• Journal of the Korean institute of surface engineering
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• v.29 no.5
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• pp.540-544
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• 1996

To apply the CVD diamond film to coated tools, it is necessary to make adhesion strength between diamond film and substrate stronger. So adhesion strength of diamond coated WC-Co tools using Microwave Plasma CVD and cutting test of Al-18mass%Si alloy using diamond cutting tools were studied. Diamond coating was carried out using Microwave Plasma CVD apparatus. Reaction gas was used mixture of methane and hydrogen. Substrate temperature were varied from 673K to 1173K by control of microwave output power and reaction pressure. By observation of SEM, grain size became larger and larger as substrate temperature became higher and higher. Also all deposits were covered with clear diamond crystals. XRD results, the deposits were identified to cubic diamond. An analysis using Raman spectroscopy, the deposit synthesized at lower substrate temperature (673K) showed higher quality than deposit synthesized at higher substrate temperature (1173K). As a result of scratch adhesion strength test, from 873K to 1173K adhesion strength decreased by rising of substrate temperature. The deposit synthesized at 873K showed best adhesion strength. In the cutting test of Al-18mass%Si alloy using diamond coated tools and the surface machinability of Al-Si works turned with diamond coating tools which synthesized at 873K presented uniform roughness. Cutting performance of Al-18mass%Si alloys using diamond coated WC-Co tools related to the adhesion strength.

• The Korean Journal of Ceramics
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• v.2 no.4
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• pp.203-211
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• 1996

CVD diamond tools are becoming more widely used in industry as an economic alternative to polycrystalline diamond (PCD) for machining non-ferrous and non-metallic materials. Although CVD diamond-sheet tools have been on the market for several years, diamond-coated carbide inserts have become available only recently, with the successful resolution of long-standing adhesion problems. Diamond coating morphology on the rake surface of the tool affects chip formation favorably, whereas a microscopically rough, faceted morphology on the flank surface of the tool produces a rough workpiece finish. Workpiece finish can be improved by using a coated tool with a larger nose radius. The tool life provided by diamond-coated tools(~30 $\mu\textrm{m}$ thick) can meet or exceed that of PCD tools, depending on the characteristics of the workpiece material. When using diamond-coated carbide tools in milling, a sharp-edged PCD tool should be used in the wiper position of the cutter to minimize workpiece roughness and burr formation.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2003.11a
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• pp.368-376
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• 2003

In this research, DLC thin films are produced as several hundred nm thickness by PE-CVD method. And then these thin films are estimated tribological characteristics to find out useful possibilities as a protecting film for high-quality function and life extension at MEMs by mechanical properties observation . These are measured thickness and residual stress of DLC coating. Compared after measuring friction coefficient, adhesion force, hardness, cohesive force of coating films. As results all test, we can decide several conclusions. First, friction coefficient decreased, as the load increased. otherwise, friction coefficient increased, as thickness of coating film increased under low load$(1\~50mN)$. Secod, adhesion force increased as thickness of coating films. Third, hardness of coating film is affected by substrate coating film when it is less than thickness of 300nm and it has general hardness of DLC coating film when it is more than thickness of 500nm. Fourth, cohesive force of coating film is complexly affected by hardness, adhesion force, residual stress, etc.

• Proceedings of the Korean Institute of Resources Recycling Conference
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• 2003.10a
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• pp.185-189
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• 2003

The effect of surface roughness of the substrate on HF-CVD diamond coating was researched. The surface roughness was changed variously by electro-chemical etching conditions. The etching process acted to remove the metallic cobalt from the WC-Co. Diamond nucleation density was higher in etched the substrate. Therefore, the etching process was effective in both Co-removal and higher surface roughness, leading to the improving the diamond nucleation and deposition.

• Journal of Sensor Science and Technology
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• v.28 no.2
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• pp.101-105
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• 2019

ZnS substrates with excellent transmittance in the mid-infrared region ($3-5{\mu}m$) were prepared using hot pressing instead of conventional chemical vapor deposition (CVD). Diamond-like carbon(DLC) was coated on either one or both sides of the ZnS substrates to improve their mechanical properties and transmittance. More specifically DLC was coated using CVD with an Ar and $C_2H_2$ mixed gas, and Ge was used as the bonding layer. During CVD, the bias voltage was fixed to 500 V and analyzed by Fourier transform infrared spectroscopy (FT-IR), nanoindenter, scanning electron microscope and energy dispersive spectrometry. Results of hardness analysis using the nanoindenter, showed that DLC coating increased from 5.9 to 17.7 GPa after deposition. The FT-IR spectroscopy results showed that, in the mid-infrared region ($3-5{\mu}m$), the average transmittance of the samples with DLC coating on one and both sides increased by approximately 6% and approximately 11.2% respectively. In conclusion, the DLC coating improved the durability and transmittance of the ZnS substrates.

• Journal of the Korean Society for Nondestructive Testing
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• v.27 no.3
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• pp.224-230
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• 2007

This work is aimed to explore a possibility of using the generalized Lamb waves for nondestructive evaluation of the bonding quality of layered substrates. For this purpose, we prepared two sets of specimens with imperfect bonding at their interfaces; 1) TiN-coated specimens with various wear conditions, and 2) CVD diamond specimens with various cleaning conditions. A dispersion simulation performed for layered substrates with imperfect interfaces are carried out to get the characteristics of dispersion curves that can be used for bonding quality evaluation. Then the characteristics of dispersion curves of the fabricated specimens are experimentally determined by use of an ultrasonic backward radiation measurement technique. The results obtained in the present study show that the lowest velocity mode (Rayleigh-like) of the generalized Lamb waves are sensitively affected by the bonding quality. Therefore, the generalized Lamb waves can be applied for nondestructive evaluation of imperfect bonding quality in various layered substrates.

