• Title/Summary/Keyword: Chemical cleaning method

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Analysis of the Extracted Non-fibrous Matters from the Exhumed Textiles of Milchang-gun Burial of Mapo (마포 밀창군 묘 출토 복식유물의 섬유외 물질의 추출분석)

  • 안춘순
    • The Research Journal of the Costume Culture
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    • v.11 no.6
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    • pp.902-912
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    • 2003
  • The purpose of this research was two-folds; first, to investigate the type of soil contaminated in the Hunsang excavated from the Milchang-gun burial of Mapo for the purpose of proposing the adequate washing method, second, to utilize the chemical degradation result obtained from the previous research to identify the natural dye source used in the Hunsang textile. The application of KS K0251 test showed that the soil was more oleophilic than hydrophilic thus indicating that wet cleaning was more adequate that dry cleaning for the removal of Hunsang soil. The GC-MS result of the Hunsang extraction showed dimethyl phthalate and 2,4-di-tert-butylphenol as its degradation product and these coincided with the degradation products from the alizarin standard data of previous research. The comparison of the two suggested that it is likely that Hunsang was dyed with madder which has alizarin as its major chromophore.

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Study on the Direct Bonding of Silicon Wafers by Cleaning in $HNO_3:H_2_O2:HF$ (HNO$_3:H_2O_2$ : HF 세척법을 이용한 실리콘 직접 접합 기술에 관한 연구)

  • Joo, C.M.;Choi, W.B.;Kim, Y.S.;Kim, D.N.;Lee, J.S.;Sung, M.Y.
    • Proceedings of the KIEE Conference
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    • 1999.07g
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    • pp.3310-3312
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    • 1999
  • We have studied the method of silicon direct bonding using the mixture of $HNO_$, $H_2O_2$, and HF chemicals called the controlled slight etch (CSE) solution for the effective wafer cleaning. CSE, two combinations of oxidizing and etching agents, have been used to clean the silicon surfaces prior to wafer bonding. Two wafers of silicon and silicon dioxide were contacted each other at room temperature and postannealed at $300{\sim}1100^{\circ}C$ in $N_2$ ambient for 2.5 h. We have cleaned silicon wafers with the various HF concentrations and characterized the parameters with regard to surface roughness, chemical nature, chemical oxide thickness, and bonding energy. It was observed that the chemical oxide thickness on silicon wafer decreased with increasing HF concentrations. The initial interfacial energy and final energy postannealed at $1100^{\circ}C$ for 2.5h measured by the crack propagation method was 122 $mJ/m^2$ and 2.96 $mJ/m^2$, respectively.

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Indoor Emission Characteristics of Liquid Household Products using Purge - and - Trap Method

  • Kwon, Ki-Dong;Jo, Wan-Kuen
    • Environmental Engineering Research
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    • v.12 no.5
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    • pp.203-210
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    • 2007
  • Since the emissions composition from the household products have potentially been associated with health risks for building occupants, the chemical composition emitted from the products should be surveyed. The current study identified the emission composition for 42 liquid household products, using a purge-and-trap method. This evaluation was done by classifying the household products into five product classes (deodorizers, household cleaners, color removers, pesticides, and polishes). Nineteen compounds were chosen on the basis of selection criteria. The quality control program for purge-and-trap and analytical systems included tests of laboratory blank Tenax traps and blank water samples, and the determination of calibration equation, measurement precision, method detection limit (MDL), and recovery. The number of chemicals varied according to the product categories, ranging from 4 for the product category of bleaches to 12 for the product categories of air fresheners and nail color removers. For all product categories, the emission composition and concentrations varied broadly according to product. It is noteworthy that most household products emit limonene: 19 of 25 cleaning products; 5 of 6 deodorizers; 1 of 3 pesticides; 3 of 3 color removers; and 4 of 5 polishes. It was suggested that the use of household products sold in Korea could elevate the formation of secondary toxic pollutants in indoor environments, by the reaction of limonene with ozone, which entered indoor environments or might be generated by indoor sources such as electronic air cleaning devices and copying machines.

