• 한국세라믹학회지
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• 제47권6호
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• pp.560-565
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• 2010

Nano laminated bulk $Ti_3SiC_2$ was synthesized by hot press process using TiCx/Si powder mixture at the temperature range of $1300^{\circ}C\sim1500^{\circ}C$. pure $Ti_3SiC_2$ was synthesized by a hot pressing above $1400^{\circ}C$, while unreacted TiCx were remained in bulk $Ti_3SiC_2$ which synthesized below $1400^{\circ}C$. The sintering density of bulk $Ti_3SiC_2$ were varied with the amount of TiCx. It was found that the mechanical properties and micro structures of bulk $Ti_3SiC_2$ were closely related to the amounts of TiCx which was controlled by the hot pressing temperature. The TiCx increase the flexural strength of bulk $Ti_3SiC_2$, while the fracture toughness and thermal shock resistance of bulk $Ti_3SiC_2$ were decreased with the content of TiCx. The plastic deformations of bulk $Ti_3SiC_2$ were appeared above $1000^{\circ}C$.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.396-400
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• 2003

A new synthesis process for nano laminating Ti$_3$SiC$_2$ has been developed using TiCx (x=0.67) and Si powder as starting materials by a reaction hot pressing. Bulk Ti$_3$SiC$_2$ was fabricated using a green body consisting of TiCx and Si by a hot pressing under the pressures of 25 MPa at 1420-1550 $^{\circ}C$ for 90 min. The synthesized Ti$_3$SiC$_2$ was consisting of only TiCx and Ti$_3$SiC$_2$. The relative density of sintered bulk Ti$_3$SiC$_2$ was increased as the hot pressing temperature was increased, which was mainly due to the increase in TiCx contents in synthesized Ti$_3$SiC$_2$. The synthesized Ti$_3$SiC$_2$ bulk was consisted of nano sized lamella structure of 20-100 nm in thickness. It was found that TiCx particles in Ti$_3$SiC$_2$ would increase the 3-point bending strength of synthesized Ti$_3$SiC$_2$ bulk. The maximum 3-P. bending strength of synthesized Ti$_3$SiC$_2$ bulk was more than 800 MPa. The Vickers hardness of synthesized Ti$_3$SiC$_2$bulk was as low as 5 Gpa, which was decreased with the indentation load. The quasi-plastic deformation behaviors were observed around indentation mark on Ti$_3$SiC$_2$.

• Journal of Welding and Joining
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• 제14권4호
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• pp.99-108
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• 1996

The microstructure and bond strength are examined on the SiC/SiC and SiC/mild steel joints brazed by the Ag-Ti based alloys with different Ti contents. In the SiC/SiC brazed joints, the thickness of the reaction layers at the bond interface and the Ti particles in the brazing alloy matrices increase with Ti contents. When Ti is added up to 9 at% in the brazing alloy. $Ti_3SiC_2$ phase in addition to TiC and $Ti_5Si_3$ phase is newly created at the bond interface and TiAg phase is produced from peritectic reaction in the brazing alloy matrix. In the SiC/mild steel joints brazed with different Ti contents, the microstructure at the bond interface and in the brazing alloy matrix near SiC varies similarly to the case of SiC/SiC brazed joints. But, in the brazing alloy matrix near the mild steel, Fe-Ti intermetallic compounds are produced and increased with Ti contents. The bond strengths of the SiC/SiC and SiC/mild steel brazed joints are independent on Ti contents in the brazing alloy. There are no large differences of the bond strength between SiC/SiC and SiC/mild steel brazed joints. In the SiC/mild steel brazed joints, Fe dissolved from the mild steel does not affect on the bond strength of the joints. Thermal contraction of the mild steel has nearly no effects on the bond strength due to the wide brazing gap of specimens used in the four-point bend test. The brazed joints has the average bond strength of about 200 MPa independently on Ti contents, Fe dissolution and joint type. Fracture in four-point bend test initiates at the interface between SiC and TiC reaction layer and propagates through SiC bulk. The adhesive strength between SiC and TiC reaction layer seems to mainly control the bond strength of the brazed joints.

• 한국세라믹학회지
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• 제43권8호
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• pp.486-491
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• 2006

A new $TiN-Ti_5Si_3$ bulk composite was synthesized from preceramic, inorganic polymer (methylpolysilsesquioxane) and $TiH_2$ filler powders via polymer pyrolysis. Using this process, ceramics with high melting points can be produced relatively easily to a near net shape. The $TiN-Ti_5Si_3$ composite oxidized slowly during heating to $1000^{\circ}C$. During heating at the temperatures of at 700 and $800^{\circ}C$, TiN oxidized to Rutile-$TiO_2$ whereas $Ti_5Si_3$ resisted to oxidation. The oxide scale formed consisted primarily of $TiO_2$ containing $Ti_5Si_3$.

• 한국세라믹학회지
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• 제31권12호
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• pp.1545-1551
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• 1994

Various kinetic parameters of the nucleation and crystallization in anorthite glass (CaO.Al2O3.2SiO2) were calculated by nonisothermal differential thermal analysis. Base glass and glass with TiO2 were prepared by melting. In base glass, the temperature where nucleation can occur ranges from 85$0^{\circ}C$ to 9$25^{\circ}C$ and the temperature for maximum nucleation was 900$\pm$5$^{\circ}C$. In glass with TiO2, the nucleation temperature range was 800~875$^{\circ}C$ and the maximum nucleation temperature was 850$\pm$5$^{\circ}C$. Kissinger equation, Bansal equation, and modified Ozawa equation were used for calculating activation energy for crystallization, Ec. The results showed the same activation energies for both glasses with and without TiO2 in the different equations. The shape of maximum exotherm peak and Ozawa equation were used for Avrami exponent, n. The n value for each glass was 2, indicating that each glass crystallized primarily by bulk crystallization.

