• Title/Summary/Keyword: Atmosphere pressure plasma

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Effect of the Process Parameters on the Fe Nano Powder Formation in the Plasma Arc Discharge Process (플라즈마 아크 방전법에서 Fe 나노 분말 형성에 미치는 공정변수의 영향)

  • 이길근;김성규
    • Journal of Powder Materials
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    • v.10 no.1
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    • pp.51-56
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    • 2003
  • To investigate the effect of the parameters of the plasma arc discharge process on the particle formation and particle characteristics of the iron nano powder, the chamber pressure, input current and the hydrogen volume fraction in the powder synthesis atmosphere were changed. The particle size and phase structure of the synthesized iron powder were studied using the FE-SEM, FE-TEM and XRD. The synthesized iron powder particle had a core-shell structure composed of the crystalline $\alpha$-Fe in the core and the crystalline $Fe_3O_4$ in the shell. The powder generation rate and particle size mainly depended on the hydrogen volume fraction in the powder synthesis atmosphere. The particle size increased simultaneously with increasing the hydrogen volume fraction from 10% to 50%, and it ranged from about 45nm to 130 nm.

Enviromental Application of Plasma Technology

  • Lee, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.119.1-119.1
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    • 2014
  • Toxic waste disposal: Many people think that when toxic waste is dumped into the ocean or into the air, it disappears. This belief is incorrect. Rather than disappearing, it accumulates over time and slowly destroys the environment. Ultimately, it leads to the destruction of human race. Plasma is environmentally friendly: Plasma is environmentally friendly because it is created and disappears. When plasma is formed on the earth, you need certain conditions such as accelerating electrons by an electrical discharge or a particle accelerator. When this is gone, plasma completely disappears, leaving no impact on the environment. Plasmas produce radicals: Even if plasma density is low at atmospheric pressure, many radicals (excited states of molecules) are created. These radicals are chemically very aggressive. So instead of using harmful chemicals, plasma can be utilized for less of an impact on the environment. Plasma can reach very high temperatures: Plasma is also useful because when you control the density, you can easily reach high temperatures up to $5000{\sim}6000^{\circ}C$ at atmosphere pressure. Because of this heat and the chemical aggressiveness of the plasma, there are many green applications for plasma technology. Pulsed power technology: Pulsed electric field for extraction, drying and killing bacteria. Treatment of biological tissue by pulsed electric fields: Extraction of substances from cells: Sterilisation, Medical applications, Growth stimulation, Food preparation. Each application has its specialities, especially with respect to pulse shape and electric field strength.

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The Low Temperature Deposition of CrN Films by the AIP Method (아크 이온플레이팅법에 의한 저온 CrN 합성)

  • Cho, Yong K.;Kim, Sang K.;Lee, Won B.;Kim, Sung W.
    • Journal of the Korean Society for Heat Treatment
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    • v.20 no.2
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    • pp.78-83
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    • 2007
  • CrN coatings were deposited by cathodic arc ion plating method on the SKD11 steel substrates. Atmosphere temperature of $350^{\circ}C$, arc current of 90 A, nitrogen partial pressure of 1.0-5.3 Pa, and negative bias voltage of 30-135 V were selected. The characteristics of microstructure were investigated with XRD. Hardness, adhesion and friction coefficient measured by microhardness tester, scratch tester, and ball on disk tribometer. Microstructures depended on nitrogen partial pressure and bias voltage. The preferred orientation of the films was changed from (200) to (111) with decreasing pressure and increasing bias voltage. Adhesion properties related with microstructure, but microstructure changes slightly influenced on hardness and friction properties. The critical load.($Lc_1$) and hardness of CrN films deposited at 5.3 Pa, -30 V condition were 55 N(HF1), $2157{\pm}47\;Hk_{0.025}$. The friction coefficient were about 0.5 under dry condition.

