• Title/Summary/Keyword: Chamber Monitoring

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Field tests of the radiation detectors for environmental radiation monitoring around KORI nuclear power plants (고리원자력 주변 환경방사선 감시를 위한 방사선 측정기의 현장 성능 시험)

  • 최성수;신대용;조규성;하달규
    • 제어로봇시스템학회:학술대회논문집
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    • 1997.10a
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    • pp.1371-1374
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    • 1997
  • We had developed the on-line environmental monitoring system which has installed around Kori Nuclear Power Plants and will be taken the place of the existing system. The system consists of a main computer and 11 sets of radiation monitoring post equipments. Nal(Tl) scintillation detectro was adopted in addition to ion-chamber detector and implemented with DCU(Dose Conversion Unit) and SCA(Single Channel Analyzer). Compared with the existing system, it has revised feature in the radiation measurements which are detection of artificial radioactivity and 2-ways of the radiatiion detectors. The field test trsults show that the developed radiation detecting equipments can measure environmental radiation withn 5.0% of the theoretical value.

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Large-volume and room-temperature gamma spectrometer for environmental radiation monitoring

  • Coulon, Romain;Dumazert, Jonathan;Tith, Tola;Rohee, Emmanuel;Boudergui, Karim
    • Nuclear Engineering and Technology
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    • v.49 no.7
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    • pp.1489-1494
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    • 2017
  • The use of a room-temperature gamma spectrometer is an issue in environmental radiation monitoring. To monitor radionuclides released around a nuclear power plant, suitable instruments giving fast and reliable information are required. High-pressure xenon (HPXe) chambers have range of resolution and efficiency equivalent to those of other medium resolution detectors such as those using NaI(Tl), CdZnTe, and $LaBr_3:Ce$. An HPXe chamber could be a cost-effective alternative, assuming temperature stability and reliability. The CEA LIST actively studied and developed HPXe-based technology applied for environmental monitoring. Xenon purification and conditioning was performed. The design of a 4-L HPXe detector was performed to minimize the detector capacitance and the required power supply. Simulations were done with the MCNPX2.7 particle transport code to estimate the intrinsic efficiency of the HPXe detector. A behavioral study dealing with ballistic deficits and electronic noise will be utilized to provide perspective for further analysis.

Status Change Monitoring of Semiconductor Plasma Process Equipment (주파수 도메인 반사파 측정법을 이용한 플라즈마 공정장비 상태변화 연구)

  • Yunsang Lee;Sang Jeen Hong
    • Journal of the Semiconductor & Display Technology
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    • v.23 no.1
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    • pp.52-55
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    • 2024
  • In this paper, a state change study was conducted through Frequency Domain Reflectometry (FDR) technology for the process chamber of plasma equipment for semiconductor manufacturing. In the experiment, by direct connecting the network analyzer to the RF matcher input of the 300 mm plasma enhanced chemical vapor deposition (PECVD) chamber, S11 was measured in a situation where plasma was not applied, and the frequency domain reacting to the chamber state change was searched. Response factors to changes in the status, such as temperature, spacing of the heating chuck, internal pressure difference, and process gas supply state were confirmed. Through this, the frequency domain in which a change in the reflection value was detected through repeated experiments. The reliability of the measured micro-displacement was verified through reproducibility experiments.

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Simultaneous Measurements of Gaseous Nitrous Acid and Particulate Nitrite Using Diffusion Scrubber/Steam Chamber/Luminol Chemiluminescence

  • Chang, Won-Il;Choi, Jung-Ho;Hong, Sang-Bum;Lee, Jai H.
    • Bulletin of the Korean Chemical Society
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    • v.29 no.8
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    • pp.1525-1532
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    • 2008
  • An instrument was developed for the simultaneous determination of gas- and aerosol-phase nitrous acid (HONO). Gaseous HONO (HONO(g)) was sampled by a diffusion scrubber and particulate nitrite ($NO_2\;^-$(p)) was collected by a particle growth chamber. The collected samples were analyzed in time-sharing manner, based on the peroxynitrite-induced luminol chemiluminescence. The automated system was found to be sensitive with 13 pptv of detection limit, fast with 4 min. of sampling frequency, and simple and affordable to construct and operate. The system was optimized by adjusting the experimental parameters. The system was applied to the field measurement of gas- and particle-phase HONO during the springtime of 2004 in Gwangju, South Korea. HONO(g) concentrations varied diurnally from 200 pptv around 3 P.M. to 800 pptv at 5 A.M. The variation of $NO_2\;^-$(p) was not significant with the maximum of 240 pptv at 11 P.M. and the minimum of 170 pptv at 4 P.M., not displaying distinct characteristics.

On-line Gamma Monitoring System for Environmental Radiation Measurement around KAERI-site (KAERI 부지 주변의 환경선량 측정을 위한 온라인 감마선량 감시시스템)

  • Lee, Chang-Woo;Park, Doo-Won;Lee, Won-Yun;Choi, Yong-Ho;Hong, Kwang-Hee;Kim, Sam-Rang;Lee, Hyun-Duk;Lee, Jeong-Ho
    • Journal of Radiation Protection and Research
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    • v.19 no.2
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    • pp.147-156
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    • 1994
  • On-line gamma monitoring system around KAERI-site was set up to monitor the radiation fluctuations in environment. Data on gamma exposure rates measured by the ionication chamber in the monitoring posts are transmitted to a computer of central control station with. radio telemetry transmission modem and monitored in real time. Radio telemetry transmission system is economical and reliable on handling and storing of data. This monitroing system can triger an early warning system in the event of abnormal radiation levels.

