• Journal of the Korean Vacuum Society
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• v.18 no.6
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• pp.468-473
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• 2009

Selective area epitaxy of multiple-stacked InP/InGaAs structures were grown by chemical beam epitaxy. The width of top of the multiple-stacked InP/InGaAs layer which were selectively grown on the stripe lines parallel to the <011> direction was narrowed, while the width of top of the multiple-stacked InP/InGaAs layer on the stripe lines parallel to the <01-1> was widen. This difference according to the <011> and <01-1> direction was explained by the growth of InGaAs <311>A and B faces on the (100) InP surface on the stripe lines parallel to the <01-1> direction. Under growth rate of $1\;{\mu}m/h$, top of the multiple-stacked InP/InGaAs was flattened as the pressure of group V gas was decreased. This phenomenon was understood by the saturation of group V element on the surface.

• Bulletin of the Korean Chemical Society
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• v.16 no.2
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• pp.149-153
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• 1995

We have grown GaAs epilayers by chemical beam epitaxy(CBE) using unprecracked hydrides and metal organic compounds via a surface decomposition process. This result shows that unprecracked arsine (AsH3) or monoethylarsine (MEAs) can be used in chemical beam epitaxy(CBE) as a replacement of a precracked AsH3 source in CBE. It was also found that the uptake of carbon impurity in epilayers grown using trimethylgallium(TMG) with unprecracked AsH3 or MEAs was significantly reduced compared to that in epilayers grown by CBE process employing TMG and arsenics produced from precracked hydrides. We propose a surface structural model suggesting that the hydrogen atoms play an important role in the reduction of carbon content in GaAs epilayer. Intermediates like dihydrides from hydride sources were also considered to hinder carbon atoms from being incorporated into the epilayers or to remove other carbon containing species on the surface.

• Journal of the Korean Vacuum Society
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• v.5 no.3
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• pp.199-205
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• 1996

InGaAs eqitaxial layers have been selectively grown on patterned GaAs(100) substrates by chemical beam epitaxy (CBE) using triethylgallium (TEGa), trimethylindium (TMIn), and unprecracked monoethylarsine (MEAs). Facet growth of InGaAs epilayers has also been investigated at the various growth temperatures and Si4N4 dielectric pattern directions. In [011] jirection of mask, the change from (311), (377) and (111) facets to (311) facet with increasing growth temperature was observed. In [011] direction, however, the change from (011) and (111) facets to (111) facet with increasing growth temperature was observed. These results are attributed to the sidewall growth caused by different surface migration lengths of reactants. The formation of U-shaped (100) top surface is also discussed in terms of dangling bond model.

• Journal of the Korean Vacuum Society
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• v.4 no.3
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• pp.275-282
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• 1995

III족 원료 가스로 triethylgallium(TEGa)과 trimethylindium(TMIn)을 사용하고 V족 원료 가스로 사전 열 분해하지 않은 arsine(AsH3)과 monoethylarsine(MEAs)을 사용하여 ultrahigh vacuum chemical vapor deposition(UHVCVD)법으로 Si3N4로 패턴된 GaAs(100)기판 위에 GaAs와 InGaAsqkr막을 선택적으로 에피택시 성장을 하였다. V족 원료 가스를 사전 열 분해하지 않으므로 넓은 성장 온도 구간과 V/lll 비율에서도 선택적으로 박막이 성장되었다. 또한 선택 에피택시의 성장 메카니즘을 규명하기 위하여 다양한 filling factor(전체면적중 opening된 면적의 비율)를 가지는 기판을 제작하여 성장에 사용하였다. UHVCVD법에서는 마스크에 면적중 opening된 면적의 비율)를 가지는 기판을 제작하여 성장에 사용하였다. UHVCVD법에서는 마스크에 입사된 분자 상태의 원료 기체가 탈착된 후 표면 이동이나 가스 상태의 확산과정 없이 마스크로부터 제거되므로 패턴의 크기와 모양에 따른 성장 속도의 변화나 조성의 변화가 없을 뿐만 아니라 chemical beam epitaxy(CBE)/metalorganic molecular beam epitaxy(MOMBE)법에서 알려진 한계 성장온도 이하에서 선택 에피택시 성장이 이루어졌다.

