• Title/Summary/Keyword: Bi-layer

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Properties of BiSbTe3 Thin Film Prepared by MOCVD and Fabrication of Thermoelectric Devices (MOCVD를 이용한 BiSbTe3 박막성장 및 열전소자 제작)

  • Kwon, Sung-Do;Yoon, Seok-Jin;Ju, Byeong-Kwon;Kim, Jin-Sang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.5
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    • pp.443-447
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    • 2009
  • Bismuth-antimony-telluride based thermoelectric thin film materials were prepared by metal organic vapor phase deposition using trimethylbismuth, triethylantimony and diisopropyltelluride as metal organic sources. A planar type thermoelectric device has been fabricated using p-type $Bi_{0.4}Sb_{1.6}Te_3$ and n-type $Bi_{2}Te_{3}$ thin films. Firstly, the p-type thermoelectric element was patterned after growth of $5{\mu}m$ thickness of $Bi_{0.4}Sb_{1.6}Te_3$ layer. Again n-type $Bi_{2}Te_{3}$ film was grown onto the patterned p-type thermoelectric film and n-type strips are formed by using selective chemical etchant for $Bi_{2}Te_{3}$. The top electrical connector was formed by thermally deposited metal film. The generator consists of 20 pairs of p- and n-type legs. We demonstrate complex structures of different conduction types of thermoelectric element on same substrate by two separate runs of MOCVD with etch-stop layer and selective etchant for n-type thermoelectric material. Device performance was evaluated on a number of thermoelectric devices. To demonstrate power generation, one side of the device was heated by heating block and the voltage output was measured. The highest estimated power of 1.3 ${\mu}m$ is obtained at the temperature difference of 45 K.

Si과 Ge 기판에의 Bi2Te3 박막 성장 특성 분석

  • Kim, Seung-Yeon;Go, Chang-Hun;Lee, Geun-Seop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.233-233
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    • 2012
  • 위상절연체(Bi2Te3)와의 격자상수 불일치 비율이 서로 다른 Si (111)와 Ge (111) 기판을 선택하여 Bi3Te3 박막의 성장 조건을 찾고 이에 따른 특성 분석을 수행하였다. 시료 제작은 초고진공 분위기에서 MBE를 이용하였고, AFM, XRD와 XPS로 각각 구조적 변화, 결정 상태 및 화학적 상태를 분석하였다. 우선 Si 위에 형성된 Bi2Te3의 경우, 초기 박막이 형성된 후, 증착 시간이 증가함에 따라 섬(island)모양의 구조물들이 step edge 부분에 분포되는 모습을 AFM 이미지에서 확인하였다. 형성된 박막의 스텝 단차는 약 1 nm 또는 이 값의 정수 배였고, 이것은 Bi2Te3 unit cell의 quintuple layer (QL) 값과 일치하였다. 또한 측정된 XRD pattern으로 Bi2Te3가 hexagonal 구조의 c-축에 따라 결정성이 이루어졌음을 확인할 수 있었다. XPS 스펙트럼에서는 Bi 4f가 높은 에너지 방향으로 2.3 eV, Te 3d는 낮은 에너지 방향으로 약 0.7 eV 만큼 구속 에너지의 화학적 이동이 나타남을 알 수 있었다. 이러한 결과는 Si 위에 Bi2Te3 박막이 높은 결정성을 가지고 형성되었다는 것을 의미한다. 또한 Si (111) 기판보다 Bi2Te3 결정과 격자상수 불일치의 비율이 상대적으로 작은 Ge (111)을 기판으로 하여 Bi2Te3 박막을 성장시켜 두 표면에서의 박막 성장의 특성을 비교, 논의할 것이다.

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Rapid Fabrication of Bi2212 Superconducting Films on Cu Tape with Cu-free Precursor (Cu-free 전구체를 이용한 동 테이프 위의 Bi2212 초전도 후막의 급속 제조)

  • 한상철;성태현;한영희;이준성;김상준
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.69-72
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    • 1999
  • A Well oriented Bi$_2$re$_2$CaCu$_2$O$\sub$8/(Bi2212) superconductor thick films were formed successfully on a copper substrate by liquid reaction between a Cu-free precursor and Cu tape using method in which Cu-free BSCO powder mixture was printed on copper plate and heat-treated. And we examined the mechanism for the rapid formation of Bi2212 superconducting films from observing the surface microstructure with heat-treatment time. At heat-treatment temperature, the printing layer partially melt by reacting with CuO of the oxidizing copper plate, and the nonsuperconducting phases present in the melt are typically Bi-free phases and Cu-free phases. Following the partial melting, the Bi$_2$Sr$_2$CaCu$_2$O$\sub$8/ superconducting phase is formed at Bi-free phase/liquid interface by nucleation and grows. It was confirmed that the phase colony from the phase diagram of Bi$_2$O$_3$-(SrO+CaO)/2-CuO system is similar to the observed result.

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Effect of Ti Buffer Layer Thickness on the Electrical and Optical Properties of In2O3/Ti bi-layered Films (Ti 완충층 두께에 따른 In2O3/Ti 적층박막의 전기적, 광학적 특성 변화)

  • Moon, Hyun-Joo;Jeon, Jae-Hyun;Gong, Tae-Kyung;Kim, Daeil
    • Journal of the Korean Society for Heat Treatment
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    • v.28 no.6
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    • pp.296-299
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    • 2015
  • $In_2O_3/Ti$ bi-layered films were deposited on glass substrate at room temperature with radio frequency (RF) and direct current (DC) magnetron sputtering to consider the effect of Ti buffer layer on the electrical and optical properties. In a comparison of figure of merit, $In_2O_3$ 90 nm/Ti 10 nm thin films show the higher opto-electrical performance of $3.0{\times}10^{-4}{\Omega}^{-1}$ than that of the $In_2O_3$ single layer films ($2.6{\times}10^{-4}{\Omega}^{-1}$). From the observed results, it is supposed that the $In_2O_3\;90nm/TiO_2$ 10 nm bi-layered films may be an alternative candidate for transparent electrode in a transparent thin film transistor device.

