• Title/Summary/Keyword: Colloidal Particles

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화염분무열분해 공정에 의해 합성되어진 Zn2SiO4:Mn 형광체 (Zn2SiO4:Mn Phsophor Particles Prepared by Flame Spray Pyrolysis)

  • 강윤찬;손종락;정경열
    • 한국재료학회지
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    • 제14권8호
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    • pp.600-606
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    • 2004
  • $Zn_{2}SiO_{4}:Mn$ phosphor particles were prepared by a flame spray pyrolysis method. It has been generally known that the high-temperature flame enables fast drying and decomposition of droplets. In the present investigation, the morphology and luminescent property of $Zn_{2}SiO_{4}:Mn$ phosphor were controlled in a severe flame preparation condition. The particle formation in the flame spray pyrolysis process was achieved by the droplet-to-particle conversion without any evaporation of precursors, which made it possible to obtain spherical $Zn_{2}SiO_{4}:Mn$ particles of a pure phase from a droplet. Using colloidal solutions wherein dispersed nano-sized silica particles were adopted as a silicon precursor. $Zn_{2}SiO_{4}:Mn$ particles with spherical shape and filled morphology were prepared and the spherical morphology was maintained even after the high-temperature heat treatment, which is necessary to increase the photoluminescence intensity. The $Zn_{2}SiO_{4}:Mn$ particles with spherical shape, which were prepared by the flame spray pyrolysis and posttreated at $1150^{\circ}C$, showed good luminescent characteristics under vacuum ultraviolet (VUV) excitation.

고온 열분해 반응법을 이용한 PbSe 나노입자의 Acetic Acid 첨가에 대한 영향 (The Effect of Acetic Acid in Synthesizing PbSe Quantum Dots by Hot Solution Chemical Process)

  • 백인찬;석상일;정용재
    • 한국세라믹학회지
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    • 제44권2호
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    • pp.89-92
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    • 2007
  • PbSe, with a band gap in the mid-infrared and a samll effective mass, is an interesting material for optical and electrical applications in infrared region. Various colloidal synthetic routes for synthesizing PbSe quantum dot nanoparticles have been developed in the last couple of years. In this work, stable colloidal solutions containing crystalline PbSe particles in the order of 5-15 nm were synthesized using different amount of acetic acid in high boiling coordinating solvents. The size and shape of PbSe nanoparticles was greatly influenced by coexistence of acetic acid in synthetic medium. It was observed by TEM that the shape of PbSe nanoparticles with different amount of acetic acid was changed from spherical to cube or star types.

FLUX DECLINE DURING THE ULTRA-FILTRATION OF DILUTE SI COLLOIDAL SOLUTION WITH HOLLOW FIBER MEMBRANE

  • Park, Ho-Sang;Nam, Suk-Tae;Jeon, Jae-Hong;Lee, Seok-Ki
    • 한국막학회:학술대회논문집
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    • 한국막학회 1999년도 The 7th Summer Workshop of the Membrane Society of Korea
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    • pp.95-96
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    • 1999
  • The ultrafiltration behavior of dilute colloidal solution containing Si particles has been investigated. The experiments in cross flow mode have been performed at different operating condition by using the membrane with 20 kDa cut-off. The flux decline was due to the development of membrane fouling which was a dynamic process of two distinctive stages. For the high trans-membrane pressure, the pore blocking resistance was dominant at the initial period of filtraion and was followed by the cake resistance. And for the low cross flow velocity, the membrane fouling was governed by the cake filtration model at the initial stage of filtration process. Flux jump was observed temporally during the membrane filtration of mixed feed solution.

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재구조화된 콜로이드 실리카 응집체에 대한 광 산란 (Light scattering from restructured colloidal silica aggregates)

  • 임영훈
    • 한국광학회지
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    • 제3권3호
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    • pp.167-171
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    • 1992
  • 소금물에 유도된 콜로이드 실리카 응집체의 재구조에 대한 정적 및 유동 광산란 결과를 나타냈다. 또한 투과전자현미경을 이용한 사진결과로부터 입자들 각각의 크기 및 그물 모양으로 갈라진 응집체에 관한 미세구조를 확인하였다. 재구조화된 실리카 응집체에 대한 프랙탈 차원들은 현상태 광산란 측정결과들과 상당히 달랐다. 소금물에 유도된 0.5wt.% 농도의 Ludox-AM에 대한 프랙탈 차원 $D_{F}$는 2.21로 측정되었다. 0.1wt.% 농도의 Ludox-AM에 대한 Rayleigh 선폭을 논의한다.

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구리 CMP 후 연마입자 제거에 화학 기계적 세정의 효과 (Effect of Chemical Mechanical Cleaning(CMC) on Particle Removal in Post-Cu CMP Cleaning)

  • 김영민;조한철;정해도
    • 대한기계학회논문집A
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    • 제33권10호
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    • pp.1023-1028
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    • 2009
  • Cleaning is required following CMP (chemical mechanical planarization) to remove particles. The minimization of particle residue is required with each successive technology generation, and the cleaning of wafers becomes more complicated. In copper damascene process for interconnection structure, it utilizes 2-step CMP consists of Cu and barrier CMP. Such a 2-steps CMP process leaves a lot of abrasive particles on the wafer surface, cleaning is required to remove abrasive particles. In this study, the chemical mechanical cleaning(CMC) is performed various conditions as a cleaning process. The CMC process combined mechanical cleaning by friction between a wafer and a pad and chemical cleaning by CMC solution consists of tetramethyl ammonium hydroxide (TMAH) / benzotriazole (BTA). This paper studies the removal of abrasive on the Cu wafer and the cleaning efficiency of CMC process.