• 마이크로전자및패키징학회지
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• 제11권3호
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• pp.91-97
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• 2004

PZT 박막을 rf-마그네트론 스퍼터링으로 $Pt/Ti/SiO_2/Si$ 기판 위에 형성시켰다. $5\%$ 과잉 PbO 를 포함한 bulk PZT 타겟을 사용하였다. 상온에서 PZT 박막을 얇게 입힌 후 나머지 두께를 $650^{\circ}C$에서 in-situ 방법으로 형성시켰다. 강유전 특성을 갖는 PZT 상은 $650^{\circ}C$에서 형성되었다. 2단계 스퍼터링에 의해 누설전류 특성을 크게 증진시킬 수 있었고, 적절한 두께의 상온층을 포함시킨 경우 $2{\times}10^{-7}A/cm^2$의 매우 작은 누설전류를 나타냈다. 누설전류 기구에 대한 조사 결과, 여러 조건에서 제조된 PZT 박막의 전기전도는 모두 bulk-limit 기구에 의한 것임을 알 수 있었다.

• 한국세라믹학회지
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• 제26권6호
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• pp.829-835
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• 1989

Devitrifing solder glasses in a specific group of glass ceramic materials are extensively used in hermetically sealing alumina electronics packages. Preferred frit glass compositions of this study consist of 37~40wt% PbO, 35~40wt% ZnO, 18~20wt% B2O3, 1~3wt% SiO2, 0~6wt% TiO2. The coated frit glasses crystallize during firing and form a strong hermetic seal. DTA and X-ray diffraction were used to characterize crystallization of the glass frit. Frit seal containing 2wt% TiO2 has crystallization temperature of 550~57$0^{\circ}C$ with surface nucleation. Frit seal containing 6wt% TiO2 has crystallization temperature of 515~5$25^{\circ}C$ with bulk nucleation, and the main crystalline phase was perovskite lead titanate having minus expansion coefficient. The average activation energy for the crystallization calculated from Ozawa equation was 65$\pm$10kcal/mol.

• 한국진공학회지
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• 제9권1호
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• pp.16-23
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• 2000

The epitaxial growth of $CeO_2$ films has been investigated on three different substrates-Si(111), $SrTiO_3$(001), and MgO(001)-over wide range of growth parameters using oxygen-plasma-assisted molecular beam epitaxy. Pure-phase, single-crystalline epitaxial films of $CeO_2$ (001) have been grown only on $SrTiO_3$(001). We discuss the growth conditions in conjunction with the choice of substrates required to synthe-size this oxide, as well as the associated characterization by menas of x-ray diffraction, reflection high-energy electron diffraction, low-energy electron diffraction, and x-ray photoelectron spectroscopy and diffraction. Successful growth of single crystalline $CeO_2$ depends critically on the choice of substrate and is rather insensitive to the growth conditions studied in this investigation. $CeO_2$(001) films on $SrTiO_3$exhibit the sturcture of bulk $CeO_2$ without surface reconstructions. Ti outdiffusion is observed on the films grown temperatures above $650^{\circ}C$.

• 한국결정성장학회지
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• 제3권2호
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• pp.176-184
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• 1993

$Li_2O-Al_2O_3-SiO_2$계 유리조성에서, 특히 주결정상으로 $\beta$-spodumene을 석출시킬 수 있는 조성영역에서 $P_2O_5, TiO_2, ZrO_2$ 등을 첨가하여 용융한 후 소결법을 이용하여 이론밀도에 가까운 결정화 유리를 만들기 위한 최적 열처리 조건, 유리 분말의 입도 변화에 따란 영향과 그 때의 물성을 시차열분석, X-선 회절분석, 비중 측정, 열팽창 측정, 전자현미경 관찰 등을 통하여 연구하였다. $P_2O_5$를 첨가하여 소결법으로 결정화할 때 소결을 증진시키는 효과가 있었으며 9wt% 첨가한 경우가 가장 치밀한 것으로 나타났다. 최적의 열처리 조건은 $740^{\circ}C$에서 소결하여 치밀화를 시키고$ 950^{\circ}C$에서 결정화를 시켰을 때로서 상대밀도는 90% 이상이었으며 열팽창계수는 $-1{\times}10^{-7}/^{\circ}C$ 정도로서 부팽창인 것으로 나타났다.

• Macromolecular Research
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• 제17권5호
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• pp.346-351
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• 2009

$TiCl(O-i-Pr)_3/SiO_2$ and $Ti(O-i-Pr)_4/SiO_2$ were prepared by immobilizing chlorotitanium (IV) isopropoxide ($TiCl(O-i-Pr)_3$) and titanium (IV) isopropoxide ($Ti(O-i-Pr)_4$), to pretreated silica. The effect of the polymerization reaction conditions on the catalytic activity and characteristics of the resulting PLA were investigated. The catalytic conversion, molecular weight and polydispersity index (PDI) of the PLA produced on the titanium alkoxide supported catalysts increased proportionally with the reaction temperature. When the PLA was synthesized in bulk polymerization, the PLA produced with the supported catalysts had higher molecular weight than those with homogeneous catalysts. The melting temperature of the polymer produced with silica supported alkoxide catalysts was approximately $170-180^{\circ}C$.