• Clean Technology
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• v.16 no.3
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• pp.162-171
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• 2010

The objective of this study is to develop cleaning agents for the indoor water supply pipe which is environmentally friendly and suitable for removing scale by using various organic acids, inorganic acids, and some additives. Among various organic acids, oxalic acid, citric acid, and malic acid showed good cleaning efficiency of iron oxides which were main components of the indoor water supply pipe scale. Several cleaning agents were formulated by adding chemical additives into these organic acids and evaluated for removal of iron oxides. In this study, it was found that nonionic surfactants were excellent for the removal of iron oxide scale among various additives. Two types of cleaning agents($F_1$, $F_2$) with comparatively high solvent power for iron oxides were formulated in this study. The cleaning agents $F_1$ made by organic acids and some additives were formulated to be safe and environmentally friendly, but seemed to have disadvantage due to their comparatively low cleaning efficiency of iron oxide than $F_2$. But, the cleaning agents $F_2$ prepared by adding inorganic acid a little to $F_1$ showed comparatively good cleaning efficiency of iron oxide and could be recommended for removing hard scale of iron oxides in the indoor water supply pipe. Thus, it is considered that the formulated cleaning agents should be selected based on the extent of scale in the indoor water supply pipe.

• Journal of the Korean Society of School Health
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• v.23 no.1
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• pp.29-40
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• 2010

Purpose: The purposes of this study were: (a) to assess indoor air quality such as $PM_{10}$, $CO_2$ concentrations in child daycare centers, (b) to compare the levels with each standard, and (c) to identify teachers' awareness of indoor air quality in child care centers. Methods: Data were obtained from seventeen child daycare centers and ninety-eight teachers in a district of Seoul, from April 3 to May 12, 2009. Collected data were analyzed by SAS 8.2, and descriptive statistics, $x^2$ test, student t-test, Pearson correlation analysis, and Spearman rank correlation were used. Results: The mean of $PM_{10}$ and $CO_2$ level were $50.3{\mu}g/m^3$ and 792.1ppm. Sixteen child daycare centers (94.2%) met the guidelines of the $PM_{10}$ level, so did thirteen child daycare centers (76.5%) in the $CO_2$ level. $CO_2$ levels were significantly low in child daycare centers using air cleaners than those do not using them (t=-6.03, p<.001). Types of child daycare centers were significantly correlated to the levels of $CO_2$, which public child daycare centers were low in $CO_2$ levels than those of private child daycare centers (t=-2.54, p=.013). There was no significant correlation between teachers' awareness and management attitude of indoor air quality while teachers' awareness of indoor air quality significantly raised the frequency of carpet cleaning. Methods of cleaning routines were significantly correlated with $PM_{10}$, and $CO_2$ levels. Conclusion: The $PM_{10}$ and $CO_2$ concentrations in child daycare centers were satisfactory. Those conditions are affected by general characteristics of child daycare centers and teachers' attitude regarding management of indoor air quality.

• Proceedings of the KIPE Conference
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• 2003.07a
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• pp.260-263
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• 2003

When ICP(Inductive Coupled Plasma type etching and wafer manufacturing is being processed in semiconductor process, a noxious gas in PFC and CFC system is generated. Gas cleaning dry scrubber is to remove this noxious gas. This paper describes a power source device, 2MHz switching frequency class 2kW RF Generator, used as a main power source of the gas cleaning dry scrubber. The power stage of DC/DC converter is consist of full bridge type converter with 100kHz switching frequency Power amplifier is push pull type inverter with 2MHz switching frequency, and transmission line transformer. The adequacy of the circuit type and the reliability of generating plasma in various load conditions are verified through 50$\Omega$ dummy load and chamber experiments result.

