• 제목/요약/키워드: Cleaning equipment

검색결과 203건 처리시간 0.031초

노인을 위한 지능형 공간환경 연구 - 주거공간의 디지털 시스템화를 위한 노인요구 조사를 중심으로 - (A Study on Intelligent Space Design Supporting the Elderly - Focused on the Needs of the Aged on Digital Systems in Residential Space -)

  • 오찬옥
    • 한국실내디자인학회논문집
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    • 제17권5호
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    • pp.61-71
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    • 2008
  • The study alms to seek a plan of applying the digital technology to housing for the elderly. The purpose of the study was to grasp the needs of the aged on 30 types of digital systems in housing. The subjects were 120 persons aged of more than 60 years and lived in Busan. Data were collected by the individual interview. The following results were drawn from this study. First, the needs of the aged on the digital systems categorized as safe and security, control of indoor environment, and housework support were very high and should be provided at first. Second, the necessary types of digital systems which should be provided to the digital home for the elderly were digital systems for heating control, health checking, sensing of fire and gas leak, and house cleaning. Also, the basic types of digital systems were ones for invasion and burglarproof, emergency, air cleaning, automatic facet, door locking, and waste collecting. Third, the Income and usage level of digital equipment of the aged influenced to the floods of the aged on the digital system. Therefore, in addition to the necessary and basic types of digital systems mentioned above, the income and usage level of digital equipment should be considered in planning the digital home for the elderly.

전리수를 이용한 실리콘 웨이퍼 세정 (A Study on Si-wafer Cleaning by Electrolyzed Water)

  • 윤효섭;류근걸
    • 한국재료학회지
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    • 제11권4호
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    • pp.251-257
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    • 2001
  • 반도체 소자의 고집적화에 따른 세정공정 수는 점점 증가하고 있는 추세에 있다 현재 사용되는 세정은 다량의 화학약품 및 초순수를 소비하며, 고온에서 행하여지고 있는 RCA세정을 근간으로 하고 있다. 세정공정수의 증가는 바로 화학약품의 사용량 증가를 초래하게 되며, 이에 따른 환경문제가 심각하게 대두되고 있는 실정에 이르렀다. 따라서 이러한 화학약품 및 초순수 사용을 절감하고, 저온에서 세정공정이 이뤄지는 기술이 향후 요구되어 지고 있다. 이번 연구는 이러한 관점에서 화학약품 및 초순수 사용량을 줄이며, 상온 공정이 이뤄지는 전리수를 이용하여 실리콘 웨이퍼 세정을 하였다. 제조된 전리수는 산화성 성질을 지닌 양극수와 환원성 성질인 음극수로 이루어지고, 각각 pH 및 ORP는 4.7/+1050mV, 9.8/-750mV를 30분 이상 유지하고 있었다 전리수의 양극수에 의한 금속제거 효과가 음극수의 효과보다 우수함을 확인할 수 있었으며, 다양한 입자제거 실험에도 불구하고, 동일한 분포도를 나타내고 있었다.

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증기발생기 2차측 제철화학세정액의 고온적용 (High Temperature Application of Iron Removal Chemical Cleaning Solvent in the Secondary Side of Nuclear Steam Generators)

  • 허도행;이은희;정한섭;김우철
    • Nuclear Engineering and Technology
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    • 제26권1호
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    • pp.140-148
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    • 1994
  • 원전 증기발생기 2차측 제철 화학세정을 기존의 93$^{\circ}C$ 표준공정보다 고온인 1$25^{\circ}C$에서 검증시험을 수행하였다. 원전 증기발생기를 1$25^{\circ}C$에서 화학 세정한다는 가정아래 현장세정 조건을 결정하고 이를 다시 모사하여 3l 용량의 소형 검증시험 조건을 결정하였다. 1 gallon 용량의 316 스텐레스강 압력용기를 반응용기로 사용하는 화학세정 시험장치에서 검증시험을 수행하여 스러지 용해거동, 모재 부식률, 세정제 화학조성 변화거동 등을 측정하였다. 1$25^{\circ}C$ 검증시험 결과에서 93$^{\circ}C$ 표준공정보다 세정시간을 절반이하로 단축시키고도 더 효율적인 세정효과를 얻을 수 있을 뿐만이 아니라 2차측 모재의 부식률도 감소함을 확인할 수 있었다. 그러나 고온 세정공정은 아직 현장적용 경험이 없고, 별도의 외부순환 세정 장치를 이용하는 93$^{\circ}C$ 표준공정과는 달리 주냉각재의 잠열로 2차측을 가열하므로 세정이 완료될 때까지 주냉각 펌프를 계속 가동하여야 하는 단점이 있다. 가동중인 증기발생기에 대한 화학세정을 수행할 때 93$^{\circ}C$ 표준공정과 고온공정의 장 단점을 신중히 검토하여 최적공정을 적용하여야 할 것이다.

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탈이온수의 압력과 정제된 $N_2$ 가스가 ILD-CMP 공정에 미치는 영향 (Influence of D.I. Water Pressure and Purified $N_2$ Gas on the Inter Level Dielectric-Chemical Mechanical Polishing Process)

  • 김상용;서용진;김창일;정헌상;이우선;장의구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 춘계학술대회 논문집 전자세라믹스 센서 및 박막재료 반도체재료 일렉트렛트 및 응용기술
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    • pp.31-34
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    • 2000
  • It is very important to understand the correlation of between inter layer dielectric(ILD) CMP process and various facility factors supplied to equipment system. In this paper, the correlation between the various facility factors supplied to CMP equipment system and ILD CMP process were studied. To prevent the partial over-polishing(edge hot-spot) generated in the wafer edge area during polishing, we analyzed various facilities supplied at supply system. With facility shortage of D.I. water(DIW) pressure, we introduced an adding purified $N_2(PN_2)$ gas in polishing head cleaning station for increasing a cleaning effect. DIW pressure and PN2 gas factors were not related with removal rate, but edge hot-spot of patterned wafer had a serious relation. We estimated two factors (DIW pressure and PN2 gas) for the improvement of CMP process. Especially, we obtained a uniform planarity in patterned wafer and prohibited more than 90% wafer edge over-polishing. In this study, we acknowledged that facility factors supplied to equipment system played an important role in ILD-CMP process.

