한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제55권2호
  • /
  • Pages.70-76
  • /
  • 2022
  • /
  • 1225-8024(pISSN)
  • /
  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
권호 표지
DOI QR코드

DOI QR Code

유도결합형 플라즈마 마그네트론 스피터로 제작된 CrN 코팅막의 전기화학적 물성 비교 연구

A comparative study of electrochemical properties in CrN films prepared by inductively coupled plasma magnetron sputtering

  • 장훈 (목포대학교 신소재공학과) ;
  • 전성용 (목포대학교 신소재공학과)
  • Jang, Hoon (Department of Advanced Materials Science and Engineering, Mokpo National University) ;
  • Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • 투고 : 2021.04.01
  • 심사 : 2021.05.10
  • 발행 : 2022.04.30
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

In this paper, we compared the properties of the chromium nitride (CrN) films prepared by inductively coupled plasma magnetron sputtering (ICPMS). As a comparison, CrN film prepared by a direct current magnetron sputtering (dcMS) is also studied. The crystal structure, surface and cross-sectional microstructure and composite properties of the as-deposited CrN films are compared by x-ray diffraction, field emission scanning electron microscopy, nanoindentation tester and corrosion resistance tester, respectively. It is found that the as-deposited CrN films by ICPMS grew preferentially on (200) plane when compared with that by dcMS on (111) plane. As a result, the films deposited by ICPMS have a very compact microstructure with high hardness: the nanoindentation hardness reached 19.8 GPa and 13.5 GPa by dcMS, respectively. Besides, the residual stress of CrN films prepared by ICPMS is also relatively large. After measuring the corrosion resistance, the corrosion current of films prepared by ICPMS was three order of magnitude smaller than that of CrN films deposited by dcMS.

키워드

과제정보

이 논문은 2021년도 정부(과학기술정보통신부)의 재원으로 한국연구재단-현장맞춤형 이공계 인재양성 지원사업의 지원을 받아 수행된 연구임 (No.NRF2019H1D8A1105567) 내부식 특성의 측정과 의미를 해석하는데 도움을 주신 목포해양대학교 기관시스템공학부 김성종 교수님께 감사를 표합니다.

참고문헌

  1. B. Subramanian, M. Jayachandran, Preparation of chromium oxynitride and chromium nitride films by DC reactive magnetron sputtering and their material properties, Corros. Eng. Sci. Technol., 46 (2011) 554-561. https://doi.org/10.1179/147842209X12579401586807
  2. Y. Konga, X. Tiana, C. Gonga, P. K. Chu, Enhancement of toughness and wear resistance by CrN/CrCN multilayered coatings for wood processing, Surf. Coat. Technol., 344 (2018) 204-213. https://doi.org/10.1016/j.surfcoat.2018.03.027
  3. P. K. Huang, W. Y. Jien, Effects of nitrogen content on structure and mechanical properties of multi-element (AlCrNbSiTiV)N coating, Surf. Coat. Technol., 203 (2009) 1891-1896. https://doi.org/10.1016/j.surfcoat.2009.01.016
  4. H. M. Tunga, J. H. Huanga, D. G. Tsai, C. F. Aib, G. P. Yua, Hardness and residual stress in nanocrystalline ZrN films: Effect of bias voltage and heat treatment, Mater. Sci. Eng. A, 500 (2009) 104-108. https://doi.org/10.1016/j.msea.2008.09.006
  5. S. W. Park, S. Y. Chun, A comparative study of CrN coatings deposited by DC and pulsed DC asymmetric bipolar sputtering for a polymer electrolyte membrane fuel cell (PEMFC) metallic bipolar plate, J. Korean Ceram. Soc., 50 (2013) 390-395. https://doi.org/10.4191/kcers.2013.50.6.390
  6. X. Guan, Y. Wang, G. Zhang, X. Jiang, L. Wang Q. Xue, Microstructures and properties of Zr/CrN multilayer coatings fabricatedby multi-arc ion plating, Tribol. Int., 106 (2017) 78-87. https://doi.org/10.1016/j.triboint.2016.10.036
  7. H. Barankova, L. Bardos, Comparison of pulsed dc and rf hollow cathode depositions of Cr and CrN films, Surf. Coat. Technol., 205 (2011) 4169-4176. https://doi.org/10.1016/j.surfcoat.2011.03.013
  8. R. Xingrun, Z. Qinying, H. Zhu, S. Wei, Y. Jiangao, C. Hao, Microstructure and tribological properties of CrN films deposited by direct current magnetron sputtering, Rare Metal Mat. Eng., 47 (2018) 2283-2289. https://doi.org/10.1016/S1875-5372(18)30180-2
  9. D. Zhang, X. Zuo, Z. Wang, H. Li, R. Chen, A. Wang, P. Ke, Comparative study on protective properties of CrN coatings on the ABS substrate by DCMS and HiPIMS techniques, Surf. Coat. Technol., 394 (2020) 125890. https://doi.org/10.1016/j.surfcoat.2020.125890
  10. S. Kumara, V. S. Rajua, R. Shekhara, J. Arunachalama, A. S. Khannab, K. G. Prasadc, Compositional characterization of CrN films deposited by ion beamassisted deposition process on stainless steel, Thin Solid Films, 388 (2001) 195-200. https://doi.org/10.1016/S0040-6090(01)00849-5
  11. L. Yang, Z. Wang, H. Zhang, Z. Liu, Q. Chen, The superior properties of CrN coatings prepared by high power pulsed reactive magnetron sputtering, AIP Adv., 10 (2020) 015125. https://doi.org/10.1063/1.5132783
  12. F. Ge, P. Zhu, F. Meng, Q. Xue and F. Huang, Achieving very low wear rates in binary transition-metal nitrides : The case of magnetron sputtered dense and highly oriented VN coatings, Surf. Coat. Technol., 248 (2014) 81-90. https://doi.org/10.1016/j.surfcoat.2014.03.035
  13. Y. Tripathi, R. Gupta, Seema, M. Gupta, D. M. Phaseb, P. Rajputc, Study of phase formulation in CrN thin films and its response to a minuscule oxygen flow in reactive sputtering process, Thin Solid Films, 670 (2019) 113-121. https://doi.org/10.1016/j.tsf.2018.10.009
  14. S. Tan, X. Zhang, X. Wu, F. Fang, J. Jiang, Comparison of chromium nitride coatings deposited by DC and RF magnetron sputtering, Thin Solid Films, 519 (2011) 2116-2120. https://doi.org/10.1016/j.tsf.2010.10.067
  15. C.P. Constable, D.B. Lewis, J. Yarwood, W.D. Munz, Raman microscopic studies of residual and applied stress in PVD hard ceramic coatings and correlation with X-ray diffraction (XRD) measurements, Surf. Coat. Technol., 184 (2004) 291-297. https://doi.org/10.1016/j.surfcoat.2003.10.014
  16. D. H. Seo, S. Y. Chun, Growth behavior of nanocrystalline CrN coatings by inductively coupled plasma (ICP) assisted magnetron sputtering, J. Korean Ceram. Soc., 49 (2012) 556-560. https://doi.org/10.4191/kcers.2012.49.6.556