• Title/Summary/Keyword: Bi-materials

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Microwave Dielectric Properties in Bi-Substituted BaO.$Nd_{2}O_{3}$.$4TiO_{2}$ (Bi 가 치환된 BaO.$Nd_{2}O_{3}$.$4TiO_{2}$ 세라믹스의 마이트로파 유전특성)

  • Cheon, Jae-Il;Kim, Jeong-SeoG
    • Korean Journal of Materials Research
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    • v.8 no.7
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    • pp.659-663
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    • 1998
  • The effect of Bi-substitution in $BaO.(Nd_{1-x}Bi_x)_2O_3.4TiO_2$ ceramic was studied on the formation of crystal phases, microstructure, and microwave dielectric properties. $BaO.(Nd_{1-x}Bi_x)_2O_3.4TiO_2$, solid solution (0$\leq$x$\leq$0.2) were formed by Bi-substitution into the Nd site of $BaO.(Nd_{1-x}Bi_x)_2O_3.4TiO_2$ ceramics. Average grain size increased with Bi-substitution. Dielectric constant(${\varepsilon}_r$) increased from 84 to U8, and the temperature coefficient of resonant frequency(${\tau}_f$) decreased from 44 ppm/$^{\circ}C$ to -30 ppm/$^{\circ}C$ when Bi contents increased up to x=0.2 in $BaO.(Nd_{1-x}Bi_x)_2O_3.4TiO_2$ solid solutions. $BaO.(Nd_{1-x}Bi_x)_2O_3.4TiO_2$ solid solutions with x=0.04~0.08 showed the most superior microwave dielectric properties, those are ${\varepsilon}_r$= 89-92, Q . f = 5855~6091 GHz, and (${\tau}_f$)= -7.5-7.5 ppm/$^{\circ}C$.

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Effect of Sn Decorated MWCNT Particle on Microstructures and Bonding Strengths of the OSP Surface Finished FR-4 Components Assembled with Sn58%Bi Composite Solder Joints (OSP 표면처리된 FR-4 PCB기판과 Sn58%Bi 복합솔더 접합부의 미세조직 및 접합강도에 미치는 Sn-MWCNT의 영향)

  • Park, Hyun-Joon;Lee, Choong-Jae;Min, Kyung Deuk;Jung, Seung-Boo
    • Journal of the Microelectronics and Packaging Society
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    • v.26 no.4
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    • pp.163-169
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    • 2019
  • Sn-Pb solder alloys in electronics rapidly has been replaced to Pb free solder alloys because of various environmental regulations such as restriction of hazardous substances directive (RoHS), European Union waste electrical, waste electrical and electronic equipment (WEEE), registration evaluation authorization and of chemicals (REACH) etc. Because Sn58%Bi (in wt.%) solder alloy has low melting point and higher mechanical properties than that of Sn-Pb solder, it has been studied to manufacture electronic components. However, the reliability of Sn58%Bi solder could be lowered because of the brittleness of Bi element included in the solder alloy. Therefore, we observed the microstructures of Sn58%Bi composite solders with various contents of Sn-decorated multiwalled carbon nanotube (Sn-MWCNT) particles and evaluated bonding strength of the FR-4 components assembled with Sn58%Bi composite solder. Also, microstructures and bonding strengths of the Sn58%Bi composite solder joints were evaluated with the number of reflows from 1 to 7 times, respectively. Bonding strengths and fracture energies of the Sn58%Bi composite solder joints were measured by die shear test. Microstructures and fracture modes were observed with scanning electron microscope (SEM). Microstructures in the Sn58%Bi composite solder joints were finer than that of only Sn58%Bi solder joint. Bonding strength and fracture energy of Sn58%Bi composite solder including 0.1 wt.% of Sn-decorated MWCNT particles increased up to 20.4% and 15.4% at 5 times in reflow, respectively.

