• 제목/요약/키워드: Back-contact layer

검색결과 65건 처리시간 0.035초

Application of Buffer Layers for Back Contact in CdTe Thin Film Solar Cells

  • Chun, Seungju;Kim, Soo Min;Lee, Seunghun;Yang, Gwangseok;Kim, Jihyun;Kim, Donghwan
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.318.2-318.2
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    • 2014
  • The high contact resistance is still one of the major issues to be resolved in CdS/CdTe thin film solar cells. CdTe/Metal Schottky contact induced a high contact resistance in CdS/CdTe solar cells. It has been reported that the work function of CdTe thin film is more than 5.7 eV. There has not been a suitable back contact metal, because CdTe thin film has a high work function. In a few decades, some buffer layer was reported to improve a back contact problem. Buffer layers which are Te, $Sb_2Te_3$, $Cu_2Te$, ZnTe:Cu and so on was inserted between CdTe and metal electrode. A formed buffer layers made a tunnel junction. Hole carriers which was excited in CdTe film by light absorption was transported from CdTe to back metal electrode. In this report, we reported the variation of solar cell performance with different buffer layer at the back contact of CdTe thin film solar cell.

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Nano-Scale CMOSFET에서 Contact Etch Stop Layer의 Mechanical Film Stress에 대한 소자특성 분석 (Investigation of Device Characteristics on the Mechanical Film Stress of Contact Etch Stop Layer in Nano-Scale CMOSFET)

  • 나민기;한인식;최원호;권혁민;지희환;박성형;이가원;이희덕
    • 대한전자공학회논문지SD
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    • 제45권4호
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    • pp.57-63
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    • 2008
  • 본 논문에서는 Contact Etch Stop Layer (CESL)인 nitride film의 mechanical stress에 의해 인가되는 channel stress가 소자 특성에 미치는 영향에 대해 분석하였다. 잘 알려진 바와 같이 NMOS는 tensile stress와 PMOS에서는 compressive stress가 인가되었을 경우 drain current가 증가하였으며 그 원인을 체계적으로 분석하였다. NMOS의 경우 tensile stress가 인가됨으로써 back scattering ratio ($\tau_{sat}$)의 감소와 thermal injection velocity ($V_{inj}$)의 증가로 인해 mobility가 개선됨을 확인하였다. 또한 $\tau_{sat}$, 의 감소는 온도에 따른 mobility의 감소율이 작고, 그에 따른 mean free path ($\lambda_O$)의 감소율이 작기 때문인 것으로 확인되었다. 한편 PMOS의 compressive stress 경우에는 tensile stress에 비해 온도에 따른 mobility의 감소율이 크기 때문에 channel back scattering 현상은 심해지지만 source에서의 $V_{inj}$가 큰 폭으로 증가함으로써 mobility가 개선됨을 확인 할 수 있었다. 따라서 CES-Layer에 의해 인가된 channel stress에 따른 소자 특성의 변화는 inversion layer에서의 channel back scattering 현상과 source에서의 thermal injection velocity에 매우 의존함을 알 수 있다.

고면저항 에미터 결정질 실리콘 태양전지의 전면전극 접촉저항 분석 (Contact Resistance Analysis of High-Sheet-Resistance-Emitter Silicon Solar Cells)

  • 안준용;정주화;도영구;김민서;정지원
    • 신재생에너지
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    • 제4권2호
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    • pp.74-80
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    • 2008
  • To improve the blue responses of screen-printed single crystalline silicon solar cells, we investigated an emitter etch-back technique to obtain high emitter sheet resistances, where the defective dead layer on the emitter surface was etched and became thinner as the etch-back time increased, resulting in the monotonous increase of short circuit current and open circuit voltage. We found that an optimal etch-back time should be determined to achieve the maximal performance enhancement because of fill factor decrease due to a series resistance increment mainly affected by contact and lateral resistance in this case. To elucidate the reason for the fill factor decrease, we studied the resistance analysis by potential mapping to determine the contact and the lateral series resistance. As a result, we found that the fill factor decrease was attributed to the relatively fast increase of contact resistance due to the dead layer thinning down with the lowest contact resistivity when the emitter was contacted with screen-printed silver electrode.

