• Transactions of the Korean Society of Mechanical Engineers A
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• v.29 no.4 s.235
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• pp.511-517
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• 2005

Fretting fatigue is often the root cause of the nucleation of cracks at attachments of structural components. Since fretting fatigue damage accumulation occurs over relatively small volumes, the subsurface cyclic plastic strain is expected to be rather non-uniformly distributed in polycrystalline materials. The scale of the cyclic plasticity and the damage process zones is often on the order of microstructure dimensions. Fretting damage analyses using cyclic crystal plasticity constitutive models have the potential to account for the influence of size, morphology, and crystallographic orientation of grains on fretting damage evolution. Two-dimensional plane strain simulations of fretting fatigue are performed using the cyclic properties of Ti-6Al-4V. The crystal plasticity simulations are compared to an initially isotropic $J_{2}$ theory with nonlinear kinematic hardening as well as to experiments. The influence of initially isotropic versus textured microstructure in the presence of crystallographic slip is studied.

• Journal of the Korean Ceramic Society
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• v.35 no.5
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• pp.505-511
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• 1998

The silicide formation mechanisms of Co/Hf and Co/Nb bilayer on (100) Si have been investigated. We ob-served that crystallographic orientationso f the 500$^{\circ}C$ formed cobalt silcides were different each other with the varying intermediate layers. Epitaxial and non-epitaxial CoSi2 formed simultaneously in Co/Hf/(100Si. While only non-epitaxial CoSi2 formed in Co/Nb/(100) Si. The reason why the crystallographic orientation of CpSi2 is different for those two systems seemed to be relate to the formation and decomposition of stable reaction barriers at high temperature. The stable reaction barrier formed at high temperature could control the uniform diffusion of Co atoms which enables epitaxial growth of CoSi2.

• Journal of the Korean institute of surface engineering
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• v.28 no.6
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• pp.386-392
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• 1995

The RF planar magnetron sputtering technique was used to fabricate uniform ZnO/$SiO_2$/Si thin films at high growth rate. A detailed crystallographic character of these thin films has been carried oct using XRD, XRC, and SEM. These thin films have the configuration of c-axis orientation perpendicular to $SiO_2$/ Si substrate. The dependence of the thickness of ZnO/$SiO_2$/Si films on applied RF power parameters was also investigated. The crystallinity of films was improved as the substrate temperature was high, RF input power increased, and Ar/$O_2$ ratio decreased. Also, most of ZnO films fabricated on $SiO_2$/Si were suitable for SAW filter since a standard deviation of XRC (002) peak was less than $6^{\circ}$. The presence of the $SiO_2$ layer has a beneficial effect on the crystalline quality of the grown ZnO films.

• 연구논문집
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• s.31
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• pp.113-125
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• 2001

Silicon addition in titanium alloys generally results in solid solution hardening by silicon itself and precipitation hardening by titanium silicides. The morphology and distribution of the titanium silicides depend upon the alloy chemistry or the heat treatment condition, and play an important role in improving the mechanical properties of the alloys. In this study, the morphology and crystallographic characteristics of the titanium silicides in the Ti-Fe-Si alloy system were studied. Three types of silicides were found in the alloys; (1) interconnected chain-like silicides at grain boundary, (2) coarse silicides over im, (3) fine silicides smaller than 0.2m. Ti3Si was dominant in cast + HIP condition while Ti5Si3 was dominant in as-cast state. It is recognized that $Ti_5Si_3$$\rightarrow$$Ti_3Si$ transition occurred by the peritectoid reaction and it may be promoted by the pressure during HIP. However, in the case of the fine silicides, $Ti_3Si$ and $Ti_5Si_3$ were found simultaneously even after HIP. Such a fine silicide was found to have a crystallographic orientation relationship with matrix.

• Korean Journal of Materials Research
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• v.26 no.4
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• pp.207-211
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• 2016

Ti films were deposited on glass substrates under various preparation conditions in a chamber of two-facing-target type dc sputtering; after deposition, the electric resistivity values were measured using a conventional four-probe method. Crystallographic orientations and microstructures, including the texture and columnar structure, were also investigated for the Ti films. The morphological features, including the columnar structures and surface roughness, are well explained on the basis of Thornton's zone model. The electric resistivity and the thermal coefficient of the resistivity vary with the sputtering gas pressure. The minimum value of resistivity was around 0.4 Pa for both the $0.5{\mu}m$ and $3.0{\mu}m$ thick films; the apparent tendencies are almost the same for the two films, with a small difference in resistivity because of the different film thicknesses. The films deposited at high gas pressures show higher resistivities. The maximum of TCR is also around 0.4 Pa, which is the same as that obtained from the relationship between the resistivity and the gas pressure. The lattice spacing also decreases with increasing sputtering gas pressure for both the $0.5{\mu}m$ and $3.0{\mu}m$ thick films. Because they are strongly related to the sputtering gas pressures for Ti films that have a crystallographic anisotropy that is different from cubic symmetry, these changes are well explained on the basis of the film microstructures. It is shown that resistivity measurement can serve as a promising monitor for microstructures in sputtered Ti films.