Synthesis of High Purity Aluminum Nitride Nanopowder in Ammonia and Nitrogen Atmosphere by RF Induction Thermal Plasma (RF 유도결합 열 플라즈마를 이용한 암모니아와 질소분위기에서 고순도 AlN 나노 분말의 합성)

  • Kim, Kyung-In;Choi, Sung-Churl;Kim, Jin-Ho;Hwang, Kwang-Taek;Han, Kyu-Sung
    • Journal of the Korean Ceramic Society
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    • v.51 no.3
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    • pp.201-207
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    • 2014
  • High-purity aluminum nitride nanopowders were synthesized using an RF induction thermal plasma instrument. Ammonia and nitrogen gases were used as sheath gas to control the reactor atmosphere. Synthesized AlN nanopowders were characterized by XRD, SEM, TEM, EDS, BET, FTIR, and N-O analyses. It was possible to synthesize high-purity AlN nanoparticles through control of the ammonia gas flow rate. However, additional process parameters such as plasma power and reactor pressure had to be controlled for the production of high-purity AlN nanopowders using nitrogen gas.

A Study on Feasibility of the Phosphoric Acid Doping for Solar Cell Using Newly Atmospheric Pressure Plasma Source (새로운 대기압 플라즈마 소스를 이용한 결정질 실리콘 태양전지 인산 도핑 가능성에 관한 연구)

  • Cho, I-Hyun;Yun, Myoung-Soo;Jo, Tae-Hoon;Kwon, Gi-Chung
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.27 no.6
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    • pp.95-99
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    • 2013
  • Furnace is currently the most important doping process using POCl3 in solar cell. However furnace need an expensive equipment cost and it has to purge a poisonous gas. Moreover, furnace typically difficult appling for selective emitters. In this study, we developed a new atmospheric pressure plasma source, in this procedure, we research the atmospheric pressure plasma doping that dopant is phosphoric acid($H_3PO_4$). Metal tube injected Ar gas was inputted 5 kV of a low frequency(scores of kHz) induced inverter, so plasma discharged at metal tube. We used the P type silicon wafer of solar cell. We regulated phosphoric acid($H_3PO_4$) concentration on 10% and plasma treatment time is 90 s, 150 s, we experiment that plasma current is 70 mA. We check the doping depth that 287 nm at 90 s and 621 nm at 150 s. We analysis and measurement the doping profile by using SIMS(Secondary Ion Mass Spectroscopy). We calculate and grasp the sheet resistance using conventional sheet resistance formula, so there are 240 Ohm/sq at 90 s and 212 Ohm/sq at 150 s. We analysis oxygen and nitrogen profile of concentration compared with furnace to check the doped defect of atmosphere.

Surface treatment of silver-paste electrode by atmospheric-pressure plasma-jet (대기압 플라즈마 제트를 이용한 실버페이스트 전극의 표면처리)

  • Sheik Abdur Rahman;Shenawar Ali Khan;Yunsook Yang;Woo Young Kim
    • Journal of the Korean Applied Science and Technology
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    • v.40 no.1
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    • pp.71-80
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    • 2023
  • Silver paste is a valuable electrode material for electronic device applications because it is easy to handle with relatively low heat treatment. This study treated the electrode surface using an atmospheric-pressure plasma jet on the silver-paste electrode. This plasma jet was generated in an argon atmosphere using a high voltage of 5.5 to 6.5 kV with an operating frequency of 11.5 kHz. Plasma-jet may be more beneficial to the printing process by performing it at atmospheric pressure. The electrode surface becomes hydrophilic quickly and contact angle variation is observed on the electrode surface as a function of plasma treatment time, applied voltage, and gas flow rate. Also, there was no deviation in the contact angle after the plasma treatment in the large-area sample, that means a uniform result could be obtained regardless of the substrate size. The outcomes of this study are expected to be very useful in forming a stacked structure in the manufacture of large-area electronic devices and future applications.

High Power Laser Driven Shock Compression of Metals and Its Innovative Applications (고 출력 레이저에 의한 충격파 현상 연구 및 응용)

  • Lee, Hyun-Hee;Gwak, Min-Cheol;Choi, Ji-Hee;Yoh, Jai-Ick
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.32 no.11
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    • pp.832-840
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    • 2008
  • Ablation occurs at irradiance beyond $10^9\;W/cm^2$ with nanosecond and short laser pulses focused onto any materials. Phenomenologically, the surface temperature is instantaneously heated past its vaporization temperature. Before the surface layer is able to vaporize, underlying material will reach its vaporization temperature. Temperature and pressure of the underlying material are raised beyond their critical values, causing the surface to explode. The pressure over the irradiated surface from the recoil of vaporized material can be as high as $10^5\;MPa$. The interaction of high power nanosecond laser with a thin metal in air has been investigated. The nanosecond pulse laser beam in atmosphere generates intensive explosions of the materials. The explosive ejection of materials make the surrounding gas compressed, which form a shock wave that travels at several thousand meters per second. To understand the laser ablation mechanism including the heating and ionization of the metal after lasing, the temporal evolution of shock waves is captured on an ICCD camera through laser flash shadowgraphy. The expansion of shock wave in atmosphere was found to agree with the Sedov's self-similar spherical blast wave solution.