Preparation of Solvent-Free Low Foaming Scouring Agents and Their Scouring Characteristics (무용제형 저기포성 정련제의 제조 및 정련특성)

  • Park, Hong-Soo;Ahn, Sung-Hwan;Shim, Il-Woo;Jo, Hye-Jin;Hahm, Hyun-Sik;Kim, Yeoung-Chan;Kim, Seong-Kil
    • Journal of the Korean Applied Science and Technology
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    • v.23 no.1
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    • pp.37-44
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    • 2006
  • Solvent-free low foaming scouring agents (LFSC) were prepared by blending of 2-ethylhexylaminoethyl sulfate (2-EHAS), POE(10) octadecylbenzyl- ammonium chloride (POBAC) and Sedlan FF-200 (FF-200). As the results of several tests, 2-EHAS/POBAC/FF-200/water (8g/12g/20g/60g) mixture (LFSC-5) showed good cleaning power, penetrating ability and stability to alkali, and gave less problem in water pollution. The foaming power of LFSC-5 measured by Ross and Miles method was 8mm foam height immediately after foaming, and that measured by Ross and Clark method was less than 300mm foam height at $30^{\circ}C$, and 18mm at $80^{\circ}C$. As a result, LFSC-5 proved a good low foaming scouring agent for fiber.

The crystallinity of silicon films deposited at low temperatures with Remote Plasma Enhanced Chemical Vapor Deposition(RPECVD) (원거리 플라즈마 화학증착을 이용한 규소 박막의 결정성)

  • 김동환;이일정;이시우
    • Journal of the Korean Vacuum Society
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    • v.4 no.S1
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    • pp.1-6
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    • 1995
  • Polycrystalline Si films have been used in many applications such as thin film transistors(TFT), image sensors and LSI applications. In this research deposition of Si films at low temperatures with remote plasma enhanced CVD from Si2H6-SiF4-H2 on SiO2 was studied and their crystallinity was investigated. It was condluded that growth of crystalline Si films was favorable with (1) low Si2H6 flow rates, (2) moderate plasma power, (3) moderate SiF4 flow rates, (4) moderate substrate temperature, and (5) suitable method of surface cleaning.

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A Study on the Characteristics of Silicon Direct Bonding by Hydrogen Plasma Treatment (수소 플라즈마 처리에 의한 실리콘 직접접합 특성에 관한 연구)

  • Choe, U-Beom;Ju, Cheol-Min;Kim, Dong-Nam;Seong, Man-Yeong
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.7
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    • pp.424-432
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    • 2000
  • The plasma surface treatment, using hydrogen gas, of the silicon wafer was investigated as a pretreatment for the application to silicon-on-insulator (SOI) wafers using the silicon direct bonding technique. The chemical reactions of hydrogen plasma with surfaces were used for both the surface activation and the removal of surface contaminants. As a result of exposure of silicon wafer to the plasma, an active oxide layer was formed on the surface, which was rendered hydrophilic. The surface roughness and morphology were estimated as functions of plasma exposing time as well as of power. The surface became smoother with decreased incident hydrogen ion flux by reducing plasma exposing time and power. This process was very effective to reduce the carbon contaminants on the silicon surface, which was responsible for a high initial surface energy. The initial surface energy measured by the crack propagation method was 506 mJ/m2, which was up to about three times higher than that of a conventional RCA cleaning method.

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A study on an experimental basis a special quality character of thin film use in order to TiN a conditioned immersion (TiN증착 조건에 따른 박막의 특성에 대한 실험적 연구)

  • Park, Il-Soo
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.12 no.11
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    • pp.4711-4717
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    • 2011
  • Formation of TiN films by PVD method and the DC and RF sputtering deposition method can be applied, the injected gas to generate plasma ionization rate of the film forming speed is slow away, anything to increase the adhesion between films limitations have. To improve this, to investigate the deposition and ion beam evaporation simultaneously IBAD(Ion beam assisted deposition) when used, Ion beam surface coating material prior to the survey because the surface cleaning effect of a large, high film adhesion can be obtained. In addition, the high vacuum and low temperature, high purity thin film of uniform thickness in the benefits is.

