• 한국세라믹학회지
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• 제31권12호
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• pp.1577-1587
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• 1994

TiO2 thin films with the substitution of oxygen with nitrogen were deposited on silicon substrate by metalorganic chemical vapor deposition (MOCVD) using Ti(OCH(CH3)2)4 (titanium tetraisopropoxide, TTIP) and N2O as source materials. X-ray diffraction (XRD) results indicated that the crystal structure of the deposited thin films was anatase TiO2 with only (101) plane observed at the deposition temperatures of 36$0^{\circ}C$ and 38$0^{\circ}C$, and with (101) and (200) plane at above 40$0^{\circ}C$. Raman spectroscopic results indicated that the crystal structure was anatase TiO2 in accordance with the XRD results without any rutile, fcc TiN, or hcp TiN structure. No fundamental difference was observed with temperature increase, but the peak intensity at 194.5 cm-1 increased with strong intensity at 143.0 cm-1 for all samples. The crystalline size of the films varied from 49.2 nm to 63.9 nm with increasing temperature as determined by slow-scan XRD experiments. The refractive index of the films increased from 2.40 to 2.55 as temperature increased. X-ray photoelectron spectroscopy (XPS) study showed only Ti 2s, Ti 2p, C 1s, O 1s and O 2s peaks at the surface of the film. The composition of the surface was estimated to be TiO1.98 from the quatitative analysis. In the bulk of the film Ti 2s, Ti 2p, O 1s, O 2s, N 1s and N 2s were detected, and Ti-N bonding was observed due to the substitution of oxygen with nitrogen. A satellite structure was observed in the Ti 2p due to the Ti-N bonding, and the composition of titanium nitride was determined to be about TiN1.0 from the position of the binding energy of Ti-N 2p3/2 and the quatitative analysis. The spectrum of Ti 2p energy level could be the sum of a 4, 5, or 6 Gaussian curve reconstruction, and the case of the sum of the 6 Gaussian curve reconstruction was physically most meaningful. From the results of Auger electron spectroscopy (AES), it was known that the composition was not varied significantly throughout the whole thickness of the film, and silicon oxide was not observed at the interface between the film and the substrate. The composition of the film was possible (TiO2)1-x.(TiN)x or TiO2-2xNx and in this experimental condition x was found to be about 0.21-0.16.

• 대한기계학회논문집B
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• 제36권9호
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• pp.931-935
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• 2012

본 연구에서는 저온형 연료전지와 고온형 연료전지의 작동 및 구성 요소 측면 단점들을 보완하기 위해 중온 영역에서 작동하는 박막 연료전지를 제작하였다. 박막 연료전지는 이트륨이 도핑된 바륨 지르코네이트(BYZ) 전해질과 백금 수소극/공기극으로 이루어져 있으며, 성능은 $350^{\circ}C$에서 측정하였다. 350nm의 두께를 가지는 백금 수소극은 다공성 기판 위에 스퍼터링 기법을 이용하여 증착하였다. BYZ전해질은 펄스레이저 기법을 이용하여 $1{\mu}m$ 증착하였고, 상부에 스퍼터링 기법을 이용하여 200nm의 두께를 가지는 백금 공기극을 증착하였다. 개회로 전압은 약 0.81V이었고, 최대 출력 성능은 11.9mW/$cm^2$이었다.

• 한국세라믹학회지
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• 제45권12호
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• pp.839-844
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• 2008

$TiO_2$ is an environment-friendly semiconducting material, and it has photocatalytic and hydrophilic effect. There are a lot of reports on the photocatalytic characteristics of $TiO_2$, such as organic pollutants resolving, anti-bacterial, and self-purification material. In this paper, $TiO_2$ micron-sized powders were deposited on the glass by room temperature powder spray in vacuum process, so called aerosol deposition (AD), and nano-grained $TiO_2$ photocatalytic thin films were fabricated. The thickness of the films were controlled by changing the number of deposition cycle. Morphologies and characteristics of the AD-$TiO_2$ thin films were examined by SEM, TEM, XRD, and UV-Visible Spectrophotometer. As the thickness of $TiO_2$ films increased, surface roughness increased. By this increment, the reaction area between film and pollutant was enlarged, resulting in better photocatalytic property.

