• 제목/요약/키워드: CVD(Chemical Vapour Deposition)

검색결과 28건 처리시간 0.026초

CVD증착에 의한 인버티드 스태거형 TFT의 전압 전류 특성 (Current and voltage characteristics of inverted staggered type amorphous silicon thin film transistor by chemical vapour deposition)

  • 이우선;박진성;이종국
    • E2M - 전기 전자와 첨단 소재
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    • 제9권10호
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    • pp.1008-1012
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    • 1996
  • I-V, C-V characteristics of inverted staggered type hydrogenerated amorphous silicon thin film transistor(a-Si:H TFT) was studied and experimentally verified. The results show that the log-log plot of drain current increased by voltage increase. The saturated drain current of DC output characteristics increased at a fixed gate voltage. According to the increase of gate voltage, activation energy of electron and the increasing width of Id at high voltage were decreased. Id saturation current saturated at high Vd over 4.5V, Vg-ld hysteresis characteristic curves occurred between -15V and 15V of Vg. Hysteresis current decreased at low voltage of -15V and increased at high voltage of 15V.

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화학기상증착법(CVD)에 의한 SiC/C 경사기능재료의 증착 (Deposition of SiC/C functionally gradient materials by chemical vapour deposition)

  • Yootaek Kim;Nam Hun Kim;Keun Ho Orr
    • 한국결정성장학회지
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    • 제4권3호
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    • pp.262-275
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    • 1994
  • SiC/C계 경사기능재료를 화학기상증착법에 의하여 흑연기판위에 증착시키고자 하였다. 본 실험에서 경사기능재료의 최적증착조착조건은 온도 $1300^{\circ}C, H_2/[SiCl_4+CH_4]=10, CH_4/[$SiCl_4+CH_4]=0.5-0.6$이었다. 불연속적인 입력개시비의 변화에도 불구하고 연속적으로 조성이 변화된 경사기능재료를 얻을 수 있었으며, 명확한 계면이 존재하지 않는 연속적인 구조변화가 주사전자현미경 관찰로 확인되었다.

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열화학증착법으로 제조된 $SnO_2$박막의 특성 (Characterization of $SnO_2$ Thin Films Prepared by Thermal-CVD)

  • 류득배;이수완
    • 한국재료학회지
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    • 제11권1호
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    • pp.15-19
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    • 2001
  • 유리기판 위에 열화학증착법으로 투명전도성 산화주석막을 제조하였다. 박막은 원료물질로 tetramethyltin(TMT), 산화제로 산소나 오존이 포함된 산소의 혼합물로부터 제조되었다 제조된 박막은 기판온도에 따라 물성이 크게 변하였고 최적화된 박막은 TMT 유랑 8 sccm, 산소유량 150 sccm, 기판온도 $380^{\circ}C$에서 제조되었다. 오존을 사용함으로서 기판온도를 약 $180^{\circ}C$정도 낮출 수 있었고 비저항은 ~$10^{ -2}{\Omega}cm$에서 ~$10^{-3}{\Omega}cm$으로 감소시킬 수 있었다.

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CVD법에 의한 강의 TiC 피복에 관하여 (Study on the Tic Coating of Steel by C.V.D. Process)

  • 강국해;최진일;영동영
    • 한국표면공학회지
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    • 제15권4호
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    • pp.208-217
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    • 1982
  • To study the effect of TiC coating on weight change, microhardness, wear and heat - resistance of TiC layer, chemical vapour deposition on the various substrates has been carried out with the gaseous mixture of TiCl4, toluene, and H2 in the temperature range of 900 - 1000$^{\circ}C$. The results obtained are as follows ; (1) There is a limited value of carrier and reductant H2 gas flow rate, above which deteriorate effect on the TiC depoition arises (2) Increased thickness of TiC layer was resulted with increasing temperature and time. Better deposition was obtained with stainless steels and the best results were introduced by cobalt coating of substrates. (3) Wear resistance of the TiC coated specimen improved markedly. Heat resistivity of the coated steel showed excellent result, whereas the coated stainless Steels were infer-ior to the substrate.

