• Journal of Surface Science and Engineering
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• v.38 no.4
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• pp.137-143
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• 2005

CrSiN coatings of stepwise changing Si concentration were deposited on stainless steel by closed field unbalanced magnetron sputtering (CFUBM) system. Microstructure of the films due to the Si concentration is measured by XRD. The corrosion behavior of CrSiN coatings in deaerated $3.5\%$ NaCl solution was investigated by potentiodynamic test, electrochemical impedance spectroscopy (EIS) and surface analyses. The microstructure of CrSiN film depends on the Si concentration. When Si/(Cr+si) was under $11.7\%$, preferred orientation is defined at CrN(220), CrN(311) and $Cr_2N(111).$ The results of potentiodynamic polarization tests showed that the corrosion current density and porosity decreased with increasing Si/(Cr+si) ratio. EIS measurements showed that the corrosion resistance of Si-bearing CrN was improved by phase transformation of the film, which leads to increase of pore resistance and charge transfer resistance. At the Si(Cr+si) ratio of 20, the Si-bearing CrN possesses the best corrosion resistance due to the highest pore resistance and charge transfer resistance.

• Journal of Surface Science and Engineering
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• v.21 no.4
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• pp.176-182
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• 1988

Effects of Cr, Ni and W on the anodic polarization behavior were investigated for Fe-Cr-Ni-W alloys in deaerated 1N HCI solution. Surface films formed on the polarization were analysed using AES, SEM and EDAX. A higerconcentration of tungten was found in the surface oxide film compared to the matrix. It played an importanet role on incresing the stability of the passive film. The presence of an adequate amount of Cr was essential to increase the pitting resistance of the alloys in acid chloride media. Under 12 wt%cr,alloys containing 6wt%W did not exhidit any passivity at all. The main role of Ni was to control the microstructure rather than to modify the corrosion resistance. In 23 cr-14Ni-^W alloy, the duplex microstructure of ferrite($\delta$-phase) in an austenic matrix was developed. The reson why proferred pitting appeared in austenite and ferrite/austenite interface was that ferrite had more amount of Cr and W than austenite.

• Proceedings of the Korean Vacuum Society Conference
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• 1993.07a
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• pp.87-88
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• 1993

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.05a
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• pp.161-161
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• 2012

결정질 TiCrN과 AlSiN 나노층이 교대로 구성하는 나노 다층 TiAlCrSiN 박막은 음극 아크 플라즈마 증착법에 의해 증착되었다. 나노 다층 TiAlCrSiN 박막의 산화특성들은 $600{\sim}1000^{\circ}C$사이에서 대기 중 최대 70시간동안 연구 되었다. 형성된 산화물들은 주로 $Cr_2O_3$, ${\alpha}-Al_2O_3$, $SiO_2$ 그리고 rutile-$TiO_2$들로 구성되었다. 나노 다층 TiAlCrSiN 박막이 산화하는 동안, 가장 바깥쪽의 $TiO_2$층은 Ti 이온의 외부확산에 의해, 외부 $Al_2O_3$층은 Al이온의 외부확산에 의해 형성되었다. 동시에, 내부($Al_2O_3$, $Cr_2O_3$) 혼합층과 가장 안쪽의 $TiO_2$층은 산소이온의 내부확산에 의해 형성되었다.

• Applied Microscopy
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• v.24 no.4
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• pp.132-144
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• 1994

The application of TEM in investigating the evolution of microstructure during solid phase crystallization of the amorphous Si, $Si_{1-x}Ge_x,\;and\;Si_{1-x}Ge_x/Si$ films deposited on $SiO_2$ substrate, in identifying the failure mechanism of the TiN barrier layer in the Cu-metallization scheme, and in comparing the microstructure of the as-deposited Cu-Cr and Cu-Ti alloy films are discussed. First, it is identified that the evolution of microstructure in Si and $Si_{1-x}Ge_x$ alloy films strongly depends on the concentration of Ge in the film. Second, the failure mechanism of the TiN diffusion barrier in the Cu-metallization is the migration of the Cu into the Si substrate, which results in the formation of a dislocation along the Si {111} plane and precipitates (presumably $Cu_{3}Si$) around the dislocation. Finally, the microstructure of the as-deposited Cu-Cr and Cu-Ti alloy films is also quite different in these two cases. From these several cases, we demonstrate that the information which we obtained using TEM is critical in understanding the behavior of materials.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.11a
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• pp.110-110
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• 2012

