• Title/Summary/Keyword: Czochralski silicon

Search Result 70, Processing Time 0.021 seconds

A numerical study on the effects of the asymmetric cusp magnetic field in 8 inch silicon single crystal growth by Czochralski method (초크랄스키법에 의한 8인치 실리콘 단결정 성장시 비대칭 커스프자장의 영향에 관한 연구)

  • 이승철;정형태;윤종규
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.6 no.1
    • /
    • pp.1-10
    • /
    • 1996
  • A numerical study was conducted on the effects of the cusp magnetic field in 8" silicon single crystal grwoth by Czochralski method. For a damping effects simulation by magnetic field, low reynolds number ${\kappa} - {\varepsilon}$ model was adopted. Symmetrci cusp magnetic field has a effect of damping streamline crystal, is lowerd with the increasing cusp magnetic field intensity. The uniformity of the oxygen concentration was improved. The asymmetirc cusp magnetic field increased the oxygen concentration however, oxygen concentration distribution in the radial direction was remained uniform. Suitable combination of symmetric and asymmetric cusp magnetic fields could give uniform and low oxygen concentration in the axial direction.tion.

  • PDF

Effect of non-uniform magnetic field on the thermal behavior and mass transfer in magnetohydrodynamic Czochralski crystal growth of silicon (Magnetic Czochralski 실리콘 단결정 성장에서 열 및 유체유동과 질량전달에 미치는 비균일 자장의 효과)

  • 김창녕
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.8 no.4
    • /
    • pp.555-562
    • /
    • 1998
  • Under the influence of non-uniform magnetic field, melt flow in steady state and oxygen concentration in unsteady state are numerically investigated. The strength of the applied characteristic magnetic fields are B=0.1T, 0.2T, and 0.3T, respectively. The buoyancy effects due to the crucible wall heating and the thermocapillary effects due to the surface tention at the free surface are suppressed differentially by the non-uniform magnetic fields. As the intensity of characteristic magnetic fields is increasing, the recirculation region in the meridional plane is moving toward the growing crystal, and is diminishing. The oxygen concentration on the growing surface of crystals is decreasing and the uniformity of the oxygen concentration is increasing as the intensity of the magnetic fields is increasing.

  • PDF

Effect of crystal and crucible rotations on the mass transfer in magnetohydrodynamic Czochralski crystal growth of silicon (자기장이 가하여진 초크랄스키 실리콘 단결정 성장에서 질량전달에 미치는 성장결정과 도가니의 회전효과)

  • 김창녕
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.7 no.4
    • /
    • pp.536-547
    • /
    • 1997
  • For various angular velocities of crucible and crystal, the characteristics of melt flows, temperatures and concentrations of oxygen are numerically studied in the Czochralski furnace with a uniform axial magnetic field. Buoyancy effect due to the heating of crucible wall and thermocapillary effect due to the temperature gradient at the free surface, can be differentiably suppressed by the centrifugal forces due to the rotations of the crucible and crystal. The most important factor which yields the centrifugal forces is the rotation velocity of the crucible, that influences the fields of velocities, temperatures and concentrations. In the case that the crucible rotation velocity is not high, the rotations of the crystal gives rise to the centrifugal forces effectively.

  • PDF

Measurement of the temperature and velocity fluctuations occurred by the baroclinic instability in the melt for Czochralski crystal growth method (초크랄스키 단결정 성장 멜트에서 baroclinic 불안정에 의해 발생하는 유동과 온도 변동의 측정)

  • 손승석;이경우
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.10 no.6
    • /
    • pp.381-388
    • /
    • 2000
  • The temperature and velocity fluctuations occurred by the baroclinic instability in the melt for Czochralski crystal growth method were experimentally investigated. Wood's metal, which has similar Pr number to the silicon melt, was used as the working fluid and azimuthal velocity was measured using incorporated magnet probe. The azimuthal velocities near the free surface are faster than velocities near the bottom and the rotational velocities near the model crystal become very fast. The results of measured temperature fluctuation as increasing rotation rate were shown that baroclinic instability occurred at the region of Ro<1.01, Ta>$9.63{\times}10^8$. In these region, the fluctuations of temperature and velocity have the same frequency.

  • PDF

X-X: Single-Crystalline Si TFTs Fabricated with ${\mu}-Czochralski$ (grain-filter) process

  • Ishihara, R.;Dijk, B.D.van;Wilt, P.Ch. van der;Metselaar, J.W.;Beenakker, C.I.M.
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2002.08a
    • /
    • pp.159-162
    • /
    • 2002
  • This paper reviews an advanced excimer-laser crystallization technique enabling precise location-control of the individual grains. With the developed ${\mu}$-Czochralski (grain-filter) process, the large grains having a diameter of 6 ${\mu}m$ can be set precisely at predetermined positions. We will also discuss the performance of the single-crystalline Si TFTs that are formed within the location-controlled Si grains. The field-effect mobility for electrons is 430 $cm^2/Vs$ on average, which is well comparable to that of TFTs made with silicon-on-insulator wafers.

