• 한국분말재료학회지
• /
• 제10권1호
• /
• pp.51-56
• /
• 2003

To investigate the effect of the parameters of the plasma arc discharge process on the particle formation and particle characteristics of the iron nano powder, the chamber pressure, input current and the hydrogen volume fraction in the powder synthesis atmosphere were changed. The particle size and phase structure of the synthesized iron powder were studied using the FE-SEM, FE-TEM and XRD. The synthesized iron powder particle had a core-shell structure composed of the crystalline $\alpha$-Fe in the core and the crystalline $Fe_3O_4$ in the shell. The powder generation rate and particle size mainly depended on the hydrogen volume fraction in the powder synthesis atmosphere. The particle size increased simultaneously with increasing the hydrogen volume fraction from 10% to 50%, and it ranged from about 45nm to 130 nm.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
• /
• pp.119.1-119.1
• /
• 2014

Toxic waste disposal: Many people think that when toxic waste is dumped into the ocean or into the air, it disappears. This belief is incorrect. Rather than disappearing, it accumulates over time and slowly destroys the environment. Ultimately, it leads to the destruction of human race. Plasma is environmentally friendly: Plasma is environmentally friendly because it is created and disappears. When plasma is formed on the earth, you need certain conditions such as accelerating electrons by an electrical discharge or a particle accelerator. When this is gone, plasma completely disappears, leaving no impact on the environment. Plasmas produce radicals: Even if plasma density is low at atmospheric pressure, many radicals (excited states of molecules) are created. These radicals are chemically very aggressive. So instead of using harmful chemicals, plasma can be utilized for less of an impact on the environment. Plasma can reach very high temperatures: Plasma is also useful because when you control the density, you can easily reach high temperatures up to $5000{\sim}6000^{\circ}C$ at atmosphere pressure. Because of this heat and the chemical aggressiveness of the plasma, there are many green applications for plasma technology. Pulsed power technology: Pulsed electric field for extraction, drying and killing bacteria. Treatment of biological tissue by pulsed electric fields: Extraction of substances from cells: Sterilisation, Medical applications, Growth stimulation, Food preparation. Each application has its specialities, especially with respect to pulse shape and electric field strength.

• 열처리공학회지
• /
• 제20권2호
• /
• pp.78-83
• /
• 2007

CrN coatings were deposited by cathodic arc ion plating method on the SKD11 steel substrates. Atmosphere temperature of $350^{\circ}C$, arc current of 90 A, nitrogen partial pressure of 1.0-5.3 Pa, and negative bias voltage of 30-135 V were selected. The characteristics of microstructure were investigated with XRD. Hardness, adhesion and friction coefficient measured by microhardness tester, scratch tester, and ball on disk tribometer. Microstructures depended on nitrogen partial pressure and bias voltage. The preferred orientation of the films was changed from (200) to (111) with decreasing pressure and increasing bias voltage. Adhesion properties related with microstructure, but microstructure changes slightly influenced on hardness and friction properties. The critical load.($Lc_1$) and hardness of CrN films deposited at 5.3 Pa, -30 V condition were 55 N(HF1), $2157{\pm}47\;Hk_{0.025}$. The friction coefficient were about 0.5 under dry condition.

• 한국세라믹학회지
• /
• 제51권3호
• /
• pp.201-207
• /
• 2014

High-purity aluminum nitride nanopowders were synthesized using an RF induction thermal plasma instrument. Ammonia and nitrogen gases were used as sheath gas to control the reactor atmosphere. Synthesized AlN nanopowders were characterized by XRD, SEM, TEM, EDS, BET, FTIR, and N-O analyses. It was possible to synthesize high-purity AlN nanoparticles through control of the ammonia gas flow rate. However, additional process parameters such as plasma power and reactor pressure had to be controlled for the production of high-purity AlN nanopowders using nitrogen gas.

• 조명전기설비학회논문지
• /
• 제27권6호
• /
• pp.95-99
• /
• 2013

Furnace is currently the most important doping process using POCl3 in solar cell. However furnace need an expensive equipment cost and it has to purge a poisonous gas. Moreover, furnace typically difficult appling for selective emitters. In this study, we developed a new atmospheric pressure plasma source, in this procedure, we research the atmospheric pressure plasma doping that dopant is phosphoric acid($H_3PO_4$). Metal tube injected Ar gas was inputted 5 kV of a low frequency(scores of kHz) induced inverter, so plasma discharged at metal tube. We used the P type silicon wafer of solar cell. We regulated phosphoric acid($H_3PO_4$) concentration on 10% and plasma treatment time is 90 s, 150 s, we experiment that plasma current is 70 mA. We check the doping depth that 287 nm at 90 s and 621 nm at 150 s. We analysis and measurement the doping profile by using SIMS(Secondary Ion Mass Spectroscopy). We calculate and grasp the sheet resistance using conventional sheet resistance formula, so there are 240 Ohm/sq at 90 s and 212 Ohm/sq at 150 s. We analysis oxygen and nitrogen profile of concentration compared with furnace to check the doped defect of atmosphere.

