• 한국지하수토양환경학회:학술대회논문집
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• 한국지하수토양환경학회 2001년도 추계학술발표회
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• pp.115-119
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• 2001

Contaminant retardation factor is derived from the colloidal and contaminant transport equations for a four-phase porous medium: an aqueous phase, two mobile colloidal phases, and a solid matrix. It is assumed that the contaminant sorption to solid matrix and colloidal particles and the colloidal deposition on solid matrix follow the linear isotherms. The behavior of the contaminant retardation factor in response to the change of model parameters is examined employing the experimental data of Magee et al. (1991) and Jenkins and Lion (1993). In the four-phase system, the contaminant retardation factor is determined by both the contaminant association with solid matrix and colloidal particles and the colloidal deposition on solid matrix. The contaminant mobility is enhanced when the affinity of contaminants to mobile colloids increases. In addition, as the affinity of colloids to solid matrix decreases, the contaminant mobility increases.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2000년도 춘계학술대회 논문집
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• pp.743-746
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• 2000

The removal of contaminants of silicon wafers has been investigated by various methods. Laser cleaning is the new dry cleaning technique to replace wafer wet cleaning in the near future. A dry laser cleaning uses inert gas jet to remove contaminant particles lifted off by the action of a KrF excimer laser. A laser cleaning model is developed to simulate the cleaning process and analyze the influence of contaminant particles and experimental parameters on laser cleaning efficiency. The model demonstrates that various types of submicrometer-sized particles from the front sides of silicon wafer can be efficiently removed by laser cleaning. The laser cleaning is explained by a particle adhesion model. including van der Waals forces and hydrogen bonding, and a particle removal model involving rapid thermal expansion of the substrate due to the thermoelastic effect. In addition, the experiment of wafer laser cleaning using KrF excimer laser was conducted to remove various contaminant particles.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2006년도 춘계학술대회
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• pp.145-149
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• 2006

As the minimum feature size decreases, it is more difficult to control critical contaminant particles. For 16GB flash memory introduced by Samsung a few months ago, 50nm process was used and in this case, contaminant particles as small as 25nm should be control led. The particle beam mass spectrometer (PBMS) was developed to directly sample particles at pressures down to 100 mtorr. This instrument is sensitive to small particles (>5nm) produced in low concentrations ($>20cm^{-3}$). The PBMS has proved to be effect ive in measuring particles generated during semi-conductor fabrication processes, such as low-pressure chemical vapor deposition (LPCVD) of thin films. The operating principle of the PBMS and some measurement results are reviewed in this paper.

• 한국정밀공학회지
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• 제25권9호
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• pp.109-115
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• 2008

The cleaning process of contaminant particles adhering to the microchips, integrated circuits (ICs) or the like is essential in modern microelectronics industry. In the cleaning process particularly working with the application of inert gases, the removal of contaminant particles of submicron scale is very difficult because the particles are prone to reside inside the boundary layer of the working fluid, The use of cryogenic $CO_2$ cleaning method is increasing rapidly as an alternative to solve this problem. In contrast to the merits of high efficiency of this process in the removal of minute particles compared to the others, even fundamental parametric studies for the optimal process design in this cleaning process are hardly done up to date, In this study, we attempted to measure the cleaning efficiency with the variations of some principal parameters such as mass flow rate, injection distance and angle, and tried to draw out optimal cleaning conditions by measuring and evaluating an effective cleaning width called $d_{50}$.

• Progress in Superconductivity
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• 제14권2호
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• pp.82-86
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• 2012

A sensitive eight-channel high-Tc Superconducting Interference Device (SQUID) detection system for magnetic contaminant in a lithium ion battery anode was developed. Finding ultra-small metallic foreign matter is an important issue for a manufacturer because metallic contaminants carry the risk of an internal short. When contamination occurs, the manufacturer of the product suffers a great loss from recalling the tainted product. Metallic particles with outer dimensions smaller than 100 microns cannot be detected using a conventional X-ray imaging system. Therefore, a highly sensitive detection system for small foreign matter is required. We have already developed a detection system based on a single-channel SQUID gradiometer and horizontal magnetization. For practical use, the detection width of the system should be increased to at least 65 mm by employing multiple sensors. In this paper, we present an 8-ch high-Tc SQUID roll-to-roll system for inspecting a lithium-ion battery anode with a width of 65 mm. A special microscopic type of a cryostat was developed upon which eight SQUID gradiometers were mounted. As a result, small iron particles of 35 microns on a real lithium-ion battery anode with a width of 70 mm were successfully detected. This system is practical for the detection of contaminants in a lithium ion battery anode sheet.

