• Title/Summary/Keyword: Contact potential difference

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Scanning Kelvin Probe Microscopy analysis of silicon carbide device structures (Scanning Kelvin Probe Microscopy를 이용한 SiC 소자의 분석)

  • Jo, Yeong-Deuk;Ha, Jae-Geun;Koh, Jung-Hyuk;Bang, Uk;Kim, Sang-Cheol;Kim, Nam-Gyun;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.132-132
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    • 2008
  • Silicon carbide (SiC) is an attractive material for high-power, high-temperature, and high-frequency applications. So far, atomic force microscopy (AFM) has been extensively used to study the surface charges, dielectric constants and electrical potential distribution as well as topography in silicon-based device structures, whereas it has rarely been applied to SiC-based structures. In this work, the surface potential and topography distributions SiC with different doping levels were measured at a nanometer-scale resolution using a scanning kelvin probe force microscopy (SKPM) with a non-contact mode AFM. The measured results were calibrated using a Pt-coated tip and a metal defined electrical contacts of Au onto SiC. It is assumed that the atomically resolved surface potential difference does not originate from the intrinsic work function of the materials but reflects the local electron density on the surface. It was found that the work function of the Au deposited on SiC surface was higher than that of original SiC surface. The dependence of the surface potential on the doping levels in SiC, as well as the variation of surface potential with respect to the schottky barrier height has been investigated. The results confirm the concept of the work function and the barrier heights of metal/SiC structures.

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Implementation of EPS Motion Signal Detection and Classification system Based on LabVIEW (LabVIEW 기반 EPS 동작신호 검출 및 분석 시스템 구현)

  • Cheon, Woo Young;Lee, Suk Hyun;Kim, Young Chul
    • Smart Media Journal
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    • v.5 no.3
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    • pp.25-29
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    • 2016
  • This paper presents research for non-contact gesture recognition system using EPS(Electronic Potential Sensor) for measuring the human body of electromagnetic fields. It implemented a signal acquisition and signal processing system for designing a system suitable for motion recognition using the data coming from the sensors. we transform AC-type data into DC-type data by applying a 10Hz LPF considering H/W sampling rate. in addition, we extract 2-dimensional movement information by taking difference value between two cross-diagonal deployed sensor.

EXPERIMENTAL INVESTIGATION AND COMPARISON OF SPRAY AND COMBUSTION CHARACTERISTICS OF GTL AND DIESEL FUELS

  • Kim, K.S.;Beschieru, V.;Jeong, D.S.;Lee, Y.
    • International Journal of Automotive Technology
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    • v.8 no.3
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    • pp.275-281
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    • 2007
  • GTL (Gas To Liquid) has the potential to be used in diesel engines as a clean alternative fuel due to advantages in emission reduction, particularly soot reduction. Since the physical properties of GTL fuel differ from those of diesel fuel to some extent, studying how this difference in characteristics of GTL and diesel fuels affects spray and combustion in diesel engines is important. In this study, visual investigation of sprays and flames from GTL and diesel fuels in a vessel simulating diesel combustion was implemented. The effects of various parameters and conditions, such as injection pressure, chamber temperature and pilot injection on liquid-phase fuel length and auto-ignition delay were investigated. It was determined that GTL has a somewhat shorter liquid-phase fuel length, which explains why there is less contact between the fuel liquid-phase and flame for GTL fuel compared to diesel fuel.

Effect of Double Schottky Barrier in Gallium-Zinc-Oxide Thin Film

  • Oh, Teresa
    • Transactions on Electrical and Electronic Materials
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    • v.18 no.6
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    • pp.323-329
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    • 2017
  • This reports the electrical behavior, bonding structure and Schottky contact of gallium-zinc-oxide (GZO) thin film annealed at $100{\sim}400^{\circ}C$. The mobility of GZO with high density of PL spectra and crystal structure was also increased because of the structural matching between GZO and Si substrate of a crystal structure. However, the GZO annealed at $200^{\circ}C$ with an amorphous structure had the highest mobility as a result of a band to band tunneling effect. The mobility of GZO treated at low annealing temperatures under $200^{\circ}C$ increased at the GZO with an amorphous structure, but that at high temperatures over $200^{\circ}C$ also increased when it was the GZO of a crystal structure. The mobility of GZO with a Schottky barrier (SB) was mostly increased because of the effect of surface currents as well as the additional internal potential difference.

