• Journal of Acupuncture Research
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• 제29권2호
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• pp.9-14
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• 2012

Objectives : This study was designed to evaluate the pesticide residue of herb medicine through high density ozone water cleaning system. Materials and Methods : We purchased ginseng(Panax ginseng) on market and sprayed pesticides (Diazinon) on ginseng. We analyzed pesticide residue according to washing methods(untreated, ozone water cleaning, ultrasonic cleaning, Water cleaning). As a result of each washing methods, in ozone water cleaning method pesticide residue was much less remained than in Ultrasonic Cleaning method and water cleaning method. Conclusions : High density ozone water cleaning is the best method for removing pesticides of herbal medicine.

• 한국의류학회지
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• 제23권7호
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• pp.987-997
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• 1999

The purpose of this study was finding out the appropriate cleaning method for buried fabrics from old tombs focusing on the conservation of textiles. Cleaning effects and physical properties change depending on cleaning method have been analysed, The following results were obtained from this study : 1. Wet cleaning showed better effect on the cleaning of fabrics compared to solvent cleaning which meant more water-soluble soils existed than oily soils. 2. All the cleaning methods used did not cause any distorsion or shrinkage to the fabrics because fabrics had been stabilized for a long time 3. Addition of detergent to cleaning system decreased the friction of fiber during cleaning rocess so that the damage of fabrics could be minimized., 4. Ironing is an undesirable process because heat remarkably weakened fibers.

• 한국인쇄학회지
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• 제15권2호
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• pp.1-4
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• 1997

Existing cleaning solvent using screen printing are the organic solvents including aromatic compounds carried with poisonous and stench. besides, Cleaning method of current screen printing are for the most part mixed cleaning method of dipping and polish. Using 1,1,1-TCE, CFC-113 alternative system cleaning solvent be substituted for existing cleaning solvent against screen printing ink measured the cleaning efficiency according to gravimetric analysis method and property change of gassamer according to Image Analyzer. Also, Cleaning process system carry with excellent cleaning efficiency studied which was proposed new cleaning process including ultrasonic cleaning process be substituted for existing mixed cleaning method of dipping and polish.

• 반도체디스플레이기술학회지
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• 제2권3호
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• pp.1-6
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• 2003

In the rapid changes of the semiconductor manufacturing technologies for early 21st century, it may be safely said that a kernel of terms is the size increase of Si wafer and the size decrease of semiconductor devices. As the size of Si wafers increases and semiconductor device is miniaturized, the units of cleaning processes increase. A present cleaning technology is based upon RCA cleaning which consumes vast chemicals and ultra pure water (UPW) and is the high temperature process. Therefore, this technology gives rise to environmental issue. To resolve this matter, candidates of advanced cleaning processes have been studied. One of them is to apply the electrolyzed water. In this work, electrolyzed water cleaning was compared with various chemical cleaning, using Si wafer surfaces by changing cleaning temperature and cleaning time, and especially, concentrating upon the contact angle. It was observed that contact angle on surface treated with Electrolyzed water cleaning was $4.4^{\circ}$ without RCA cleaning. Amine series additive of high pKa (negative logarithm of the acidity constant) was used to observe the property changes of cathode water.

• 복식문화연구
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• 제11권6호
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• pp.956-966
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• 2003

The purpose of study is to find out a suitable cleaning method for excavated textiles of Jeon-ui Lee(1570∼1647). The textiles were excavated from her tomb in 1997, and her descendents put them in a box without any treatment and kept them in the warehouse since then. We used two kinds of silk as samples, non-dyed and dyed textile. The experiment was performed by 8 kinds of wet cleaning and dry cleaning methods, an ultrasonic cleaner was used in the wet cleaning, decane and perchloroethylene were used as solvents in the dry cleaning. The use of the ultrasonic cleaner in the wet cleaning method did not show any damage to the fibers of the textiles and it not only cleaned well but also was safe for the fugitive dyes. It resulted in more effective cleaning when the detergent was used together. Therefore, it is effective to use the ultrasonic cleaning on the delicate historical textiles and helpful to the operator's safety and environment.

