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http://dx.doi.org/10.7736/KSPE.2013.30.11.1193

Development of a Far Field type Megasonic for Nano Particle Removing  

Lee, Yanglae (Korea Institute of Machinery & Materials)
Kim, Hyunse (Korea Institute of Machinery & Materials)
Lim, Euisu (Korea Institute of Machinery & Materials)
Publication Information
Journal of the Korean Society for Precision Engineering / v.30, no.11, 2013 , pp. 1193-1201 More about this Journal
Abstract
Improved far field type(improved type) megasonic applicable to the cleaning equipment of single wafer processing type has been developed. In this study, to improve the uniformity of acoustic pressure distribution(APD), we utilize far field with relatively uniform APD, piezoelectric ceramic with a triangle hole in its center to prevent standing wave resulted from radial mode, and reflected wave from the wall of waveguide. On the basis of these methods, two analysis models of improved type were designed to which piezoelectric ceramic of different shape of electrode attached, and APD were analyzed by means of finite element method, and then one of them was selected by analysis results, finally, the selected model was fabricated. Test results show that the fabricated is better in the uniformity of APD than the imported and the conventional, also the fabricated shows high particle removal efficiency of 92.3% using DI water alone as a cleaning solution.
Keywords
Far Field; Single Wafer Processing Type; Acoustic Pressure Distribution; Megasonic Transmitter; Cleaning Efficiency;
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