• Journal of the Institute of Electronics Engineers of Korea SD
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• v.38 no.7
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• pp.473-478
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• 2001

Ferroelectric P $b_{0.99}$［(Z $r_{0}$ 6S $n_{0.4}$)/0.9/ $Ti_{0.1}$］0.98/N $b_{0.02}$ $O_3$(PNZST) thin films were deposited by a RF magnetron sputtering on L $a_{0.5}$S $r_{0.5}$Co $O_3$(LSCO)/Pt/Ti/ $SiO_2$/Si substrate using a PNZST target with excess PbO of 10 mole%. The crystallinity and electrical properties of the thin films annealed at various temperature and time were investigated. The thin films deposited at the substrate temperature of 500 $^{\circ}C$ and the power of 80 W were crystallized to a perovskite phase after rapid thermal annealing(RTA). The thin films annealed at 650 $^{\circ}C$ for 10 seconds in air exhibited the good crystal structures. The remanent polarization and coercive field of the PNZST capacitor were about 20 $\mu$C/$\textrm{cm}^2$ and 50 kV/cm, respectively. The reduction of the polarization after 2.2$\times$10$^{9}$ switching cycles was less than 10 %..10 %......

• Journal of Korea Foundry Society
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• v.30 no.4
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• pp.147-150
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• 2010

An eco-friendly production technique of Al-8.6Ti-0.025C refiner was developed by melting a Al-Ti master alloy in a graphite crucible, in which the potential nucleation site, TiC effectively formed by the spontaneous in-situ reaction between excessive Ti and carbon from graphite crucible. The A3003 alloy refined by the Al-8.6Ti-0.025C showed effectively refined macrostructure and enhanced mechanical properties comparable to the commercial Al-Ti-B refiner. The effective refinement was achieved in a shorter compare to the melt-treating time commercial Al-Ti-B refiner.

• Journal of Astronomy and Space Sciences
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• v.5 no.1
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• pp.9-18
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• 1988

Gamma Cassiopeae has been observe at Yonsei University Observatory(YUO) for 31 nights in the period 1983-1987 and a total of 312 UBV observations(104 in each colour) was secured. Light curves of ${\gamma}$ Cas in V, B-V, and U-B have been constructed with the YUO data; among them we present selected light curves of 5 different long nights. Discussed are the general photometric behaviour of ${\gamma}$ Cas, especially in connection with B-V changes, V/R variations of $H\alpha$ and H$\beta$, and high velocity narrow component(hvnc) exhibited in the far UV. Six spectral image sets of $\varepsilon$Per archived on IUE satellite are reduced and their line profiles in C IV and Si IV resonance lines are analyzed to find out any change, but the evidence is unlikely.

• Proceedings of the Korean Magnestics Society Conference
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• 2007.05a
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• pp.245.2-245.2
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• 2007

• Electronics and Telecommunications Trends
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• v.27 no.5
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• pp.109-125
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• 2012

액정 디스플레이의 산업 규모는 놀라운 속도로 확대되고 있다. 그 원동력이 된 것이 박막 트랜지스터(Thin Film Transistor: TFT) 기술의 발전에 있다. 비정질 실리콘(Amorphous Silicon: a-Si) TFT 기술은 대형 액정 TV를 탄생시키고, 저온 폴리실리콘 TFT는 휴대전화 등의 중소형 디스플레이와 AMOLED의 핵심 기술이 되었다. 또한 다양한 TFT 기술 seeds가 계속해서 출현하여 정보 인프라와 생활 스타일에 맞춘 새로운 정보기기의 출현을 예감시키고 있다. 새로운 응용제품의 요구는 새로운 기술 개발의 견인차가 되고 있다. 최근에는 이러한 요구에 따라 산화물 TFT, 마이크로 결정실리콘(microcrystalline Si: ${\mu}c-Si$) TFT, 유기물 TFT 등의 기술도 활발하게 연구개발되고 있다. 본고에서는 지금까지의 TFT 기술 개발의 발전사를 뒤돌아보고 지금부터의 발전 방향을 박막 트래지스터 기술 이노베이션 관점으로부터 전망하였다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.10
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• pp.802-807
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• 2001