• 한국전기전자재료학회논문지
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• 제22권2호
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• pp.114-118
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• 2009

PVA (polyvinyl alcohol) brush cleaning method is a typical cleaning method for semiconductor cleaning process especially post-CMP cleaning. PVA brush contacts with the wafer surface and abrasive particle, generating the contact rotational torque of the brush, which is the removal mechanism. The brush rotational torque can overcome theoretically the adhesion force generated between the abrasive particle and wafer by zeta potential. However, after CMP (chemical mechanical polishing) process, many particles remained on the wafer because the brush was contaminated in previous post-CMP cleaning step. The abrasive particle on the brush redeposits to the wafer. The level of the brush contamination increased according to the cleaning run time. After cleaning the brush, the level of wafer contamination dramatically decreased. Therefore, the brush cleanliness effect on the cleaning performance and it is important for the brush to be maintained clearly.

• 한국컴퓨터정보학회논문지
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• 제14권11호
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• pp.31-40
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• 2009

가장 많이 활용하는 청소로봇의 청소기법은 크게 랜덤기법과 바둑판식기법으로 나눌 수 있다. 랜덤기법을 이용한 청소로봇은 장애물을 만날 때까지 직진 방향으로 청소를 수행하며, 장애물을 만나면 일정한 각도로 회전한 후 다시 직진 방향으로 청소를 수행한다. 랜덤기법은 중복적인 청소를 수행하는 문제가 빈번히 발생하며, 청소를 완료하는 데 오래 시간이 소요되는 단점이 있다. 바둑판식기법을 이용한 청소로봇은 장애물을 만날 때까지 직진 방향으로 청소를 수행하며, 장애물을 만나면 직진과 회전을 이용하여 청소가 수행되지 않은 위치로 이동하고, 이전에 청소를 수행한 방향의 반대로 청소를 수행한다. 바둑판식기법은 청소공간을 조밀하게 청소하며 진행하기 때문에 장애물이 없거나 작은 공간에서 작업 성능이 뛰어나다. 그러나 바둑판식기법으로 장애물이 있거나 복잡한 공간을 청소할 때는 청소시간이 증가한다. 그러므로 청소의 효율성을 증가시키기 위해서는 작업공간을 정확히 파악하여 청소를 계획적으로 진행해야 한다. 본 논문에서 제안한 가상지도 기반 청소로봇은 작업공간을 효율적으로 청소하는 특성을 갖는다. 시뮬레이션을 통해 제안한 기법의 효율성을 측정하였다.

• 한국건축시공학회:학술대회논문집
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• 한국건축시공학회 2016년도 추계 학술논문 발표대회
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• pp.162-163
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• 2016

Conventional window cleaning method has a number of limitations, for example, workers dependent and high crash risk. The purpose of this study is to derive the performance requirements of a window cleaning apparatus through technology survey. For this, we investigated the domestic and international patents related to window cleaning, and interviewed experts in the field of window cleaning and mechanical design. Through this research, we have proposed performance requirements of the window cleaning apparatus.

• 한국레이저가공학회지
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• 제3권1호
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• pp.2-11
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• 2000

Laser cleaning has begun to attract a considerable amount of interest recently as a new cleaning technique among scientists and engineers. The unique characteristics of laser cleaning are currently finding successful applications in industry, in medicine as well as in the world of art conservation. This paper takes an overview of the laser cleaning technique itself including basic principles and characteristics, and provides an account of current trends especially with regard to practical applications. Experience with its successful applications in various fields shows that laser cleaning may be about to emerge as a real alternative to conventional cleaning methods.

• 한국응용과학기술학회지
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• 제14권2호
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• pp.115-122
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• 1997

The field of printing use to pressurization ink using screen gassamer that is called screen printing. Existing cleaning solvent using screen printing are the organic solvents including aromatic compounds carried with poisonous and stench. Besides, cleaning method of current screen printing are for the most part mixed cleaning method of dipping and polish. Using 1,1,1-TCE, CFC-113 alternative system cleaning solvent be substituted for existing cleaning solvent against screen printing ink measured the cleaning efficiency according to gravimetric analysis method and property change of gassamer according to Image Analyzer. Also, Cleaning process system carry with excellent cleaning efficiency studied which was proposed new cleaning process including ultrasonic and vibration cleaning process be substituted for existing mixed cleaning method of dipping and polish.