• Title/Summary/Keyword: Cu surface

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A Reliability Test for ph-free SnCu Plating Solution and It's Deposit (Sn-Cu 무연 도금용액 및 피막의 신뢰성평가)

  • Lee Hong-Kee;Hur Jin-Young
    • Journal of the Korean institute of surface engineering
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    • v.38 no.6
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    • pp.216-226
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    • 2005
  • Pb-Free Technology was born with environmental problems of electronic component, Being connected by big and small project of every country. Also, in each country environment is connected and various standards of IEC, ISO, MIL, JIS, KS, JEDEC, EIAJ etc. All products can divide at solder part and finishing part These can tested each and synthetically divide. This research is reliability evaluation for three kind of ph-free SnCu solder plating solution and it's deposit. First, executed analysis about Pure Sn, SnCu solutions and plating surface by way similar to other plating solution analysis. Next, executed reliability about test method and equipment for reliable analyzer system construction. Next, data comparison and estimation, main estimation test method and item's choice. In this paper the systematic surface analysis and reliability for plating solutions and it's deposit in metal surface finishing processes could be shown.

Effect of Plating Condition and Surface on Electroless Co-Cu-P Alloy Plating Rate (무전해 Co-Cu-P 도금속도에 미치는 도금 조건과 표면상태의 영향)

  • Oh, L.S.
    • Journal of Power System Engineering
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    • v.4 no.2
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    • pp.31-39
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    • 2000
  • Relationships between the plating condition and the plating rate of the deposition film for the electroless plating of Co-Cu-P alloy were discussed in this report. The result obtained from this experiment were summarized as follow ; The optimum bath composition was consisted of 0.8 ppm thiourea as a stabilizing agent. Composition of the deposit was found to be uniform after two hours of electroless plating. Plating rates of nickel-catalytic surface and zincate-catalytic surface were found to be very closely equal, but the plating time of nickel-catalytic surface took longer than that of the zincated-catalytic surface.

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Galvanic Corrosion of AZ31 Mg Alloy Contacting with Copper

  • Phuong, Nguyen Van;Moon, Sungmo
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2017.05a
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    • pp.151.1-151.1
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    • 2017
  • This work studied the corrosion behavior of AZ31 Mg alloy galvanically coupled with Cu during immersion in 0.1 and 0.5 M NaCl solutions by in-situ observation and galvanic corrosion current measurement using a zero resistance ammeter. The corrosion behavior of AZ31 Mg alloy was also studied by salt spray test. The average galvanic corrosion density during 2 h immersion in 0.1 NaCl solution was found to decrease as an exponential function with increasing the surface area ratios between AZ31:Cu or with increasing the distance between AZ31 and Cu. The corrosion of electrodeposited Cu on AZ31 Mg alloy was concentrated at the area next to Cu (about 5 mm for immersion test and 2 mm for salt spray test) and pitting corrosion was accelerated at the area beyond the severely corroded area by the galvanic coupling effect.

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Effect of Current Density and Solution pH on Properties of Electrodeposited Cu Thin Films from Sulfate Baths for FCCL Applications (Sulfate 용액을 이용하여 전기도금 한 FCCL용 Cu 필름의 특성에 미치는 전류밀도와 pH의 영향)

  • Shin, Dong-Yul;Park, Doek-Yong;Koo, Bon-Keup
    • Journal of the Korean institute of surface engineering
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    • v.42 no.4
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    • pp.145-151
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    • 2009
  • Nanocrystalline Cu thin films for FCCL were electrodeposited from sulfate baths to investigate systematically the influences of current density, solution pH on current efficiency, residual stress, surface morphology, and microstructure of thin Cu films. Current efficiencies were measured to be approximately 100%, irrespective of the applied current density and solution pH. But these influenced residual stress, surface morphology, XRD pattern, and grain size of electrodeposited Cu thin film. The residual stress decreased with decreasing the surface roughness, but increased with increasing the fcc(111) peak strength of XRD patterns.

Nano-Scale Surface Observation of Cyclically Deformed Copper and Cu-Al Single Crystals (반복변형된 Cu 및 Cu-Al 단결정 표면형상의 나노-스케일 관찰)

  • 최성종;이권용
    • Tribology and Lubricants
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    • v.16 no.5
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    • pp.389-394
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    • 2000
  • Scanning Probe Microscope (SPM) such as Scanning Tunneling Microscope (STM) and Atomic Force Microscope (AEM) was shown to be the powerful tool for nano-scale characterization of material surfaces. Using this technique, surface morphology of the cyclically deformed Cu or Cu-Al single crystal was observed. The surface became proportionately rough as the number of cycles increased, but after some number of cycles no further change was observed. Slip steps with the heights of 100 to 200 nm and the widths of 1000 to 2000 nm were prevailing at the stage. The slipped distance of one slip system at the surface was not uniform, and formation of the extrusions or intrusions was assumed to occur such place. By comparing the morphological change caused by crystallographic orientation, strain amplitude, number of cycles or stacking fault energy, some interesting results which help to clarify the basic mechanism of fatigue damage were obtained. Furthermore, applicability of the scanning tunneling microscopy to fatigue damage is discussed.