• Proceedings of the Korean Vacuum Society Conference
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• 1997.02a
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• pp.41-41
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• 1997

• ETRI Journal
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• v.20 no.2
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• pp.231-240
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• 1998

We report, for the first time, the fabrication of vertically stacked InGaAs/GaAs quantum wires (QWRs) on V-grooved substrates by chemical beam epitaxy (CBE). To fabricate the vertically stacked QWRs structure, we have grown the GaAs resharpening barrier layers on V-grooves with (100)-(322) facet configuration instead of (100)-(111) base at 450 $^{\circ}C$. Under the conditions of low growth temperature, the growth rate of GaAs on the (322) sidewall is higher than that at the (100) bottom. Transmission electron microscopy verifies that the vertically stacked InGaAs QWRs were formed in sizes of about $200{\AA} {\times} 500{\sim}600 {\AA}$. Three distinct photoluminescence peaks related with side-quantum wells (QWLs), top-QWLs and QWRs were observed even at 200 K due to sufficient carrier and optical confinement. These results strongly suggest the existence of the quantized state in the vertically stacked InGaAs/GaAs QWRs grown by CBE.

• Proceedings of the Optical Society of Korea Conference
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• 2000.02a
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• pp.266-267
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• 2000

최근에 Stranski-Krastanov 방법을 이용한 나노미터 크기의 변형된 섬 구조 제작에 많은 관심을 보이고있다.$^{(1)}$ 이는 결함이 적고, 균일한 저차원의 반도체 구조가 광전자 장치에 지대한 발전을 가져올 것으로 기대되기 때문이다. 예를들어 양자 선이나 양자 점은 반도체 레이저의 이득 영역으로 좋은 특성을 가지는 것으로 알려졌다.$^{(2)}$ 이 논문에서 우리는 Chemical Beam Epitaxy (CBE)를 이용하여 InP 기판 위에 격자상수가 맞지 않는 InAs 층의 성장과 Photoluminescence (PL) 측정을 통해 이 구조의 특성에 대해서 알아보고자 한다. (중략)

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.70-70
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• 2010

일차원 나노구조를 갖는 재료는 크기효과 뿐만 아니라 단결정성, 일차원성으로 인해 새로운 물리적, 화학적 성질과 높은 표면적-부피비 등으로 인하여 많은 관심의 대상이 되고 있다. 일차원 나노구조 중에 특히 GaAs 나노와이어의 경우, 미래의 전자 소자 혹은 광자 소자로서의 잠재력 때문에 많은 연구가 이루어지고 있다. GaAs 나노와이어는 MOCVD(Metal-Organic Chemical Vapor Deposition), CBE(Chemical Beam Epitaxy), MBE(Molecular Beam Epitaxy)등의 방법으로 성장시킬 수 있다. 본 연구에서는 아크 방전법으로 합성한 단일벽 탄소나노튜브 템플릿 위에 GaAs를 MBE로 성장시켜 다공성의 GaAs-탄소나노튜브 복합체를 제작하였다. GaAs는 성장온도를 $400^{\circ}{\sim}600^{\circ}C$ 사이로 변화시켜 성장시켰다. 성장온도가 $500^{\circ}C$ 미만일 경우에는 GaAs가 탄소나노튜브 위에서 입상구조로 성장이 되었으며 $500^{\circ}C$ 이상에서는 탄소나노튜브 위에 나노와이어가 성장되었다. 또한, 제작된 GaAs-탄소나노튜브 복합체를 전자 소스로서의 응용가능성을 보기 위해 전계 방출 특성을 측정하였다.

• Proceedings of the Materials Research Society of Korea Conference
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• 1997.05a
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• pp.37-37
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• 1997

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.202.1-202.1
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• 2013

ZnO nanostructure was fabricated on a Si substrate using two-step growth. The seed layer was grown on the Si substrate by a sol-gel spin-coating. In the first step, ZnO nanorods were grown by a hydrothermal method at $140^{\circ}C$ for 5 min. In the second step, a ZnO thin film was grown on the ZnO nanorods by spin-coating. After growth, these films were annealed at $800^{\circ}C$ for 10 min. Electrical and optical properties of ZnO nanostructures have modified by plasma-assisted molecular beam epitaxy (PA-MBE) regrowth. The carrier concentration and resistivity increased by PA-MBE regrowth. In the photoluminescence, the full width at half maximum and intensity were decreased and increased, respectively, by PA-MBE regrowth.