A Study for plasma nonuniformity measurement by PDM Tool (PDM Tool을 이용한 plasma nonuniformity 측정에 관한 연구)

  • 김상용;서용진;이우선;정헌상;김창일;장의구
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.75-78
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    • 2000
  • This paper is estimated to enhance yield improvement and device reliability using PDM(plasma damage monitoring) system capable of in-suit detection about plasma nonuniformity. PDM Tool is the non-contact method of wafer and surface potential electrode(kelvin probe). Its tool measures Vox(oxide barrier) with charge created by plasma. It's possible to inspect the wafer damage generated by plasma charge and analysis of in-situ monitoring data. we obtained the good data which is continuously prevented from plasma damage using its tool for 10weeks. This tool is contributed to preventive steps contemporaneously inspecting the difference of inter-chamber.

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Analysis of Flexible Media Behavior by Dynamic Elastica (Dynamic Elastica에 의한 유연매체의 거동해석)

  • Hong, Sung-Kwon;Jee, Jung-Geun;Jang, Yong-Hoon;Park, No-Cheol;Park, Young-Pil
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • 2004.11a
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    • pp.600-605
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    • 2004
  • In many machines handling lightweight and flexible media such as magnetic tape drives, xerographic copiers and sewing machines, the media must transit an open space. It is important to predict the static and dynamic behavior of the sheets with a high degree of reliability. The nonlinear theory of the dynamic elastica has often been used to a nonlinear dynamic deflection model. In this paper, the governing equation is derived and simulated by the finite differential method. The parametric cubic curve is applied for defining the guide shape. The dynamic contact conditions suggested by Klarbring is used to predict the direction of the flexible media according to the initial velocity and the friction coefficient. The analysis is also compared to the conventional model, showing that after contacting a $45^{\circ}$ wall, the directions of flexible media of two models are different.

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Analysis of Flexible Media Behavior by Dynamic Elastica (Dynamic Elastica에 의한 유연매체의 거동해석)

  • Hong, Sung-Kwon;Jee, Jung-Geun;Jang, Yong-Hoon;Park, No-Cheol;Park, Young-Pil
    • Transactions of the Korean Society for Noise and Vibration Engineering
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    • v.15 no.2 s.95
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    • pp.206-212
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    • 2005
  • In many machines handling lightweight and flexible media, such as magnetic tape drives, xerographic copiers and sewing machines, the media must transit an open space. It is important to predict the static and dynamic behavior of the sheets with a high degree of reliability. The nonlinear theory of the dynamic elastica has often been used to a nonlinear dynamic deflection model. In this paper, the governing equation is derived and simulated by the finite difference method. The parametric cubic curve is applied for defining the guide shape. The dynamic contact conditions suggested by Klarbring is used to predict the direction of the flexible media according to the initial velocity and the friction coefficient. The analysis is also compared to the conventional model, showing that after contacting a $45^{\circ}$ wall, the directions of flexible media of two models are different.

Scanning Kelvin Probe Microscope analysis of Nano-scale Patterning formed by Atomic Force Microscopy in Silicon Carbide (원자힘현미경을 이용한 탄화규소 미세 패터닝의 Scanning Kelvin Probe Microscopy 분석)