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Silica막 반응기를 이용한 Dimethyl Ether 합성에 관한 연구 (Study on Synthesis of Dimethyl Ether Using Silica Membrane Reactor)

  • 서봉국;윤민영;이규호
    • 멤브레인
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    • 제15권4호
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    • pp.330-337
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    • 2005
  • [ $250^{\circ}C$의 고온에서 수증기 선택 투과 특성을 가지는 silica 막을 메탄을 탈수에 의한 dimethyl ether (DME) 합성 반응에 분리막 반응기로 적용하였다. Silica 전구체로서 tetraethoxysilane (TEOS)을 이용하여 초음파 분무 열분해 및 기상화학 증착법(CVD)법 등에 의해 다공성 스테인레스 스틸(SUS)에 silica 막을 합성하였다. CVD법에 의해 합성한 silica막의 수증기 투과도 및 메탄올에 대한 분리계수 상관관계 trade-off 선이 열분해 silica 막보다 높이 존재하였다. 수증기 투과도가 $1.2\times10^{-7}\;mol\;{\cdot}\;m^{-2}\;{\cdot}\;S^{-1}\;{\cdot}\;Pa^{-1}$ 이상이고, 메탄올에 대한 분리계수가 10 이상의 성능을 가지는 분리막 반응기에 대해서 기존 반응기 대비 $20\%$ 이상 메탄을 전환율이 향상되었다. 고온 수증기 선택성 silica 막이 메탄을 탈수 반응에 의해 생성되는 수증기를 제거함으로서 촉매 활성 저하를 억제하여 반응 전환율을 개선시키는 막 반응기로서의 효과를 확인할 수 있었다.

Al$_2$O$_3$ formation on Si by catalytic chemical vapour deposition

  • Ogita, Yoh-Ichiro;Shinshi Iehara;Toshiyuki Tomita
    • E2M - 전기 전자와 첨단 소재
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    • 제16권9호
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    • pp.63.1-63
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    • 2003
  • Catalytic chemical vapor deposition (Cat-CVD) has been developed to deposit alumina(Al$_2$O$_3$) thin films on silicon (Si) crystal using N$_2$ bubbled tir-methyl aluminium [Al(CH$_3$)$_3$, TMA] and molecular oxygen (O$_2$) as source species and tungsten wires as a catalyzer. The catalyzer dissociated TMA at approximately 600$^{\circ}C$ The maximum deposition rate was 18 nm/min at a catalyzer temperature of 1000 and substrate temperature of 800$^{\circ}C$. Metal oxide semiconductor (MOS) diodes were fabricated using gates composed of 32.5-nm-thick alumina film deposited as a substrate temperature of 400oC. The capacitance measurements resulted in a relatively dielectric constant of 7, 4, fixed charge density of 1.74*10e12/$\textrm{cm}^2$, small hysteresis voltage of 0.12V, and very few interface trapping charge. The leakage current was 5.01*10e-7 A/$\textrm{cm}^2$ at a gate bias of 1V.

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Synthesis of self-aligned carbon nanotubes on a Ni particles using Chemical Vapour Deposition

  • Park, Gyu-Seok
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.64-64
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    • 2000
  • Since its discovery in 1991, the carbon nanotube has attracted much attention all over the world; and several method have been developed to synthesize carbon nanotubes. According to theoretical calculations, carbon nanotubes have many unique properties, such as high mechanical strength, capillary properties, and remarkable electronical conductivity, all of which suggest a wide range of potential applications in the future. Here we report the synthesis in the catalytic decomposition of acetylene at ~65 $0^{\circ}C$ over Ni deposited on SiO2, For the catalyst preparation, Ni was deposited to the thickness of 100-300A using effusion cell. Different approaches using porous materials and HF or NH3 treated samples have been tried for synthesis of carbon nanotubes. It is decisive step for synthesis of carbon nanotubes to form a round Ni particles. We show that the formation of round Ni particles by heat treatment without any pre-treatment such as chemical etching and observe the similar size of Ni particles and carbon nanotubes. Carbon nanotubes were synthesized by chemial vapour deposition ushin C2H2 gas for source material on Ni coated Si substrate. Ni film gaving 20~90nm thickness was changed into Ni particles with 30~90nm diameter. Heat treatment of Ni fim is a crucial role for the growth of carbon nanotube, High-resolution transmission electron microscopy images show that they are multi-walled nanotube. Raman spectrum shows its peak at 1349cm-1(D band) is much weaker than that at 1573cm-1(G band). We believe that carbon nanotubes contains much less defects. Long carbon nanotubes with length more than several $\mu$m and the carbon particles with round shape were obtained by CVD at ~$650^{\circ}C$ on the Ni droplets. SEM micrograph nanotubes was identified by SEM. Finally, we performed TEM anaylsis on the caron nanotubes to determine whether or not these film structures are truly caron nanotubes, as opposed to carbon fiber-like structures.

