• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 추계학술대회 논문요약집
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• pp.160-160
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• 2003

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2000년도 추계 기술심포지움 논문집
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• pp.43-46
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• 2000

• 한국경영과학회:학술대회논문집
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• 한국경영과학회/대한산업공학회 1999년도 춘계공동학술대회:정보화시대의 지식경영
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• pp.453-453
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• 1999

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 1999년도 추계학술발표회 초록집
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• pp.53-54
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• 1999

• 한국원자력학회:학술대회논문집
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• 한국원자력학회 2005년도 추계학술발표회
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• pp.745-746
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• 2005

• 한국산업보건학회지
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• 제22권1호
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• pp.52-59
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• 2012

Objectives: The purpose of this study was to evaluate the exposure possibility of by-products during the semiconductor manufacturing processes. Methods: The authors investigated types of chemicals generated during semiconductor manufacturing processes by the qualitative experiment on generation of by-products at the laboratory and a literature survey. Results: By-products due to decomposition of photoresist by UV-light during the photo-lithography process, ionization of arsine during the ion implant process, and inter-reactions of chemicals used at diffusion and deposition processes can be generated in wafer fabrication line. Volatile organic compounds (VOCs) such as benzene and formaldehyde can be generated during the mold process due to decomposition of epoxy molding compound and mold cleaner in semiconductor chip assembly line. Conclusions: Various types of by-products can be generated during the semiconductor manufacturing processes. Therefore, by-products carcinogen such as benzene, formaldehyde, and arsenic as well as chemical substances used during the semiconductor manufacturing processes should be controlled carefully.

• JSTS:Journal of Semiconductor Technology and Science
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• 제11권3호
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• pp.182-189
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• 2011

In this work, a tunneling field-effect transistor (TFET) based on heterojunctions of compound and Group IV semiconductors is introduced and simulated. TFETs based on either silicon or compound semiconductors have been intensively researched due to their merits of robustness against short channel effects (SCEs) and excellent subthreshold swing (SS) characteristics. However, silicon TFETs have the drawback of low on-current and compound ones are difficult to integrate with silicon CMOS circuits. In order to combine the high tunneling efficiency of narrow bandgap material TFETs and the high mobility of III-V TFETs, a Type-I heterojunction tunneling field-effect transistor (I-HTFET) adopting $Ge-Al_xGa_{1-x}As-Ge$ system has been optimized by simulation in terms of aluminum (Al) composition. To maximize device performance, we considered a nanowire structure, and it was shown that high performance (HP) logic technology can be achieved by the proposed device. The optimum Al composition turned out to be around 20% (x=0.2).

• 조명전기설비학회논문지
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• 제22권6호
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• pp.141-147
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• 2008

본 논문에서는 화합물 반도체 및 CMOS 공정을 이용하여 수신기에서 주파수를 하향 변환하는 수신믹서를 설계하였다. 주파수 하향변환 믹서의 기본적인 이론과 구조에 대해 살펴보고 이중평형 믹서 구조와 광대역 특성을 얻기위해 매칭회로 대신 고주파와 국부발진기의 입력단에 싱글엔드 신호를 차분신호로 변환하기 위한 능동발룬을 결합한 믹서회로를 화합물과 CMOS 공정으로 설계한다. CMOS 공정을 이용하여 제작한 능동발룬 내장 믹서는 $2{\sim}6[GHz]$ 대역에서 1[dB] 이하의 이득오차와 $3[^{\circ}]$ 이하의 위상오차를 가지며 $2{\sim}6[GHz]$ 대역에서 변환이득 $-1{\sim}-6[dB]$ 특성을 얻었다. 모의실험 결과 화합물 공정을 이용하여 능동 발룬을 결합한 믹서는 $2{\sim}6[GHz]$ 주파수대역에서 $-2[dBm]$의 국부발진기 입력에 대해 약 7[dB]의 변환이득과 5.8[GHz]에서 -10[dBm]의 입력 P1[dB]특성을 나타낸다.

• 반도체디스플레이기술학회지
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• 제21권4호
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• pp.126-131
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• 2022

The number of joint disease patients is increasing every year. Currently, the most CPM(Continuous Passive Motion) equipment uses expensive imported equipment, and one CPM equipment is designed to be used only in one joint, medical personnel or hospitals who are the main users of the medical equipment need to have several types of CPMs for joint rehabilitation. To solve this problem, this paper designed a multifunctional joint medical equipment that enables rehabilitation of knee, shoulder, and elbow joints in one CPM equipment and includes general, intensive, and adaptive exercise functions for effective treatment according to the patient's condition. The patient's condition was diagnosed using a load cell and a current sensor. In this paper, effective rehabilitation methods were presented and high reliability and precision of medical equipment was confirmed through experiments using potentiometer, encoder, and PI controller.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2005년도 춘계종합학술대회
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• pp.1026-1029
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• 2005

Grating 이 형성된 SiO$_2$ 기판상에 ZnO 박막을 graphoepitaxy 법으로 형성시킬 것을 제안하고 그 가능성을 고찰하였다. Si(100) 기판상에 노광작업(photolithograpy)을 이용하여 요철구조를 형성시킨 다음 자연산화를 시켜서 SiO$_2$ 기판을 제작하였고, 제작된 요철구조 위에 열증착 법으로 Zn 를 증착 시킨 후 이를 산화 시켜서 ZnO 박막을 형성 시켰다. 또한 열처리에 의한 결정성의 변화를 관찰하기 위하여 700 ${\sim}$ 900 $^{\circ}C$에서 열처리를 하였다. 제작된 시료는 Atomic Force Microscopy (AFM)로 표면을 관찰하였으며, Photoluminescence (PL) 을 이용하여 결정성의 변화를 관찰하였다.