• 한국재료학회지
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• 제12권4호
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• pp.296-303
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• 2002

For potential application to quantum mechanical devices, nano-composite thin films, consisting of GaAs quantum dots dispersed in SiO$_2$ glass matrix, were fabricated and studied in terms of structural, chemical, and optical properties. In order to form crystalline GaAs quantum dots at room temperature, uniformly dispersed in $SiO_2$matrix, the composite films were made to consist of alternating layers of GaAs and $SiO_2$in the manner of a superlattice using RF magnetron sputter deposition. Among different film samples, nominal thickness of an individual GaAs layer was varied with a total GaAs volume fraction fixed. From images of High Resolution Transmission Electron Microscopy (HRTEM), the formation of GaAs quantum dots on SiO$_2$was shown to depend on GaAs nominal thickness. GaAs deposits were crystalline and GaAs compound-like chemically according to HRTEM and XPS analysis, respectively. From measurement of optical absorbance using a spectrophotometer, absorption edges were determined and compared among composite films of varying GaAs nominal thicknesses. A progressively larger shift of absorption edge was noticed toward a blue wavelength with decreasing GaAs nominal thickness, i.e. quantum dots size. Band gaps of the composite films were also determined from Tauc plots as well as from PL measurements, displaying a linear decrease with increasing GaAs nominal thickness.

• 한국재료학회지
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• 제10권8호
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• pp.575-580
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• 2000

Ta(TaC) 필라멘트를 이용한 HF-CVD 법에 의하여 $Si_3N_4$, SiC, WC, $Al_2O_3$를 기판으로 다이아몬드 박막을 증착하고, 그 밀착특성을 평가하였다. 로내의 $CH_4$농도를 10%로 높게 하였을 경우에는 막중에 graphitic(amorphous) carbon이 생성됨을 확인할 수 있었다. 박막을 $12\mu\textrm{m}$ 정도까지 두껍게 하면, WC기판에서는 부분적 박리형상이 관찰되었으나, $Si_3N_4$를 기판으로 하였을 경우에는 안정한 박막을 얻을 수 있었다. Indentation test 결과로부터 grainding에 의한 기판표 처리가 밀착성 향상에 효과적이라는 것을 알 수 있었다. 또 compression topple test에서는 박막의 두께는 밀착성과 반비례의 관계를 가지는 것을 알 수 있었다. 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.323-323
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• 2013

High power light-emitting diodes (LEDs) are widely used in many device applications due to its ability to operate at high power and produce high luminance. However, releasing the heat accumulated in the device during operating time is a serious problem that needs to be resolved to ensure high optical efficiency. Ceramic or Aluminium base metal printed circuit boards are generally used as integral parts of communication and power devices due to its outstanding thermal dissipation capabilities as heat sink or heat spreader. We investigated the characterisation of electroless plating of Ni-B film according to plating bath temperature, ranging from $50^{\circ}C$ to $75^{\circ}C$ on Ag paste/anodised Al ($Al_2O_3$)/Al substrate to be used in metal PCB for high power LED packing systems. X-ray diffraction (XRD), Field-Emission Scanning Electron Microscopy (FE-SEM) and X-ray Photoelectron Spectroscopy (XPS) were used in the film analysis. By XRD result, the structure of the as deposited Ni-B film was amorphous irrespective of bath temperature. The activation energy of electroless Ni-B plating was 59.78 kJ/mol at the temperature region of $50{\sim}75^{\circ}C$. In addition, the Ni-B film grew selectively on the patterned Ag paste surface.

• Composites Research
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• 제33권3호
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• pp.101-107
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• 2020

본 논문에서는 탄화규소로 코팅된 탄소-탄소복합재료의 단열 특성을 고찰하였다. 탄소-탄소 복합재료 상에 탄화규소를 화학증착법(CVD)법으로 코팅하였다. 먼저 탄화규소로 코팅한 복합재와 코팅되지 않은 복합재에 대해, 공기 중에서 1350℃의 온도를 급작스럽게 부가하였을 때의 단열특성을 서로 비교하는 연구를 수행하였다. 또한 본 연구에서는 최대 1700℃ 및 2000℃의 온도에 복합재의 표면을 노출시키는 고온 버너실험을 수행하였다. 버너실험 전, 후의 무게를 측정하여 무게변화를 고찰하였다. 고온 버너실험 후 탄소-탄소 복합재 및 탄화규소로 코팅된 복합재의 손상여부를 비교, 고찰하였다. 그 결과 2000℃의 온도에 노출 시 탄화규소 코팅재에서 박리, 균열, 공동 등의 결함손상들이 발견되었으나, 고온으로부터 탄소-탄소 복합재를 보호하는데 효과적이었다.