FE-SEM Image Analysis of Junction Interface of Cu Direct Bonding for Semiconductor 3D Chip Stacking

  • Byun, Jaeduk;Hyun, June Won
    • Journal of the Korean institute of surface engineering
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    • v.54 no.5
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    • pp.207-212
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    • 2021
  • The mechanical and electrical characteristics can be improved in 3D stacked IC technology which can accomplish the ultra-high integration by stacking more semiconductor chips within the limited package area through the Cu direct bonding method minimizing the performance degradation to the bonding surface to the inorganic compound or the oxide film etc. The surface was treated in a ultrasonic washer using a diamond abrasive to remove other component substances from the prepared cast plate substrate surface. FE-SEM was used to analyze the bonding characteristics of the bonded copper substrates, and the cross section of the bonded Cu conjugates at the sintering junction temperature of 100 ℃, 150 ℃, 200 ℃, 350 ℃ and the pressure of 2303 N/cm2 and 3087 N/cm2. At 2303 N/cm2, the good bonding of copper substrate was confirmed at 350 ℃, and at the increased pressure of 3087 N/cm2, the bonding condition of Cu was confirmed at low temperature junction temperature of 200 ℃. However, the recrystallization of Cu particles was observed due to increased pressure of 3087 N/cm2 and diffusion of Cu atoms at high temperature of 350 ℃, which can lead to degradation in semiconductor manufacturing.

Effects of Wheel Condition on Solidification Characteristics of Al-Cu Polycrystalline Ribbon (Al-Cu 다결정 리본의 응고거동에 미치는 휠조건의 영향)

  • Kim, Ju-Hyung;Lee, Sang-Mok;Hong, Chun-Pyo
    • Journal of Korea Foundry Society
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    • v.17 no.3
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    • pp.276-285
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    • 1997
  • The effect of wheel surface condition on solidification behavior of Al-Cu ribbon was investigated in order to establish extreme levels of heat extraction. The condition of wheel surface was changed either by heating the wheel surface up to $200^{\circ}C$ or by coating boron nitride(BN) onto the the rim of a wheel. Heating the wheel surface up to $200^{\circ}C$ improved the wetting behavior between the molten metal and the rotating wheel, leading to an increase in the ratio of columnar structure to the entire thickness of Al-4.3wt%Cu and Al-33.2wt%Cu ribbons. For Al-4.3wt%Cu ribbon, assuming one grain as a single heterogeneous nucleation event at the contact point, the nucleation density with the wheel surface heated to $200^{\circ}C$, was $4{\times}10^6/mm^2$, and in the cases of BN coating with thin and thick layers, $10^5/mm^2$ and $5{\times}10^4/mm^2$, respectively. The largest cooling capacity of the wheel corresponded to the heated wheel surface, and as the thickness of BN coating layer increased, the cooling capacity of the wheel gradually decreased.

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Sliding Wear Behavior of Pure Metal, Fe and Cu Having a Cubic Crystal System (입방정계 순 금속 Fe, Cu의 미끄럼 마멸 거동)

  • Yi, S.K.;Kim, Y.S.
    • Transactions of Materials Processing
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    • v.19 no.6
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    • pp.357-362
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    • 2010
  • Dry sliding wear behavior of pure Fe and Cu which have BCC and FCC crystal structure, respectively, was investigated. The wear characteristics of the pure metals with different crystal structure were compared. Dry sliding wear tests were carried out using a pin-on-disk wear tester at various loads under the constant sliding speed condition of 0.15 m/s against a silica ball at room temperature. Sliding distance was fixed as 600 m for all wear tests. Wear rate of a specimen was calculated by dividing the weight loss of the specimen after the test by the specific gravity and sliding distance. Worn surfaces and wear debris were analyzed by SEM. The wear of both pure Fe and Cu proceeded with surface deformation, resulting in similar wear rates despite of their structure difference under the current test conditions. Wear rates of both metals were low if the surface deformation due to wear forms thick surface-deformation layer that is strain hardened beneath the wearing surface. The pure Cu specimens showed a lot of oxides on the worn surface when tested at low loads less than 5 N, which resulted in very low wear rate.

Characteristics of Electomigration & Surface Hardness about Tungsten-Carbon-Nitrogen(W-C-N) Related Diffusion Barrier (W-C-N 확산방지막의 전자거동(ElectroMigration) 특성과 표면 강도(Surface Hardness) 특성 연구)

  • Kim, Soo-In;Hwang, Young-Joo;Ham, Dong-Shik;Nho, Jae-Kue;Lee, Jae-Yun;Park, Jun;Ahn, Chan-Goen;Kim, Chang-Seong;Oh, Chan-Woo;Yoo, Kyeng-Hwan;Lee, Chang-Woo
    • Journal of the Korean Vacuum Society
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    • v.18 no.3
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    • pp.203-207
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    • 2009
  • Copper is known as a replacement for aluminum wire which is used for semiconductor. Because specific resistance of Cu ($1.67{\mu}{\Omega}$-cm) is lower than that of Al ($2.66{\mu}{\Omega}$-cm), Cu reduce RC delay time. Although melting point of Cu($1085^{\circ}C$) is higher than melting point of Al, Cu have characteristic to easily react with Silicon(Si) in low temperature, and it isn't good at adhesive strength with Si. For above these reason, research of diffusion barrier to prevent reaction between Cu and Si and to raise adhesive strength is steadily advanced. Our study group have researched on W-C-N (tungsten-carbon-nitrogen) Diffusion barrier for preventing diffusion of Cu through semiconductor. By recent studies, It's reported that W-C-N diffusion barrier can even precent Cu and Si diffusing effectively at high temperature. In this treatise, we vaporized different proportion of N into diffusion barrier to research Cu's Electromigration based on the results and studied surface hardness in the heat process using nano scale indentation system. We gain that diffusion barrier containing nitrogen is more stable for Cu's electromigration and has stronger surface hardness in heat treatment process.