• Title/Summary/Keyword: Czochralski Single Crystal Growth

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Automatic diameter control system for Czochralski growth (자동직경제어 Czochralski 성장장치의 제작)

  • Han, J.Y.;Park, S.S.;Lee, S.K.;Ma, D.J.;Kim, Y.H.;Lee, S.H.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.4 no.4
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    • pp.356-362
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    • 1994
  • We developed a computer controlled Czochralski puller which automated entire crystal growing processes. Crystal weighing technique was employed for an automatic diameter control. The performance of the system was evaluated by the growth of $LiNbO_3$ single crystals.

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Magnetic field effects of silicon melt motion in Czochralski crystal puller (초크랄스키 단결정 장치내 실리콘 용융액 운동의 자기장효과)

  • Lee, Jae-Hee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.15 no.4
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    • pp.129-134
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    • 2005
  • A numerical analysis was performed on magnetic field effects of silicon melt motion in Czochralski crystal puller. The turbulent modeling was used to simulate the transport phenomena in 18' single crystal growing process. For small crucible angular velocity, the natural convection is dominant. As the crucible angular velocity is increased, the forced convection is increased and the distribution of temperature profiles is broadened. The cusp magnetic field reduces effectively the natural and forced convection near the crucible and the temperature profiles of the silicon fluids is similar in the case of conduction.

Defects analysis of RE : YAG (RE = Nd3+, Er3+) single crystal synthesized by Czochralski method (Czochralski법으로 성장된 RE : YAG(RE = Nd3+, Er3+) 단결정의 결함분석)

  • Park, Cheong Ho;Joo, Young Jun;Kim, Hye Young;Shim, Jang Bo;Kim, Cheol Jin
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.26 no.1
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    • pp.1-7
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    • 2016
  • RE : YAG ($RE=Nd^{3+}$, $Er^{3+}$) single crystals are laser diodes and generally grown by Czochralski method with controlling the various growth parameter. Since the defects occurred by temperature gradient or the rotation speed of solid-liquid growth interface act as the decline of crystal optical property during the growth procedure, crystalline quality improvement via defects analysis is necessary. The etch pit density (EPD) analysis was used to confirm the surface defect of grown RE : YAG single crystal and to select the area of transmission electron microscopy (TEM) analysis. Defects in the specimen produced by tripod polishing method such as buckling, rod shaped, bend contours by internal stress, segregation and others were observed by using 200 kV TEM and 300 kV FE-TEM.

Single crystal growth of $ZnWO_4$ by the CZ and its physical properties (CZ법에 의한 $ZnWO_4$단결정 성장 및 물리적 특성)

  • 임창성;오근호
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.11 no.5
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    • pp.211-217
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    • 2001
  • Czochralski법에 의한 ZnWO₄단결정을 [100], [101], [001] 방향으로 성공적으로 성장시켰다. 각 축 방향에 따른 성장조건이 rotation speed, pulling rate, 성장된 결정의 직경 등의 변수를 가지고 조사되어졌다. 성장된 결정의 냉각시 발생되는 균열을 annealing 효과에 의하여 방지할 수 있었다. 성장된 결정의 방위는 Laue back reflection으로 결정하였다. 각 축 방향으로 성장된 결정의 미세구조적 특징이 논하여졌으며, 경도, 열팽창계수 및 유전상수의 물리적 특성이 평가되어졌다.

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The latest development in the preparation of indium phosphide (InP) poly- crystals and single crystals

  • Guohao Ren;Kyoon Choi;Eui-Seok Choi;Myung-Hwan Oh
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.13 no.5
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    • pp.222-229
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    • 2003
  • InP crystal is an increasingly important semiconductor material in the application of long-wave optoelectronic and high frequency devices. The equilibrium vapor pressure of phosphorus at the melting point of InP is so high that the synthesis process is very difficult. Liquid-encapsulated Czochralski (LEC) pulling from the melt at high pressure is a generally favored technique to grow InP single crystals. This technique involves two steps: the synthesis of polycrystalline powder and the growth of single crystal from the melt at high pressure. This article reviewed the latest development in the preparation of InP crystal and the evaluation on the crystal quality.

A study on the periodical domain obtained in Nd : $LiNbO_3$ sinlgle crystals grown by czochralski method (Czochralski법에 의해 성장시킨 Nd : $LiNbO_3$ 단결정의 주기적인 domain제어에 관한 연구)

  • 최종건
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.12 no.1
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    • pp.50-55
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    • 2002
  • $Nd_2O_3$0.2~0.5 wt.% doped $LiNbO_3$single crystals were grown by the Czochralski method. The ZnO doping by 2~8 mole% can improve the resistance of optical damage. In this study, Nd : LiNbO$_3$ single crystals with the periodical domain structure were obtained by CZ method.

