• Title/Summary/Keyword: Buffer-layer

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Integration of Ba0.5Sr0.5TiO3Epitaxial Thin Films on Si Substrates and their Dielectric Properties (Si기판 위에 Ba0.5Sr0.5TiO3 산화물 에피 박막의 집적화 및 박막의 유전 특성에 관한 연구)

  • Kim, Eun-Mi;Moon, Jong-Ha;Lee, Won-Jae;Kim, Jin-Hyeok
    • Journal of the Korean Ceramic Society
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    • v.43 no.6 s.289
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    • pp.362-368
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    • 2006
  • Epitaxial $Ba_{0.5}Sr_{0.5}TiO_3$ (BSTO) thin films have been grown on TiN buffered Si (001) substrates by Pulsed Laser Deposition (PLD) method and the effects of substrate temperature and oxygen partial pressure during the deposition on their dielectric properties and crystallinity were investigated. The crystal orientation, epitaxy nature, and microstructure of oxide thin films were investigated using X-Ray Diffraction (XRD) and Transmission Electron Microscopy (TEM). Thin films were prepared with laser fluence of $4.2\;J/cm^2\;and\;3\;J/cm^2$, repetition rate of 8 Hz and 10 Hz, substrate temperatures of $700^{\circ}C$ and ranging from $350^{\circ}C\;to\;700^{\circ}C$ for TiN and oxide respectively. BSTO thin-films were grown on TiN-buffered Si substrates at various oxygen partial pressure ranging from $1{\times}10^{-4}$ torr to $1{\times}10^{-5}$ torr. The TiN buffer layer and BSTO thin films were grown with cube-on-cube epitaxial orientation relationship of $[110](001)_{BSTO}{\parallel}[110](001)_{TiN}{\parallel}[110](001)_{Si}$. The crystallinity of BSTO thin films was improved with increasing substrate temperature. C-axis lattice parameters of BSTO thin films, calculated from XRD ${\theta}-2{\theta}$ scans, decreased from 0.408 m to 0.404 nm and the dielectric constants of BSTO epitaxial thin films increased from 440 to 938 with increasing processing oxygen partial pressure.

Process of Hairpin Vortex Packet Generation in Channel Flows (채널 유동 내에서 헤어핀 보텍스 패킷의 형성 과정)

  • Kim, Kyoung-Youn
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.36 no.8
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    • pp.839-847
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    • 2012
  • Numerical simulations for channel flows with $Re_{\tau}$ = 180, 395 and 590 have been performed to investigate the hairpin packet formation process in wall-bounded turbulent flows. Using direct numerical simulation databases, the initial flow fields are given by the conditionally averaged flow field with the second quadrant event specified at the buffer layer. By tracking the initial vortex development, the change in the initial vortex to an ${\Omega}$-shaped vortex and th generation of a secondary hairpin vortex were found to occur with time scales based on the wall units. In addition, at the time when the initial vortex has grown to the channel center, the inclination angle of the hairpin vortex packet is approximately $12{\sim}14^{\circ}$, which is similar for all three Reynolds numbers. Finally, numerical simulations of the evolution of two adjacent hairpin vortices have been performed to examine the interaction between the adjacent vortex packets.

Formation of GaAs buffer grown on Germanium by the growth condition of GaAs seed layer

