• Journal of the Korean Vacuum Society
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• v.9 no.2
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• pp.130-135
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• 2000

We have analyzed characteristics for the structure of $Al_{0.25}/Ga_{0.75}/As/In_{0.15}/Ga_{0.85}$/AS/GaAS pseudomorphic high electron mobility transistor (PHEMT) by photoluminescence (PL) and photoreflectance (PR) measurements. By the PL measurement at 10 K, we observed el-hl transition peak at 1.322 eV and e2-hl transition peak at 1.397 eV in the InGaAs quantum well. We calculated value of 23 meV, the difference between the first energy level and the second energy level of a valence band by dependence of temperatures. Also, (e2-h2) transition signal was observed at 300 K by PR measurement. From the PR measurement, we recognized that the transition was dominated the second energy level of conduction band than the first energy level of conduction band due to band filling. The other hand, PL signal of the first energy level of conduction band was dominated because of the electron screening effect.

• Applied Chemistry for Engineering
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• v.22 no.1
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• pp.26-30
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• 2011

In order to improve the energy conversion efficiency of dye-sensitized solar cell (DSSC), the photoelectrode was manufactured by using $TiO_2$ and $WO_3$ on combination effects of two conduction bands. The smash procedure of $TiO_2$ and $WO_3$ was carried out by using a paint shaker to enlarge the contact area of semiconductor with dye and electrolyte. The energy conversion efficiency of prepared DSSC was improved about two times from current-voltage curve based on effects of $WO_3$ and smash. The mechanism was suggested that the conduction band of $WO_3$ worked for prohibiting the trapping effects of electrons in conduction band of $TiO_2$. This result is attributed to the prevention of electron recombination between electron in conduction band of $TiO_2$ with dye and electrolyte. Impedance results indicate the improved electron transport at interface of $TiO_2$/dye/electrolyte.

• Polymer Science and Technology
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• v.15 no.3
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• pp.317-326
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• 2004

광자 (photon)를 이용하여 정보의 전달, 표시, 감지 그리고 저장이 가능한 다양한 형태의 소자들은 현재 그 주를 이루고 있는 전자 (electron)가 매개인 소자를 대체할 수 있는 가능성을 가지고 활발히 연구되고 있다. 전자의 움직임은 재료 내에 주기적으로 배열되어 있는 원자나 분자의 결정구조에 의해 제어된다. 이는 전도밴드 (conduction band)와 원자가 밴드(valance band) 사이에 존재하는 전자 밴드갭 (electronic band gap)을 조절함으로써 가능하다. 이와 유사한 개념으로 광자의 움직임은 유전체의 주기적인 배열을 통해서 가능함이 제안되었다. 규칙적인 유전체의 결정구조를 가진 재료에 빛이 조사되었을 때, 그 재료를 통과하지 못하는 특정파장이 결정되며 이를 광자 밴드갭 (photonic band gap: PBG)이라 한다. (중략)

• Korean Journal of Materials Research
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• v.30 no.3
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• pp.117-122
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• 2020

The effects of fast neutron irradiation on the electrical and optical properties of Li (3 at%) doped ZnSnO (ZTO) thin films fabricated using a sol-gel process are investigated. From the results of Li-ZTO TFT characteristics according to change of neutron irradiation time, the saturation mobility is found to increase and threshold voltage values shift to a negative direction from 1,000 s neutron irradiation time. X-ray photoelectron spectroscopy analysis of the O 1s core level shows that the relative area of oxygen vacancies is almost unchanged with different irradiation times. From the results of band alignment, it is confirmed that, due to the increase of electron carrier concentration, the Fermi level (E_F) of the sample irradiated for 1,000 s is located at the position closest to the conduction band minimum. The increase in electron concentration is considered by looking at the shallow band edge state under the conduction band edge formed by fast neutron irradiation of more than 1,000 s.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1998.06a
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• pp.223-226
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• 1998

In this paper, we have investigated how morphology and electrical properties in Polyphenylene sulfide(PPS) are changed by uniaxial elongation. XRD pattern shows that interplanar distance and crystallinities are decreased by increasing elongation ratio. Electrical conduction mechanism of PPS is explained as schottky emission from analysis of electrical current. The electrical current is decreased by increasing elongation ratio. The conductivity is changed remarkably above the glass transition temperature around $(82^{\circ}C)$. The band gap of PPS is evaluated as 3.9-4(eV) from the results of photoconductivity. Increarnent of elongation ratio gives us some information about deep trap formation from photocurrent.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.381-381
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• 2010

