• 한국결정학회지
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• 제7권2호
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• pp.183-190
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• 1996

수열법을 이용하여 은(Ag)이 내장된 고온고압용 autoclave에서 KOH를 광화제로 하여 ZnO 단결정을 성장하고, LiOH 및 NH4OH의 첨가에 따른 결정외형의 변화에 대해 고찰하였다. 성장된 단결정은 연한 녹색을 띠고 있었으며 최대크기는 30×30×20mm3였다. KOH 광화제에 1.0-2.0M의 LiOH를 첨가하면 (0001)면의 flaw의 수가 감소하였다. 또한 NH4OH를 첨가한 결과 Vc/Va(c 축의 방향의 성장속도/a축 방향의 성장속도)가 증가함을 확인하였고, 이 방법을 응용하여 판상형의 종자결정 대신 침상형의 종자결정으로도 등방주상(Equant hexagonal prism)형의 ZnO 단결정을 성장할 수 있었다.

• 한국재료학회지
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• 제26권11호
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• pp.656-661
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• 2016

4H- and 6H-SiC grown by physical vapor transport method were investigated by transmission electron microscopy (TEM). From the TEM diffraction patterns observed along the [11-20] zone axis, 4H- and 6H-SiC were identified due to their additional diffraction spots, indicating atomic stacking sequences. However, identification was not possible in the [10-10] zone axis due to the absence of additional diffraction spots. Basal plane dislocations (BPDs) were investigated in the TEM specimen prepared along the [10-10] zone axis using the two-beam technique. BPDs were two Shockley partial dislocations with a stacking fault (SF) between them. Shockley partial BPDs arrayed along the [0001] growth direction were observed in the investigated 4H-SiC. This arrayed configuration of Shockley partial BPDs cannot be recognized from the plan view TEM with the [0001] zone axis. The evaluated distances between the two Shockley partial dislocations for the investigated samples were similar to the equilibrium distance, with values of several hundreds of nanometers or even values as large as over a few micrometers.

• 한국표면공학회지
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• 제24권2호
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• pp.96-102
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• 1991

Co-Ni-P alloys were electrodeposited from NH4Cl-sulfate-hypophosphite baths under various plating conditions. Their effective anisotropic magnetic field which is one of the important properties for magnetic recording materials were investigated as the function of alloy compositions and c-axis orientation. The preferred orientation and the contents of Ni and P depend on the pH of solutions and also on the current density. It was found that the alloy films deposited from the solutions of pH4 at high current density had c-axis orientation parallel to the growth direction and the effective anisotropic fields sufficient for perpendicular magnetic recording application.

• 한국전기전자재료학회논문지
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• 제21권5호
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• pp.463-467
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• 2008

Aluminum nitride (AlN) thin films have been deposited on Au electrodes by using reactive RF magnetron sputtering method in a gas mixture of Ar and $N_2$ at different substrate temperature. It was found that substrate temperature was varied in the range up to $400^{\circ}C$, highly c-axis oriented film can be obtained at $300^{\circ}C$ with full width at half maximum (FWHM) $3.1^{\circ}$. Increase in surface roughness from 3.8 nm to 5.9 nm found to be associated with increase in grain size, with substrate temperature; however, the AlN film fabricated at $400^{\circ}C$ exhibited a granular type of structure with non-uniform grains. The Al 2p and N 1s peak in the X-ray photoelectron spectroscopy (XPS) spectrum confirmed the formation of Al-N bonds. The XPS spectrum also indicated the presence of oxynitrides and oxides, resulting from the presence of residual oxygen in the vacuum chamber. It is concluded that the AlN film deposited at substrate temperature of $300^{\circ}C$ exhibited the most desirable properties for the application of high-frequency surface acoustic devices.

• 자원환경지질
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• 제24권3호
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• pp.219-226
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• 1991

High quality quartz crystals are grown in 0.5N NaOH + LiOH solution on the seed crystal at $370-395^{\circ}C$ and $1200-1300kg/cm^2$ condition. Growth rates are determined by the crystal thickness grown on the seed crystals with Z(0001) and X($11\bar{2}0$) direction. Relatively high growth rate of Z(0001) direction gradually changes as the temperaure difference (${\Delta}$ Ti) between growth and dissolution zones from 25 to $10^{\circ}C$. The X axis direction is affeced by ${\Delta}$ Ti, and +X($11\bar{2}0$) direction shows a high growth rate than -X($\bar{1}\bar{1}20$) direction. According to the variation with kinds of solutions used, the crystal growth that in NaOH solution is found to be slower than that in $Na_2CO_3$ solution. However, for the case in the NaOH solution mixed with LiOH, it shows a favorable growth rate in terms of grown crystal quality.

