• Journal of the Korean institute of surface engineering
• /
• v.47 no.2
• /
• pp.86-92
• /
• 2014

The purpose of this comparative study was to investigate the properties of chromium nitride coatings deposited by asymmetric bipolar pulsed DC sputtering and DC sputtering system. Oscilloscope traces of the I-V waveforms indicate high power and high current density outputs during the asymmetric bipolar pulsed mode. The grain size decreases with decreasing duty cycle. The duty cycle has a strong influence not only on the microstructural properties but also on the mechanical properties of chromium nitride coatings. Comparing with the continuous DC sputtering, the chromium nitride coatings prepared by pulsed DC asymmetric bipolar process also exhibit better surface roughness.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2001.11a
• /
• pp.29-30
• /
• 2001

This paper presents some results of plasma nitriding on hard chromium deposit. The substrates were C45 steel and $30~50{\;}\mu\textrm{m}$ of chromium deposit by electroplating was formed. Plasma nitriding was carried out in a plasma nitriding system with $95NH_3{\;}+{\;}SCH_4$ atmosphere at the pressure about 600 Pa and different temperature from $450^{\circ}C{\;}to{\;}720^{\circ}C$ for various time. Optical microscopy and X-ray diffraction were used to evaluate the characteristics of surface nitride layer formed by nitrogen diffusion from plasma atmosphere inward iCr coating and interface carbide layer formed by carbon diffusion from substrate outward Cr coating. The microhardness was measured using microhareness tester at the load of 100 gf. Corrosion resistance was evaluated using the potentiodynamic measurement in 3.5% NaG solution. A saturated calomel electrode (SiCE) was used as the reference electrode. Fig.1 shows the typical microstructures of top surface and cross-section for nitrided and unnitrided samples. Aaer plasma nitriding a sandwich structure was formed consisting of surface nitride layer, center chromium layer and interface carbide layer. The thickness of nitride and carbide layers was increased with the increase of processing temperature and time. Hardness reached about 1000Hv after nitriding while 900Hv for unnitrided hard chromium deposit. X-ray diffraction indicated that surface nitrided layer was a mixture of $Cr_2N$ and CrN at low temperature and erN at high temperature (Fig.2). Anodic polarization curves showed that plasma nitriding can greatly improve the corrosion resistance of chromium e1ectrodeposit. After plasma nitriding, the corrosion potential moved to noble direction and passive current density was lower by 1 to 4 orders of magnitude compared with chromium deposit(Fig.3).

• Korean Journal of Materials Research
• /
• v.17 no.11
• /
• pp.618-621
• /
• 2007

Chromium nitride (CrN) films were deposited on silicon substrate by RF magnetron sputtering assisted by inductive coupled nitrogen plasma without intentional substrate heating. Films were deposited with different levels of bombarding energy by nitrogen ions $(N^+)$ to investigate the influence of substrate bias voltage $(V_b)$ on the growth of CrN thin films. XRD spectra showed that the crystallographic structure of CrN films was strongly affected by substrate bias voltage. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) results showed that surface roughness and grain size of the CrN films varied significantly with bias voltage. For - 80 $V_b$ depositions, the CrN films showed bigger grain sizes than those of other bias voltage conditions. The lowest surface roughness of 0.15 nm was obtained from the CrN films deposited at .130 $V_b$.

• Journal of the Korean Society for Heat Treatment
• /
• v.19 no.2
• /
• pp.83-89
• /
• 2006

The surface phase changes, the hardness variations, the nitrogen contents and the corrosion resistances of 17-4 PH stainless steel have been investigated after nitrogen permeation(solution nitriding) at a temperature ranges from $1050^{\circ}C$ to $1150^{\circ}C$ The phases appeared at the nitrogen-permeated surface layer were shown to martensite plus austenite and austenite, depending on the variation of nitrogen and chromium contents. And the surface hardness was also depended on the phases appeared at the surface layer from 370 Hv to 220 Hv. The precipitates exhibited at the nitrogen-permeated surface layer were niobium nitride, niobium chromium nitride and carbo-nitride in the austenite and martensite matrices. The surface nitrogen contents were followed by the Cr contents of the surface layers, representing 0.55% at the temperatures of $1050^{\circ}C$ and $1150^{\circ}C$ respectively, and 0.96% at $1100^{\circ}C$ at the distances of $60{\mu}m$ from the outmost surface. From the comparison of the corrosion resistances between nitrogen-permeated and solution-annealed steels, nitrogen permeation remarkably improved the corrosion resistance in the solution of 1 N $H_2SO_4$ due to the increase of nitrogen content in the surface austenite phase.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2001.11a
• /
• pp.36-36
• /
• 2001

