• Title/Summary/Keyword: Bias pumping

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A Ka-band Harmonic Miter Design Using Multiplier Theory (체배기 이론을 이용한 Ka-대역 고조파 믹서 설계)

  • Go Min-Ho;Kang Suk-Youb;Park Hyo-Dal
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.30 no.11A
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    • pp.1104-1109
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    • 2005
  • In this paper, a Ka-band harmonic mixer is designed and fabricated on the base of the multiplier theory that there is a bias point to maximize the third harmonic order($3f_{LO}$) with respect to a fundamental LO frequency($f_{LO}$), which can make the high-order mixing element($f_{RF}{\pm}3f_{LO}$) to be greater than other mixing elements, Pumping a RF frequency($f_{RF}$) and LO frequency($f_{LO}$). The harmonic mixer by the proposed design method is fabricated by using a commercial GaAs MESFET device with a plastic package and overcome these disadvantages that a conventional mixer in Ka-band suffer from a high cost, inefficient productivity and circuit complexity. The harmonic mixer have a -10 dB conversion loss at the IF Sequency($3f_{LO}-f_{RF}$=1.0GHz) by selecting a gate bias voltage for the maximum third-order LO harmonic element($3f_{LO}$=34.5 GHz) as pumping LO frequency($f_{LO}$=11.5 GHz) With respect to RF Sequency ($f_{RF}$=33.5GHz)

Effects of Breastfeeding Interventions Program on Breastfeeding for Premature babies: A Systematic Review and Meta-analysis (미숙아를 위한 모유수유 중재 프로그램의 효과: 체계적 문헌고찰과 메타분석)

  • Lee, Ju Yeon;No, Se Hee
    • Korean Parent-Child Health Journal
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    • v.21 no.1
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    • pp.50-60
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    • 2018
  • Purpose: This study is a systematic literature review and meta-analysis study conducted to identify the effects of breastfeeding intervention program on premature infants by integrating and analyzing the results of randomized controlled trials and non-randomized trials. Methods: The literature review process was based on the PRISMA (Preference Reporting Items for Systematic Reviews and Meta-Analyzes) guideline. Data retrieval and collection were conducted from May 25 to May 30, 2018, and the articles analyzed were all domestic papers retrieved from the database. Two reviewers independently select the studies and assessed methodological risk of bias of studies using the Cochrane criteria. The topics of breastfeeding interventions were analyzed using descriptive analysis and the effects of intervention were meta-analyzed using the R program. Results: Finally, eight papers were included in the systematic review and meta-analysis. The breastfeeding intervention program for premature infants showed a significant increase in the self-efficacy and the amount of pumping and baby's hight. Conclusion: This study has some limitations due to the few randomized controlled trials and non-randomized trials comparing breastfeeding for premature babies in Korea. Therefore, it needs to be integrated with the research conducted in other countries.

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The Properties of RF Sputtered Zinc Tin Oxide Thin Film Transistors at Different Sputtering Pressure (스퍼터 증착된 Zinc Tin Oxide 박막 트랜지스터의 공정 압력에 따른 특성 연구)

  • Lee, Hong Woo;Yang, Bong Seob;Oh, Seungha;Kim, Yoon Jang;Kim, Hyeong Joon
    • Journal of the Semiconductor & Display Technology
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    • v.13 no.1
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    • pp.43-49
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    • 2014
  • Zinc-tin oxides (ZTO) thin film transistors have been fabricated at different process pressure via re sputtering technique. TFT properties were improved by depositing channel layers at lower pressure. From the analysis of TFTs comprised of multi layer channel, deposited consecutively at different sputtering pressure, it was suggested that the electrical characteristics of TFTs were mainly affected by interfacial layer due to their high conductance, however, the stability under the NBIS condition was influenced by whole bulk layer due to low concentration of positive charges, which might be generated by the oxygen vacancy transition, from Vo0 to $Vo^{2+}$. Those improvements were attributed to increasing sputtered target atoms and decreasing harmful effects of oxygen molecules by adopting low sputtering pressure condition.

Electrical Property Changes of $\textrm{NO}_X$ Sensitive $\textrm{WO}_3$ Thin Films as Applied DC Voltages on 8YSZ Substrate (8YSZ 기판에 증착한 $\textrm{WO}_3$ 박막의 DC 전압에 따른 $\textrm{NO}_X$ 감지특성)

  • 전춘배;박기철
    • Journal of the Korean Institute of Telematics and Electronics T
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    • v.36T no.1
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    • pp.8-12
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    • 1999
  • $\textrm{WO}_3$ semiconductive film, which is known to have a sensitivity on $\textrm{NO}_X$ gas was prepared on 8YSZ (8% Yttria stabilized $\textrm{ZrO}_2$) ionic conductor substrate that has oxygen ion pumping effect. Microstructure and electrical properity, especially $\textrm{NO}_X$ sensitivity as a function of DC voltage applied to 8YSZ substrate was examined. When the $\textrm{WO}_3$ film was annealed, it showed amorphous structure, while crystallization was occurred at $600^{\circ}$C revealing orthorhombic phase of $\textrm{WO}_3$. As the annealing temperature increases, (111) and (001) peaks of $\textrm{WO}_3$ film was enhanced. At $400^{\circ}C$ when DC voltage was applied, comparing with no DC bias, more stable and large response characteristics was showed, and the best sensitivity was observed at 2V. Recovery characteristics of NO gas was much better that that of $\textrm{NO}_2$ gas.