Synthesis of amorphous calcium carbonate by gas-liquid reaction and its crystallization

  • Ahn Ji-Whan;Kim Hyung-Seok;Park Jin-Koo;Kim Ka-Yeon;Yim Going;Joo Sung-Min
    • 한국지구물리탐사학회:학술대회논문집
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    • 한국지구물리탐사학회 2003년도 Proceedings of the international symposium on the fusion technology
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    • pp.654-657
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    • 2003
  • We obtained amorphous calcium carbonate through the carbonation reaction of $Ca(OH)_2$, and through this reaction, observed changes in particle shape and phase by electric conductivity, XRD and TEM analysis. According to the result of the analysis, in the first declining stage of electric conductivity, amorphous calcium carbonate that has formed is coated on the surface of $Ca(OH)_2$ and obstructs its dissolution, and in the first recovery stage of electric conductivity, amorphous calcium carbonate is dissolved and re-precipitated and forms chains of fine calcite particles linearly joined. In the second decline of conductivity, viscosity increases due to the growth of chains of calcite particles, and finally the calcite particles are dissolved and separated into colloidal crystalline calcite, thereby increasing electric conductivity again.

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구리 CMP 후 연마입자 제거에 버프 세정의 효과 (Effect of buffing on particle removal in post-Cu CMP cleaning)

  • 김영민;조한철;정해도
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.1880-1884
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    • 2008
  • Cleaning is required following CMP (chemical mechanical planarization) to remove particles. The minimization of particle residue is required with each successive technology generation, and the cleaning of wafers becomes more complicated. In copper damascene process for interconnection structure, it utilizes 2-steop CMP consists of Cu CMP and barrier CMP. Such a 2-steps CMP process leaves a lot of abrasive particles on the wafer surface, cleaning is required to remove abrasive particles. In this study, the buffing is performed various conditions as a cleaning process. The buffing process combined mechanical cleaning by friction between a wafer and a buffing pad and chemical cleaning by buffing solution consists of tetramethyl ammonium hydroxide (TMAH)/benzotriazole(BTA).

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양이온 OTAC와 음이온ADS 혼합 수용액에서 형성된 층막구형체에 의한 $CaSO_4$ 나노입자의 제조 (Preparation of $CaSO_4$ Nanoparticles by Catanionic Vesicles Formed in Cationic OTAC and Anionic ADS Mixed Aqueous Solution)

  • 김홍운;임경희
    • 한국응용과학기술학회지
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    • 제21권4호
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    • pp.380-387
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    • 2004
  • The preparation of $CaSO_4$ nanoparticle by vesicles formed spontaneously in cationic OTAC and anionic ADS mixed surfactant solution whose ratio is 0.3/0.7 is investigated. Added electrolytes for preparing nanoparticles reduce vesicle size about 200-300 nm comparing with that of pure vesicle whose size is 700-800 nm by DLS. The core of vesicles has 200 nm size and acts as nanoreactors which same size of monodisperse $CaSO_4$ nanopaticles are formed. Although $CaSO_4$ particles are formed at the outer of vesicles, they are very large and amorphous. The formed particles are identified with XRD analysis after separation due to coinciding with $CaSO_4$ particles.

전단 흐름을 갖는 서스펜션 내부 나노 입자의 유변학적 특성 연구 (Rheological Modeling of Nanoparticles in a Suspension with Shear Flow)

  • 김구;후카이 준;히로나카 슈지
    • 공업화학
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    • 제30권4호
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    • pp.445-452
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    • 2019
  • Shear thickening is an intriguing phenomenon in the fields of chemical engineering and rheology because it originates from complex situations with experimental and numerical measurements. This paper presents results from the numerical modeling of the particle-fluid dynamics of a two-dimensional mixture of colloidal particles immersed in a fluid. Our results reveal the characteristic particle behavior with an application of a shear force to the upper part of the fluid domain. By combining the lattice Boltzmann and discrete element methods with the calculation of the lubrication forces when particles approach or recede from each other, this study aims to reveal the behavior of the suspension, specifically shear thickening. The results show that the calculated suspension viscosity is in good agreement with the experimental results. Results describing the particle deviation, diffusivity, concentration, and contact numbers are also demonstrated.

광-전기역학 기술을 이용한 미생물의 미세유체역학적 제어 (Opto-electrokinetic Technique for Microfluidic Manipulation of Microorganism)

  • 권재성
    • 한국가시화정보학회지
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    • 제17권1호
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    • pp.69-77
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    • 2019
  • This paper introduces microfluidic manipulation of microorganism by opto-electrokinetic technique, named rapid electrokinetic patterning (REP). REP is a hybrid method that utilizes the simultaneous application of a uniform electric field and a focused laser to manipulate various kinds and types of colloidal particles. Using the technique in preliminary experiments, we have successfully aggregated, translated, and trapped not only spherical polystyrene, latex, and magnetic particles but also ellipsoidal glass particles. Extending the manipulation target to cells, we attempted to manipulate saccharomyces cerevisiae (S. cerevisiae), the most commonly used microorganism for food fermentation and biomass production. As a result, S. cerevisiae were assembled and dynamically trapped by REP at arbitrary location on an electrode surface. It firmly establishes the usefulness of REP technique for development of a high-performance on-chip bioassay system.