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유기용제에 의한 탈지세정 (도장전처리로써의) (Cleaning with Organic Solvent)

  • 죽내절삼
    • 한국기술사회:학술대회논문집
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    • 한국기술사회 1984년도 한일 합동 심포지움
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    • pp.52-60
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    • 1984
  • As far as we handle industrial products, the painting process is prerequisite; and the preparatory treatment of materials is, therefore, indispensable to the above process. However, it is a matter for regret that people are liable to overlook the importance the treatment of materials at the preparatory stage, giving themselves up to the surface of finished goods. The preparatory treatment of materials is like backstage personnel (operations) in dramatic performance; the performance cannot be successful without the support of backstage operations in surface treatment. The various methods which are being applied widely as preparatory treatment are as follow: (1) the method by using hand tools such as grinders, etc. (2) the method with blasting (3) the method with chemical coating (4) the method by getting rid of fatty substance with organic solvent The methods No. 1 and No. 2 are in use mainly for larger structures, and those No. 3 and No. 4, either singly or combined, are applied for mass-produced, smaller items (acid cleaning is applied for getting rid of rust, as the case may be). The method No. 3 is used mainly as anti-rust by forming zinc phosphate film on the surface of steel plate or enhancing the bonding power of paints by taking advantage of irregular surfaces of films. Recently are no the market steel plates treated directly with film-coating by omitting the process No. 3. Furthermore, those goods painted include not only nonferrous goods but plastics and elastomer. The present discourse describes the cleaning process by using the steam of organic acid, picked up from among No. 4, and its equipment applied.

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나노입자 제거용 Far Field 메가소닉 개발 (Development of a Far Field type Megasonic for Nano Particle Removing)

  • 이양래;김현세;임의수
    • 한국정밀공학회지
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    • 제30권11호
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    • pp.1193-1201
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    • 2013
  • Improved far field type(improved type) megasonic applicable to the cleaning equipment of single wafer processing type has been developed. In this study, to improve the uniformity of acoustic pressure distribution(APD), we utilize far field with relatively uniform APD, piezoelectric ceramic with a triangle hole in its center to prevent standing wave resulted from radial mode, and reflected wave from the wall of waveguide. On the basis of these methods, two analysis models of improved type were designed to which piezoelectric ceramic of different shape of electrode attached, and APD were analyzed by means of finite element method, and then one of them was selected by analysis results, finally, the selected model was fabricated. Test results show that the fabricated is better in the uniformity of APD than the imported and the conventional, also the fabricated shows high particle removal efficiency of 92.3% using DI water alone as a cleaning solution.

세척밸브 급수제어장치 설치에 따른 경제적 효과 분석 (A Study on Economic benefits for Water Control Device Installed with a Flush Valve on a Toilet)

  • 박강현;김수민
    • 설비공학논문집
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    • 제23권10호
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    • pp.656-661
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    • 2011
  • The amount of water resources that can be used tend to be decreased gradually. In contrast, the rapidly increasing water consumption is a problem that need to be addressed. Renovation and equipment replacement to improve energy efficiency and to reduce expenditure for building usage is required. But the excessive initial investment cost and the prolonged of pay back period may be uneconomical choice. Water usage for cleaning the toilet bowl accounts for 27%of the total water usage. Water-saving valve that can select the amount of water for cleaning toilet bowl can be reduced expenditure. After installing water-saving valve, analysed the economic effects. Water-saving valves compared with flush valves, and researched the amount of water usage. Then analyzed for the economic effects. Water-saving valve was used 5.6 ${\ell}$/time for cleaning toilet bowl. In contrast, flush valve was consumed 8.4 ${\ell}$/time. Water-saving valve's water-saving rate was 33.3%. The initial payback period for Water-saving valve was 459.5 days. By a small investment in water saving valve, the economic benefits can be obtained.

Time Series Data Cleaning Method Based on Optimized ELM Prediction Constraints

  • Guohui Ding;Yueyi Zhu;Chenyang Li;Jinwei Wang;Ru Wei;Zhaoyu Liu
    • Journal of Information Processing Systems
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    • 제19권2호
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    • pp.149-163
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    • 2023
  • Affected by external factors, errors in time series data collected by sensors are common. Using the traditional method of constraining the speed change rate to clean the errors can get good performance. However, they are only limited to the data of stable changing speed because of fixed constraint rules. Actually, data with uneven changing speed is common in practice. To solve this problem, an online cleaning algorithm for time series data based on dynamic speed change rate constraints is proposed in this paper. Since time series data usually changes periodically, we use the extreme learning machine to learn the law of speed changes from past data and predict the speed ranges that change over time to detect the data. In order to realize online data repair, a dual-window mechanism is proposed to transform the global optimal into the local optimal, and the traditional minimum change principle and median theorem are applied in the selection of the repair strategy. Aiming at the problem that the repair method based on the minimum change principle cannot correct consecutive abnormal points, through quantitative analysis, it is believed that the repair strategy should be the boundary of the repair candidate set. The experimental results obtained on the dataset show that the method proposed in this paper can get a better repair effect.