• Journal of the Korean Vacuum Society
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• v.4 no.1
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• pp.12-17
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• 1995

Diamondlike carbon(DLC)films having good characteristics in mechanical and optical properties, were synthesized by rf-plasma enhanced chemical vapor deposition method. Methane, methane-hydrogen, or methane-argon were used as source gases. The infrared transparency and composition of the films were investigate. Especially, the anti-reflection effect of KLC film in infrared region was confirmed by depositing it on Ge/Si sample. When DLC films were deposited on the plastic substrates and thermal distortion, which were originated before and during deposition, respectively, played a role as a crack source of the films.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.61 no.10
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• pp.1561-1564
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• 2012

In this work, we have fabricated the nanocrystalline carbon films by using unbalanced magnetron sputtering method with graphite and Ti targets for contact strip application of electrical railway. The power density of graphite target was fixed and the power density was increased for the increase of Ti concentration in TiC films. We investigated the hardness, surface roughness, contact angle, resistivity, HRTEM and XPS of TiC films with Ti concentration. The hardness and resistivity were improved with increasing Ti concentration. These results indicate that the improvement of hardness and resistivity is related to the increase of sp2 clusters in TiC films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.23 no.4
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• pp.338-342
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• 2010

Carbon nanotubes (CNTs) have excellent electrical, chemical stability, mechanical and thermal properties. The MWCNT films were investigated as a transparent electrode for the solar cell, OLED, and field-emission display. MWCNT films were fabricated by air spray method, whose process is quite low-costed, using the multi-walled CNTs solution on glass substrates. Moreover, the most stable film was fabricated when the spraying time was 60 sec. The film that was sprayed with the MWCNT dispersion for 60 sec, has 300nm thick. And its electric resistivity, transmittance rate, mobility and carrier concentration are $6{\times}10^{-2}{\Omega}{\cdot}cm$, 50% at ${\lambda}=550mm$, $4.3{\times}10^{-2}cm^2/V{\cdot}s$ and $2.1{\times}10^{21}cm^{-3}$, respectively. Also, absorption energy of MWCNT films show from 3.9 eV to 4.6 eV. Furthermore, we can use MWCNT films fabricated by the spray method for the transparent electrode.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.346-346
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• 2010

Using a novel deposition technique, which can be described as pulsed chemical vapor deposition (CVD), $TiO_2$ thin films were synthesized on carbon fibers. We show that these films exhibit extraordinary high absorption capacities of toluene vapor. Such an absorption phenomenon of toluene at room temperature was not found for other $TiO_2$ samples. We expect that $TiO_2$ thin films prepared here can be used for removing volatile organic compounds from indoor atmosphere. Structures of there $TiO_2$ films were studied by SEM and XPS, and the results are discussed.

• Proceedings of the KIEE Conference
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• 1997.07d
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• pp.1379-1382
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• 1997

Diamond-like carbon(DLC) thin films are produced by using a filtered cathodic vacuum arc(FCVA) deposition system. Different magnetic components, namely steering, focusing, and filtering plasma-optic systems, are used to achieve a stable arc plasma and to prevent the macroparticles from incorporating into the deposited films. Effects of magnetic fields on plasma behavior and film deposition are examined. The carbon ion energy is found to be varied by applying a negative (accelerating) substrate bias voltage. The deposition rate of DLC films is dependent upon magnetic field as well as substrate bias voltage and at a nominal deposition condition is about $2{\AA}/s$. The structural properties of DLC films, such as internal stress, relative fraction of tetrahedral($sp^3$) bonds, and surface roughness have also been characterized as a function of substrate bias voltages and partial gas($N_2$) pressures.

• Korean Journal of Materials Research
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• v.13 no.3
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• pp.150-154
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• 2003

Amorphous carbon nitride films were deposited on Si(001) substrates by a plasma enhanced chemical vapor deposition technique (PECVD) using $CH_4$and $N_2$as reaction gases. The growth and film properties were investigated while the gas ratio and the working pressure were changed systematically. At 1 Torr working pressure, an increase in the $N_2$partial pressure results in a significant increase of the deposition rate as well as an apparent presence of C ≡N bonding, while little affecting the microstructure and amorphus nature of the films. In the case of changing the working pressure at a fixed $N_2$partial pressure of 98%, a film grown at a medium pressure of $1${\times}$10^{-2}$ Torr shows the most prominent C=N bonding nature and photoluminescent property.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.303.1-303.1
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• 2016

Polymer-like amorphous carbon films were deposited on polyethylene naphthalate (PEN) substrate by plasma-enhanced chemical vapor deposition (PECVD) and their water vapor transmission rates (WVTR) were tested. propane was used as precursors. To make a polymer-like amorphous carbon film the deposition rate, surface roughness, light transmittance, and WVTR of the films were characterized as a function of the precursor feed ratio and plasma power. The water vapor transmission rates of bare PEN film and single layer PAC on PEN substrate were 6.95 g/m2/day and 0.3 g/m2/day, respectively. The superior property the water vapor permeability of thin layers of PAC was attributed to uniform coverage and good adhesion between PAC film and PEN substrate.

• Journal of Sensor Science and Technology
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• v.9 no.3
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• pp.248-255
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• 2000

Penning type sputtering system which has two opposed targets was implemented and the physical characteristics of the deposited carbon nitride films were investigated. When argon ratio was reduced and nitrogen ratio was increased in the sputtering gas mixture, Fe was less sputtered. The grain size of grown carbon nitride films was distributed from $150{\AA}$ to $250{\AA}$. As nitrogen partial pressure increases, growth rate and nitrogen incorporation in the film increases.

• Macromolecular Research
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• v.15 no.4
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• pp.357-362
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• 2007

Polyimide/carbon nanotube (CNT) composite films, for potential use in high performance microelectronics and aerospace applications, were prepared by mixing a polyisoimide (PII) solution and a CNT suspension in NMP, followed by casting, evaporation and thermal imidization. The CNTs were modified by a nitric acid treatment to improve the thermal and electrical properties, as well as to provide good dispersion of the CNTs in a polymer matrix. The formation of functional groups on the modified CNT was confirmed by Raman spectroscopy. Scanning electron microscopy revealed the modified CNTs to be well dispersed in the polyimide matrix, with a uniform diameter of ca. 50 nm. The thermal stability of the films containing the CNTs was improved due to the enhanced interfacial interaction and good dispersion between the polyimide matrix and modified CNTs. In addition, the thermal expansion coefficient of the composites films was slightly decreased, but the dielectric constants increased linearly with increasing CNT content.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.147-150
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• 2002

The electron field emission properties of amorphous carbon (a-C) films deposited using a RF magnetron sputtering system have been improved by introducing a simple method of argon plasma treatment at room temperature. Surface morphologies and structural properties of the a-C films were investigated by scanning electron microscopy and Raman spectroscope, respectively. Structural properties and surface morphologies of the a-C films were changed by argon plasma treatment. The emission properties improved with the plasma treatment.