• 한국세라믹학회지
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• 제50권6호
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• pp.364-371
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• 2013

The sintering behavior of monolithic SiC is examined using the binary sintering additive of $Al_2O_3$-rare earth oxide ($RE_2O_3$, where RE = Sc, Nd, Dy, Ho, or Yb). Through hot pressing at 20 MPa and $1750^{\circ}C$ for 1 h in an Ar atmosphere for 52 nm fine ${\beta}$-SiC powder added with 5 wt% sintering additive, a SiC density of > 97% is achieved, which indicates the effectiveness of $Al_2O_3-RE_2O_3$ system as a sintering of additive for SiC. Based on this result, 7 wt% of $Al_2O_3-Sc_2O_3$ is tested as an additive system for the fabrication of a continuous SiC fiber-reinforced SiC-matrix composite ($SiC_f$/SiC). Electrophoretic deposition combined with the application of ultrasonic pulses is used to efficiently infiltrate the matrix phase into the voids of $Tyranno^{TM}$-SA3 fabric. After hot pressing, a composite density of > 97% is obtained, along with a maximum flexural strength of 443 MPa.

• 한국세라믹학회지
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• 제40권3호
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• pp.268-272
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• 2003

직류 마그네트론 스퍼터링법을 이용하여 증착압력과 기판온도변화에 따른 텅스텐 박막의 미세구조 변화에 대하여 연구하였다. 기판온도 40$0^{\circ}C$에서 증착 압력의 감소에 따라 텅스텐 박막의 미세구조가 zone I에서 zone T로 변화하였다. 텅스텐 박막의 미세구조 비저항과 결정배향성은 상관관계를 보였으며. 미세구조가 zone T 영역에서 낮은 비저항(10$\times$$10^{-6}$ $\Omega$-cm) 과 99%의 (110)면 우선 배향성을 나타내었다. zone T 영역에 해당하는 미세구조를 지니는 텅스텐 박막을 이용한 박막형 공진기는 텅스텐 박막의 높은 탄성저항과 매끈한 표면으로 인해 494의 $Q_{s}$와 5.50%의 $K_{eff}$$^{2}$ 값의 우수한 공진특성을 보였다....

• 한국세라믹학회지
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• 제37권11호
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• pp.1091-1096
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• 2000

본 연구에서는 기상 반응법을 이용하여 TMS(Tetramethylsilane:Si($CH_3$)$_4$)와 NH$_3$그리고 H$_2$의 혼합기체로부터 반응 온도 1000~120$0^{\circ}C$ 및 입력비(NH$_3$/Si($CH_3$)$_4$) 1~3의 조건에서 초미분의 SiC-Si$_3$N$_4$복합 분말을 합성하였다. 합성되어진 복합 분말들의 결정상의 변화와 평균 입경을 알아보기 위해 XRD와 TEM 분석을 행한 결과, 구형의 비정질 분말이 형성되었으며, 입자의 크기는 약 70~130nm이었다. 입자의 크기는 입력비에 관계없이 거의 일정하였으나 반응 온도가 증가함에 따라서 감소하였다. FT-IR과 EA 분석 결과, 합성되어진 분말은 Si, N, C, 그리고 H로 이루어진 화합물임을 확인할 수 있었다. 또한 입력비가 다른 조건에서 합성되어진 분말을 $N_2$분위기 하에서 155$0^{\circ}C$로 2시간 열처리를 행한 결과, 낮은 입력비인 경우 $\beta$-SiC, $\alpha$-Si$_3$N$_4$와 $\beta$-Si$_3$N$_4$의 결정상들이 혼재하였으나, 높은 입력비인 경우는 결정화 후 $\alpha$-Si$_3$N$_4$상만이 존재하였다.