Optimum Chemical Cleaning Conditions for Ceramic Microfiltration Membrane Process (세라믹 정밀여과막 공정을 위한 최적 약품세척 방안)

  • Lim, Jae-Lim;Lee, Kyung-Hyuk;Lee, Young-Joo;Park, Jong-Yul
    • Membrane Journal
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    • v.22 no.6
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    • pp.461-469
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    • 2012
  • This study was carried out to find the optimum chemical cleaning (CIP) conditions for ceramic microfiltration membrane process of Y drinking water treatment plant. B train consists of coagulation as pretreatment process with membrane was chemically cleaned 9 times more than that of A train with ozonation and coagulation. The frequent CIP of B train was due to improper CIP method suggested by membrane manufacture as well as different membrane fouling between A and B train resulting from the different pretreatment processes. That is, recovery rate of CIP was overestimated because the rate was calculated based on normalized trans membrane pressure (TMP) rather than normalized permeability. And also, iron oxide fouling was ineffectively removed by citric acid. By using a mixture of 1% citric acid and 0.1 N sulfuric acid as reagent for acid CIP step, the recovery rate of CIP was the highest while CIP efficiency by 0.1 N sulfuric acid was the lowest. When sulfuric acid concentration increased from 0.1 N to 0.3 N in mixture, total recovery rate of CIP was not increased due to the decreased CIP efficiency in alkali CIP step by 0.3% NaOCl although its rate in acid CIP step was increased. It was proved through the experiment result of CIP sequence changes that an acid followed by alkali CIP was more effective than that of the reverse method.

RF Power Conversional System for Environment-friendly Ferrite Core Inductively Coupled Plasma Generator (환경친화형 페라이트 코어 유도결합 플라즈마 고주파 전력 변환 장치)

  • Lee, Joung-Ho;Choi, Dae-Kyu;Kim, Soo-Seok;Lee, Byoung-Kuk;Won, Chung-Yuen
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.20 no.8
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    • pp.6-14
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    • 2006
  • This paper is a study about a proper method of plasma generation to cleaning method and a high frequency power equipment circuit to generation of plasma that used cleaning of chamber for TFT-LCD PECVD. The high density plasma required for cleaning causes a possibility of high density plasma more than $1{\times}10^{11}[EA/cm^3]$. It apply a ferrite core of ferromagnetic body to a existing ICP form. In case of power transfer equipment on 400[kHz] high frequency to generation of plasma it makes certain a stable switching operation in condition of plasma through using a inverter form for general purpose HB. And it demonstrates the performance of power transfer equipment using methods of measurement which use a transformer of series combination the density of plasma and the rate of dissolution of $NF_3$ in condition of $A_r\;and\;NF_3$.

Types and Characteristics of Lubricant Filters (윤활유 필터의 종류 및 특징)

  • Sung-Ho Hong;Ju-Yong Shin;Tae-Sung Park;Sang-Hoo Lee
    • Tribology and Lubricants
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    • v.39 no.4
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    • pp.133-138
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    • 2023
  • This paper presents a discussion on lubricating oil filters. The maintenance of lubricating oil filters can improve the performance of mechanical systems and extend the service life of the lubricating oil. Therefore, the effective management of the lubricating oil can extend the service life of the machine and reduce maintenance costs. A representative method for managing lubricating oil is filtering the lubricating oil using a lubricant filter. However, effectively managing a lubricating oil using a lubricant filter requires an understanding of the related knowledge. In this paper, we present the definition, classification, characteristics, specifications, performance, and self-cleaning function of lubricating oil filters. The lubricant filters are classified based on the filter material, filtering method, filtering location, and amount of filtered fluid. Cellulose and glass fiber materials are conventionally used as materials for lubricant filters, and recently, metal materials, which show excellent durability, are being increasingly adopted. The filtering methods can be classified into physical, chemical, magnetic, and electric field methods, and the lubricant filters can be classified according to their location in the lubrication system. The beta ratio and efficiency of the lubricant filter can be determined based on the performance of the filter. Finally, there are many products or technologies that add a self-cleaning function to the filter to remove foreign substances or contaminants for efficient management.