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http://dx.doi.org/10.5762/KAIS.2011.12.11.4711

A study on an experimental basis a special quality character of thin film use in order to TiN a conditioned immersion  

Park, Il-Soo (Department of Refrigeration Engineering, Tongmyong University)
Publication Information
Journal of the Korea Academia-Industrial cooperation Society / v.12, no.11, 2011 , pp. 4711-4717 More about this Journal
Abstract
Formation of TiN films by PVD method and the DC and RF sputtering deposition method can be applied, the injected gas to generate plasma ionization rate of the film forming speed is slow away, anything to increase the adhesion between films limitations have. To improve this, to investigate the deposition and ion beam evaporation simultaneously IBAD(Ion beam assisted deposition) when used, Ion beam surface coating material prior to the survey because the surface cleaning effect of a large, high film adhesion can be obtained. In addition, the high vacuum and low temperature, high purity thin film of uniform thickness in the benefits is.
Keywords
Plasma; Ion beam assisted deposition; Physical vapor deposition; Chemical vapor deposition;
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