• Korean Journal of Materials Research
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• v.25 no.11
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• pp.630-635
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• 2015

The fatigue strength of a nickel-base superalloy was studied. Stress-controlled fatigue tests were carried out at $700^{\circ}C$ and 5 Hz using triangular wave forms. In this study, two kinds of testing procedures were adopted. One is the conventional tension-zero fatigue test(R = 0). The other was a procedure in which the maximum stress was held at 1000 MPa and the minimum stress was diverse from zero to 1000 MPa at 24 and $700^{\circ}C$. The results of the fatigue tests at $700^{\circ}C$ indicate that the fracture mechanism changed according to both the mean stress and the stress range. At a higher stress range, ${\gamma}^{\prime}$ precipitates are sheared by a/2<110> dislocation pairs coupled by APB. Therefore, in a large stress range, the deformation occurred by shearing of ${\gamma}^{\prime}$ by a/2<110> dislocations, which brought about crystallographic shear fracture. As the stress range was decreased, the fracture mode gradually changed from crystallographic shear fracture to gradual growth of fatigue cracks. At an intermediate stress range, as it became more difficult for a/2<110> dislocation pairs to shear ${\gamma}^{\prime}$ particles, cracks started to propagate in the matrix, avoiding the harder ${\gamma}^{\prime}$ particles. High mean stress induced creep deformation, that is, ${\gamma}^{\prime}$ particles were sheared by {111}<112> slip systems, which led to the formation of stacking faults in the precipitates. Thus, the change in fracture mechanism brought about the inversion of the S-N curves.

• Korean Journal of Crystallography
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• v.5 no.2
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• pp.93-99
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• 1994

Growth form and surface morphology of NYAB single crystal grown by TSSG technique using a K2O/3MoOS/0.5B203 flux was investigated. In the crystal grown from <100> or <120> seed, prismatic and (101) faces were well developed with different size each other. (001) face was also developed in the crystal grown from <001> seed. While growth hillocks were observed on the prismatic face of the crystal grown from <100> seed, surface striations parallel to neighbor (101) faces were formed on that face of the crystal grown from <001> seed. The (101) faces were grown by two dimensional nucleation growth. (001) face which was developed at slow growth velocity of [001] direction was grown by screw dislocation Anisotropy of growth velocity as to seed orientation affected on crystal morphology and surface morphology.

• Journal of the Korean Ceramic Society
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• v.34 no.4
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• pp.373-379
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• 1997

A study on the deposition and characterization of BaTiO3 thin films on MgO-buffered Si(100) substrates by sputtering was conducted. The MgO buffer layers were investigated as a function of deposition temperature. At lower substrate temperature, the MgO layers were not fully crystalline, but a crystallized MgO layer with (001) preferred orientation was obtained at the substrate temperature of $700^{\circ}C$. Partially (00ι) or (h00) textured BaTiO3 films were obtained on Si(100) with the MgO buffer layer grown at 700ι. While, randomly oriented BaTiO3 films with large-scale cracks on the surface were made without the MgO layer. The crystallographic orientation, morphology and electrical properties between the BaTiO3 films on Si with and without the MgO layer were compared using the BaTiO3 film on MgO(100) single crystal substrate as a reference system. Also the favorable role of the MgO layer as a buffer for growing of oriented BaTiO3 films on Si substrates was confirmed.

• Korean Journal of Crystallography
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• v.12 no.4
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• pp.233-238
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• 2001

X-ray microdiffraction which uses x-ray beam focused down to a micron size from synchrotron radiation sources allow precision measurements of local orientation and strain variations in polycrystalline materials. Using x-ray microdiffraction setup at Pohang Light Source, we investigated the tex-ture of Cu interconnects with various widths on Si wafer by collecting Laue images and focused to about 2×3㎛ ² in size. Our results show that 1㎛ wide Cu interconnect had grains in rather ran- dom orientation. On the other hand the 20㎛ wide interconnects showed a 〈111〉fiber texture near the center. The grains were 2∼5㎛ long at the 1㎛ wide interconnect and 6∼8㎛ in size at the 20㎛ wide interconnect.

• Journal of the Semiconductor & Display Technology
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• v.5 no.1 s.14
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• pp.13-16
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• 2006

AIN thin films were prepared on amorphous glass and $SiO_2(1{\mu}m)/Si(100)$ substrate by the facing targets sputtering (FTS) apparatus, which can provide high density plasma, a high deposition rate at a low working gas pressure. The AIN thin films were deposited at a different nitrogen gas flow rate ($1.0{\sim}0.3$) and other sputtering parameters were fixed such as sputtering power of 200w, working pressures of 1mTorr and AIN thin film thickness of 800 nm, respectively. The thickness and crystallographic characteristics of AIN thin films as a function of $N_2$ gas flow rate $[N_2/(N_2+Ar)]$ were measured by $\alpha$-step and an X-ray diffraction (XRD) instrument. And the c-axis preferred orientations were evaluated by rocking curve. In the results, we could prepared the AIN thin film with c-axis preferred orientation of about $5^{\circ}$ on substrate temperature R.T. at nitrogen gas flow rate 0.7.