• 한국재료학회지
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• 제9권5호
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• pp.478-483
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• 1999

The effects of the composition on the consolidation temperature and refractive index of the glass thin film fabricated by aerosol flame deposition method in SiO$_2$-B$_2$O$_3$-CaO-P$_2$O\ulcorner system were investigated. When the amount of CaO was constant in SiO$_2$-B$_2$O$_3$-CaO system the consolidation temperature of glass thin film decreased with increasing the amount of B$_2$O$_3$. Also, when the amount of SiO$_2$ and B$_2$O$_3$ was constant the consolidation temperature of glass thin film increased with increasing the amount of CaO. P$_2$O\ulcorner was added to 72.5SiO$_2$-25B$_2$O$_3$-2.5CaO in order to decrease its consolidation temperature. As the amount of P$_2$O\ulcorner increased its consolidation temperature decreased and the refractive index linearly increased from 1.4649 to 1.4684. When the amount of CaO and P$_2$O\ulcorner was constant in SiO$_2$-B$_2$O$_3$-CaO-P$_2$O\ulcorner system the consolidation temperature of glass thin film decreased with increasing the ratio of SiO$_2$/B$_2$O$_3$.

• 한국세라믹학회지
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• 제38권11호
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• pp.973-979
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• 2001

Sn을 도핑한 In$_2$O$_3$(ITO) 박막을 R.F. 마그네트론 반응성 스퍼터링법에 의해서 증착하였다. 동일한 마그네트론 스퍼터링 조건에서 증착위치에 따른 ITO 박막의 저항, 자유 전하 농도 및 이동도 전기적 특성을 조사하였다. 동일한 마그네트론 스퍼터링 조건임에도 불구하고, ITO 박막의 전기적 특성은 증착위치에 따라 불균질성을 나타내었다. 타겟의 중심에 위치한 기판위에 증착된 ITO 박막의 저항은 최소 값인 2~4$\times$$10^{-4}$ $\Omega$.cm인 반면, 중심에서 멀어질수록 박막의 전기 저항은 대칭적으로 증가하였다. ITO 박막의 밀도 측정 결과도 중심에서 이론 밀도 값의 97%에 해당하는 7.0g/$cm^3$를 나타내나, 위치가 중심에서 멀어질수록 박막의 밀도가 대칭적으로 감소하였다. ITO 박막에서 이동도와 전도도는 밀도에 직접적으로 영향을 받는 것이 실험적으로 확인되었다. ITO 박막의 밀도가 7.0g/$cm^3$(이론 밀도의 97%)인 경우, 자유행정거리와 입자크기(=주상의 직경)가 동일한 값을 가지나, 밀도가 이 보다 감소하면 자유행정거리와 입자크기의 차이는 더욱 증가하였다. 이 결과는 ITO 박막의 밀도가 7.0g/$cm^3$인 경우는 입계가 자유 전자의 전도에 중요한 산란 원으로 작용하는 반면, 그 외의 경우는 결정 내의 공격자점, 공공, 기공 등이 다른 산란 원으로 작용하고 있다는 것을 나타낸다.

• 한국세라믹학회지
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• 제51권5호
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• pp.453-458
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• 2014

SiC and its composites have been considered for use as nuclear fuel cladding materials of pressurized light water reactors. In this study, a $SiC_f$/SiC composite as a constituent layer of SiC triplex fuel cladding was fabricated using a chemical vapor infiltration (CVI) process in which tubular SiC fiber preforms were prepared using a filament winding method. To enhance the matrix density of the composite layer, winding patterns, deposition temperature, and gas input ratio were controlled. Fiber arrangement and porosity were the main parameters influencing densification behaviors. Final density of the composites decreased as the SiC fiber volume fraction increased. The CVI process was optimized to densify the tubular preforms with high fiber volume fraction at a high $H_2$/MTS ratio of 20 at $1000^{\circ}C$; in this process, surface canning of the composites was effectively retarded.

