• 제목/요약/키워드: Au thin film

검색결과 302건 처리시간 0.028초

이종재료를 사용한 다층 박막에서의 잔류응력 평가 (Evaluation of the Residual Stress on the Multi-layer Thin Film made of Different Materials)

  • 심재준;한근조;김태형;안성찬;한동섭;이성욱
    • 한국정밀공학회지
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    • 제20권9호
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    • pp.135-141
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    • 2003
  • MEMS structures generally have been fabricated using surface-machining method, but the interface failure between silicon substrate and evaporated thin film frequently takes place due to the residual stress inducing by the applied the various loads. And the very important physical property in the heated environment is the linear coefficient of thermal expansion. Therefore this paper studied the residual stress caused the thermal loads in the thin film and introduced the simple method to measure the trend of the residual stress by the indentation. Specimens were made of materials such as Al, Au and Cu and thermal load was applied repeatedly. The residual stress was measured by nano-indentation using AFM and FEA. The existence of the residual stress due to thermal load was verified by the experimental results. The indentation length of the thermal loaded specimens increased minimum 11.8% comparing with the virgin thin film caused by tensile residual stress. The finite element analysis results are similar to indentation test.

Study of surface state density of hydrogenated amorphous silicon thinfilm transistors by admittance spectroscopy

  • Hsieh, Ming-Ta;Chang, Chan-Ching;Chen, Jenn-Fang;Zan, Hsiao-Wen;Yen, Kuo-Hsi;Shih, Ching-Chieh;Chen, Chih-Hsien;Lee, Yeong-Shyang;Chiu, Hsin-Chih
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.904-907
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    • 2007
  • We reported a simplified circuit model to investigate the interface states and the quality of a-Si film based on a MIS structure using admittance spectroscopy. The model can be employed easily to monitor the fabrication process of thin-film transistor and to obtain the important parameters.

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Dielectric properties of Pt/PVDF/Pt modified by low energy ion beam irradiation

  • Sung Han;Yoon, Ki-Hyun;Jung, Hyung-Jin;Koh, Seok-Keun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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    • pp.110-110
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    • 1999
  • Polyvinylidenefluoride (PVDF) is most used in piezoelectric polymer industry. Electrode effect on the electrical properties of PVDF has been investigated. al has been used due to fair adhesion for PVDF. Work function of metal plays an important role on the electrical properties of ferroelectrics for top and /or bottom electrode. However, Al has much lower work function than Pt or Au and so leakage current of Al/PVDF/Al may be large. Pt or Au has not been used for electrode of PVDF system due to poor adhesion. PVDF irradiated by Ar+ ion beam with O2 environment takes good adhesion to inert metal. Contact angle of PVDF to triple distilled water was reduced from 75$^{\circ}$ to 31$^{\circ}$ at 1$\times$1015 Ar+/cm2. Working pressure was 2.3$\times$10-4 Torr and base pressure was 5$\times$10-6 Torr. Pt was deposited by ion beam sputtering and thickness of pt film was about 1000$\AA$. in previous study, enhancing adhesion of Pt on PVDF was shown. in this study, effect of electrode on PVDF will be represented.

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Soft Lithographic Patterning Method for Flexible Graphene-based Chemical Sensors with Heaters

  • Kang, Min-a;Jung, Min Wook;Myung, Sung;Song, Wooseok;Lee, Sun Suk;Lim, Jongsun;Park, Chong-Yun;An, Ki-Seok
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.176.2-176.2
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    • 2014
  • In this work, we demonstrated that the fabrication of flexible graphene-based chemical sensor with heaters by soft lithographic patterning method [1]. First, monolayer and multilayer graphene were prepared by thermal chemical vapor deposition transferred onto SiO2 / Si substrate in order to fabrication of patterned-sensor and -heater. Second, patterned-monolayer and multilayer graphene were detached through soft lithography process, which was transferred on top and bottom sides of PET film. Third, Au / Ti (Thickness : 100/30 nm) electrodes were deposited end of the patterned-graphene line by sputtering system. Finally, we measured sensor properties through injection of NO2 and CO2 gas on different temperature with voltage change of graphene heater.

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Au nano array formed on patterened $Al_2O_3$(0006)

  • 황재성;강현철;서옥균;오필건;이성표;이수용;김수남;김재명;조인화;노도영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.402-402
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    • 2010
  • The formation of Au nano particles from thin films on patterned substrates depends sensitively on film thickness and time. The nano Au line and shape formed by annealing Au films on patterned oxide substrates are different from those formed on semiconductor. In this experiment, we deposited thin Au films on patterned $Al_2O_3$(0006) using E-beam evaporator, and annealed them at various temperatures and thickness under various conditions by RTA. We measured behavior of the Au during annealing Au structure and shape are changed when Au film becomes thicker. The shape of the resultant Au nano particles and their coarsening process are investigated using SEM and XRD.

