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http://dx.doi.org/10.5695/JKISE.2014.47.2.086

A Comparative Study of CrN Coatings Deposited by DC and Asymmetric Bipolar Pulsed DC Sputtering  

Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University)
Baek, Ji-Won (Department of Advanced Materials Science and Engineering, Mokpo National University)
Publication Information
Journal of the Korean institute of surface engineering / v.47, no.2, 2014 , pp. 86-92 More about this Journal
Abstract
The purpose of this comparative study was to investigate the properties of chromium nitride coatings deposited by asymmetric bipolar pulsed DC sputtering and DC sputtering system. Oscilloscope traces of the I-V waveforms indicate high power and high current density outputs during the asymmetric bipolar pulsed mode. The grain size decreases with decreasing duty cycle. The duty cycle has a strong influence not only on the microstructural properties but also on the mechanical properties of chromium nitride coatings. Comparing with the continuous DC sputtering, the chromium nitride coatings prepared by pulsed DC asymmetric bipolar process also exhibit better surface roughness.
Keywords
Pulsed DC; Bipolar; Nanocrystalline; Chromium nitride; Microstructure;
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Times Cited By KSCI : 4  (Citation Analysis)
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