• 한국응용과학기술학회지
• /
• 제40권1호
• /
• pp.71-80
• /
• 2023

실버 페이스트는 상대적으로 낮은 열처리로 공정이 가능하기 때문에 전자 소자 응용분야에서 유용한 전극 재료이다. 본 연구에서는 은 페이스트 전극에 대기압 플라즈마 제트를 이용하여 전극 표면을 처리 했다. 이 플라즈마 제트는 11.5 kHz 작동 주파수에서 5.5 ~ 6.5 kV의 고전압을 사용하여 아르곤 분위기에서 생성되었다. 플라즈마 제트는 대기압에서 수행함으로써 인쇄 공정에 더 유용할 수 있다. 플라즈마 처리시간, 인가된 전압, 가스유량에 따라 전극의 표면은 빠르게 친수성화 되었으며 접촉각의 변화가 관찰되었다. 또한, 대면적 샘플에서 플라즈마 처리 후 접촉각의 편차가 없었는데, 이는 기판의 크기에 관계없이 균일한 결과를 얻을 수 있었다는 것을 의미한다. 본 연구의 결과는 대면적 전자소자의 제조 및 향후 응용 분야에서 적층 구조를 형성하는데 매우 유용할 것으로 기대된다.

• 대한기계학회논문집B
• /
• 제32권11호
• /
• pp.832-840
• /
• 2008

Ablation occurs at irradiance beyond $10^9\;W/cm^2$ with nanosecond and short laser pulses focused onto any materials. Phenomenologically, the surface temperature is instantaneously heated past its vaporization temperature. Before the surface layer is able to vaporize, underlying material will reach its vaporization temperature. Temperature and pressure of the underlying material are raised beyond their critical values, causing the surface to explode. The pressure over the irradiated surface from the recoil of vaporized material can be as high as $10^5\;MPa$. The interaction of high power nanosecond laser with a thin metal in air has been investigated. The nanosecond pulse laser beam in atmosphere generates intensive explosions of the materials. The explosive ejection of materials make the surrounding gas compressed, which form a shock wave that travels at several thousand meters per second. To understand the laser ablation mechanism including the heating and ionization of the metal after lasing, the temporal evolution of shock waves is captured on an ICCD camera through laser flash shadowgraphy. The expansion of shock wave in atmosphere was found to agree with the Sedov's self-similar spherical blast wave solution.

• 한국진공학회지
• /
• 제13권3호
• /
• pp.132-138
• /
• 2004

대기압의 공기 중에서 코로나 방전 플라스마에 대한 특성을 연구하기 위해 wire-cylinder 형태의 반응로에서 FCT(flux-corrected transport) 알고리즘과 FEM(finite element method) 방법을 적용한 자체 모순이 없는 1차원 수치적 모델을 사용하였다. 코로나 방전 반응로에 펄스 전압과 직류 전압을 인가하였을 때, 플라스마 밀도의 분포를 계산하여 전압의 변화에 따른 플라스마 특성의 변화를 연구하였으며, 또한 반응로의 크기 변화에 따른 플라스마의 특성 변화를 연구하였다. 이 결과로 얻어지는 활동 반경(active radius)의 변화를 Peek의 실험값과 비교해 보았다. 이와 같은 코로나 방전 플라스마에 대한 수치적 계산 결과는 방전 과정에서 일어나는 물리적 특성을 잘 설명하여 환경오염 물질 제거를 위한 반응로의 최적 설계를 위해 유용하게 쓰일 수 있을 것이다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
• /
• 제55권3호
• /
• pp.122-126
• /
• 2006

In this study, composite materials were put to dry interfacial treatment by use of plasma technology It has been presented that the optimum parameters for the best wettability of the samples at the time of generation of plasma were oxygen atmosphere, 0.1 Torr of system pressure, 100 W of discharge power, and 3 minutes of discharge time. The decrease in surface potential of charged samples by corona discharge indicates that the amount of accumulated electrical charges reduces and the charges that have been injected lessen rapidly when the duration of UV irradiation increases. The surface resistivity and the tensile strength of plasma treated samples, a longer UV irradiation time resulted in decreased insulation.

• 한국표면공학회:학술대회논문집
• /
• 한국표면공학회 2001년도 추계학술발표회 초록집
• /
• pp.29-30
• /
• 2001

This paper presents some results of plasma nitriding on hard chromium deposit. The substrates were C45 steel and $30~50{\;}\mu\textrm{m}$ of chromium deposit by electroplating was formed. Plasma nitriding was carried out in a plasma nitriding system with $95NH_3{\;}+{\;}SCH_4$ atmosphere at the pressure about 600 Pa and different temperature from $450^{\circ}C{\;}to{\;}720^{\circ}C$ for various time. Optical microscopy and X-ray diffraction were used to evaluate the characteristics of surface nitride layer formed by nitrogen diffusion from plasma atmosphere inward iCr coating and interface carbide layer formed by carbon diffusion from substrate outward Cr coating. The microhardness was measured using microhareness tester at the load of 100 gf. Corrosion resistance was evaluated using the potentiodynamic measurement in 3.5% NaG solution. A saturated calomel electrode (SiCE) was used as the reference electrode. Fig.1 shows the typical microstructures of top surface and cross-section for nitrided and unnitrided samples. Aaer plasma nitriding a sandwich structure was formed consisting of surface nitride layer, center chromium layer and interface carbide layer. The thickness of nitride and carbide layers was increased with the increase of processing temperature and time. Hardness reached about 1000Hv after nitriding while 900Hv for unnitrided hard chromium deposit. X-ray diffraction indicated that surface nitrided layer was a mixture of $Cr_2N$ and CrN at low temperature and erN at high temperature (Fig.2). Anodic polarization curves showed that plasma nitriding can greatly improve the corrosion resistance of chromium e1ectrodeposit. After plasma nitriding, the corrosion potential moved to noble direction and passive current density was lower by 1 to 4 orders of magnitude compared with chromium deposit(Fig.3).