• 반도체디스플레이기술학회지
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• 제7권4호
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• pp.29-33
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• 2008

Rapid increase of integrity for recent semiconductor industry highly demands the development of removal technology of contaminated particles in the scale of a few microns or even smaller. It is known that the surface cleaning technology using $CO_2$ snow has its own merits of high efficiency. However, the detailed removal mechanism of particles using this technology is not yet fully understood due to the lack of sophisticated research endeavors. The detachment mechanism of particles from the substrates is known to be belonged in four types; rebounding, sliding, rolling and lifting. In this study, a modeling effort is performed to explain the detachment mechanism of a contaminant particle due to the rebounding caused by the vertical collision of the $CO_2$ snow. The Hertz and Johnson-Kendall-Roberts(JKR) theories are employed to describe the contact, adhesion and deformation mechanisms of the particles on a substrate. Numerical simulations are followed for several representative cases, which provide the perspective views on the dynamic characteristics of the particles as functions of the material properties and the initial inter-particle collision velocity.

• 한국해양공학회지
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• 제16권5호
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• pp.41-48
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• 2002

Numerical experiments are conducted using a three-dimensional baroclinic equation model and a Lagrangian method for clarifying the effect of th settling velocity on the suspended solids diffusion caused by the dredging and the reclamination works. Diffusion characteristics of the neutral particles and the weighting particles is experimented by the Lagrangian particles trajectory model, The results show that the diffusion characteristics of the suspended solids is effected by the settling velocity classified by the particles size in the density layered semi-closed bay. To estimate exactly the diffusion characteristics of the suspended solids and the contaminant with weight the three-dimensional baroclinic equation model and the three-dimensional Lagrangian particles trajectory model considering the settling velocity of the particle in the density layered semi-closed bay must be used.

• 반도체디스플레이기술학회지
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• 제22권4호
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• pp.66-71
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• 2023

This paper describes a hybrid cleaning method of silicon wafer combining nano-bubble and ultrasound to remove sub-micron particles and contaminants with minimal damage to the wafer surface. In the megasonic cleaning process of semiconductor manufacturing, the cavitation induced by ultrasound can oscillate and collapse violently often with re-entrant jet formation leading to surface damage. The smaller size of cavitation bubbles leads to more stable oscillations with more thermal and viscous damping, thus to less erosive surface cleaning. In this study, ultrasonic energy was applied to the wafer surface in the DI water to excite nano-bubbles at resonance to remove contaminant particles from the surface. A patented nano-bubble generator was developed for the generation of nano-bubbles with concentration of 1×10⁹ bubbles/ml and nominal nano-bubble diameter of 150 nm. Ultrasonic nano-bubble technology improved a contaminant removal efficiency more than 97% for artificial nano-sized particles of alumina and Latex with significant reduction in cleaning time without damage to the wafer surface.

• 대한지하수환경학회지
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• 제2권1호
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• pp.22-29
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• 1995

유동 세균 입자는 지체계수를 감소시키므로써 지하수에서 소수성 오염물의 이동을 촉진시킨다. 그 크기와 표면의 적당한 물리화학적 조건으로 인하여 세균은 효율적인 오염물의 운반자가 될 수 있다. 이러한 운반자가 있을 때, 그 계는 액상, 입상, 그리고 고상의 3 상으로 해석되어야한다. 오염물은 각 상에 모두, 혹은 그 중의 일부에 존재할 수 도 있다. 본 연구에서는 세균이 있는 경우, 생화학적으로 분해 가능한 유기성 오염물의 다공매질에서의 거동을 물질수지에 기초하여 수학적 모델로 묘사한다. 세균의 액상과 고상사이의 물질 전이 및 오염물의 액상과 입상사이의 물질 전이는 동역학적 관계식으로 나타냈다. 모델 결과를 일반화하기 위하여 무차원화를 수행했고, 그 해를 구하여 세균에 의한 오염물의 가속이송 효과를 알 수 있었다. 모델 결과는 문헌상의 실험결과와 비교되었다. 모델 결과로부터 오염물은 그 계의 Damkohler I 수가 10 이상일 경우 국지 평형 가정을 할 수 있었으며, 세균의 성장율과 주입 농도 등이 오염물의 청소에 아주 중요한 요소임을 알 수 있었다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2009년도 추계학술대회 논문집
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• pp.609-610
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• 2009