• Title/Summary/Keyword: Barrier Height

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Barrier-Transition Cooling in LED

  • Kim, Jedo
    • Journal of Power System Engineering
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    • v.17 no.5
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    • pp.44-51
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    • 2013
  • This paper proposes and analyzes recycling of optical phonons emitted by nonradiative decay, which is a major thermal management concern for high-power light emitting diodes (LED), by introducing an integrated, heterogeneous barrier cooling layer. The cooling is proportional to the number of phonons absorbed per electron overcoming the potential barrier, while the multi-phonon absorption rate is inversely proportional to this number. We address the theoretical treatment of photon-electron-phonon interaction/transport kinetics for optimal number of phonons (i.e., barrier height). We consider a GaN/InGaN LED with a metal/AlGaAs/GaAs/metal potential barrier and discuss the energy conversion rates. We find that significant amount of heat can be recycled by the barrier transition cooling layer.

Noise reduction of noise barrier with noise reducer for high speed train by using scale down model test (축척모형 실험에 의한 고속전철 방음벽용 소음저감 장치)

  • 정성수;전병수;나희승;김준엽;양신추
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • 2001.11b
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    • pp.647-652
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    • 2001
  • A noise reduction of noise barrier for high speed train was measured by using scale down model test. A selected types of noise barriers were simple vertical barrier, interference type barrier with plate, interference type barrier with cylindrical pipes. On experiment, in order to make similar present test lane condition, reduced train model and multiple noise sources were considered. As a result. interference type noise barrier with cylindrical pipes is most effective than other barriers. A present height of noise barrier which is established in a test lane is not high enough for reducing patograph noise.

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Deposition Temperature and Annealing Temperature Dependent Structural and Electrical Properties of Ga-doped ZnO on SiC (퇴적 온도와 열처리에 따른 SiC에 퇴적된 Ga 도핑된 ZnO의 구조 및 전기적 특성)

  • Lee, Jung-Ho;Koo, Sang-Mo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.2
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    • pp.121-124
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    • 2012
  • The characteristics of Ga-doped zinc oxide (GZO) thin films deposited at different deposition temperatures (TS~250 to $550^{\circ}C$) on 4H-SiC have been investigated. Structural and electrical properties of GZO thin film on n-type 4H-SiC(0001) were investigated by using x-ray diffraction(XRD), atomic force microscopy(AFM), Hall effect measurement, barrier height from I-V curve and Auger electron spectroscopy(AES). XRD $2\theta$ scan shows GZO thin film has preferential orientation with c-axis perpendicular to SiC substrate surface. The lowest resistivity ($\sim1.9{\times}10^{-4}{\Omega}cm$) was observed for the GZO thin film deposited at $400^{\circ}C$. As deposition temperature increases, barrier height between GZO and SiC was increased. Whereas, resistivity of GZO thin films as well as barrier height between GZO and SiC were increased after annealing process in air atmosphere. It has been found that the c-axis oriented crystalline quality as well as the relative amount of activated Ga3+ ions and oxygen vacancy may affect the electrical properties of GZO films on SiC.

High Voltage Ti/4H-SiC Schottky Rectifiers (고전압 Ti/4H-SiC 쇼트키 장벽 다이오드 제작 및 특성분석)

  • Kim, C.K.;Yang, S.J.;Lee, J.H.;Noh, I.H.;Cho, N.I.;Kim, N.K.;Kim, E.D.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.834-838
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    • 2002
  • In this paper, we have fabricated 4H-SiC schottky diodes utilizing a metal-oxide overlap structure for electric filed termination. The barrier height and Ideality factor were measured by current-voltage, capacitance-voltage characteristics. Schottky barrier height(SBH) were 1.41ev for Ni and 1.35eV for Pt, 1.52eV for Pt/Ti at room temperature and Pt/Ti Schottky diode exhibited Ideality factor was 1.06 to 1.4 in the range of $25^{\circ}C{\sim}200^{\circ}C$. To improve the reverse bias characteristics, an edge termination technique is employed for Pt/Ti/4H-SiC Schottky rectifiers and the device show excellent characteristics with higher blocking voltage up to 780V compared with unterminated devices.

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Formation Mechanism of a Large Schottky Barrier Height for Cr-AlGaN/GaN Heterostructure (Cr/n-AlGaN/GaN Schottky Contact에서 높은 쇼트키 장벽 형성 메카니즘에 관한 연구)

  • Nam, Hyo-Duk;Lee, Yeung-Min;Jang, Ja-Soon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.4
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    • pp.266-270
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    • 2011
  • We report on the formation mechanism of large Schottky barrier height (SBH) of nonalloyed Cr Schottky contacts on strained Al0.25Ga0.75N/GaN. Based on the current-voltage (I-V) and capacitance-voltage (C-V) data, the SBHs are determined to be 1.98 (${\pm}0.02$) and 2.07 (${\pm}0.02$) eV from the thermionic field emission and two-dimensional electron gas (2DEG) calculations, respectively. Possible formation mechanism of large SBH will be described in terms of the formation of Cr-O chemical bonding at the interface between Cr and AlGaN/GaN, low binding-energy shift to surface Fermi level, and the reduction of 2DEG electrons.