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고면저항 에미터 결정질 실리콘 태양전지의 전면전극 접촉저항 분석 (CONTACT RESISTANCE ANALYSIS OF HIGH-SHEET-RESISTANCE-EMITTER SILICON SOLAR CELLS)

  • 안준용;정주화;도영구;김민서;정지원
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2008년도 춘계학술대회 논문집
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    • pp.390-393
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    • 2008
  • To improve the blue responses of screen-printed single crystalline silicon solar cells, we investigated an emitter etch-back technique to obtain high emitter sheet resistances, where the defective dead layer on the emitter surface was etched and became thinner as the etch-back time increased, resulting in the monotonous increase of short circuit current and open circuit voltage. We found that an optimal etch-back time should be determined to achieve the maximal performance enhancement because of fill factor decrease due to a series resistance increment mainly affected by contact and lateral resistance in this case. To elucidate the reason for the fill factor decrease, we studied the resistance analysis by potential mapping to determine the contact and the lateral series resistance. As a result, we found that the fill factor decrease was attributed to the relatively fast increase of contact resistance due to the dead layer thinning down with the lowest contact resistivity when the emitter was contacted with screen-printed silver electrode.

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Substrate Temperature Effects on DC Sputtered Mo thin film

  • Ahn, Heejin;Lee, Dongchan;Um, Youngho
    • Applied Science and Convergence Technology
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    • 제26권1호
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    • pp.11-15
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    • 2017
  • To improve the adhesion of Mo thin film as a back contact material, a DC magnetron sputtering system was used to deposit in the form of a bi-layer on soda-lime glass. Films with low resistivity and good adhesion were obtained from this deposition, even though the two qualities were found be hard to obtain at the same time. The best Mo bi-layer showed a resistivity of $8.13{\times}10^{-4}{\Omega}{\cdot}cm$ at $500^{\circ}C$ and $3.0{\times}10^{-3}\;Torr$. The XRD measurements showed that the crystallites of the films were mainly oriented in the (110) direction, the FE-SEM images revealed that the resistivity of the Mo films decreased with increasing substrate temperature, which temperature reduction is accompanied by an increase of the grain size. These experimental results were analyzed using the Fuchs-Sondheimer theory. Our Mo bi-layer film with better crystallinity and lower resistivity can be suitably used as a back-contact layer for CIGS solar cells.

Over 8% efficient nanocrystal-derived Cu2ZnSnSe4 solar cells with molybdenum nitride barrier films in back contact structure

  • Pham, Hong Nhung;Jang, Yoon Hee;Park, Bo-In;Lee, Seung Yong;Lee, Doh-Kwon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.426.2-426.2
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    • 2016
  • Numerous of researches are being conducted to improve the efficiency of $Cu_2ZnSnSe_4$ (CZTSe)-based photovoltaic devices, which is one of the most promising candidates for low cost and environment-friendly solar cells. In this work, we concentrate on the back contact of the devices. A proper thickness of $MoSe_2$ in back contact structure is believed to enhance adhesion and ohmic contact between Mo back contact and absorber layer. Nevertheless, too thick $MoSe_2$ layers that are grown during high-temperature selenization process can impede the current collection, thus resulting in low cell performance. By applying molybdenum nitride as a barrier in back contact structure, we were able to control the thickness of $MoSe_2$ layer, which resulted in lower series resistance and higher fill factor of CZTSe devices. The phase transformation of Mo-N binary system was systematically studied by changing $N_2$ concentration during the sputtering process. With a proper phase of Mo-N fabricated by using an adequate partial pressure of $N_2$, the efficiency of CZTSe solar cells as high as 8.31% was achieved while the average efficiency was improved by about 2% with respect to that of the referent cells where no barrier layer was employed.

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Local Back Contact의 Boron-BSF 최적화에 따른 태양전지의 특성에 관한 연구

  • 안시현;박철민;조재현;장경수;백경현;이준신
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.394-394
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    • 2011
  • 최근 태양전지의 후면에서 통상적으로 사용되는 Al을 이용한 후면의 BSF형성과 그에 관한 연구보다 계면의 recombination을 줄이기 위하여 passivation 특성이 좋은 층을 후면에 형성하고 국부적으로 BSF를 형성하는 back contact을 형성하여 특성을 향상시키는 연구가 많이 이루어지고 있다. 본 연구는 이러한 local back contact을 boron-BSF를 이용하여 형성하고 passivation layer는 oxide를 이용한 구조를 SILVACO 2-dimension simulation을 이용하여 그 특성을 분석하였다. Boron-local back contact 구조에서 boron-BSF의 doping concentration, depth, lateral width, boron-BSF spacing 가변을 통해 태양전지의 특성변화에 대해서 spectrum response를 통한 QE 분석 및 I-V를 분석하여 최적화하였다.