  • Yu, So-Yeong;Kim, Hyo-Jin;Ryu, Sang-Wan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.222-222
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    • 2010
  • III-V반도체 태양전지는 다양한 에너지 밴드갭을 만들 수 있으며 다중접합 태양전지의 경우 흡수 전류가 커져 효율이 증가한다. 태양전지의 효율의 증가는 태양광 발전시스템의 발전 단가를 낮추는 중요한 요인이다. 우리는 효율이 높은 III-V 태양전지를 제작하기 위해 일차적으로 Ge기판 위에 GaAs를 성장하고자 한다. Ge기판과 GaAs의 격자상수는 0.07%차이로 거의 일치하나 물질의 열팽창계수가 다르고 비극성인 Ge기판 위에 극성인 GaAs를 성장 시 위상불일치(Anti Phase Domain) 나타난다. 위상불일치 현상을 줄이기 위해 성장 시 온도와 V/III비율, 성장두께 등을 달리하여 성장한다. 표면의 상태가 좋아질수록 위상불일치 현상이 작으며 단일성장 보다 두 단계 과정으로 성장 했을 때 표면의 상태가 더 좋은 결과를 바탕으로[1], 20nm 이하로 얇게 seed층을 성장하고 그 위에 두꺼운 버퍼층을 성장하는 두 단계로 진행하였다. seed층의 성장온도는 $400{\sim}550^{\circ}C$, V/III 비율을 3.5~30으로 다양하게 바꿔가면서 표면의 상태를 비교하였다. 이때 버퍼층의 성장 온도와 V/III 비율은 $680^{\circ}C$, 192으로 일정하게 유지하였다. 표면은 SEM과 AFM을 통해 분석하였으며 결정질의 상태는 XRD 장비(Panalytical사)로 분석하고 광학적 특성은 LTPL(Accent Optical Technologies사)로 측정하였다. 실험의 결과는 seed층의 온도가 낮고 V/III 비율이 낮으며 성장률이 높았을 때 표면상태가 좋은 반면 버퍼층은 온도가 높고 V/III 비율이 높으며 성장률이 낮을 때 표면상태가 좋았다. seed층을 $450^{\circ}C$온도에서 V/III 비율이 3.5이고 성장률이 버퍼층에 비교하여 크게 하여 성장 했을 때 표면 거칠기가 3.75nm로 작아 표면의 상태가 좋음을 확인할 수 있었다. 두 단계 성장 시 표면의 상태는 seed층의 조건에 따라 결정됨을 알 수 있었다. 표면상태가 좋았을 때 결정상태 역시 좋았으며 성장률이 바뀜에 따라 반치폭이 42~45 arcsec의 값을 나타내었다. 광학적 특성은 10K에서 1.1512eV 밴드갭 에너지를 가지고 있어 양질의 GaAs가 성장됨을 알 수 있다.

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Bi-axial texture analysis of Ni substrate for superconducting coated conductor using R2R XRD (R2R XRD를 이용한 초전도박막선재용 기판의 이축배향 특성 분석)

  • Ha, Hong-Soo;Yang, Ju-Saeng;Kim, Ho-Sup;Ko, Rock-Kil;Song, Kyu-Jung;Ha, Dong-Woo;Oh, Sang-Soo;Joo, Jin-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.22-23
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    • 2005
  • In order to increase the critical current of coated conductor, highly Bi-axially textured substrates are required. Texture uniformity of substrate is also important to fabricate high quality superconducting coated conductor because the amount of current flow along the coated conductor is limited by the defects such as bad textured area. Therefore, we need to evaluate the distribution of texture of Ni substrate along the length before buffer layer deposition on Ni tape. R2R(reel-to-reel) XRD system was used to measure the texture of long Ni substrate continuously. $\theta-2\theta$ scan of 10 m long Ni tape was measured and indicates that some of Ni(111) planes equally remain on Ni(002) textured substrate. The results of continuous Ni(220) $\Phi$-scan indicate that average FWHM is 9$^{\circ}$ within $\pm$1.

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Landscape Design for the Rural Village - A Case Study of Naegokri, Yeohang-myeon, Haman-gun - (조경식재를 통한 농촌마을 경관조성에 관한 연구 - 함안군 여항면 내곡리를 사례로 -)

  • Kim, Sang-Bum;Lee, Seung-Joo;Rhee, Sang-Young
    • Journal of Korean Society of Rural Planning
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    • v.14 no.1
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    • pp.59-71
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    • 2008
  • The landscape commonly refers to the appearance of the land, including its shape, texture, and colours. Among many factors contributing to the landscape, tree and plants factors playa significant role in rural landscape as a colours. Therefore the rural traditional theme village where had been designated under the rural traditional theme village since 2007 in Naegok-ri, Eohang-myeon, Haman-gun has planned to design the tree plant planning for creating a unique rural landscape. The landscape proposal for the new Rural Village in Naegokri, Yeohang-myeon, Haman-gun suggests three main strategies; 1) The riverside area and reservoir area adjoined forest was required to be prepared to offer organization waterside landscape and forest landscape through landscape planting and selecting trees i.e. able to reflect sense of the season that promote high quality values of landscape area in rural. 2) The area adjoined stable was required to strengthen the screen planting and buffer planting with multiple plant layer structure and trees of branches and leaves closeness, shrubs of beauty flowers in order to improve disamenity landscape and odours. 3) The rural traditional theme village adjoined entrance was required to open space such as multipurpose garden, specialized or themed garden which include Landmark factors and prepared to the space with the various theme and visual diversity in order to take charge of function as landmark characteristic in Naegok-ri, Eohang-myeon, Haman-gun, and so on. In conclusion, this winning principal purpose of this study is applied to basic tree plant model for sustainable rural landscape creation in rural areas by selecting beautiful landscape plants and the tree plant planning.