• 한국세라믹학회지
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• 제33권9호
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• pp.985-994
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• 1996

The initiation and growth of $\alpha$-Al2O3/metal composites by the directed oxidation of molten commercial AlZnMg-alloy at 1223-1423K were investigated. Spontaneous bulk growth did not occur on the alloy alone. but the uniform initiation and growth of the composite were obtained by putting a thin layer of SiO2 particles on the surface of the alloy. Without SiO2 the external surface of the oxide layer was convered by MgO and MgAl2O4. But with the SiO2 reaction initiate the porous ZnO layers were found on the growth surface. The higher process temperature yielded a lower metal content. The oxidation product of $\alpha$-Al2O3 was found to be oriented with c-axis parallel to th growth direction. The growth rates increased with temperature and the apparent activation energy was 111.8 kJ/mol.

• 한국결정학회지
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• 제7권1호
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• pp.44-56
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• 1996

CuInTe2 다결정은 수평전기로에서 합성하고, CuInTe2 단결정은 수직 Bridgman 방법으로 성장하여 결정구조를 조사하고, Hall 효과를 30K에서 293K의 온도영역에서 측정하였다. CuInTe2 다결정 및 단결정은 정방정계였다. 다결정의 격자상수는 a=6.168Å, c=12.499Å 그리고 c/a=2.026이었고, 단결정의 격자상수는 a=6.186Å, c=12.453Å, 그리고 c/a=2.013이었다. CuInTe2 단결정의 성장면은 Laue 배면반사 사진으로부터 구하였으며 (112)면이었다. CuInTe2 단결정의 Hall 효과는 van der Pauw 방법으로 측정하였다. 상온에서 측정된 c축에 수직한 시료의 운반자농도 p는 2.14×1023holes/m3, 전기전도도 δ는 739.58Ω-1m-1 그리고 이동도 μ는 2.16×10 m2/V·s 이었다. c축에 평행한 시료의 운반자농도 p는 1.51×1023holes/m3, 전기전도도 σ는 717.55Ω-1m-1 그리고 이동도 μ는 2.97×10-2 m2/V·s이었다. c축에 수직 및 평행한 시료의 Hall계수가 양의 값이어서 CuInTe2 단결정은 p형 반도체임을 알 수 있었다.

• 한국자기학회지
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• 제4권1호
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• pp.44-47
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• 1994

Laser ablation법으로 c-축 배향되도록 만든 Y/sub 1/Ba/sub 2/Cu/sub 3/O/sub 7- .delta. / 박막으로 임계온도 근처에서 운반자들의 정보를 얻기위하여 Hall 효과를 연구하였다. 자기비저항은 Nernst 효과 때문에 자기장이 증가할 수록 offset 점의 온도가 낮았고, 자기비저항으로 부터 열자기적 효과를 고 려하여 계산한 Hall 비저항값과 실제 van der Pauw 법으로 측정한 Hall 비저항값을 비교해 본 결과 비교적 잘 일치하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.822-824
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• 2002

Transparent conducting ZnO:$Ga_2O_3$ thin films were deposited on glass substrates using rf magnetron sputtering method. The ZnO:$Ga_2O_3$ thin films were highly c-axis oriented normal to the substrates and had smooth surface features. The sheet resistance of the films was 2.8-6.4 ${\Omega}/{\square}$ at the growth temperature ranging from 25 to 30$^{\circ}C$.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.9-9
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• 2009

1 wt % Ga-dope ZnO (ZnO:Ga) thin films with n-type semiconducting behavior were grown on c-sapphire substrates by radio frequency magnetron sputtering at various growth temperatures. The room temperature grown ZnO:Ga film showed the faint preferred orientation behavior along the c-axis with small domain size and high density of stacking faults, despite limited surface diffusion of the deposited atoms. The increase in the growth temperature in the range between $300\sim550^{\circ}C$ led to the granular shape of epitaxial ZnO:Ga films due to not enough thermal energy and large lattice mismatch. The growth temperature above $550^{\circ}C$ induced the quite flat surface and the simultaneous improvement of electrical carrier concentration and carrier mobility, $6.3\;\times\;10^{18}/cm^3$ and $27\;cm^2/Vs$, respectively. In addition, the increase in the grain size and the decrease in the dislocation density were observed in the high temperature grown films. The low-temperature photoluminescence of the ZnO:Ga films grown below $450^{\circ}C$ showed the redshift of deep-level emission, which was due to the transition from $Zn_j$ to $O_i$ level.