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가연성 가스 인식을 위한 $SnO_2$계열의 박막 가스센서 ($SnO_2$-based thin film gas sensors in array for recognizing inflammable gases)

  • 이대식;심창현;이덕동
    • 한국진공학회지
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    • 제10권3호
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    • pp.289-297
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    • 2001
  • 가연성 가스의 검지 및 인식을 위하여, SnO$_2$계열의 4가지 종류의 박막을 형성하였다. 감지막 형성을 위하여, Sn, Pt/Sn, Au/Sn 그리고 Pt, Au/Sn 막을 Sn의 열증착과 귀금속의 스퍼터링으로 증착하였다. 증착된 박막들을 $700^{\circ}C$ 정도에서 2 시간 열산화시켜 $SnO_2$계열의 감지막을 형성하였다. 제작된 박막은 tetragonal구조의 $SnO_2$이었고, 가스 흡착을 위한 가스 흡착점과 기공도를 많이 갖고 있었다. 스퍼터로 형성된 박막보다 열산화법으로 형성된 박막이 고감도를 보였다. 제작 박막들은 작업환경기준치정도의 저농도에서 측정 가연성 가스(부탄, 프로판, LPG, 일산화탄소)에 대해 고감도와 재현성을 나타내었다. 특히, 백금(30 $\AA$)을 첨가한 박막이 LPG와 부탄 가스에 대해, 순수 열산화된 $SnO_2$ 박막이 프로판과 일산화탄소에 대하여 가장 고감도를 나타내었다. 이들 센서들의 각 가스별로 차별화된 감도패턴을 이용하여 주성분 분석 기법을 통해 환경기준치(LEL, TLV) 범위에서 부탄, 프로판, LPG, 일산화탄소와 같은 가연성 가스의 종류 인식 및 정량을 인식할 수 있었다.

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Sol-gel법에 의한 LiCoO2 박막의 합성과 특성평가 (Synthesis and characterization of LiCoO2 thin film by sol-gel process)

  • 노태호;연석주;고태석
    • 한국결정성장학회지
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    • 제24권3호
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    • pp.94-98
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    • 2014
  • $LiCoO_2$는 박막 베터리의 양극재료로써 많은 관심을 받고 있다. 본 연구에서는 스핀 코터를 이용한 졸-겔 합성공정과 열처리 과정에 의해서 Au 지지체 위에 $LiCoO_2$ 박막을 합성하였다. 합성된 박막의 구조는 X-선회절분석, 라만분광 광도계를 이용하여 분석하였다. 박막의 입자 형태는 전자현미경에 의해 관찰하였다. X-선회절분석, 라만분광광도계의 결과로부터, $550^{\circ}C$$750^{\circ}C$에서 합성된 박막은 스피넬구조와 층상 암염 형 구조를 가지는 박막으로 보이며, $650^{\circ}C$에서 합성된 박막은 층상 암염 형 구조와 스피넬 구조가 혼재되어져 있는 것으로 생각된다. $750^{\circ}C$에서 합성된 박막은 다른 낮은 온도에서 합성된 박막보다 큰 결정질의 균일한 분포의 입자를 가지는 것으로 확인되었다.

$Au/Cd_{1-x}Zn_x/Te(x=20%)/Au$ 구조의 전기적 특성 및 방사선 탐지 특성 (The Electrical and Radiation Detection Properties of $Au/Cd_{1-x}Zn_x/Te(x=20%)/Au$ Structure)

  • 최명진;왕진석
    • E2M - 전기 전자와 첨단 소재
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    • 제10권1호
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    • pp.39-44
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    • 1997
  • Bulk type radiation detector of Au/Cd$_{1-x}$ Zn$_{x}$Te(x=20%)/Au structure using Cd$_{1-x}$ Zn$_{x}$Te(x=20%) wafer(3x4xl mm$^{3}$) grown by high pressure Bridgman method has been developed. We etched wafer surfaces with 2% Br-methanol solution and coated gold thin film on the surfaces by electroless deposition method for 5 min. in 49/o HAuCI$_{3}$ 4H20 solution. Initial etch rates of Cd, Zn and Te were 46%, 12% and 42% respectively. After etched, the surface of wafer was slightly revealed to Te rich condition. The leakage current was increased with etch time, but it didn't exceed 3nA at 50volt. The thickness of Au film was about 100nm by Rutherford Backscattering Spectroscopy(RBS). The resolution were 6.7% for 22.1 keV photon from 109 $^{109}$ Cd and 8.2% for 59.5 keV photon from $^{241}$ Am. The radiation detector such as Au/Cd$_{1-x}$ Zn$_{x}$Te(x=20%)/Au structure was more effective to monitor the low energy gamma radiation.iation.

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다층박막을 이용한 Ga-doped ZnO 투명전도막의 특성 (The Characteristics of Ga-doped ZnO Transparent Thin Films by using Multilayer)

  • 김봉석;이규일;강현일;이태용;오수영;이종환;송준태
    • 한국전기전자재료학회논문지
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    • 제20권12호
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    • pp.1044-1048
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    • 2007
  • With development of electronic products the demands for miniaturization and weight-lightening have increased until a recent date. Accordingly, The effort to substitute glass substrates was widely made. However, polymer substrates have weak point that substrates were damaged at high temperature. In this paper, we deposited transparent conductive film at low temperature. And we inserted Au thin film between oxide to compensate for deteriorated electrical characteristics. Ga-doped ZnO(GZO) multilayer coatings were deposited on glass substrate by DC sputtering. The optimization of deposition conditions of both AZO and Au layers were performed to obtain better electrical and optical characteristics in advance. We presumed that the properties of multilayer were affected by the deposition process of both GZO and Au layers. The best multilayer coating exhibited the resistivity of $2.72{\times}10^{-3}\;{\Omega}-cm$ and transmittance of 77 %. From these results, we can confirm a possibility of the application as transparent conductive electrodes.