Plasma resistance of Bi-Al-Si-O and Bi-Al-Si-O-F glass coating film (Bi-Al-Si-O와 Bi-Al-Si-O-F 유리 코팅막의 플라즈마 저항성)

  • Sung Hyun Woo;Jihun Jung;Jung Heon Lee;Hyeong-Jun Kim
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.34 no.4
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    • pp.131-138
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    • 2024
  • In this study, the microstructure and plasma resistance characteristics of 35Bi2O3-15Al2O3-50SiO2 (BiAl SiO) and 35Bi2O3-7.5Al2O3-50SiO2-7.5AlF3 (BiAlSiOF) glass layers coated on sintered alumina substrates were investigated according to the sintering conditions. The coated layers were formed using the bar coating method and then sintered at a temperature in the range of 700~900℃, which corresponds to the temperature before and after the hemisphere forming temperature, after a debinding process. The plasma resistance of the two coated glasses was approximately 2~3 times higher than that of the quartz glass, and in particular, the BiAlSiOF glass film with F added showed higher plasma resistance than BiAlSiO. It is thought to be due to the effect of suppressing the reaction with fluorine gas by adding fluorine to the glass. When the sintering time was increased at 700℃ and 800℃, the plasma resistance of both glasses improved, but when the sintering temperature was increased to 900℃, the plasma resistance decreased again (i.e., the etching rate increased). This phenomenon is thought to be related to the crystallization behavior of both glasses. The change in plasma resistance depending on the sintering conditions is thought to be related to the appearance of Al and Bi-rich phases.

Phase Stability of Bi-2212 and Bi-2223 Thin Films Prepared by IBS Technique

  • Yang, Sung-Ho;Park, Yong-Pil
    • Transactions on Electrical and Electronic Materials
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    • v.2 no.1
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    • pp.12-15
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    • 2001
  • Bi-2212 and Bi-2223 thin films are prepared by IBS(ion beam sputtering) technique. Three phases of Bi-2201, Bi-2212 and Bi-2223 appear as stable ones in spite of the conditions for thin film fabrication of Bi-2212 and Bi-2223 compositions, depending on substrate temperature (T $_{sub}$) and ozone pressure(PO$_3$). It is found out that these phases are limited within very narrow temperature.e.

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Exploring Thermoelectric Transport Properties and Band Parameters of n-Type Bi2-xSbxTe3 Compounds Using the Single Parabolic Band Model

  • Linh Ba Vu;Soo-ho Jung;Jinhee Bae;Jong Min Park;Kyung Tae Kim;Injoon Son;Seungki Jo
    • Journal of Powder Materials
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    • v.31 no.2
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    • pp.119-125
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    • 2024
  • The n-type Bi2-xSbxTe3 compounds have been of great interest due to its potential to achieve a high thermoelectric performance, comparable to that of p-type Bi2-xSbxTe3. However, a comprehensive understanding on the thermoelectric properties remains lacking. Here, we investigate the thermoelectric transport properties and band characteristics of n-type Bi2-xSbxTe3 (x = 0.1 - 1.1) based on experimental and theoretical considerations. We find that the higher power factor at lower Sb content results from the optimized balance between the density of state effective mass and nondegenerate mobility. Additionally, a higher carrier concentration at lower x suppresses bipolar conduction, thereby reducing thermal conductivity at elevated temperatures. Consequently, the highest zT of ~ 0.5 is observed at 450 K for x = 0.1 and, according to the single parabolic band model, it could be further improved by ~70 % through carrier concentration tuning.