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Real-Time Small Exposed Area $SiO_2$ Films Thickness Monitoring in Plasma Etching Using Plasma Impedance Monitoring with Modified Principal Component Analysis

  • Jang, Hae-Gyu;Nam, Jae-Uk;Chae, Hui-Yeop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.320-320
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    • 2013
  • Film thickness monitoring with plasma impedance monitoring (PIM) is demonstrated for small area $SiO_2$ RF plasma etching processes in this work. The chamber conditions were monitored by the impedance signal variation from the I-V monitoring system. Moreover, modified principal component analysis (mPCA) was applied to estimate the $SiO_2$ film thickness. For verification, the PIM was compared with optical emission spectroscopy (OES) signals which are widely used in the semiconductor industry. The results indicated that film thickness can be estimated by 1st principal component (PC) and 2nd PC. Film thickness monitoring of small area $SiO_2$ etching was successfully demonstrated with RF plasma harmonic impedance monitoring and mPCA. We believe that this technique can be potentially applied to plasma etching processes as a sensitive process monitoring tool.

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Real-time Environmental Radiation Monitoring System with Automatic Restoration of Backup Data in Site Detector via Communication using Radio Frequency (현장검출기에 저장된 백업데이터를 무선통신방식으로 자동 복원하는 실시간 환경선량 감시 시스템)

  • Lee, Wan-No;Kim, Eun-Han;Chung, Kun-Ho;Cho, Young-Hyun;Choi, Geun-Sik;Lee, Chang-Woo;Park, Ki-Hyun;Kim, Yun-Goo
    • Journal of Radiation Protection and Research
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    • v.28 no.3
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    • pp.255-261
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    • 2003
  • An environmental radiation monitoring system based on high pressurized ionization chamber has been used for on-line gamma monitoring surrounding the KAERI (Korea Atomic Energy Research Institute), which transmits the dose data measured from ion chamber on the site via radio frequency to a central processing computer and stores the transmitted real-time data. Although communication using radio frequency has several advantages such as effective and economical transmission, storage, and data process, there is one main disadvantage that data loss during transmission often happens because of unexpected communication problems. It is possible to restore the loss data by off-line such as floppy disk but the simultaneous process and display of current data as well as the backup data are very difficult in the present on-line system. In this work, a new electronic circuit board and the operation software applicable to the conventional environmental radiation monitoring system are developed and the automatical synchronization of the ion chamber unit and the central processing computer is carried out every day. This system is automatically able to restore the backup data within 34 hours without additional equipments and also display together the current data as well as the transmitted backup data after checking time flag.

Development of HC Sensor & System for Vehicles Exhaust Gas Check (HC 센서를 이용한 자동차 배기가스 감지 연구)

  • Chon, Young-Kap;Cho, Kook-Hee
    • Proceedings of the KIEE Conference
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    • 1999.11d
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    • pp.1011-1014
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    • 1999
  • An on-board monitoring system for an automobile emission gas has a test chamber remote from the automobile's engine exhaust gas stream: apparatus for supplying the chamber with sampled exhaust gases. A single hydrocarbon sensor exposed to the exhaust gas in the chamber to render a signal responsive to the hydrocarbon. The conductive ions in emission gas was checked by the HC sensor in test chamber. A preferred application includes hydrocarbons in an automotive exhaust gas stream by exposing a transition porous alumina($Al_{2}O_{3}$) ceramic based sensor to the same exhaust gas stream. By combining the electrical signal, a measure of hydrocarbons can be provided.

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Real time monitoring of In-Line type sputtering system using an in-vacuo wireless camera (내장형 무선 카메라를 이용한 In-Line type 스퍼터링 시스템 내부의 실시간 모니터링)

  • Choi, Ji-Seong;Do, Woo-Ri;Hong, Kwang-Gi;Ju, Jeong-Hun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.10a
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    • pp.243-244
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    • 2009
  • 진공 chamber 내부 plasma를 외부에서 view port를 통한 확인 및 촬영보다 효율을 높이기 위하여 chamber 내부에 무선 camera (IVC : internal vacuum camera)를 삽입하여 더 세밀하게 plasma를 촬영하였고 view port로 확인이 불가능한 부분을 촬영 및 녹화하였다. 외부 view port로 확인할 수 없는 원거리 플라즈마 소스 (remote plasma source, RPS)와 in-line type의 chamber에서 동적 (dynamic) 증착이 이루어지는 substrate에 camera를 부착하여 이동 중 target 위쪽에 방전된 plasma, ICP (inductively coupled plasma) antenna를 진공 중 chamber 내부에서 촬영 및 녹화하였다.

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Effect of Flow Field and Detection Volume in the Optical Particle Sensor on the Detection Efficiency (광학입자센서 내 유동장과 측정영역이 측정효율에 미치는 영향)

  • Kim, Young-Gil;Jeon, Ki-Soo;Kim, Tae-Sung
    • Proceedings of the KSME Conference
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    • 2007.05b
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    • pp.3162-3167
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    • 2007
  • The OPS (Optical Particle Sensor) using light scattering from the particles (real-time measurement without physical contact to the particles) can be used for cleanroom or atmospheric environment monitoring. For particles smaller than 300 nm, the detection efficiency becomes lower as scattered light decreases with particle size. To obtain higher detection efficiency with small particles, the flow field in particle chamber and the detection volume should be designed optimally to achieve maximum scattered light from the particles. In this study, a commercial computational fluid dynamics software FLUENT was used to simulate the gas flow field and particle trajectories with various optical chamber designs for 300 nm PSL particle. For estimation of laser viewing volume, we used a commercial computational optical design program ZEMAX. The results will be a great help in the development of OPS which can measure small particles with higher detection efficiency.

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