• Corrosion Science and Technology
• /
• v.13 no.2
• /
• pp.48-55
• /
• 2014

Influence of annealing temperature on the microstructure and resistance to pitting corrosion of the hyper duplex stainless steel was investigated in acid and neutral chloride environments. The pitting corrosion resistance is strongly dependent on the microstructure, especially the presence of chromium nitrides ($Cr_2N$), elemental partitioning behavior and volume fraction of ferrite phase and austenite phase. Precipitation of deleterious chromium nitrides reduces the resistance to pitting corrosion due to the formation of Cr-depleted zone. The difference of PREN (Pitting Resistance Equivalent Number) values between the ferrite and austenite phases was the smallest when solution heat-treated at $1060^{\circ}C$. Based on the results of electrochemical tests and critical crevice temperature tests, the optimal annealing temperature is determined as $1060^{\circ}C$.

• Proceedings of the Korean Powder Metallurgy Institute Conference
• /
• 2006.09b
• /
• pp.1118-1118
• /
• 2006

• Journal of the Korean institute of surface engineering
• /
• v.55 no.2
• /
• pp.70-76
• /
• 2022

In this paper, we compared the properties of the chromium nitride (CrN) films prepared by inductively coupled plasma magnetron sputtering (ICPMS). As a comparison, CrN film prepared by a direct current magnetron sputtering (dcMS) is also studied. The crystal structure, surface and cross-sectional microstructure and composite properties of the as-deposited CrN films are compared by x-ray diffraction, field emission scanning electron microscopy, nanoindentation tester and corrosion resistance tester, respectively. It is found that the as-deposited CrN films by ICPMS grew preferentially on (200) plane when compared with that by dcMS on (111) plane. As a result, the films deposited by ICPMS have a very compact microstructure with high hardness: the nanoindentation hardness reached 19.8 GPa and 13.5 GPa by dcMS, respectively. Besides, the residual stress of CrN films prepared by ICPMS is also relatively large. After measuring the corrosion resistance, the corrosion current of films prepared by ICPMS was three order of magnitude smaller than that of CrN films deposited by dcMS.

• Journal of the Korean Society for Heat Treatment
• /
• v.8 no.4
• /
• pp.279-288
• /
• 1995

To investigate the characteristics of nitrocarburizing for high carbon chromium bearing steel, it was undertaken 4 hours holding at $850^{\circ}C$ in the atmosphere containing 60% endothermic gas and 40% ammonia. The microstructure of nitrocarburized surface consists of ${\varepsilon}-Fe_{2-3}N$, ${\gamma}^{\prime}-Fe_4N$, $Fe_3C$ and $Fe_3$(C,N), and the ${\varepsilon}$-nitride was rich in the surface-internal part. The nitrocarburized surface contains a larger volume fraction of primary carbonitrides and has more retained austenite and is slightly harder than the interior.

• Transactions of the Korean Society of Mechanical Engineers A
• /
• v.25 no.1
• /
• pp.47-53
• /
• 2001

Results ar presented of a new process for internal precision finishing of slender fine ceramic pipes using a magnetic field generated by a permanent magnets. For finishing the interior surface of a long pipe, a new type of finishing equipment was developed which can be very easily used in an industrial surrounding. In general, the pipe is so slender that a conventional finishing tool is hardly inserted into the pipe deeply, being impossible to finish. Therefore, a new technology has been considered to finish inside of a slender ceramic pipe by a simple technique. In this experimental, Magnetic Abrasive Machining is applied for the inner surface of silicon nitride fine ceramic pipe using ferromagnetic particles mixed with chromium-oxide powder. It is shown the initial roughness of 2.6㎛ Ry(0.42㎛ Ra) in the inside surface can be precisely finished to the roughness of 0.1㎛ Ry(0.01㎛ Ra). This paper discusses the outline of the processing by the application of magnetic abrasive machining and a few finishing characteristics.