• Title/Summary/Keyword: Bandgap

Search Result 635, Processing Time 0.027 seconds

탄화규소 전력반도체 기술 동향

  • Kim, Sang-Cheol
    • The Magazine of the IEIE
    • /
    • v.37 no.8
    • /
    • pp.31-40
    • /
    • 2010
  • 1947년 트랜지스터의 발명을 시작으로 사이리스터, MOSFET 및 IGBT 등의 전력반도체 소자가 개발되면서 산업, 가전 및 통신 등의 다양한 분야에서 실리콘 기반의 전력반도체 소자가 활용되고 있다. 개발 당시에는 10A/수백V 정도의 전류통전능력 및 전압저지능력을 가지고 있었지만, 현재에는 8000A/12kV급의 대용량 소자까지 생산되고 있다. 이러한 전력반도제 소자는 다양한 응용분야에 서 높은 전압 저지능력, 큰 전류 통전 능력 및 빠른 스위칭 특성을 요구하고 있다. 특히 최근의 전력변환장치들은 고온동작특성 및 고효율화에 대한 요구가 더욱 강조되고 있다. 일반적인 실리콘 전력반도체소자는 물질적인 특성한계로 고온에 서의 동작 시 소자 특성이 떨어지는 특징을 보이고 있어 고온 환경에 적합한 전력반도체 소자의 필요성이 증가되어 실리콘에 비해 밴드�b이 넓은 SiC 및 GaN 등의 wide bandgap 반도체 물질의 연구가 활발히 진행되고 있다. 특히 SiC는 단결정 성장을 통한 웨이퍼화가 용이하고 소자 제작공정이 기존 실리콘공정과 유사하여 많은 연구가 진행되었으며 일부 소자에서 상용화가 진행되었다. 본고에서는 현재 활발히 진행되고 있는 탄화규소 전력반도체소자의 기술동향에 대해 소개하고자 한다.

  • PDF

The Formation of Microcrystalline SiGe Film Using a Remote Plasma Enhanced Chemical Vapor Deposition (원격 플라즈마 화학기상 증착법으로 성장된 미세 결정화된 SiGe 박막 형성)

  • Kim, Doyoung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.31 no.5
    • /
    • pp.320-323
    • /
    • 2018
  • SiGe thin films were deposited by remote plasma enhanced chemical vapor deposition (RPE-CVD) at $400^{\circ}C$ using $SiH_4$ or $SiCl_4$ and $GeCl_4$ as the source of Si and Ge, respectively. The growth rate and the degree of crystallinity of the fabricated films were characterized by scanning electron microscopy and Raman analysis, respectively. The optical and electrical properties of SiGe films fabricated using $SiCl_4$ and $SiH_4$ source were comparatively studied. SiGe films deposited using $SiCl_4$ source showed a lower growth rate and higher crystallinity than those deposited using $SiH_4$ source. Ultraviolet and visible spectroscopy measurement showed that the optical band gap of SiGe is in the range of 0.88~1.22 eV.

Gas sensor based on hydrogenated multilayer graphene

  • Park, Seong-Jin;Park, Min-Ji;Yu, Gyeong-Hwa
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2016.02a
    • /
    • pp.273.1-273.1
    • /
    • 2016
  • Graphene exhibits a number of unique properties that make it an intriguing candidate for use in sensor. Here, we report graphene-based gas sensor. Graphene was grown using CVD. Then, the sensor was made using standard lithography techniques. The sensor conductance increased upon exposure to NH3, whereas it decreased upon NO2, suggesting that NH3 and NO2 might be discriminated using the graphene-based sensor. To improve the sensitivity, graphene was treated with hydrogen plasma. After hydrogen treatment, the electrical properties of graphene changed from ambipolar to p-type semiconductors. In addition, the sensor performance was improved probably due to an opening of bandgap.

  • PDF

Optoelectric properties of gate-tunable n-MoS2/n-WSe2 heterojunction with proper electrode metals

  • Lee, Seom-Gyun;Park, Min-Ji;Yu, Gyeong-Hwa
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2016.02a
    • /
    • pp.332.2-332.2
    • /
    • 2016
  • Two dimensional transition-metal dichalcogenides (TMDs) semiconductors are attractive materials for optoelectric devices because of their direct energy bandgap and transparency. To investigate the feasibility of transparent p-n junctions, we have fabricated a p-n heterojunction consisting of p-type WSe2 and n-type MoS2 flakes since WSe2 and MoS2 with proper electrode metals exhibit p-type and n-type behaviors, respectively. These heterojunctions exhibits gate-tunable rectifying behaviors and photovoltaic effects (ECE ~ 0.2%) indicating that p-n junctions were formed. In addition, photocurrent and photovoltaic effects were observed under light illumination, which were dependent on the gate voltage. In addition, the photocurrent mapping images indicate that the photovoltaic effects comes from the junction area. Possible origins of gate-tunability are discussed.

  • PDF

Large Area Bernal Stacked Bilayer Graphene Grown by Multi Heating Zone Low Pressure Chemical Vapor Deposition

  • Han, Jaehyun;Yeo, Jong-Souk
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2015.08a
    • /
    • pp.239.2-239.2
    • /
    • 2015
  • Graphene is a most interesting material due to its unique and outstanding properties. However, semi-metallic properties of graphene along with zero bandgap energy structure limit further application to optoelectronic devices. Recently, many researchers have shown that band gap can be induced in the Bernal stacked bilayer graphene. Several methods have been used for the controlled growth of the Bernal staked bilayer graphene, but it is still challenging to control the growth process. In this paper, we synthesize the large area Bernal stacked bilayer graphene using multi heating zone low pressure chemical vapor deposition (LPCVD). The synthesized bilayer graphenes are characterized by Raman spectroscopy, optical microscope (OM), scanning electron microscopy (SEM). High resolution transmission electron microscopy (HRTEM) is used for the observation of atomic resolution image of the graphene layers.