• 한국세라믹학회지
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• 제52권4호
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• pp.264-268
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• 2015

Cu films were plated in an eco-friendly electroless bath (No-Formaldehyde) on Ni/screen printed Ag pattern/PET substrate. For electroless Cu plating, we used sodium-phosphinate ($NaH_2PO_2{\cdot}H_2O$) as reducing agent instead of Formaldehyde. All processes were carried out in electroless solution of pH 7 to minimize damage to the PET substrate. According to the increase of sodium-phosphinate, the deposition rate, the granule size, and rms roughness of the electroless Cu film increased and the Ni content also increased. The electroless Cu films plated using 0.280 M and 0.575 M solutions of sodium-phosphinate were made with Cu of 94 at.% and 82 at.%, respectively, with Ni and a small amount P. All electroless Cu plated films had typical FCC crystal structures, although the amount of co-deposited Ni changed according to the variation of the sodium-phosphinate contents. From these results, we concluded that a formation of higher purity Cu film without surface damage to the PET is possible by use of sodium-phosphinate at pH 7.

• 한국세라믹학회지
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• 제52권4호
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• pp.290-293
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• 2015

The properties of the IZTO thin films on the glass were studied with a variation of the $SiO_2$ buffer layer thickness. $SiO_2$ buffer layers were deposited by plasma-enhanced chemical vapor deposition (PECVD) on the glass, and the In-Zn-Tin-Oxide (IZTO) thin films were deposited on the buffer layer by RF magnetron sputtering. All the IZTO thin films with the $SiO_2$ buffer layer are shown to be amorphous. Optimum $SiO_2$ buffer layer thickness was obtained through analyzing the structural, morphological, electrical, and optical properties of the IZTO thin films. As a result, the IZTO surface roughness is 0.273 nm with a sheet resistance of $25.32{\Omega}/sq$ and the average transmittance is 82.51% in the visible region, at a $SiO_2$ buffer layer thickness of 40 nm. The result indicates that the uniformity of surface and the properties of the IZTO thin film on the glass were improved by employing the $SiO_2$ buffer layer and the IZTO thin film can be applied well to the transparent conductive oxide for display devices.

• 한국세라믹학회지
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• 제55권3호
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• pp.203-223
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• 2018

The development of two-dimensional graphene layers has recently attracted considerable attention because of its tremendous application in various research fields. Semi-metal materials have received significant attention because of their excellent biocompatibility as well as distinct physical, chemical, and mechanical properties. Taking into account the technical importance of graphene in various fields, such as complementary metal-oxide-semiconductor technology, energy-harvesting and -storage devices, biotechnology, electronics, light-emitting diodes, and wearable and flexible applications, it is considered to be a multifunctional component. In this regard, material scientists and researchers have primarily focused on two typical problems: i) direct growth and ii) low-temperature growth of graphene. In this review, we have considered only cold growth of graphene. The review is divided into five sections. Sections 1 and 2 explain the typical characteristics of graphene with a short history and the growth methods adopted, respectively. Graphene's direct growth at low temperatures on a required substrate with a well-established application is then precisely discussed in Sections 3 and 4. Finally, a summary of the review along with future challenges is described in Section 5.

• 한국세라믹학회지
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• 제42권6호
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• pp.399-404
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• 2005

Anti-reflection film was coated by using spherical silica nano colloidal particles and fumed silica particles. Silica colloid sol was reserved between two inclined slide glasses by capillary force, and particles were stacked to form a film onto the substrate as the upper glass was sliding. The deposition processes were studied to enhance the wavelength dependency of the light transmittance and to control the effective refractive index of the film. Both of the spherical and fumed silica particles showed an enhancement of $4.0-4.4\%$ in light transmittance by one step coating. The dependence of the transmittance on wavelength was largely improved at the longer wavelength by partial coating of fumed particles on the film of spherical particles. The effective refractive index of the film was controlled by removing latex particles that were co-deposited with silica particles. Using this process the light reflectance from one side of the glass substrate could be reduced from $4.2\%$ to $0.6\%$ although zero reflectance was not achieved due to the agglomeration of the latex particles.