Quality evaluation of diamond wire-sawn gallium-doped silicon wafers

  • Lee, Kyoung Hee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.23 no.3
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    • pp.119-123
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    • 2013
  • Most of the world's solar cells in photovoltaic industry are currently fabricated using crystalline silicon. Czochralski-grown silicon crystals are more expensive than multicrystalline silicon crystals. The future of solar-grade Czochralski-grown silicon crystals crucially depends on whether it is usable for the mass-production of high-efficiency solar cells or not. It is generally believed that the main obstacle for making solar-grade Czochralski-grown silicon crystals a perfect high-efficiency solar cell material is presently light-induced degradation problem. In this work, the substitution of boron with gallium in p-type silicon single crystal is studied as an alternative to reduce the extent of lifetime degradation. The diamond-wire sawing technology is employed to slice the silicon ingot. In this paper, the quality of the diamond wire-sawn gallium-doped silicon wafers is studied from the chemical, electrical and structural points of view. It is found that the characteristic of gallium-doped silicon wafers including texturing behavior and surface metallic impurities are same as that of conventional boron-doped Czochralski crystals.

Effect of Applied Magnetic Fields on Czochralski Single Crystal Growth (Czochralski 단결정 성장특성제어를 위한 자장형태에 관한 연구)

  • 김창녕;김경훈
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.3 no.1
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    • pp.18-30
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    • 1993
  • A numerical analysis has been carried out on the Czochralski flow fields when uniform and nonuniform magnetic fields are applied. Czochralski flow fields are governed by buoyancy forces, thermocapillarity, centrifugal forces, and applied magneic fields. In this analysis, pressure and three components of velocity vectors are obtained, and circumferential electrical currents are calculated. When a uniform magnetic field is applied, all the velocity components are decreased and the circumferential electric currents near the crystal surface are increased as the magnetic field intensity is increased. In the case of a nonuniform field, the flows in a meridional plane are suppressed and the circumferential velocity is increased as the non uniformity is increased. The understanding on the Czochralski flow fields under the influence of magnetic fields can lead to the study on the behavior of the concentration of the solute and impurities.

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Melt-Crystal Interface Shape Formation by Crystal Growth Rate and Defect Optimization in Single Crystal Silicon Ingot (단결정 실리콘 잉곳 결정성장 속도에 따른 고-액 경계면 형성 및 Defect 최적화)

  • Jeon, Hye Jun;Park, Ju Hong;Artemyev, Vladimir;Jung, Jae Hak
    • Current Photovoltaic Research
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    • v.8 no.1
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    • pp.17-26
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    • 2020
  • It is clear that monocrystalline Silicon (Si) ingots are the key raw material for semiconductors devices. In the present industries markets, most of monocrystalline Silicon (Si) ingots are made by Czochralski Process due to their advantages with low production cost and the big crystal diameters in comparison with other manufacturing process such as Float-Zone technique. However, the disadvantage of Czochralski Process is the presence of impurities such as oxygen or carbon from the quartz and graphite crucible which later will resulted in defects and then lowering the efficiency of Si wafer. The heat transfer plays an important role in the formation of Si ingots. However, the heat transfer generates convection in Si molten state which induces the defects in Si crystal. In this study, a crystal growth simulation software was used to optimize the Si crystal growth process. The furnace and system design were modified. The results showed the melt-crystal interface shape can affect the Si crystal growth rate and defect points. In this study, the defect points and desired interface shape were controlled by specific crystal growth rate condition.

Relation Between the Growth Twin and the Morphology of a Czochralski Silicon Single Crystal (초크랄스키 실리콘 단결정에서 성장 쌍정과 결정 외형의 관계)

  • 박봉모
    • Korean Journal of Crystallography
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    • v.11 no.4
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    • pp.207-211
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    • 2000
  • In a Czochralski silicon single crystal, the relation between the growth twin and the crystal morphology was investigated. The growth twin is nucleated on the {111} facet planes near the growth ridges. When a {111} growth twin is formed in the <100> silicon crystal, the growth ridge where twin is nucleated will continuous through the twin plane. Other two ridges at the 90。 apart will be displaced about 33° and be deformed to facets. The ridge on the opposite side of twin nucleation will disappear by forming a slight hill. Because the growth ridges of silicon is due to the {111} planes, the variation in the growth ridge formation can be predicted clearly by considering the change of the {111} plane traces in the stereographic projection after twining.

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