Fault Current Characteristics of a Bi-2223 Tape (Bi-2223 테이프의 사고전류 특성)

  • 류경우;최병주;차귀수
    • Progress in Superconductivity and Cryogenics
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    • v.3 no.1
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    • pp.29-34
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    • 2001
  • A Bi-2223 tape has been developed for low-field Power applications such as Power cables or transformers working at liquid nitrogen temperature For such applications it is required to understand fault current characteristics of the Bi-2223 tape. In this paper we report fault current characteristics using two types of samples, straight sample and pancake coil sample. It was found that the fault current characteristics of the Bi-2223 tape are independent of external fields and frequencies . However they depend on electrical insulations and fault durations strong1y Also it was shown that the fault current characteristics in the insulated straight sample are similar to those in the pancake sample with a conductor insulation. Finally. it was shown that the Pancake sample with a layer insulation has better characteristics than that with a conductor insulation fur fault currents.

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Epitaxial Growth of GaAs Thin Films Using MOCVD (MOCVD를 이용한 GaAs 박막의 에피성장)

  • So, Myoung-Gi
    • Journal of Industrial Technology
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    • v.24 no.B
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    • pp.59-64
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    • 2004
  • GaAs thin films were grown epitaxially by MOCVD method on (001) GaAs substrate. And as a surfactant, Bi(bismuth) thin films were deposited on GaAs buffer layer by using TMBi(trimethylbismuth) source. In-situ reflectance difference spectroscopy(RDS) was used to monitor the surface reconstruction of GaAs and Bi thin films. As the results, under the exposure of TBAs(tertiarybuthylarsine) and hydrogen atmosphere, the surface reconstruction of GaAs was changed from As-rich c($4{\times}4$) to As-rich ($2{\times}4$), which was due to the adsoption and desorption of As dimers. The first bismuth surface related RDS signal was reported. At the deposition temperature of $450^{\circ}C$, Bi-terminated GaAs surface showed the RDS spectrum similar to that of Sb-terminated GaAs surface, possibly a ($2{\times}4$) surface. And Bi surface layers were rapidly evaporated with increasing the deposition temperature($550^{\circ}C$), finally becoming As-terminated ($2{\times}4$) surface.

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Fabrication and performance of 100 m Class Bi-2223 High Temperature Superconducting Tape (100 m급 Bi-2223 고온초전도 선재 제조 및 특성)

  • 하홍수;오상수;하동우;장현만;이남진;류강식;이준석
    • Progress in Superconductivity and Cryogenics
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    • v.1 no.2
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    • pp.15-19
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    • 1999
  • For large scale applications of high temperature superconductor (HTS) such as transmission cables, motors and generators, long length of flexible HTS conductor is required. Currently, Bi-2223 HTS tape is capable of being fabricated in longer than 100 m length by industrial processes. In this study, we fabricated 100 m 19 filamentary Bi-2223 ($Bi_{1.8}Pb_{0.4}Sr_2Ca_2O_{10+x}$) HTS tape by PIT (Power in Tube) process. Critical current(IC) of this long length tape was measured 18.5 A at 77K, self field. Critical current of 100 m length tape was mainly resulted from the increase of inhomogeneity in oxide from the increase of inhomogeneity in oxide layer. Engineering critical current (Je=Ic/total tape cross-section area) that is important factor for practical applications and fabrication cost was measured 2.2 kA/cm2.

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High-Tc Superconducting Bi-Sr-Ca-Cu-O Thin Films prepared by Sputter Deposition (스퍼터 증착법으로 제작한 Bi-Sr-Ca-Cu-O 고온 초전도 박막)

  • Cheon, Min-Woo;Yang, Sung-Ho;Park, No-Bong;Park, Yong-Pil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.329-330
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    • 2005
  • Bi-Sr-Ca-Cu-O thin films have been fabricated by sputter deposition method. During the deposition, 10 and 90 wt%-ozone/oxygen mixture gas of typical pressure of $1\sim9\times10^{-5}$ Torr are supplied with ultraviolet light irradiation for oxidation. XRD and RHEED investigations reveal out that a buffer layer with some different compositions is formed at the early deposition stage of less than 10 units cell and then Bi-2201 oriented along the c-axis is grown.

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Bi(Pb)SrCaCuO superconductor fabricated by interdiffusion of SrCaCuO and BiPbCuO double layers (SrCaCuO와 BiPbCuO 이중층의 상호확산에 의해 제조된 Bi(Pb)SrCaCuO 초전도체)

  • 최효상;이중근;정동철;한병성
    • Electrical & Electronic Materials
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    • v.9 no.7
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    • pp.680-689
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    • 1996
  • SrCaCuO와 BiPbCuO 화합물로 이루어진 이중층시료가 만들어 졌으며, 소결과정에서 나타나는 확산과 입자간의 상호작용으로 108K의 임계온도를 나타내었다. 이 시료는 820.deg. C에서 0-210 시간동안 소결되었다. 초전도체의 생성, 성장메카니즘과 임계온도의 관계가 연구되었으며, 최적조건은 820.deg. C에서 210시간 소결하고 SrCaCuO와 BiPbCuO의 도포비가 1:0.6인 시편에서 나타났다. 또한 이중층시료에서 가장 좋은 조성비는 S $r_{2}$C $a_{2}$C $u_{2}$ $O_{x}$와 B $i_{1.9}$P $b_{0.5}$C $u_{3}$ $O_{y}$ 이었다.다.

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