The (S $r_{0.85}$C $a_{0.15}$)Ti $O_{3}$(SCT) thin films are deposited on Pt-coated electrode (Pt/TiN/ $SiO_2$/Si) using RF sputtering method. The composition of SCT thin films deposited on Si substrate at woom temperature is close to stoichiometry(1.102 in A/B ratio). The maximum dielectric constant of SCT thin films is obtained by annealing at 600[$^{\circ}C$]. The capacitance characteristics had a stable value within $\pm$4[%]. The drastic decrease of dielectric constant and increase of dielectric loss in SCT thin films is observed above 200[kHz]. SCT thin films used in this study show the phenomena of dielectric relaxation with the increase of frequencey.cey.

• Journal of the Semiconductor & Display Technology
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• v.6 no.3
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• pp.41-45
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• 2007

The (SrCa)$TiO_3$(SCT) thin films were deposited on Pt-coated electrode(Pt/TiN/$SiO_2$/Si) using RF sputtering method according to the deposition condition. The crystallinity of SCT thin films were increased with increase of deposition temperature in the temperature range of $100{\sim}500[^{\circ}C]$. The optimum conditions of RF power and Ar/$O_2$ ratio were 140[W] and 80/20, respectively. Deposition rate of SCT thin films was about $18.75[{\AA}/min]$ at the optimum condition. The composition of SCT thin films deposited on Si substrate is close to stoichiometry (1.081 in A/B ratio). The maximum dielectric constant of SCT thin film was obtained by annealing at $600[^{\circ}C]$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.244-247
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• 1999

The(Sr$\sub$0.85/Ca$\sub$0.15/) TiO$_3$(SCT) thin films are deposited on Pt-coated electrode(Pt/TiN/SiO$_2$/Si) using RF sputtering method. The composition of SCT thin films deposited on Si substrate at room temperature is close to stoichiometry(1.102 in A/B ratio). Also, SCT thin films deposited on Pt-coated electrodes have the cubic perovskite structure and polycrystalline state. The maximum dielectric constant of SCT thin films is obtained by annealing at 600[$^{\circ}C$].The dielectric constant changes almost linearly in temperature ranges of -80~+90[$^{\circ}C$].

• Journal of the Korean Ceramic Society
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• v.14 no.3
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• pp.182-186
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• 1977

Compression creep of polycrystalline magnesia at about 1$600^{\circ}C$ under 5-40kg/$\textrm{cm}^2$ was examined, and also the effects on it of minor additives such as B2O3, CaO and SiO2 were examined. The high temperature creep of high purity magnesia was primarily controlled by the Nabarro-Herring type lattice diffusion of Mg in magnesia. B2O3 was included in the molten state and showed on increasing B2O3 contents. Some of the CaO and SiO2 were also included in the molten state, promoted the grain boundary sliding, so that creep rate was increased with an increasing content of them.

• Proceedings of the KIEE Conference
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• 2006.07c
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• pp.1398-1399
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• 2006

현재 상용화된 OLED 소자는 최대 단점인 수분 취약성의 원인으로 top emission과 flexible 타입으로 제조되는데 장애가 되고 있다. 따라서 top emission 방식과 flexible한 소자를 실현하기 위해 수분 및 산소 침투를 방지하기 위한 유전체 막의 실험이 진행되고 있는데, 본 실험에서는 기존의 PECVD보다 plasma의 density가 높은 HDP(High Density Plasma)-CVD를 사용해 SiOx 및 SiNx 유전체 film을 증착하였고 MOCON 테스트를 통한 수분침투 방지막으로써의 가능성을 검증하였다.