• Journal of Power System Engineering
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• v.20 no.1
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• pp.30-35
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• 2016

The objective of this study is to investigate the physicochemical properties of the catalysts and the feasibility of remanufacturing them after removing ash in CDPF using a cleaning agent KOH. Compared with the carbon oxidation ability of fresh CDPF, that of de-ashed CDPF had an insignificant difference due to the low activation energy of CO and $CO_2$. As ash deposited in CDPF was de-ashed with KOH, it had a practical feasibility on remanufacturing point of view, but washcoat was melted about 26%. Further studies were required for the prevention of washcoat loss.

• Proceedings of the International Microelectronics And Packaging Society Conference
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• 2003.11a
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• pp.256-259
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• 2003

To develop cleaning process various particles should be deposited on wafer surfaces to measure particle removal efficiencies. The purpose of the article in to evaluate, removal efficient)r of silica and alumina particles from wafer surfaces when they are deposited by dry and wet method. Dry deposition in air and wet spray deposition using solutions are used. van der Waals are considered to calculate the adhesion force of particles on surfaces. Higher adhesion force is measured on alumina particles on silicon when particles are deposited in air.

• The KSFM Journal of Fluid Machinery
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• v.17 no.2
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• pp.54-58
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• 2014

The method of residential waste and food waste collecting is changed into automatic waste collection(AWC) system from direct collection by human resource. To solve the problem caused by odour from AWC facilities, the structure of input facilities, conveying pipes and collecting facilities have been changed into closed and sealed construction to enclosed the facilities and collect odour efficiently. Based on cases and experiences, to treat variable odour matters which are caused by food waste, chemical cleaning method is preferable method to cope with odour caused by food waste.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1425-1428
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• 2006

We have proposed a novel cleaning technology with organic nanoparticles for high-performance TFT array. The surface of the TFT layer becomes more hydrophilic after cleaning by the nanoparticles. This is concluded from the comparison of contact angles for the samples cleaned by various methods. It is found that the drain currents in the subthreshold and off-state regions are less than those for the TFTs cleaned with conventional method.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.37 no.6
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• pp.815-820
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• 2013

With the development of technology, there has been a considerable increase in the number of skyscrapers in the world. Accordingly, there are increasing requirements with regard to maintenance, such as cleaning, painting, and inspection. However, it is extremely dangerous to work on the walls of buildings, and falls from buildings have accounted for a large proportion of construction accidents. In particular, as the number of buildings with irregular shapes increases, the accident rate during maintenance work has increased each year, with most accidents leading to deaths. An alternative solution must be developed with the commercialization of automatic systems. In this study, fundamental research has been conducted for drafting and commercializing an automation tool with a built-in guide system that can perform cleaning.

• Journal of the Korea Convergence Society
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• v.10 no.11
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• pp.85-93
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• 2019

Despite its matchless position in the global semiconductor industry, Korea has not distinguished itself in the semiconductor equipment sector. Semiconductor cleaning equipment is one of the semiconductor fabrication equipment, and it is expected to be more important along with the advancement of semiconductor fabrication processes. This study attempts to analyze technology competitiveness of major countries in the sector including Korea, and explore specialty sub-areas of the countries. For this purpose, we collected patents of semiconductor cleaning equipment during the last 10 years from the US patent database, and implemented quantitative patent analysis and co-classification network analysis. The result shows that, the US and Japan have been leading the technological progress in this sector, and Korea's competitiveness has lagged behind not only the leading countries but also its competitors and even latecomers. Therefore, intensive R&D and developing technological capabilities are needed for advancing the country's competitiveness in the sector.

• Journal of the Korean Vacuum Society
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• v.20 no.6
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• pp.416-421
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• 2011

In this paper, the relationship of chamber contamination and the intensity change of specific wavelength was investigated. "diff_CO" formula was introduced to rule out background noise caused by external conditions and to detect when the polymer is removed from the chamber. As RF time increased, diff_CO trend showed the decrease of the maximum peak and increased number of small intensity peaks. From the diff_CO change, it was possible to determine when the chamber needs to be cleaned without opening the chamber.