    • 제25권3호
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    • pp.424-433
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    • 2001
  • We present a new electrostatic repulsive-force microactuator using a lateral repulsive force induced by an asymmetric distribution of electrostatic field. The lateral repulsive force has been characterized by a simple analytical equation, derived from a finite element simulation. A set of repulsive force polysilicon microactuators has been designed and fabricated by a 4-mask surface-micromachining process. Static and dynamic micromechanical behavior of the fabricated microactuators has been measured at the atmospheric pressure for a varying bias voltage. The static displacement of the fabricated microactuator, proportional to the square of the DC bias voltage, is obtained as 1.27 $\mu\textrm{m}$ for the DC bias voltage of 140V. The resonant frequency of the repulsive-force microactuator increases from 11.7 kHz to 12.7 kHz when the DC bias voltage increases from 60V to 140V. The measured quality-factor varies from 12 to 13 for the bias volatge range of 60V∼140V. The characteristics of the electrostatic repulsive-force have been discussed and compared and compared with those of the conventional electrostatic attractive-force.

이온빔 합성법에 의해 증착된 다이아몬드성 카본 필름의 구조 및 특성 (Structure and properties of ion beam deposited diamond-like carbon films)

  • 김성화;이광렬;은광용
    • 한국진공학회지
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    • 제8권3B호
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    • pp.346-352
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    • 1999
  • Diamond-like carbon (DLC) lims were deposited by using end hall type ion gun. Benzene gas was used for the generation of carbon ions. In order to systematically control the ion energy, we applied to the substrate DC, pulsed DC or 250 kHz medium frequency bias voltage, DLC films of superior mechanical properties of hardness 39$\pm$4 GPa and elastic mudulus 290$\pm$50GPa (2 to 6 times better than those of the films deposited by plasma assisted CVD method) could be obtained. Deposition rate was much higher than when using Kaufman type ion source, which results from higher ion beam current of end hall type ion gun. The mechanical properties and atomic bond structure were independent of the bias voltage type ion gun. The mechanical properties and atomic bond structure were independent of the bias voltage type but intimately related with the magnitude of the bias voltage. With increasing the negative bias voltage, the structure of the films changed to graphitic one resulting in decreased content of three dimensional inter-links. Degradation of the mechanical properties with increasing bias voltage could be thus understood in terms of the content odf three dimensional inter-links.

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