Discontinuous precipitation in Sn-Bi Alloys (Sn-Bi계 합금의 불연속 석출현상)

  • Kim, Jeong-Seok;Kim, Ju-Hyeong;Yu, Chung-Sik
    • Korean Journal of Materials Research
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    • v.8 no.3
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    • pp.238-244
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    • 1998
  • Sn-rich합금의 석출 현상을 조사하였다. 첫째, 대기중과 진공 중에서 용해된 90Sn-o10Bi(wt%)합금을 $140^{\circ}C$에서 용체화 처리한 후 석출반응을 조사하였다. 90Sn-10Bi(wt%)합금은 불연속 석출(DP)현상을 나타냈다. 공기 중에서 용융된 시료의 DP반응이 진공 중에서 용융된 시료보다 빠르게 진행되었다. 이것은 공기 중에서 용융하는 과정에서 시료에 용존된 산소에 의해 입계 에너지가 감소한 것에 기인하는 것으로 판단된다. 둘째, 용융 후 서냉 응고된 Sn-Bi(-In)합금을 $140^{\circ}C$이하의 온도에서 열처리하여 미세조직 변화를 조사하였다. 명확한 고경각 입계가 존재하지 않는 응고조직에서, 편석영역으로부터 DP반응이 진행되어 석출셈이 형성되었다. DP반응선단에는 반응계면이 관찰되었다. 이 현상은, 이제까지 알려진 바와는 다르게, DP반응이 반응 전에 존재하는 고경각 입계뿐만 아니라 재결정현상에 의해 새로운 석출계면이 생성될 수 있음을 의미한다. 이러한 재결정 현상은 확산에 의한 정합변형(coherency strain)으로 설명된다.

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Electrical Properties of SrBi$_2$$Nb_2$>$O_9$ Thin Films deposited by RF Magnetron Sputtering Method (RF 마그네트론 스퍼터링법에 의해 증착된 SrBi$_2$$Nb_2$>$O_9$ 박막의 전기적 특성에 관한 연구)

  • Zhao, Jin-Shi;Choi, Hoon-Sang;Lee, Kwan;Choi, In-Hoon
    • Korean Journal of Materials Research
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    • v.11 no.4
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    • pp.290-293
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    • 2001
  • The SrBi$_2$Nb$_2$O$_{9}$ (SBN) thin films were deposited on p-type(100) Si substrates by rf magnetron sputtering to confirm the Possibility of Pt/SBN/Si structure for the application of nondestructive read out ferroelectric random access memory (NDRO- FRAM). The SBN thin films were deposited by co-sputtering method with Sr$_2$Nb$_2$O$_{7}$ (SNO) and Bi$_2$O$_3$ ceramic targets. The SBN thin films deposited at room temperature were annealed at $700^{\circ}C$ for 1hr in $O_2$ ambient. The structural and electrical properties of SBN with different power ratios of targets were measured by x-ray diffraction(XRD), scanning electron microscopy(SEM), capacitance-voltage(C-V), and current-voltage(I-V). The C-V curves of the SBN films showed hysteresis curves of a clockwise rotation showing ferroelectricity. When the Power ratio of the SNO/Bi$_2$O$_3$ targets was 120 W/100 W, the SBN thin films had excellent electrical properties. The memory window of SBN thin film was 1.8 V-6.3 V at applied voltage of 3 V-9 V and the leakage current density was 1.5 $\times$ 10$^{-7}$ A/$\textrm{cm}^2$ at applied voltage of 5 V The composition of SBN thin films was analysed by electron probe X-ray micro analyzer(EPMA) and the atomic ratio of Sr:Bi:Nb with pawer ratio of 120 W/100 W was 1:3:2.

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Effect of Sintering Temperature on the Thermoelectric Properties of Bismuth Antimony Telluride Prepared by Spark Plasma Sintering (방전플라즈마 소결법으로 제조된 Bismuth Antimony Telluride의 소결온도에 따른 열전특성)