Characteristics of Ni/SiC Schottky Diodes Grown by ICP-CVD

  • Gil, Tae-Hyun;Kim, Han-Soo;Kim, Yong-Sang
    • KIEE International Transactions on Electrophysics and Applications
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    • v.4C no.3
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    • pp.111-116
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    • 2004
  • The Ni/SiC Schottky diode was fabricated with the $\alpha$-SiC thin film grown by the ICP-CVD method on a (111) Si wafer. $\alpha$-SiC film has been grown on a carbonized Si layer in which the Si surface was chemically converted to a very thin SiC layer achieved using an ICP-CVD method at $700^{\circ}C$. To reduce defects between the Si and $\alpha$-SiC, the surface of the Si wafer was slightly carbonized. The film characteristics of $\alpha$-SiC were investigated by employing TEM (Transmission Electron Microscopy) and FT-IR (Fourier Transform Infrared Spectroscopy). Sputterd Ni thin film was used as the anode metal. The boundary status of the Ni/SiC contact was investigated by AES (Auger Electron Spectroscopy) as a function of the annealing temperature. It is shown that the ohmic contact could be acquired beyond a 100$0^{\circ}C$ annealing temperature. The forward voltage drop at 100A/cm was I.0V. The breakdown voltage of the Ni/$\alpha$-SiC Schottky diode was 545 V, which is five times larger than the ideal breakdown voltage of the silicon device. As well, the dependence of barrier height on temperature was observed. The barrier height from C- V characteristics was higher than those from I-V.

Electrical Properties and Luminous Efficiency in Organic Light-Emitting Diodes Depending on Buffer Layer and Cathodes (버퍼층과 음전극에 따른 유기 발광 소자의 전기적 특성과 발광 효율)

  • 정동회;김상걸;홍진웅;이준웅;김태완
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.5
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    • pp.409-417
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    • 2003
  • We have studied electrical properties and luminous efficiency of organic light-emitting diodes(OLEDs) with different buffer layer and cathodes in a temperature range of 10 K and 300 K. Four different device structures were made. The OLEDs are based on the molecular compounds, N,N'-diphenyl-N,N'-bis(3-methylphenyl)-1,1'-biphenyl-4,4'-diamine (TPD) as a hole transport, tris(8-hydroxyquinolinato) aluminum(III) (Alq$_3$) as an electron transport and omissive layer, and poly(3,4-ethylenedioxythiophene) :poly (styrenesulfonate) (PEDOT:PSS ) as a buffer layer. And LiAl was used as a cathode. Among the devices, the ITO/PEDOT:PSS/TPD/Alq$_3$/LiAl structure has a low energy-barrier height for charge injection and show a good luminous efficiency. We have got a highly efficient and low-voltage operating device using the conductive PEDOT:PSS and low work-function LiAl. From current-voltage characteristics with temperature variation, conduction mechanisms are explained SCLC (space charge limited current) and tunneling one. We have also studied energy barrier height and luminous efficiency at various temperature.

Electrical and Physical Characteristics of Nickel Silicide using Rare-Earth Metals (희토류 금속을 이용한 니켈 실리사이드의 전기 및 물리적 특성)

  • Lee, Won-Jae;Kim, Do-Woo;Kim, Yong-Jin;Jung, Soon-Yen;Wang, Jin-Suk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.1
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    • pp.29-34
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    • 2008
  • In this paper, we investigated electrical and physical characteristics of nickel silicide using rare-earth metals(Er, Yb, Tb, Dy), Incorporated Ytterbium into Ni-silicide is proposed to reduce work function of Ni-silicide for nickel silicided schottky barrier diode (Ni-silicided SBD). Nickel silicide makes ohmic-contact or low schottky barrier height with p-type silicon because of similar work function (${\phi}_M$) in comparison with p-type silicon. However, high schottky barrier height is formed between Ni-silicide and p-type substrate by depositing thin ytterbium layer prior to Ni deposition. Even though the ytterbium is deposited below nickel, ternary phase $Yb_xN_{1-x}iSi$ is formed at the top and inner region of Ni-silicide, which is believed to result in reduction of work function about 0.15 - 0.38 eV.

Analysis on the Insertion Loss of a Noise Barrier by the Boundary Element Method (경계요소법을 이용한 방음벽의 삽입손실 해석)

  • 이우섭;정성수;황철호
    • Journal of KSNVE
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    • v.10 no.3
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    • pp.423-429
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    • 2000
  • This paper investigates the use of boundary element method(BEM) to analyze the insertion loss of a noise barrier. To begin with the validity of the BEm for the analysis of noise barrier insertion loss in checked by both Lam's theoretical method and the measurements in the anechoic chamber for the scale-down models. Through simulation it is shown that using 2D BEM model is sufficient to the analysis for the barrier with large ratio of length to height. By using 2D BEM model the insertion loses are predicted for the real noise barriers in several cases which are the case that they are built parallel on both roadsides the one that there are multiple sound sources and the one that there is a gap between a concrete structure and a barrier plate.

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Study on the Sound Absorption Properties of Noise Barrier according to the Compositions of Absorptive Material (흡음재 구성방법에 따른 방음벽의 흡음특성에 관한 연구)

  • 김경우;양관섭;강재식;이승언
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • 2002.05a
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    • pp.1222-1227
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    • 2002
  • Noise barrier is used to reduce traffic noise. The effect of a noise barrier depends not only on the materials, but also on the physical properties such as density, height and degree of absorption, etc. Typical absorptive noise barrier is used sound absorbing material, such as glass wool and mineral wool. The goal of this study is to develope excellent absorptive noise barrier using a polyester. Laboratory measurements were peformed with various thicknesses, density and layer of absorber in a reverberation room.

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