$(ZrO_2)_{0.66}(HfO_2)_{0.34}$ thin films as gate dielectrics have been proposed to overcome the problems of tunneling current and degradation mobility inachieving a thin equivalent oxide thickness. An extremely thin $SiO_2$ layer is used in order to separate the carrier in MOSFET channel from the dielectric field fluctuation caused by phonons in the dielectric which decreases the carrier mobility. The electronic and optical properties influenced the device performance to a great extent. $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ dielectric films on p-Si (100) were grown by atomic layer deposition method, for which the conduction band offsets, valence band offsets and band gapswere obtained by using X-ray photoelectron spectroscopy and reflection electron energy loss spectroscopy. The band gap, valence and conduction band offset values for $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ dielectric thin film, grown on Si substrate were about 5.34, 2.35 and 1.87 eV respectively. This band alignment was similar to that of $ZrO_2$. In addition, The dielectric function (k, $\omega$), index of refraction n and the extinction coefficient k for the $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ thin films were obtained from a quantitative analysis of REELS data by comparison to detailed dielectric response model calculations using the QUEELS-$\varepsilon$(k, $\omega$)-REELS software package. These optical properties are similar with $ZrO_2$ dielectric thin films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.3
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• pp.220-226
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• 2002

Amorphous $Sb_{2-x}Bi_xTe_3$ (x = 0.0, 0.5 and 1.0) thin films were prepared by vacuum evaporation. The resistivity of 7he films decreases from 1.4{\times}10^{-2}$ to $8.84{\times}10^{-5}\Omega cm$ and the type of conductivity changes from p to n with the increase of the x value of the films. D.C. conduction studies on these films ate performed at various electric fields in the temperature range of 303-403 K. At low electric fields, two types of conduction mechanisms, i.e. the variable range hopping and the phonon assisted hopping are found to be responsible for the conduction, depending upon the temperature. The activation energy decreases from 0.082 to 0.076 eV in the temperature range of 303-363 K and from 0.47-0.456 eV in the second range of 363-403 K, indicating the shift of the Fermi level towards the conduction band edge and hence the change of the conduction from P to n type with the increase of the Bi concentration. Poole-Frankel emission dominates at high fields. The shape of the potential well of the localized centre is deduced and the mean free path of the charge carriers is also calculated.

• KIEE International Transactions on Electrophysics and Applications
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• v.11C no.4
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• pp.99-106
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• 2001

An overview of Silicon Carbide (SiC) Static Induction Transistor (SIT) development is presented. Basic conduction mechanisms are introduced and discussed, including ohmic, exponential, and space charge limited conduction (SCLC) mechanisms. Additionally, the impact of velocity saturation and temperature effects on SCLC are reviewed. The small-signal model, breakdown voltage, power density, and different gate structures are also discussed, before a final review of published SiC SIT results. Published S-band (3-4 GHz) results include 9.5 dB of gain and output power of 120 W, and L-band (1.3 GHz) results include 400 W output power, 7.7 dB of gain, and power density of 16.7 W/cm.

• Journal of the Korean Institute of Telematics and Electronics
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• v.21 no.6
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• pp.51-55
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• 1984

Band headings, at grain boundary and surface of polycrystalline thin semiconductor films, were assumed. thin film ransistor conduction theory which considered trapping at surface of semiconductor was proposed. CdSe Thin Film Transistors were fabricated. CdSe was thermal evaporated and SiO2 used as insulator was rf sputtered. Output characteristics which was calculated by conduction theory were compared with experimental results.

• Journal of the Korean Ceramic Society
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• v.45 no.4
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• pp.208-213
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• 2008

In this study, helical antenna with microwave ZST ceramics was designed using finite element method and developed. Studied parameters are relative dielectric constant of the dielectric core and the width of the conduction metal band of the antenna. As shown in the results, the center frequency of the antenna was decreased as the dielectric constant increased. Also beam width of the antenna increased as both the dielectric constant and the conduction band width increased. Based on the designed optimal shape, the manufactured antenna has the good beam width at center frequency 1.58 GHz.