• 제목/요약/키워드: Atomic force microscopy

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Probing of Surface Potential Using Atomic Force Microscopy

  • Kwon, Owoong;Kim, Yunseok
    • Applied Microscopy
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    • 제44권3호
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    • pp.100-104
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    • 2014
  • As decreasing device size, probing of nanoscale surface properties becomes more significant. In particular, nanoscale probing of surface potential has paid much attention for understanding various surface phenomena. In this article, we review different atomic force microscopy techniques, including electrostatic force microscopy and Kelvin probe force microscopy, for measuring surface potential at the nanoscale. The review could provide fundamental information on the probing method of surface potential using atomic force microscopy.

Advanced atomic force microscopy-based techniques for nanoscale characterization of switching devices for emerging neuromorphic applications

  • Young-Min Kim;Jihye Lee;Deok-Jin Jeon;Si-Eun Oh;Jong-Souk Yeo
    • Applied Microscopy
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    • 제51권
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    • pp.7.1-7.9
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    • 2021
  • Neuromorphic systems require integrated structures with high-density memory and selector devices to avoid interference and recognition errors between neighboring memory cells. To improve the performance of a selector device, it is important to understand the characteristics of the switching process. As changes by switching cycle occur at local nanoscale areas, a high-resolution analysis method is needed to investigate this phenomenon. Atomic force microscopy (AFM) is used to analyze the local changes because it offers nanoscale detection with high-resolution capabilities. This review introduces various types of AFM such as conductive AFM (C-AFM), electrostatic force microscopy (EFM), and Kelvin probe force microscopy (KPFM) to study switching behaviors.

A New Calibration Method of Atomic Force Microscopy

  • Hyunkyu Kweon
    • International Journal of Precision Engineering and Manufacturing
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    • 제2권2호
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    • pp.11-16
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    • 2001
  • This paper presents an in self-calibration method to corrent the Z-directional distortion of AFM(Atomic Force Microscopy).

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Morphological Discretion of Basidiospores of the Puftball Mushroom Calostoma by Electron and Atomic Force Microscopy

  • Kim, Mi-Sun;Kim, Ki-Woo;Jung, Hack-Sung
    • Journal of Microbiology and Biotechnology
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    • 제17권10호
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    • pp.1721-1726
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    • 2007
  • Comparative morphology among species of the genus Calostoma, including C. cinnabarina, C. ravenelii, and C. japonicum, was investigated by scanning electron microscopy and atomic force microscopy. Spore morphology of C. cinnabarina and C. ravenelii showed no dramatic differences by light microcopy and scanning electron microscopy. To differentiate these species, atomic force microscopy was employed. Quantitative analysis of the surface roughness of basidiospores revealed subtle differences in height fluctuation at the nanometer scale between the species of Calostoma. Basidiospores of C. cinnabarina had a relatively rougher surface than those of C. ravenelii at $2.0{\times}2.0\;{\mu}m^2$ scan areas.

Tribological Properties of Annealed Diamond-like Carbon Film Synthesized by RF PECVD Method

  • Choi, Won-Seok
    • Transactions on Electrical and Electronic Materials
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    • 제7권3호
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    • pp.118-122
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    • 2006
  • Diamond-like carbon (DLC) films were prepared on silicon substrates by the RF PECVD (Plasma Enhanced Chemical Vapor Deposition) method using methane $(CH_4)$ and hydrogen $(H_2)$ gas. We examined the effects of the post annealing temperature on the tribological properties of the DLC films using friction force microscopy (FFM). The films were annealed at various temperatures ranging from 300 to $900^{\circ}C$ in steps of $200^{\circ}C$ using RTA equipment in nitrogen ambient. The thickness of the film was observed by scanning electron microscopy (SEM) and surface profile analysis. The surface morphology and surface energy of the films were examined using atomic force microscopy and contact angle measurement, respectively. The hardness of the DLC film was measured as a function of the post annealing temperature using a nano-indenter. The tribological characteristics were investigated by atomic force microscopy in FFM mode.

다중주파수 AFM 원리 및 연구 동향 (Principle and Applications of Multifrequency Atomic Force Microscopy)

  • 이수일;김일광
    • 한국소음진동공학회:학술대회논문집
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    • 한국소음진동공학회 2014년도 춘계학술대회 논문집
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    • pp.88-89
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    • 2014
  • In dynamic force microscopy, the cantilever oscillates at a resonant frequency, and the tip deflection is measured at this frequency. The cantilever deflection is, however, highly nonlinear, and the surface properties can be embedded in the deflection at the frequencies other than the original resonant frequency of the cantilever. Multifrequency atomic force microscopy includes the excitation and detection of the deflection in two or more frequencies which are higher harmonics or eigenmodes. This can overcome the limitations of conventional atomic force microscope. We reviewed the multifrequency atomic force microscopy and its applications in many fields.

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DLC 코팅 마모면에 대한 원자력 현미경을 이용한 고찰 (An investigation of worn DLC coatings using atomic force microscopy)

  • 조경만;안효석
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 2001년도 제33회 춘계학술대회 개최
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    • pp.299-304
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    • 2001
  • Tribofilms formed on worn surface protect the DLC coating surface and decrease the friction coefficient. However it is very difficult to evaluate their micromechanical properties due to their small thickness, inhomogeneity and discontinuity. The phase contrast images in tapping mode atomic force microscopy allow an estimation of inhomogeneity in micromechanical properties of the sample surface. The purpose of this investigation is to demonstrate how the phase contrast images contribute to the characterization of thin tribofilms.

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Atomic Force Microscopy와 신경망을 이용한 플라즈마 진단 (Plasma Diagnosis by Using Atomic Force Microscopy and Neural Network)

  • 박민근;김병환
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 심포지엄 논문집 정보 및 제어부문
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    • pp.138-140
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    • 2006
  • A new diagnosis model was constructed by combining atomic force microscopy (AFM), wavelet, and neural network. Plasma faults were characterized by filtering AFM-measured etch surface roughness with wavelet. The presented technique was evaluated with the data collected during the etching of silicon oxynitride thin film. A total of 17 etch experiments were conducted. Applying wavelet to AFM, surface roughness was detailed into vertical, horizon%at, and diagonal components. For each component, neural network recognition models were constructed and evaluated. Comparisons revealed that the vertical component-based model yielded about 30% improvement in the recognition accuracy over others. The presented technique was evaluated with the data collected during the etching of silicon oxynitride thin film. A total of 17 etch experiments were conducted

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