아크이온플레이팅법과 스퍼터링법을 이용하여 금형의 보호코팅으로서 CrTiAlSiN 박막을 합성하였다. 연구는 CrTiAlN 피막에 Si이 첨가됨에 따른 농도변화가 피막의 경도 및 내열성에 미치는 영향을 조사하였다. Si 함유량 변화에 따른 특성의 변화에 대해 XRD, TGA, 경도분석, 윤활성의 분석을 통해 조사하였으며, 함성된 피막은 기존 CrN 박막 대비 내열성이 우수하게 향상되었으며 경도의 향상과 낮은 윤활성을 보였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.04a
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• pp.91-92
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• 2007

비대칭 마그네트론 스퍼터링을 이용하여 CrN / TaN 초격자 박막을 합성하였으며, 각층(bilayer)의 두께(${\lambda}$)를 4.3 nm에서 43 nm까지 제어하였다. X선 회절 패턴 분석 결과, 합성된 박막의 미세구조는 CrN (200) 방향과 TaN (200) 방향으로 성장하였으며, 각층의 두께 (${\lambda}$)에 따라 최대 31.2 GPa의 경도 값을 얻었다.

• Journal of Surface Science and Engineering
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• v.45 no.6
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• pp.257-263
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• 2012

CrN/AlN multilayer coatings with various bilayer periods in the range of 1.8 to 7.4 nm were synthesized using a closed-field unbalanced magnetron sputtering method. Their crystalline structure, chemical compositions and mechanical properties have been investigated with Auger electron spectroscopy, X-ray diffractometry, atomic force microscopy, nanoindentation, scratch tests. The properties of the multilayer coatings varied strongly depending upon the magnitude of the bilayer period. The multilayer coating with a bilayer period of 1.8 nm showed the maximum hardness and an elastic modulus of approximately 37.6 and 417 GPa, respectively, which was 1.54 times higher than the hardness predicted by the rule of mixture from the CrN and AlN coatings. The hardness of the multilayer coating increased as the bilayer period decreased, i.e. as the rotation speed increased. The Hall-Petch type relationship, hardness being related to (1/periodicity)$^{-1/2}$, suggested by Lehoczky was confirmed for the CrN/AlN multilayer coatings with bilayer period close to the 5-10 nm range. With decreasing bilayer period, the surface morphology of the films became rougher and the critical load of films for adhesion strength gradually decreased.

• Proceedings of the Korean Magnestics Society Conference
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• 1991.05a
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• pp.73-74
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• 1991

The films with ferromagnetic fine particles dispersed in nonmagnetic matrix, such as $Fe-Al_2O_3$ and Fe-Cu have been studied for use of magnetic recording medium, optically device and sensor. Their magnetic properties depend strongly on structural parameter such as size and volume fraction of ferromagnetic particles. Fe-Cr-Ni alloy sputtered films also have microstructure with ferromagnetic -- b.c.c phase and nonmagnetic f.c.c phase grains. Magnetic properties of these films depend strongly on such a unique structure. These are depend on the ratio in volume of ferromagnetic particles to nonmagnetic ones $V_F/V_N$, the saturation magnetization Ms increased with increase of $V_F/V_N$. The coercivity Hc of the as-deposited films took maximum value of about 200 Oe at adequate $V_F/V_N$ and then Ms and Squareness S were 500 emu/cc and 0.5, respectively.(omitted)

• Journal of Surface Science and Engineering
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• v.34 no.5
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• pp.421-428
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• 2001

New WC-CrN superlattice film was deposited on Si substrate (500$\mu\textrm{m}$) using cathodic arc ion plating system. The microstructure and mechanical properties of the film depend on the superlattice period (λ). In the X-ray diffraction analysis (XRD), preferred orientation of microstructure was changed according to various superlattice periods(λ). During the Transmission Electron Microscope analysis (TEM), microstructure and superlattice period (λ) of the WC - CrN superlattice film was confirmed. Hardness and adhesion of the deposited film was evaluated by nanoindentation test and scratch test, respectively. As a result of nanoindentation test, the hardness of WC - CrN superlattice film was gained about 40GPa at superlattice period (λ) with 7nm. Also residual stress with various superlattice period (λ) was measured on Si wafer (100$\mu\textrm{m}$) by conventional beam-bending technique. The residual stress of the film was reduced to a value of 0.2 GPa by introducing Ti - WC buffer layers periodically with a thickness ratio ($t_{buffer}$/$t_{buffer+superlattice}$ ). To the end, for the evaluation of oxidation resistance at the elevated temperature, CrN single layer and WC - CrN superlattice films with various superlattice periods on SKD61 substrate was measured and compared with the oxidation resistance.