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벤젠 증착에 의해 제조된 활성탄소섬유의 $CH_4/CO_2$ 분자체 성질 (Molecular Sieve Properties for $CH_4/CO_2$ of Activated Carbon Fibers Prepared by Benzene Deposition)

  • 문승현;심재운
    • 대한환경공학회지
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    • 제27권6호
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    • pp.614-619
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    • 2005
  • [ $CO_2$ ]와 $CH_4$의 혼합가스로부터 $CO_2$를 선택적으로 분리, 회수하기 위하여 비표면적과 기공구조가 다른 일련의 활성탄소섬유에 벤젠을 CVD하여 기공 크기를 조절하였다. 벤젠 증착 온도 및 증착 시간을 변화시켜 제조한 ACF 분자체의 흡착 선택도를 $CO_2$$CH_4$의 흡착을 통해 측정하였으며, 그 기공구조를 질소흡착에 의한 흡착등온선으로부터 조사하였다. 열분해로 생성된 탄소는 활성탄소 섬유의 기공 크기를 크게 변화시켰으며, 벤젠 CVD에 의해 제조된 ACF 분자체는 $CH_4$의 흡착량을 크게 감소시키며 $CO_2$에 대해 우수한 흡착선택도를 보여주었다.

다공성실리콘 위의 탄화규소 박막의 증착 및 발광특성 (Deposition and Photoluminescence Characteristics of Silicon Carbide Thin Films on Porous Silicon)

  • 전희준;최두진;장수경;심은덕
    • 한국세라믹학회지
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    • 제35권5호
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    • pp.486-492
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    • 1998
  • Silicon carbide (SiC) thin films were deposited on the porous silicon substrates by chemical vapour de-position(CVD) using MTS as a source material. The deposited films were ${\beta}$-SiC with poor crystallity con-firmed by XRD measurement. It was considered that the films showed the mixed characteistics of cry-stalline and amorphous SiC where amorphous SiC where amorphous SiC played a role of buffer layer in interface between as-dep films and Si substrate. The buffer layer reduced lattice mismatch to some extent the generally occurs when SiC films are deposited on Si. The low temperature (10K) PL (phtoluminescence) studies showed two broad bands with peaks at 600 and 720 for the films deposited at 1100$^{\circ}C$ The maximum PL peak of the crystalline SiC was observed at 600 nm and the amrophous SiC of 720 nm was also confirmed. PL peak due the amorphous SiC was smaller than that of the crystalline SiC, PL of porous Si might be disapperared due to densification during heat treatment.

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Role of Metal Catalyst and Substrate Site for the Growth of Carbon Nanomaterials

  • Manocha, L.M.;Valand, Jignesh;Manocha, S.
    • Carbon letters
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    • 제6권2호
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    • pp.79-85
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    • 2005
  • The work reported in this paper relates to preparation and characterization of carbon nanomaterials by CVD method on different substrates by decomposition of certain hydrocarbons at 550-$800^{\circ}C$ using a horizontal quartz tube reactor. Monometallic and bimetallic catalyst system of iron and nickel were used for the preparation of different carbon nanomaterials. The influence of various parameters such as substrate/catalyst preparation parameters, the nature of substrate, catalyst concentration, reaction time and temperature on the growth, yield and alignment of carbon nanotubes has been studied. The characterization of carbon nanomaterials has been carried out using SEM, TEM and TGA. The carbon nanomaterials developed were vertically aligned on a large area of flat quartz substrate.

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