  • Lee, Kyoung-Seok;Seo, Sung-Ho;Jin, Sang-Hyun;Yoo, Bong-Young;Jeong, Young-Keun
    • Korean Journal of Materials Research
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    • v.22 no.6
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    • pp.280-284
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    • 2012
  • Bismuth antimony telluride (BiSbTe) thermoelectric materials were successfully prepared by a spark plasma sintering process. Crystalline BiSbTe ingots were crushed into small pieces and then attrition milled into fine powders of about 300 nm ~ 2${\mu}m$ size under argon gas. Spark plasma sintering was applied on the BiSbTe powders at 240, 320, and $380^{\circ}C$, respectively, under a pressure of 40 MPa in vacuum. The heating rate was $50^{\circ}C$/min and the holding time at the sintering temperature was 10 min. At all sintering temperatures, high density bulk BiSbTe was successfully obtained. The XRD patterns verify that all samples were well matched with the $Bi_{0.5}Sb_{1.5}Te_{3}$. Seebeck coefficient (S), electric conductivity (${\sigma}$) and thermal conductivity (k) were evaluated in a temperature range of $25{\sim}300^{\circ}C$. The thermoelectric properties of BiSbTe were evaluated by the thermoelectric figure of merit, ZT (ZT = $S^2{\sigma}T$/k). The grain size and electric conductivity of sintered BiSbTe increased as the sintering temperature increased but the thermal conductivity was similar at all sintering temperatures. Grain growth reduced the carrier concentration, because grain growth reduced the grain boundaries, which serve as acceptors. Meanwhile, the carrier mobility was greatly increased and the electric conductivity was also improved. Consequentially, the grains grew with increasing sintering temperature and the figure of merit was improved.

Sonophotocatalytic Performance of Bi2Se3-Graphene/TiO2 Hybrid Nanomaterials Synthesized with a Microwave-assisted Method

  • Zhu, Lei;Jo, Sun-Bok;Ye, Shu;Ullah, Kefayat;Oh, Won-Chun
    • Journal of the Korean Ceramic Society
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    • v.51 no.3
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    • pp.162-169
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    • 2014
  • This paper introduces a microwave-assisted synthesis method to prepare hybrid $Bi_2Se_3-GR/TiO_2$ nanocomposites, which exhibit superior properties over single component materials. The as-prepared composites were characterized by XRD, UV-vis absorbance spectra, SEM,TEM, EDX, and BET analyses, revealing uniform covering of the graphene nanosheet with $Bi_2Se_3$ and $TiO_2$ nanocrystals. For visible light photocatalysis of Rh.B, a significant enhancement in the reaction rate was consequently observed with $Bi_2Se_3-GR/TiO_2$ composites. The degradation rate($k_{app}$) obtained for sonophotocatalysis was $6.8{\times}10^{-3}min^{-1}$, roughly 2.2 times better than that of VL photocatalysis under higher concentrations of Rh.B. The sonophotocatalysis was faster due to greater formation of reactive radicals as well as an increase of the active surface area of the $Bi_2Se_3-GR/TiO_2$ composites. The high activity is attributed to the synergetic effects of high charge mobility and red shift of the absorption edge of $Bi_2Se_3-GR/TiO_2$.

Ductility Enhancement in Sn-40Bi-X Alloys by Minor Additions of Alloying Elements (합금원소 첨가에 의한 Sn-40Bi-X 합금의 연성 향상)

  • Kim, Ju-Hyung;Lee, Jong-Hyun
    • Korean Journal of Metals and Materials
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    • v.49 no.3
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    • pp.211-220
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    • 2011
  • To improve the low ductility and high strain-rate sensitivity in Sn-Bi based solder alloys, the influences of the minor additions of alloying elements (Ag, Mn, In) were investigated. The strain-stress curves of various Sn-40Bi(-X) alloys, including a pre-suggested Sn-40Bi-0.1Cu composition were measured using a tensile testing machine. As a result, the elongation and ultimate tensile strength (UTS) values were compared. The small addition (0.5 wt.%) of Ag significantly enhanced the ductility and high strain-rate sensitivity of the alloys at strain rates of $10^{-4}$ to $10^{-2}\;s^{-1}$ mainly due to the increase and refinement of eutectic lamellar structures. The microstructure change increased the area of grain boundaries, thus ameliorating the grain boundary sliding mode. It was also found that Mn is an effective element in enhancing the ductility, especially at the strain rates of $10^{-3}$ to $10^{-2}\;s^{-1}$ The enhancement is likely attributed to the fine and homogeneous microstructure in the alloys containing Mn.