Preparation of $Yb_2O_3$ Film by MOCVD Method (MOCVD 공정을 이용한 $Yb_2O_3$ 박막 제조)

  • Jung, Woo-Young;Jun, Byung-Hyuk;Park, Hai-Woong;Hong, Gye-Won;Kim, Chan-Joong
    • Progress in Superconductivity
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    • v.8 no.1
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    • pp.75-80
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    • 2006
  • [ $Yb_2O_3$ ] films were successfully deposited on a cube-textured Ni and(100) $SrTiO_3$(STO) single crystal substrates by metal organic chemical vapor deposition(MOCVD) method using $H_2O$ vapor as an oxidant. $H_2O$ vapor was used in order to avoid the oxidation of Ni substrate. The working pressure and Ar flow rate were 10 Ton and 600 sccm, respectively. $Yb_2O_3$ films on STO were formed at high temperatures above $900^{\circ}C$. While XRD peaks from $Yb_2O_3$ were hardly detected at $900^{\circ}C$, the $Yb_2O_3$(400) texture was developed fur the films grown at deposition temperatures above $950^{\circ}C$. The AEM surface roughness of $Yb_2O_3$ film, grown on STO, was in the range of $6{\sim}10nm$ for the film deposited at $950^{\circ}C$ with a $H_2O$ vapor partial pressure of 5.5 Ton and deposition times of 3 and 5 mins. For cube-textured Ni substrate, both $Yb_2O_3$(222) and $Yb_2O_3$ (400) textures were developed textures at deposition temperatures above $850^{\circ}C$.

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Growth of HgCdTe thin film by the hot-wall epitaxy method (Hot-wall epitaxy 방법에 의한 HgCdTe 박막 성장)

  • 최규상;정태수
    • Journal of the Korean Vacuum Society
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    • v.9 no.4
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    • pp.406-410
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    • 2000
  • Using the hot-wall epitaxy method, we grew a $Hg_{1-x}Cd_xTe$ (MCT) thin film in-situ after growing (111) CdTe of 9 $mu \textrm{m}$ as a buffer layer. The value of FWHM of double crystal x-ray diffraction rocking curve was 125 arcsec and the surface morphology was clean with a small roughness of 10 nm. From measuring the photocurrent of the grown MCT thin film, the maximum peak wavelength and the cut-off wavelength were 1.1050 $\mu\textrm{m}$ (1.1220 eV) and 1.2632 $\mu\textrm{m}$ (0.9815 eV), respectively. This peak wavelength corresponds to the peak of the band gap due to the intrinsic transition of the photoconductor. Therefore, the MCT thin film could be used as the photoconducting detector sensing a near-IR wavelength band from 1.0 to 1.6 $\mu\textrm{m}$.

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Deposition of $MgB_2$ Thin Films on Alumina-Buffered Si Substrates by using Hybrid Physical-Chemical Vapor Deposition Method (혼성물리화학기상 증착법에 의한 알루미나 완충층을 가진 실리콘 기판 위의 $MgB_2$ 박막제조에 대한 연구)

  • Lee, T.G.;Park, S.W.;Seong, W.K.;Huh, J.Y.;Jung, S.G.;Lee, B.K.;An, K.S.;Kang, W.N.
    • Progress in Superconductivity
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    • v.9 no.2
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    • pp.177-182
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    • 2008
  • [ $MgB_2$ ] thin films were fabricated using hybrid physical-chemical vapor deposition (HPCVD) method on silicon substrates with buffers of alumina grown by using atomic layer deposition method. The growth war in a range of temperatures $500\;{\sim}\;600^{\circ}C$ and under the reactor pressures of $25\;{\sim}\;50\;Torr$. There are some interfacial reactions in the as-grown films with impurities of mostly $Mg_2Si$, $MgAl_2O_4$, and other phases. The $T_c$'s of $MgB_2$ films were observed to be as high as 39 K, but the transition widths were increased with growth temperatures. The magnetization was measured as a function of temperature down to the temperature of 5 K, but the complete Meissner effect was not observed, which shows that the granular nature of weak links is prevailing. The formation of mostly $Mg_2Si$ impurity in HPCVD process is discussed, considering the diffusion and reaction of Mg vapor with silicon substrates.

