• 반도체디스플레이기술학회지
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• 제9권1호
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• pp.5-10
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• 2010

Among a variety of cleaning processes, the cryogenic carbon dioxide ($CO_2$) cleaning has merits because it is highly efficient in removing very fine particles, innoxious to humans and does not produce residuals after the cleaning, which enables us to extend its area of coverage in the semi-conductor fabrication society. However, the cryogenic carbon dioxide cleaning method has some technical research issues in aspect to particles' adhesion and removal. To resolve these issues, performing an analysis for the identification of particle adhesion mechanism is needed. In this study, a research was performed by a theoretical approach. To this end, we extended the G-T (Greenwood-Tripp) model by applying the JKR (Johnson-Kendall-Roberts) and Lennard-Jones potential theories and the statistical characteristics of rough surface to investigate and identify the contact, adhesion and deformation mechanisms of soft or hard particles on the rough substrate. The statistical characteristics of the rough surface were taken into account through the employment of the normal probability distribution function of the asperity peaks on the substrate surface. The effects of surface roughness on the pull-off force for these particles were examined and discussed.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2003년도 춘계학술발표회 초록집
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• pp.54-54
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• 2003

MgO layer는 POP 패빌 내 유전증을 이온의 스퍼터링으로부터 보호하여 주며, 또한 높은 이차 전자 밤출 계수의 특성을 가지고 있어 구동 및 유지 전압을 낮춰 주는 역할을 한다. 그러나. MgO layer는 $H_20,{\;}CO_2,{\;}N_2,{\;}0_2$ 그리고 $H_2$와 같은 불순물 들을 쉽게 를착하는 단점이 있어, PDP의 특성 및 수명 단축에 영향을 줄 수 있다. 따라서, 본 연구에서는 atmospheric pressure plasma cleaning 과 low pressure i inductively coupled plasma (ICP) cleaning 처리에 의하여, 보호층으로 사용이 되는 MgO layer의 outgassing 특성을 조사하고자 한다. plasma cleaning에 의한 MgO layer 표면의 roughness와 불순물의 변화를 알아보기 위 하여 atomic force microscopy(AFM)과 x-ray p photoelectron spectroscopy(XPS)를 이용하여 측정 하였다. 또한, outgassing의 특성을 분석하기 위하여 MgO layer를 $400^{\circ}C$ 까지 온도를 가하여 온도에 따른 outgassing의 특성을 quadrupole mass spectrometer(QMS)를 이용하여 알아보았다. atmospheric pressure plasma cleaning 에서는 $He/O_2/Ar/N_2$의 gas를 사용하였으며, low pressure ICP cleaning 에 서는 Ar의 gas를 사용하였다. atmospheric pressure plasma cleaning는 low pressure ICP C cleaning과 비교해 더 낮은 outgassing을 관잘 할 수 있었으나. MgO 표면의 roughness는 low pressure ICP cleaning 후 더 낮은 것을 알 수 있었다. 또한 $He/O_2/Ar/N_2$의 gas를 사용 한 atmospheric pressure plasma cleaning 과 $Ar/O_2$의 gas를 사용한 ICP cleaning에서 이 차전자방출계수(SEEC)가 약 1.5~2.5배 증가된 것을 알 수 있었다.

• 한국응용과학기술학회지
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• 제22권1호
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• pp.15-20
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• 2005

$Na_2CO_3$. Sodium orthosilicate (Na-OSi), Tetronix T-701 (T-701), Na-dioctyl sulfosuccinate (303C), Newpol PE-68 (PE-68), MJU-100A, and tetrasodium pyrophosphate were blended to prepare high performance alkaline cleaning agents (ACASs). The results of cleaning test with steel specimen showed that ACAS-6 ($Na_2CO_3$ 50g/Na-OSi 35g/T-701 20g/303C 18g/PE-68 17g/MJU-100A 10g/TSPP 20g/ water 180g mixture) had a good cleaning power. The cleaning power for press-rust preventing oil was 98% and 99% degreasing at 4wt%, $70^{\circ}C$ and $90^{\circ}C$, respectively ; for quenching oil, the cleaning power of ACAS-6 was 91% degreasing at 4wt% and $70^{\circ}C$. The foam heights measured immediately after foaming by Ross & Miles method and Ross & Clark method at 6wt%, $60^{\circ}C$ were 18mm and 65mm, respectively. It was concluded that ACAS-6 had a good low foaming cleaning agent.

• 한국응용과학기술학회지
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• 제20권4호
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• pp.283-288
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• 2003

Alkaline powder cleaning agents (APCAs) were prepared by blending of $Na_2CO_3$ tetrasodium pyrophosphate (TSPP). sodium orthosilicate (Na-OSi), Na-dioctyl sulfosuccinate (303C), Demol C, and MJU-100A (100A). The physical properties of APCAs tested with steel specimen showed the following results. The cleaning powers of APCA-6 ($Na_2CO_3$ 250g/TSPP 70g/Na-OSi 40g/303C 60g/Demol C 50g/100A 30g mixture) for press-rust preventing oil was 97% and 98% degreasing at 2wt%, $70^{\circ}C$ and $90^{\circ}C$, respectively; for Quenching oil, the cleaning power of APCA-6 was 95% degreasing at 2wt% and $70^{\circ}C$. From the results, it was ascertained that APCA-6 exhibited a good cleaning power. Also low foaming power tests proved that the APCA-6 maintained good defoaming effect.