  • PDF

Research for High Quality Ingot Production in Large Diameter Continuous Czochralski Method (대구경 연속성장 초크랄스키법에서 고품질 잉곳 생산을 위한 연구)

  • Lee, Yu Ri;Jung, Jae Hak
    • Current Photovoltaic Research
    • /
    • v.4 no.3
    • /
    • pp.124-129
    • /
    • 2016
  • Recently industry has voiced a need for optimally designing the production process of low-cost, high-quality ingots by improving productivity and reducing production costs with the Czochralski process. Crystalline defect control is important for the production of high-quality ingots. Also oxygen is one of the most important impurities that influence crystalline defects in single crystals. Oxygen is dissolved into the silicon melt from the silica crucible and incorporated into the crystalline a far larger amount than other additives or impurities. Then it is eluted during the cooling process, there by causing various defect. Excessive quantities of oxygen degrade the quality of silicone. However an appropriate amount of oxygen can be beneficial. because it eliminates metallic impurities within the silicone. Therefore, when growing crystals, an attempt should be made not to eliminate oxygen, but to uniformly maintain its concentration. Thus, the control of oxygen concentration is essential for crystalline growth. At present, the control of oxygen concentration is actively being studied based on the interdependence of various factors such as crystal rotation, crucible rotation, argon flow, pressure, magnet position and magnetic strength. However for methods using a magnetic field, the initial investment and operating costs of the equipment affect the wafer pricing. Hence in this study simulations were performed with the purpose of producing low-cost, high-quality ingots through the development of a process to optimize oxygen concentration without the use of magnets and through the following. a process appropriate to the defect-free range was determined by regulating the pulling rate of the crystals.

Relationships between Carrier Lifetime and Surface Roughness in Silicon Wafer by Mechanical Damage (기계적 손상에 의한 실리콘 웨이퍼의 반송자 수명과 표면 거칠기와의 관계)

  • 최치영;조상희
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.12 no.1
    • /
    • pp.27-34
    • /
    • 1999
  • We investigated the effect of mechanical back side damage in viewpoint of electrical and surface morphological characteristics in Czochralski silicon wafer. The intensity of mechanical damage was evaluated by minority carrier recombination lifetime by laser excitation/microwave reflection photoconductance decay technique, atomic force microscope, optical microscope, wet oxidation/preferential etching methods. The data indicate that the higher the mechanical damage degree, the lower the minority carrier lifetime, and surface roughness, damage depth and density of oxidation induced stacking fault increased proportionally.

  • PDF

Interpretation of the Asymmetric Color and Shape of Brownish Ring in Quartz Crucible

  • Jung, YoonSung;Choi, Jae Ho;Min, Kyung Won;Byun, Young Min;Im, Won Bin;Kim, Hyeong-Jun
    • Journal of the Semiconductor & Display Technology
    • /
    • v.21 no.4
    • /
    • pp.50-52
    • /
    • 2022
  • Brownish rings (BRs) with white interiors are formed during the manufacture of silicon ingots in quartz glass crucibles. These BRs inhibit the yield of silicon ingots. However, the composition and mechanism of the formation of these BRs remain unclear thus far. Therefore, in this study, we analyzed the color and shape of these BRs. Raman analysis revealed that the brown and white colors appear owing to oxygen deficiency rather than crystallization from excess oxygen supply as previously assumed. Moreover, the dark shade of the brown areas depends on the degree of oxygen deficiency and the asymmetrical width of the brown areas is attributed to the direction of the molten silicon flow, which is influenced by the rotation and heat of the ingot crucible.

Influence of relative distance between heater and quartz crucible on temperature profile of hot-zone in Czochralski silicon crystal growth (쵸크랄스키법 실리콘 성장로에서 핫존 온도분포 경향에 대한 히터와 석영도가니의 상대적 위치의 영향)

  • Kim, Kwanghun;Kwon, Sejin;Kim, Ilhwan;Park, Junseong;Shim, Taehun;Park, Jeagun
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.28 no.5
    • /
    • pp.179-184
    • /
    • 2018
  • To lessen oxygen concentrations in a wafer through modifying the length of graphite heaters, we investigated the influence of relative distance from heater to quartz crucible on temperature profile of hot-zone in Czochralski silicon-crystal growth by simulation. In particular, ATC temperature and power profiles as a function of different ingot body positions were investigated for five different heater designs; (a) typical side heater (SH), (b) short side heater-up (SSH-up), (c) short side heater-low (SSH-low), (d) bottom heater without side heater (Only-BH), and (e) side heater with bottom heater (SH + BH). It was confirmed that lower short side heater exhibited the highest ATC temperature, which was attributed to the longest distance from triple point to heater center. In addition, for the viewpoint of energy efficiency, it was observed that the typical side heater showed the lowest power because it heated more area of quartz crucible than that of others. This result provides the possibility to predict the feed-forward delta temperature profile as a function of various heater designs.

Effect of argon flow on the quality of Czochralski silicon crystal (쵸크랄스키 실리콘 단결정의 특성에 미치는 아르곤 유동의 영향)

  • 김정민;이홍우;최준영;유학도
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.10 no.2
    • /
    • pp.91-95
    • /
    • 2000
  • The effects of argon gas flow on the axial temperature gradient near the interface, the oxygen concentration, and the radial oxygen uniformity was investigated for 8-inch CZ silicon growth. As argon flow rate was increased, the temperature gradient was increased in the crystal near the crystavmelt interface and the oxygen content in the crystal was decreased. But the radial oxygen uniformity was deteriorated. It was found that argon flow is one of the important growing parameters to affect the quality of crystals such as oxygen content and uniformity.

  • PDF