  • Jo, Yeong-Deuk;Bahng, Wook;Kim, Sang-Cheol;Kim, Nam-Kyun;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.32-32
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    • 2009
  • Silicon carbide (SiC) is a wide-bandgap semiconductor that has materials properties necessary for the high-power, high-frequency, high-temperature, and radiation-hard condition applications, where silicon devices cannot perform. SiC is also the only compound semiconductor material. on which a silicon oxide layer can be thermally grown, and therefore may fabrication processes used in Si-based technology can be adapted to SiC. So far, atomic force microscopy (AFM) has been extensively used to study the surface charges, dielectric constants and electrical potential distribution as well as topography in silicon-based device structures, whereas it has rarely been applied to SiC-based structures. In this work, we investigated that the local oxide growth on SiC under various conditions and demonstrated that an increased (up to ~100 nN) tip loading force (LF) on highly-doped SiC can lead a direct oxide growth (up to few tens of nm) on 4H-SiC. In addition, the surface potential and topography distributions of nano-scale patterned structures on SiC were measured at a nanometer-scale resolution using a scanning kelvin probe force microscopy (SKPM) with a non-contact mode AFM. The measured results were calibrated using a Pt-coated tip. It is assumed that the atomically resolved surface potential difference does not originate from the intrinsic work function of the materials but reflects the local electron density on the surface. It was found that the work function of the nano-scale patterned on SiC was higher than that of original SiC surface. The results confirm the concept of the work function and the barrier heights of oxide structures/SiC structures.

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A HISTOMORPHOMETRIC STUDY OF BONE APPOSITION TO NEWLY DEVELOPED TI-BASED ALLOYS IN RABBIT BONE (가토의 경골에 이식된 새로운 티타늄계 합금 주위의 골형성에 관한 형태학적 연구)

  • Kim, Tae-In
    • The Journal of Korean Academy of Prosthodontics
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    • v.36 no.5
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    • pp.701-720
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    • 1998
  • Research advances in dental implantology have led to the development of several different types of materials and it is anticipated that continued research will lead to advanced dental implant materials. Currently used pure titanium has relatively low hardness and strength which may limit its ability to resist functional loads as a dental implant. Ti-6Al-4V also has potential problems such as corrosion resistance. osseointegration properties and neurologic disorder due to aluminium and vanadium, known as highly toxic elements, contained in Ti-6Al-4V. Newly developed titanium based alloys(Ti-20Zr-3Nb-3Ta-0.2Pd-1In, Ti-20Zr-3Nb-3Ta-0.2Pd) which do not contain toxic metallic components were designed by the Korea Institute of Science and Technology (KIST) with alloy design techniques using Zr, Nb, Ta, Pd, and In which are known as non-toxic elements. Biocompatibility and osseointegration properties of these newly designed alloys were evaluated after implantation in rabbit femur for 3 months. The conclusions were as follows : 1. Mechanical properties of the new designed Ti based alloys(Ti-20Zr-3Nb-3Ta-0.2Pd-1In, Ti-20Zr-3Nb-3Ta-0.2Pd) demonstrated close hardness and tensile strength values to Ti-6Al-4V. 2. New desinged experimental alloys showed stable corrosion resistance similar to the pure Ti but better than Ti-6Al-4V. However, the corrosion rate was higher for the new alloys. 3. Cell culture test showed that the new alloys have similar cell response compared with pure Ti and Ti-6Al-4V with no cell adverse reaction. 4. New designed alloys showed similar bone-metal contact ratio and osseointegration properties compared to pure Ti and Ti-6Al-4V after 3 months implantation in rabbit femur. 5. Four different surface treatments of the metals did not show any statistical difference of the cell growth and bone-metal contact ratio.

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Short Channel Analytical Model for High Electron Mobility Transistor to Obtain Higher Cut-Off Frequency Maintaining the Reliability of the Device

  • Gupta, Ritesh;Aggarwal, Sandeep Kumar;Gupta, Mridula;Gupta, R.S.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.7 no.2
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    • pp.120-131
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    • 2007
  • A comprehensive short channel analytical model has been proposed for High Electron Mobility Transistor (HEMT) to obtain higher cut-off frequency maintaining the reliability of the device. The model has been proposed to consider generalized doping variation in the directions perpendicular to and along the channel. The effect of field plates and different gate-insulator geometry (T-gate, etc) have been considered by dividing the area between gate and the high band gap semiconductor into different regions along the channel having different insulator and metal combinations of different thicknesses and work function with the possibility that metal is in direct contact with the high band gap semiconductor. The variation obtained by gate-insulator geometry and field plates in the field and channel potential can be produced by varying doping concentration, metal work-function and gate-stack structures along the channel. The results so obtained for normal device structure have been compared with previous proposed model and numerical method (finite difference method) to prove the validity of the model.