  • PDF

Development of Highly Efficient and Stable Blue Organic Electroluminescent Devices

  • Lee, Meng Ting;Chen, Hsia Hung;Tsai, Chih Hung;Liao, Chi Hung;Chen, Chin H.
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2004.08a
    • /
    • pp.265-268
    • /
    • 2004
  • We have developed a highly efficient and stable blue organic electroluminescent device (OLED) based on the blue fluorescent p-bis(p-N,N-diphenyl-aminostyryl)benzene (DSA-Ph) dopant in a morphologically stable high-bandgap host material, 2-methyl-9,10-di(2-naphthyl)anthracene (MADN), which achieved an EL efficiency of 9.7 cd/A and 5.5 lm/W at 20 mA/$cm^2$ and 5.7 V with a Commission Internationale d'Eclairage coordinates of(x = 0.16, y = 0.32). This sky blue device which could also alleviate the problematic current induced quenching at high current achieved a half-decay lifetime ($t_{1\;2}$) of 46,000 h at an initial brightness of 100 cd/$m^2$.

  • PDF

Luminescent Properties of SrTiO3:Al1Pr Phosphors doped with Er and Y (Er과 Y을 첨가한 SrTiO3:Al1Pr 형광체의 발광특성)

  • Park Chang-Sub;Lee Jong-Baek;You Il
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.19 no.10
    • /
    • pp.971-975
    • /
    • 2006
  • [ $SrTiO_3:Al,Pr$ ] red phosphors doped with Y and Er were synthesized by solid state reaction method. The luminescence properties of $SrTiO_3:Al,Pr$ phosphors before and after doping were examined by photoluminescence. Efforts were paid to elucidate the cause of the increase of green luminescence in $(Sr_{0.95}Y_{0.05})TiO_3:Pr,Er\;and\;(Sr_{0.95}Y_{0.05})TiO_3:Pr,Al$ phosphors. The enhanced green luminescence was interpreted by the energy transfer between $Er^{3+}\;and\;Pr^{3+}$ ions, and the change of bandgap in the $(Sr_{0.95}Y_{0.05})TiO_3:Pr$ phosphors.

Intergrated circuit design of power-stabilizing circuitry for optical transmitter (광송신기용 광파워 안정화 회로의 집적회로 설계)

  • 이성철;박기현;정행근
    • Journal of the Korean Institute of Telematics and Electronics B
    • /
    • v.33B no.3
    • /
    • pp.47-55
    • /
    • 1996
  • An optical transmitter, which is a key component of the optical transmission system, converts the electrical signal to optical signal and consists of a high-speed current-pulse driver for laser diode and low-speed feedback loops that stabilize optical power against aging, power supply voltage fluctuations, and ambient temperature changes. In this paper, the power-stabilizing part, which forms the bulk of the optical transmitter circuitry was designed in integrted circuits. Operational amplifiers and reference voltage generation circuits, which were identified as key building blocks for the power-stabilizing feedback loops, were designed and were subsequently verified through HSPICE simulations. The designed operational amplifier consists of a two-stage folded cascode amplifier and class AB output stage, whereas the reference voltage is obtained by bandgap reference circuits. Finally the power-stabilizing circuitry was laid out based on 3\mu$m CMOS design rules for fabrication.

  • PDF

CMOS on-chip voltage and current reference circuits for low-voltage applications (저전압용 CMOS 온-칩 기준 전압 및 전류 회로)

  • 김민정;이승훈
    • Journal of the Korean Institute of Telematics and Electronics C
    • /
    • v.34C no.4
    • /
    • pp.1-15
    • /
    • 1997
  • This paper proposes CMOS on-chip voltage and current reference circuits that operate at supply voltages between 2.5V and 5.5V without using a vonventional bandgap voltage structure. The proposed reference circuits based on enhancement-type MOS transistors show low cost, compatibility with other on-chip MOS circuits, low-power consumption, and small-chip size. The prototype was implemented in a 0.6 um n-well single-poly double-metal CMOS process and occupies an active die area of $710 um \times 190 um$. The proposed voltage reference realizes a mean value of 0.97 V with a standard deviation of $\pm0.39 mV$, and a temperature coefficient of $8.2 ppm/^{\circ}C$ over an extended temeprature range from TEX>$-25^{\circ}C$ to $75^{\circ}C$. A measured PSRR (power supply rejection ratio) is about -67 dB at 50kHz.

  • PDF

A Novel Oscillator Utilizing Corrugated CPW EBG Structure with Reduced Phase Noise and Improved Harmonic Characteristics (Corrugated CPW EBG 구조를 이용한 낮은 위상잡음과 향상된 고조파 특성을 갖는 새로운 형태의 발진기)

  • Hwang, Cheol-Gyu;Myung, Noh-Hoon
    • Proceedings of the Korea Electromagnetic Engineering Society Conference
    • /
    • 2005.11a
    • /
    • pp.101-106
    • /
    • 2005
  • This paper presents a new microwave oscillator incorporating a corrugated coplanar waveguide (CCPW) electromagnetic bandgap (EBG) structure as its terminating resonance component. The use of a compact CCPW EBG structure was effective in reducing the phase noise and improving the harmonic characteristics of the microwave oscillator circuit without additional backside processing and drastic size increment. The fully planar CCPW oscillator oscillating at the frequency of 5.41 GHz showed a phase noise characteristic of -90.7 dBc/Hz at 100kHz offset and a second harmonic suppression of 42.67 dB.

  • PDF