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Eligibility of Fluoride Ion as A Tracer of Wastewaters and Distribution of Fluoride in Jinhae Bay (해수오염원추적자로서의 플루오르화물이온 및 진해만의 플루오르화물이온농도분포)

  • Won, Jong Hun;Park, Kil Soon
    • 한국해양학회지
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    • v.8 no.1
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    • pp.9-21
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    • 1973
  • When industrial wastewater containing fluoride runs into the ocean, approximately 0.1ppm of F$\^$-/ will react with seawater and will be eventually lost, and the remaining F$\^$-/ can be determined withe the ALC. Therefore F$\^$-/ is eligible to be used as a tracer of pollutant which contains fluoride. Determination of F$\^$-/ in the seawater with the Dotite reagent, Alfusone, has been made by the following method: To 10 ml of water sample, 1 ml of buffer solution (pH=4.0), 8 ml of acetone, and 1ml of 10% Alfusone were added and diluted to 25ml with distilled water. After 20 minutes the absorbance at 620 nm against a reagent blank was measured. The distributions of F$\^$-/ in Jinhae Bay has been made on the basis of water samples collected from 103 different sampling stations occupied in Jinhae Bay. The water samplings, three in the spring tide and two in the neap tide, were taken from surface layer during the flood and ebb tide periods respectively. The average concentration of F$\^$-/ in the bay, except the area to which the wastewater runs off from the Chemical plant, was 1.45 ppm(1.07-6.33ppm), and that of F$\^$-/ in the plant effluent was 330ppm, occasionally up to 562 ppm. Thus high levels of F$\^$-/ in the bay are strongly correlated to the amount of effluent from the plant, and waters of Jinhae Bay contains at least 0.13% of the plant effluent.

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Thickness Dependence of $SiO_2$ Buffer Layer with the Device Instability of the Amorphous InGaZnO pseudo-MOSFET

  • Lee, Se-Won;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.170-170
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    • 2012
  • 최근 주목받고 있는 amorphous InGaZnO (a-IGZO) thin film transistors (TFTs)는 수소가 첨가된 비정질 실리콘 TFT (a-Si;H)에 비해 비정질 상태에서도 높은 이동도와 뛰어난 전기적, 광학적 특성에 의해 큰 주목을 받고 있다. 또한 넓은 밴드갭에 의해 가시광 영역에서 투명한 특성을 보이고, 플라스틱 기판 위에서 구부러지는 성질에 의해 플랫 패널 디스플레이나 능동 유기 발광 소자 (AM-OLED), 투명 디스플레이에 응용되고 있다. 하지만, 실제 디스플레이가 동작하는 동안 스위칭 TFT는 백라이트 또는 외부에서 들어오는 빛에 지속적으로 노출되게 되고, 이 빛에 의해서 TFT 소자의 신뢰성에 악영향을 끼친다. 또한, 디스플레이가 장시간 동안 동작 하면 내부 온도가 상승하게 되고 이에 따른 온도에 의한 신뢰성 문제도 동시에 고려되어야 한다. 특히, 실제 AM-LCD에서 스위칭 TFT는 양의 게이트 전압보다 음의 게이트 전압에 의해서 약 500 배 가량 더 긴 시간의 스트레스를 받기 때문에 음의 게이트 전압에 대한 신뢰성 평가는 대단히 중요한 이슈이다. 스트레스에 의한 문턱 전압의 변화는 게이트 절연막과 반도체 채널 사이의 계면 또는 게이트 절연막의 벌크 트랩에 의한 것으로 게이트 절연막의 선택에 따라서 신뢰성을 효과적으로 개선시킬 수 있다. 본 연구에서는 적층된 $Si_3N_4/SiO_2$ (NO 구조) 이중층 구조를 게이트 절연막으로 사용하고, 완충층의 역할을 하는 $SiO_2$막의 두께에 따른 소자의 전기적 특성 및 신뢰성을 평가하였다. a-IGZO TFT 소자의 전기적 특성과 신뢰성 평가를 위하여 간단한 구조의 pseudo-MOS field effect transistor (${\Psi}$-MOSFET) 방법을 이용하였다. 제작된 소자의 최적화된 $SiO_2$ 완충층의 두께는 20 nm이고 $12.3cm^2/V{\cdot}s$의 유효 전계 이동도, 148 mV/dec의 subthreshold swing, $4.52{\times}10^{11}cm^{-2}$의 계면 트랩, negative bias illumination stress에서 1.23 V의 문턱 전압 변화율, negative bias temperature illumination stress에서 2.06 V의 문턱 전압 변화율을 보여 뛰어난 전기적, 신뢰성 특성을 확인하였다.

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