• Proceedings of the KIEE Conference
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• 2015.07a
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• pp.1090-1091
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• 2015

사막은 일조량이 많고, 세계적으로 넓은 규모를 가지고 있어 대규모 태양광 발전소 건설에 주목받고 있지만, 태양광 모듈 표면에 쌓이는 모래먼지로 인하여 발전효율 저하가 발생되고 있는 실정이다. 이에 태양광 모듈 표면의 모래먼지를 제거할 수 있는 태양광 모듈 크리닝 시스템을 개발 하였다. 본 논문에서는 사막 환경을 고려하여 물을 필요로 하지 않는 압축공기 및 회전하는 브러쉬로 모듈 표면을 세척하는 Solar Module Cleaning System을 제안한다.

• Journal of the Korean Geosynthetics Society
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• v.16 no.4
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• pp.75-82
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• 2017

In this study, a new cleaning method using carbon dioxide pellet in the part of underground pipe cleaning method was proposed and verified. First of all, the commentary of The Society for Protective Coatings was examined in detail to determine the quantitative cleaning effects. Also, field tests were carried out to confirm the application of the new method. In the test, the surface condition of inner pipe after the application of the new method was investigated and two types of nozzles were compared in the tests. Also, the tests to measure the final impact pressure of air and carbon dioxide pellet mixtures were performed to investigate the losses of air pressure were investigated. Through this verification on the new method, it was found that the new method is very efficient for the removal of the rust in the pipe cleaning works. Also, the nozzle with excellent cleaning effect was also selected. As a result, this method will be able to largely contribute to the recycling of $CO_2$ which is limited to the use as a cooling agent or the storage of waste.

• Journal of the Semiconductor & Display Technology
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• v.19 no.2
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• pp.45-50
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• 2020

We investigated the Si_1-xGe_x surface properties when dry cleaning the films using NF₃ / H₂O remote plasma. After the dry cleaning process, it was found that about 80-250 nm wide bumps were formed on the SiGe surface regardless of Ge concentration in the rage of x = 0.1 ~ 0.3. In addition, effects of the dry cleaning processing parameters such as pressure, substrate temperature, and H₂O flow rates were examined. It was found that the surface bump is significantly dependent on the flow rate of H₂O. Based on these observations, we would like to provide additional guidelines for implementing the dry cleaning process to SiGe materials.

• Proceedings of the Korean Radioactive Waste Society Conference
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• 2019.05a
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• pp.357-358
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• 2019

• Proceedings of the Korean Radioactive Waste Society Conference
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• 2017.05a
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• pp.399-400
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• 2017

• Cement Symposium
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• no.30
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• pp.182-186
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• 2003

• Journal of the Korean Applied Science and Technology
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• v.27 no.2
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• pp.107-113
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• 2010

The object of this research is to conform of practicable possibility and recycling of producing junk after citrus fruits is processed. With extracting d-limonene oil that have 70~90% a component of oil out of junk citrus peel, making certain the about 12000ppm concentration of it. Limonene derived from citrus in jeju using conventional synthetic detergents can be replaced with the development of environmentally friendly natural detergent investigated the possibility. Mostly due to ocean dumping, disposal and cause environmental problems by recycling natural citrus cleaner alternative to the research conducted on the possibility. Cleaning efficiency with temperature did not affect the largest concentrations were able to identify the difference between cleaning efficiency. At least 10% of the d-limonene oil could be from the cleaning performance, increasing the concentration of the cleaning efficiency was increased in size. Ultrasonic is very high removal efficiency under the conditions shown in the cause of pure self-generated ultrasonic cleaning power as co-effects of d-limonene oil appears to chemical cleaning effect of ultrasonic cavitation occurs in the physical cleaning effect due to a combination of synergistic stability is maximized by low concentrations of d-limonene oil in a short time showed an excellent cleaning ability. Having the ability of cleaning at the same time, considering the side recycling in the junk citrus peels reflects possibility of basic materials utility eco-friendly in the skin soap, bath soap, cosmetics etc, through ability of exclusion a contaminant in based cleaning effect(EC) it can prospect substitution effect environmentally in the pre existence synthetic detergents.

• Journal of the Semiconductor & Display Technology
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• v.22 no.4
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• pp.26-31
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• 2023

We investigated the impact of NF₃ / H₂O remote plasma dry cleaning conditions on the SiO₂ etching rate at different preparation states during the fabrication of ultra-large-scale integration (ULSI) devices. This included consideration of factors like Si crystal orientation prior to oxidation and three-dimensional structures. The dry cleaning process were carried out varying the parameters of pressure, NF₃ flow rate, and H₂O flow rate. We found that the pressure had an effective role in controlling anisotropic etching when a thin SiO₂ layer was situated between Si₃N₄ and Si layers in a multilayer trench structure. Based on these observations, we would like to provide further guidelines for implementing the dry cleaning process in the fabrication of semiconductor devices having 3D structures.

• Journal of the Korean Society for Precision Engineering
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• v.30 no.4
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• pp.390-396
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• 2013

Due to the development of technology, there is a considerable increase in the number of skyscrapers in the world. Accordingly, there are rapid growing requests about maintenances such as cleaning, painting, and inspection. However, it is extremely dangerous working the walls of buildings, and crashes from buildings have accounted for large proportion of constructional accidents. Especially, as the number of buildings with irregular shapes increases, the accident rate during the maintenance work increases each year, and most of the accidents lead to death. An alternative solution must be developed with the commercialization of automatic systems. In this research, a fundamental research has been conducted for drafting and commercializing an automation tool that is carried in the built-in guide system, which can perform cleaning.

• Journal of the Semiconductor & Display Technology
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• v.4 no.4 s.13
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• pp.13-17
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• 2005

The behavior of ozone in $NH_4OH$ was investigated to evaluate the solution as a cleaning chemical of the silicon wafer. The solubility of ozone in DI(Deionized) water increased as the oxygen flow-rate decreased and ozone generator power increased. Ozone in DI water showed solubility of 100 ppm or higher at room temperature. Ozone concentration was stabilized at the range of ${\pm}2ppm$ by controlling oxygen flow rate and ozone generator power. On the contrary, the solubility of ozone in $NH_4OH$ was very low and strongly depended on the concentration of $NH_4OH$ and pH. The redox potential of ozone was saturated within 10 minutes in DI water and decreased rapidly with the addition of $NH_4OH$. The behavior of ozone in $NH_4OH$ is well explained by redox potential calculation.