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Na 도핑된 ZnTe 후면전극을 이용한 CdTe 태양전지의 안정성 개선에 관한 연구 (Stability Improvement of CdTe Solar Cells using ZnTe:Na Back Contact)

  • 차은석;박규찬;안병태
    • Current Photovoltaic Research
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    • 제3권1호
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    • pp.10-15
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    • 2015
  • Cu doping by copper or $Cu_2Te$ materials enhances p+ formation in CdTe near the back contact interface, allowing better formation of ohmic contact. However, the Cu in CdTe junction is also considered as a principal component of CdTe cell degradation. In this paper, Na-doped ZnTe layer was employed as a back contact material to improve the stability of CdTe solar cells. As a process variable, post $CdCl_2$ treatment of CdS/CdTe film was conducted before or after depositing ZnTe:Na on CdTe. The change of the photovoltaic properties of CdTe cells were investigated with aging time. Low-temperature photoluminescence analysis was conducted to describe the degradation mechanism. The result showed that the CdTe solar cells with better stability compare to Cu contact were achieved using an optimized ZnTe:Na back contact.

단결정 실리콘 태양전지의 후면 전극형성에 관한 비교분석 (Analysis of the Formation of Rear Contact for Monocrystalline Silicon Solar Cells)

  • 권혁용;이재두;김민정;이수홍
    • 한국전기전자재료학회논문지
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    • 제23권7호
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    • pp.571-574
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    • 2010
  • Surface recombination loss should be reduced for high efficiency of solar cells. To reduce this loss, the BSF (back surface field) is used. The BSF on the back of the p-type wafer forms a p+layer, which prevents the activity of electrons of the p-area for the rear recombination. As a result, the leakage current is reduced and the rear-contact has a good Ohmic contact. Therefore, the open-circuit-voltage (Voc) and fill factor (FF) of solar cells are increased. This paper investigates the formation of the rear contact process by comparing aluminum-paste (Al-paste) with pure aluminum-metal(99.9%). Under the vacuum evaporation process, pure aluminum-metal(99.9%) provides high conductivity and low contact resistance of $4.2\;m{\Omega}cm$, but It is difficult to apply the standard industrial process to it because high vacuum is needed, and it's more expensive than the commercial equipment. On the other hand, using the Al-paste process by screen printing is simple for the formation of metal contact, and it is possible to produce the standard industrial process. However, Al-paste used in screen printing is lower than the conductivity of pure aluminum-metal(99.9) because of its mass glass frit. In this study, contact resistances were measured by a 4-point probe. The contact resistance of pure aluminum-metal was $4.2\;m{\Omega}cm$ and that of Al-paste was $35.69\;m{\Omega}cm$. Then the rear contact was analyzed by scanning electron microscope (SEM).

결정질 태양전지 Local Back Contact 구조 후면에서의 B-H 결합에 의한 태양전지 특성 저하에 대한 연구

  • 송규완;유경열;이준신
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.420-420
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    • 2011
  • 결정질 태양전지에서 고효율 달성을 위한 LBC(Local Back Contact) 구조의 중요성이 강조되고 있다. LBC 구조에서 후면 passivation 형성을 위한 SiNX layer를 PECVD로 형성 시, 실리콘 bulk 내로 H+ 원자가 침투하여 Boron과 결합하게 되면 Boron이 bulk 내에서 dopant로 작용을 하지 못하게 되어, 후면에서 p-층을 형성하고, 이는 VOC의 저하를 야기 시킨다. 본 연구에서는 LBC 구조에서 후면 passivation 시 bluk 내 B-H결합으로 인한 태양전지 특성 저하 문제를 해결하기 위해, SiNX를 증착하기 전에 얇은 산화막 barrier를 성장시켜 Bulk 내에 H+ 침투를 최소화 하였다. PECVD를 이용한 N2O 플라즈마 처리, HNO3 Wet Chemical Oxidation의 방법을 통해 substrate와 SiNX 사이에 얇은 oxide 층을 형성하였으며, 각각의 조건에 대해 lifetime 측정을 실시하였다. 그 결과 SiON/SiNx를 이용한 막의 lifetime이 $94.5{\mu}s$로 가장 우수하였고, Reference에 비해 25.4% 증가함을 확인할 수 있었다. 그러나 HNO3/SiNx에서는 30.6%, SiON에서는 84.3% 감소함을 확인하였다. Voc 측정 결과 또한 SiON/SiNx를 이용한 막이 670mV로 가장 우수함을 확인할 수 있었다. 본 연구를 통해 LBC구조에서 후면에 얇게 SiON/SiNx막을 형성함으로서 H+이온의 침투를 저지하여 후면 B-H결합을 막아 태양전지 특성 저하를 감소시키는 것을 확인할 수 있었다.

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