• 반도체디스플레이기술학회지
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• 제22권4호
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• pp.66-71
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• 2023

This paper describes a hybrid cleaning method of silicon wafer combining nano-bubble and ultrasound to remove sub-micron particles and contaminants with minimal damage to the wafer surface. In the megasonic cleaning process of semiconductor manufacturing, the cavitation induced by ultrasound can oscillate and collapse violently often with re-entrant jet formation leading to surface damage. The smaller size of cavitation bubbles leads to more stable oscillations with more thermal and viscous damping, thus to less erosive surface cleaning. In this study, ultrasonic energy was applied to the wafer surface in the DI water to excite nano-bubbles at resonance to remove contaminant particles from the surface. A patented nano-bubble generator was developed for the generation of nano-bubbles with concentration of 1×10⁹ bubbles/ml and nominal nano-bubble diameter of 150 nm. Ultrasonic nano-bubble technology improved a contaminant removal efficiency more than 97% for artificial nano-sized particles of alumina and Latex with significant reduction in cleaning time without damage to the wafer surface.

• 한국기계가공학회지
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• 제15권1호
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• pp.8-13
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• 2016

The micro drill bit automatic regrinding in-line system is a system that refurbishes drill bits used in a PCB manufacturing process. This system is able to refurbish drill bits with a minimum size of ø0.15-0.075mm that have previously been discarded. Beyond the conventional manual cleaning process using ultrasound, this system adopts a water jet cleaning system, making it capable of cleaning drill bits with a minimum size of ø0.15-0.075mm. This paper analyses various contact pressures applied to the surface of drill bits depending on the shooting pressure of the cleaning device and fluid velocity in order to optimize the nozzle location and to detect structural instability caused by the contact pressures.

• Nuclear Engineering and Technology
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• 제52권3호
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• pp.581-588
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• 2020

The membrane fouling is an important problem for FO applied to the radioactive wastewater treatment. The FO fouling characteristics for simulated radioactive wastewater treatment was investigated. On-line cleaning by deionized (DI) water and external cleaning by ultrasound and HCl were applied for the fouled membrane. The effectiveness and foulant removing amount by each-step cleaning were evaluated. The membrane fouling was divided into three stages. Co(II), Sr(II), Cs(I), Na(I) were all found deposited on both active and support layers of the membrane surface, resulting in membrane surface became rougher and more hydrophobic, which increased membrane resistance. On-line cleaning by DI water recovered the water flux to 69%. HCl removed more foulants than ultrasound.

• Korean Chemical Engineering Research
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• 제40권6호
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• pp.769-777
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• 2002

Nonionic surfactant/water/탄화수소 오일/alcohol의 4성분계 시스템에서 12종의 조성물을 제조하여 물성 평가를 수행한 결과, 30.5-31.1 dyne/cm의 낮은 표면장력의 값과, 1.6-7.2 c.p.의 낮은 점도의 물성을 보여 산업용 세정제로서의 기본 물성을 보여주었다. 이들 조성물들이 안정한 단일상으로 존재하는 온도의 범위는 alcohol/surfactant(A/S)비의 증가에 따라 감소되는 경향을 보이고 있으나, 전체적으로는 계면활성제의 hydrophilic lipophilic balance(HLB) 값에 크게 영향을 받고 있으며, HLB 값이 높을수록 안정하게 존재하는 온도 영역이 증가되는 경향을 보여주고 있다. 그리고 각각의 조성물에 물의 함량을 증가 시켜 안정한 단일상이 유지되는 물의 최대 함유량을 측정한 결과 HLB 값이 낮은 계면활성제를 사용하였을 경우 HLB 값이 6.4인 비이온 계면활성제를 사용할 경우 22.1%까지도 물을 함유할 수 있었고, 물의 양이 증가됨에 따라서 단일상으로 존재하는 온도영역은 좁아졌다. 오염원으로 플럭스 제조에 사용되는 abietic acid에 대한 세정 효율을 UV/Visable Spectrophotometer와 FT-IR Spectrometer와 같은 분석기기를 이용하여 검토하여 본 결과, 비이온 계면활성제의 HLB 값이 낮을수록 높은 세정 효율을 보여주어, W/O microemulsion의 경우 비이온 계면활성제에 따른 세정력의 변화가 매우 큼을 확인 할 수 있었다. 그러나 A/S의 비가 증가에 따른 세정효율의 차이는 별다른 경향을 보이지 않았다. 또한 산업세정에 있어서 중요한 세정 요소로 작용하는 변수인 온도 변화와 초음파 주파수의 변화에 따른 세정효율을 측정한 결과, 온도가 높을수록 그리고 초음파의 주파수가 낮을수록 높은 세정력을 보여주었다. 세정 공정 중 린스조에서의 유분 오염물이 함유된 린스액의 유수분리 효율을 측정한 결과, HLB 값이 6.4인 비이온 계면활성제를 사용한 시스템의 경우 $25^{\circ}C$ 이상에서 85% 이상의 높은 제거 효율을 보여, 효율적인 세정 및 관리가 가능한 것으로 판단되었다.

• 한국품질경영학회:학술대회논문집
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• 한국품질경영학회 2006년도 추계 학술대회
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• pp.283-286
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• 2006

The study of The cost of cleaning S-city's air pollution is effective. The cost is calculated by ABC distribution system and analysed the air pollution and cost's correlation. Because the whole air pollution's analysis is so heavy, We did about vehicle's pollution.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2006년도 추계학술대회 논문집
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• pp.477-478
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• 2006