• Journal of Sensor Science and Technology
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• v.31 no.4
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• pp.255-259
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• 2022

In this study, we fabricated ZnS substrates with excellent transmittance in the mid-infrared region (3-5 ㎛) using hot pressing instead of conventional chemical vapor deposition (CVD). Diamond-like carbon (DLC) was coated on either one or both sides of the ZnS substrates to improve their mechanical properties and transmittance efficiency. To reduce the reflectance and further improve transmittance in the mid-infrared region, anti-reflection (AR) coating was designed for DLC/ZnS /AR and AR/ ZnS /AR structures. The coating structure, microstructure, and optical properties of the AR-coated ZnS substrates were subsequently investigated by employing energy dispersive X-ray spectroscopy, scanning electron microscopy, and Fourier-transform infrared (FTIR) spectroscopy. The FTIR spectroscopy results demonstrated that, in the mid-infrared region, the average transmittance of the samples with AR coating on one and both sides increased by approximately 18% and 27%, respectively. Thus, AR coating improved the transmittance of the ZnS substrates.

• Journal of the Korean Chemical Society
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• v.34 no.5
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• pp.396-403
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• 1990

We describe how to design and construct a LPCVD (Low Pressure Chemical Vapor Deposition) apparatus which can be applicable to the study of reaction mechanism in general CVD experiments. With this apparatus we have attempted to make diamond like carbon films on the p-type (111) Si wafer from (H$_2$ ＋ CH$_4$) gas mixtures. Two different methods have been tried to get products. (1)The experiment was carried out in the reactor with two different inlet gas tubes. One coated with phosphoric acid was used for supplying microwave discharged hydrogen gas stream, and methane has been passed through the other tube without the microwave discharge. In this method we got only amorphous carbon cluster products. (2) The gas mixture (H$_2$ ＋ CH$_4$) has been passed through the discharge tube with the Si wafer located in and/or near the microwave plasma. In this case diamond-like carbon products could be obtained.

• Journal of the Korean institute of surface engineering
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• v.46 no.2
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• pp.68-74
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• 2013

For the coating of diamond films on WC-Co tools, a buffer interlayer is needed because Co catalyzes diamond into graphite. W and Ti were chosen as candidate interlayer materials to prevent the diffusion of Co during diamond deposition. W or Ti interlayer of $1{\mu}m$ thickness was deposited on WC-Co substrate under Ar in a DC magnetron sputter. After seeding treatment of the interlayer-deposited specimens in an ultrasonic bath containing nanometer diamond powders, $2{\mu}m$ thick nanocrystalline diamond (NCD) films were deposited at $600^{\circ}C$ over the metal layers in a 2.45 GHz microwave plasma CVD system. The cross-sectional morphology of films was observed by FESEM. X-ray diffraction and visual Raman spectroscopy were used to confirm the NCD crystal structure. Micro hardness was measured by nano-indenter. The coefficient of friction (COF) was measured by tribology test using ball on disk method. After tribology test, wear tracks were examined by optical microscope and alpha step profiler. Rockwell C indentation test was performed to characterize the adhesion between films and substrate. Ti and W were found good interlayer materials to act as Co diffusion barriers and diamond nucleation layers. The COFs on NCD films with W or Ti interlayer were measured as less than 0.1 whereas that on bare WC-Co was 0.6~1.0. However, W interlayer exhibited better results than Ti in terms of the adhesion to WC-Co substrate and to NCD film. This result is believed to be due to smaller difference in the coefficients of thermal expansion of the related films in the case of W interlayer than Ti one. By varying the thickness of W interlayer as 1, 2, and $4{\mu}m$ with a fixed $2{\mu}m$ thick NCD film, no difference in COF and wear behavior but a significant change in adhesion was observed. It was shown that the thicker the interlayer, the stronger the adhesion. It is suggested that thicker W interlayer is more effective in relieving the residual stress of NCD film during cooling after deposition and results in stronger adhesion.

• Journal of the Korean institute of surface engineering
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• v.47 no.2
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• pp.75-80
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• 2014

Nanocrystalline diamond(NCD) films on steel(SKH51) has been investigated using SiC interlayer film. SiC was deposited on SKH51 or Si wafer by RF magnetron sputter. NCD was deposited on SiC at $600^{\circ}C$ for 0.5~4 h employing microwave plasma CVD. Film morphology was observed by FESEM and FIB. Film adherence was examined by Rockwell C adhesion test. The growth rate of NCD on SiC/Si substrate was much higher than that on SiC/SKH51. During particle coalescence, NCD growth rate was slow since overall rate was determined by the diffusion of carbon on SiC surface. After completion of particle coalescence, NCD growth became faster with the reaction of carbon on NCD film controlling the whole process. In the case of SiC/SKH51 substrate, a complete NCD film was not formed even after 4 h of deposition. The adhesion test of NCD/SiC/SKH51 samples revealed a delamination of film whereas that of SiC/SKH51 showed a good adhesion. Many voids of less than 0.1 ${\mu}m$ were detected on NCD/SiC interface. These voids were believed as the reason for the poor adhesion between NCD and SiC films. The origin of voids was due to the insufficient coalescence of diamond particles on SiC surface in the early stage of deposition.