Study of Characteristics of Corona Discharge Plasma in a Wire-Cylinder Type Reactor (Wire-Cylinder형 반응로에서의 코로나 방전 플라스마의 특성 연구)

  • 박승자;박인호;고욱희
    • Journal of the Korean Vacuum Society
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    • v.13 no.3
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    • pp.132-138
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    • 2004
  • We used the self-consistent one-dimensional model applied to FCT algorithm and FEM method in a wire-cylinder type reactor to study the characteristics of corona discharge plasma in air at the atmospheric pressure. At the pulsed do voltage and do voltage, we studied the changes of the characteristic of plasma by computing electron density profile according to the changes of voltage and the size of reactor. The changes of active radius from this result are compared with the data of Peek's. The numerical simulation results for a corona discharge plasma explain the physical mechanism of the discharge process and could be used to obtain the optimized parameters for designing the plasma reactor for pollution abatement.

A Study on the UV Degradation Characteristics of FRP by Plasma Surface Modification (플라즈마 표면개질에 따른 FRP의 자외선 열화 특성에 관한 연구)

  • Hwang, Myung-Hwan;Lim, Kyung-Bum
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.55 no.3
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    • pp.122-126
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    • 2006
  • In this study, composite materials were put to dry interfacial treatment by use of plasma technology It has been presented that the optimum parameters for the best wettability of the samples at the time of generation of plasma were oxygen atmosphere, 0.1 Torr of system pressure, 100 W of discharge power, and 3 minutes of discharge time. The decrease in surface potential of charged samples by corona discharge indicates that the amount of accumulated electrical charges reduces and the charges that have been injected lessen rapidly when the duration of UV irradiation increases. The surface resistivity and the tensile strength of plasma treated samples, a longer UV irradiation time resulted in decreased insulation.

Plasma nitriding on chromium electrodeposit

  • Wang Liang;K.S. Nam;Kim, D.;Kim, M.;S.C. Kwon
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2001.11a
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    • pp.29-30
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    • 2001
  • This paper presents some results of plasma nitriding on hard chromium deposit. The substrates were C45 steel and $30~50{\;}\mu\textrm{m}$ of chromium deposit by electroplating was formed. Plasma nitriding was carried out in a plasma nitriding system with $95NH_3{\;}+{\;}SCH_4$ atmosphere at the pressure about 600 Pa and different temperature from $450^{\circ}C{\;}to{\;}720^{\circ}C$ for various time. Optical microscopy and X-ray diffraction were used to evaluate the characteristics of surface nitride layer formed by nitrogen diffusion from plasma atmosphere inward iCr coating and interface carbide layer formed by carbon diffusion from substrate outward Cr coating. The microhardness was measured using microhareness tester at the load of 100 gf. Corrosion resistance was evaluated using the potentiodynamic measurement in 3.5% NaG solution. A saturated calomel electrode (SiCE) was used as the reference electrode. Fig.1 shows the typical microstructures of top surface and cross-section for nitrided and unnitrided samples. Aaer plasma nitriding a sandwich structure was formed consisting of surface nitride layer, center chromium layer and interface carbide layer. The thickness of nitride and carbide layers was increased with the increase of processing temperature and time. Hardness reached about 1000Hv after nitriding while 900Hv for unnitrided hard chromium deposit. X-ray diffraction indicated that surface nitrided layer was a mixture of $Cr_2N$ and CrN at low temperature and erN at high temperature (Fig.2). Anodic polarization curves showed that plasma nitriding can greatly improve the corrosion resistance of chromium e1ectrodeposit. After plasma nitriding, the corrosion potential moved to noble direction and passive current density was lower by 1 to 4 orders of magnitude compared with chromium deposit(Fig.3).

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