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http://dx.doi.org/10.4191/KCERS.2008.45.1.839

Effect of Film Thickness on the Photocatalytic Performance of TiO2 Film Fabricated by Room Temperature Powder Spray in Vacuum Process  

Kim, Kun-Young (Functional Ceramics Research Group, Korea Institute of Materials Science (KIMS))
Ryu, Jung-Ho (Functional Ceramics Research Group, Korea Institute of Materials Science (KIMS))
Hahn, Byung-Dong (Functional Ceramics Research Group, Korea Institute of Materials Science (KIMS))
Choi, Jong-Jin (Functional Ceramics Research Group, Korea Institute of Materials Science (KIMS))
Yoon, Woon-Ha (Functional Ceramics Research Group, Korea Institute of Materials Science (KIMS))
Lee, Byoung-Kuk (Functional Ceramics Research Group, Korea Institute of Materials Science (KIMS))
Park, Dong-Soo (Functional Ceramics Research Group, Korea Institute of Materials Science (KIMS))
Park, Chan (Division of Materials Science and Engineering, Pukyong National University)
Publication Information
Journal of the Korean Ceramic Society / v.45, no.12, 2008 , pp. 839-844 More about this Journal
Abstract
$TiO_2$ is an environment-friendly semiconducting material, and it has photocatalytic and hydrophilic effect. There are a lot of reports on the photocatalytic characteristics of $TiO_2$, such as organic pollutants resolving, anti-bacterial, and self-purification material. In this paper, $TiO_2$ micron-sized powders were deposited on the glass by room temperature powder spray in vacuum process, so called aerosol deposition (AD), and nano-grained $TiO_2$ photocatalytic thin films were fabricated. The thickness of the films were controlled by changing the number of deposition cycle. Morphologies and characteristics of the AD-$TiO_2$ thin films were examined by SEM, TEM, XRD, and UV-Visible Spectrophotometer. As the thickness of $TiO_2$ films increased, surface roughness increased. By this increment, the reaction area between film and pollutant was enlarged, resulting in better photocatalytic property.
Keywords
Photocatalyst; $TiO_2$; Film; Aerosol deposition; RTPSV process;
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