• 한국세라믹학회지
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• 제43권11호
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• pp.688-692
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• 2006

Ferroelectric lanthanides-substituted $Bi_4Ti_3O_{12}$ $(Bi_{4-x}Ln_xTi_3O_{12}, BLnT)$ thin films approximately 200 nm in thickness were deposited by metal organic chemical vapor deposition onto Pt(111)/Ti/SiO$_2$/Si(100) substrates. Many researchers reported that the lanthanides substitution for Bi in the pseudo-perovskite layer caused the distortion of TiO$_6$ octahedron in the a-b plane accompanied with a shift of the octahedron along the a-axis. In this study, the effect of lanthanides (Ln=Pr, Eu, Gd, Dy)-substitution and crystallization temperature on their ferroelectric properties of bismuth titanate $(Bi_4Ti_3O_{12}, BIT)$ thin films were investigated. As BLnT thin films were substituted to lanthanide elements (Pr, Eu, Gd, Dy) with a smaller ionic radius, the remnant polarization (2P$_r$) values had a tendency to increase and made an exception of the Eu-substituted case because $Bi_{4-x}Eu_xTi_3O_{12}$ (BET) thin films had the smaller grain sizes than the others. In this study, we confirmed that better ferroelectric properties can be expected for films composed of larger grains in bismuth layered peroskite materials. The crystallinity of the thin films was improved and the average grain size increased as the crystallization temperature,increased from 600 to 720$^{\circ}C$. Moreover, the BLnT thin film capacitor is characterized by well-saturated polarization-electric field (P-E) curves with an increase in annealing temperature. The BLnT thin films exhibited no significant degradation of switching charge for at least up to $1.0\times10^{11}$ switching cycles at a frequency of 1 MHz. From these results, we can suggest that the BLnT thin films are the suitable dielectric materials for ferroelectric random access memory applications.

• 한국세라믹학회지
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• 제49권6호
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• pp.631-636
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• 2012

Conventional SONOS (poly-silicon/oxide/nitride/oxide/silicon) type memory is associated with a retention issue due to the continuous demand for scaled-down devices. In this study, $Al_2O_3/Y_2O_3/SiO_2$ (AYO) multilayer structures using a high-k $Y_2O_3$ film as a charge-trapping layer were fabricated for nonvolatile memory applications. This work focused on improving the retention properties using a $Y_2O_3$ layer with different tunnel oxide thickness ranging from 3 nm to 5 nm created by metal organic chemical vapor deposition (MOCVD). The electrical properties and reliabilities of each specimen were evaluated. The results showed that the $Y_2O_3$ with 4 nm $SiO_2$ tunnel oxide layer had the largest memory window of 1.29 V. In addition, all specimens exhibited stable endurance characteristics (program/erasecycles up to $10^4$) due to the superior charge-trapping characteristics of $Y_2O_3$. We expect that these high-k $Y_2O_3$ films can be candidates to replace $Si_3N_4$ films as the charge-trapping layer in SONOS-type flash memory devices.

• 한국세라믹학회지
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• 제45권4호
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• pp.245-249
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• 2008

The SiC and ZrC are critical and essential materials in TRISO coated fuel particles since they act as protective layers against diffusion of metallic and gaseous fission products and provides mechanical strength for the fuel particle. However, SiC and ZrC have critical disadvantage that SiC loses chemical integrity by thermal dissociation at high temperature and mechanical properties of ZrC are weaker than SiC. In order to complement these problems, we made new combinations of the coating layers that the ZrC layers composed of SiC. In this study, after Silicon carbide(SiC) were chemically vapor deposited on graphite substrate, Zirconium carbide(ZrC) were deposited on SiC/graphite substrate by using Zr reaction technology with Zr sponge materials. The different morphologies of sub-deposited SiC layers were correlated with microstructure, chemical composition and mechanical properties of deposited ZrC films. Relationships between deposition pressure and microstructure of deposited ZrC films were discussed. The deposited ZrC films on SiC of faceted structure with smaller grain size has better mechanical properties than deposited ZrC on another structure due to surface growth trend and microstructure of sub-deposited layer.