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A New Third-Order Harmonic Mixer Design for Microwave Airborne Radar (항공용 레이다의 3차 고조파 믹서 설계에 대한 연구)

  • Go, Min-Ho;Kang, Se-Byeok
    • The Journal of the Korea institute of electronic communication sciences
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    • v.15 no.5
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    • pp.827-834
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    • 2020
  • In this paper, a third-order harmonic mixer is designed using frequency multiplier theory for the microwave airborne radar. Unlike the basic mixer design method, the gate bias voltage, at which the third-harmonic component of the Local frequency (LO) is the maximum, is selected using a frequency multiplier theory to maximize the third-harmonic mixing component at the intermediate frequency (IF). The proposed harmonic mixer was designed and manufactured using a commercial GaAs MESFET device in a plastic package, and it was possible to improve the high conversion loss, circuit complexity, high cost, and manufacturing complexity of the existing microwave mixer. The harmonic mixer using the proposed design method has a -8 ~ -10 dB conversion loss by pumping 11.5 GHz LO with a +5 dBm level when operating from 33.0 GHz to 36.0 GHz and the 1-dB gain compression point (P1dB) of 0 dBm.

The Study on the Confidence Building for Evaluation Methods of a Fracture System and Its Hydraulic Conductivity (단열체계 및 수리전도도의 해석신뢰도 향상을 위한 평가방법 연구)

  • Cho Sung-Il;Kim Chun-Soo;Bae Dae-Seok;Kim Kyung-Su;Song Moo-Young
    • The Journal of Engineering Geology
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    • v.15 no.2 s.42
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    • pp.213-227
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    • 2005
  • This study aims to assess the problems with investigation method and to suggest the complementary solutions by comparing the predicted data from surface investigation with the outcome data from underground cavern. In the study area, one(NE-1) of 6 fracture zones predicted during the surface investigation was only confirmed in underground caverns. Therefore, it is necessary to improve the confidence level for prediction. In this study, the fracture classification criteria was quantitatively suggested on the basis of the BHTV images of NE-1 fracture zone. The major orientation of background fractures in rock mass was changed at the depth of the storage cavern, the length and intensity were decreased. These characteristics result in the deviation of predieted predicted fracture properties and generate the investigation bias depending on the bore hole directions and investigated scales. The evaluation of hydraulic connectivity in the surface investigation stage needs to be analyze by the groundwater pressures and hydrochemical properties from the monitoring bore hole(s) equipped with a double completion or multi-packer system during the test bore hole is pumping or injecting. The hydraulic conductivities in geometric mean measured in the underground caverns are 2-3 times lower than those from the surface and furthermore the horizontal hydraulic conductivity in geometric mean is six times lower than the vertical one. To improve confidence level of the hydraulic conductivity, the orientation of test hole should be considered during the analysis of the hydraulic conductivity and the methodology of hydro-testing and interpretation should be based on the characteristics of rock mass and investigation purposes.

Dry etching of polycarbonate using O2/SF6, O2/N2 and O2/CH4 plasmas (O2/SF6, O2/N2와 O2/CH4 플라즈마를 이용한 폴리카보네이트 건식 식각)

  • Joo, Y.W.;Park, Y.H.;Noh, H.S.;Kim, J.K.;Lee, S.H.;Cho, G.S.;Song, H.J.;Jeon, M.H.;Lee, J.W.
    • Journal of the Korean Vacuum Society
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    • v.17 no.1
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    • pp.16-22
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    • 2008
  • We studied plasma etching of polycarbonate in $O_2/SF_6$, $O_2/N_2$ and $O_2/CH_4$. A capacitively coupled plasma system was employed for the research. For patterning, we used a photolithography method with UV exposure after coating a photoresist on the polycarbonate. Main variables in the experiment were the mixing ratio of $O_2$ and other gases, and RF chuck power. Especially, we used only a mechanical pump for in order to operate the system. The chamber pressure was fixed at 100 mTorr. All of surface profilometry, atomic force microscopy and scanning electron microscopy were used for characterization of the etched polycarbonate samples. According to the results, $O_2/SF_6$ plasmas gave the higher etch rate of the polycarbonate than pure $O_2$ and $SF_6$ plasmas. For example, with maintaining 100W RF chuck power and 100 mTorr chamber pressure, 20 sccm $O_2$ plasma provided about $0.4{\mu}m$/min of polycarbonate etch rate and 20 sccm $SF_6$ produced only $0.2{\mu}m$/min. However, the mixed plasma of 60 % $O_2$ and 40 % $SF_6$ gas flow rate generated about $0.56{\mu}m$ with even low -DC bias induced compared to that of $O_2$. More addition of $SF_6$ to the mixture reduced etch of polycarbonate. The surface roughness of etched polycarbonate was roughed about 3 times worse measured by atomic force microscopy. However examination with scanning electron microscopy indicated that the surface was comparable to that of photoresist. Increase of RF chuck power raised -DC bias on the chuck and etch rate of polycarbonate almost linearly. The etch selectivity of polycarbonate to photoresist was about 1:1. The meaning of these results was that the simple capacitively coupled plasma system can be used to make a microstructure on polymer with $O_2/SF_6$ plasmas. This result can be applied to plasma processing of other polymers.