• 한국광물학회지
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• 제9권2호
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• pp.93-101
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• 1996

Behavior of platinum group elements during crystallization within ore magma is of interest. In this study platinum is selected and its mineralogical and geochemical behavior in the presence of antimony and tellurium is investigated at 600$^{\circ}C$. High purity Pt, Sb, and Te are used as starting material and silica quartz tubings are as container. Rection products have been examined by use of ore microscope, X-ray diffractometer, electron microprobe analyser and micro-indentation hardness tester. stable phases at 600$^{\circ}C$ are platinum (Pt), Pt5Sb, Pt3Sb, PtSb, stumpflite (PtSb), geversite (PtSb), PtTe, Pt3Te4, Pt2Te3, moncheite (PtTe2), tellurantimony (Sb2Te3), and antimony (Sb). Geversite is the mineral showing the most significant extent of solid solution by up to 27 at% between Sb and Te elements. Isothermal section of 600$^{\circ}C$ is established in this study. It is noted that platinum cannot coexists with stumpflite or geversite under equilibrium condition, and stumpflite composition in equilibrium with geversite may be used as geothermometer.

• 한국전기전자재료학회논문지
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• 제30권3호
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• pp.144-147
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• 2017

In this study, $Ge_2Sb_2Te_5$ and $Ge_8Sb_2Te_{11}$ were used as an insulator layer to fabricate ReRAM devices. The resistance change is correlated to the appearance or disappearance of a conductivity filament at the surface of the GeSbTe layer. Changes in the electrical properties of ITO/GeSbTe/Ag devices were measured using a I-V-L measurement system. As a result, compared to the $ITO/Ge_8Sb_2Te_{11}/Ag$ device, this $ITO/Ge_2Sb_2Te_5/Ag$ ReRAM device exhibits highly uniform bipolar resistive switching characteristics, such as the operating voltages, and the resistance values.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2009년도 제40회 하계학술대회
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• pp.1260_1261
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• 2009

A detailed investigation and structure of tested samples are clearly presented. As a reference, $Ge_1Se_1Te_2$/Sb only sample was also investigated. We used compound of Ge-Se-Te material for phase-change cell. Actually, the performance properties have been improved surprisingly then conventional Ge-Sb-Te. However, crystallization time was as long as ever for amorphization time. We conducted this esperiment in order to solve that problem by doping-Sb.

• 한국전기전자재료학회논문지
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• 제21권5호
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• pp.411-414
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• 2008

The germanium films were deposited by metal organic chemical vapor deposition using $Ge(allyl)_4$ precursors on TiAlN substrates. Deposition of germanium films was only possible with a presence of $Sb(iPr)_3$, which means that $Sb(iPr)_3$ takes a catalytic role by a thermal decomposition of $Sb(iPr)_3$ for Ge film deposition. Also, as Sb bubbler temperature increases, deposition rate of the Ge films increases at a substrate temperature of $370^{\circ}C$. The GeTe thin films were fabricated by MOCVD with $Te(tBu)_2$ on Ge thin film. The GeTe films were grown by the tellurium deposition at $230-250^{\circ}C$ on Ge films deposited on TiAlN electrode in the presence of Sb at $370^{\circ}C$. The GeTe film growth on Ge films depends on the both the tellurium deposition temperature and deposition time. Also, using $Sb(iPr)_3$ precursor, GeSbTe films with hexagonal structures were fabricated on GeTe thin films. GeSbTe films were deposited in trench structure with 200 nm*120 nm small size.

• 한국재료학회지
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• 제21권4호
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• pp.192-195
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• 2011

The electro-deposition of compound semiconductors has been attracting more attention because of its ability to rapidly deposit nanostructured materials and thin films with controlled morphology, dimensions, and crystallinity in a costeffective manner (1). In particular, low band-gap $A_2B_3$-type chalcogenides, such as $Sb_2Te_3$ and $Bi_2Te_3$, have been extensively studied because of their potential applications in thermoelectric power generator and cooler and phase change memory. Thermoelectric $Sb_xTe_y$ films were potentiostatically electrodeposited in aqueous nitric acid electrolyte solutions containing different ratios of $TeO_2$ to $Sb_2O_3$. The stoichiometric $Sb_xTe_y$ films were obtained at an applied voltage of -0.15V vs. SCE using a solution consisting of 2.4 mM $TeO_2$, 0.8 mM $Sb_2O_3$, 33 mM tartaric acid, and 1M $HNO_3$. The stoichiometric $Sb_xTe_y$ films had the rhombohedral structure with a preferred orientation along the [015] direction. The films featured hole concentration and mobility of $5.8{\times}10^{18}/cm^3$ and $54.8\;cm^2/V{\cdot}s$, respectively. More negative applied potential yielded more Sb content in the deposited $Sb_xTe_y$ films. In addition, the hole concentration and mobility decreased with more negative deposition potential and finally showed insulating property, possibly due to more defect formation. The Seebeck coefficient of as-deposited $Sb_2Te_3$ thin film deposited at -0.15V vs. SCE at room temperature was approximately 118 ${\mu}V/K$ at room temperature, which is similar to bulk counterparts.

• Bulletin of the Korean Chemical Society
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• 제26권5호
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• pp.735-739
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• 2005

Presented is a voltammetric study of co-adsorption of irreversibly adsorbing Sb and Te on Pt(111). When a layer of Sb and Te was formed via simultaneous adsorption, the reduction peak of Te was observed at 0.30 V in the initial cathodic scan. In contrast, sequential adsorption of Sb followed by Te adsorption led to a Te reduction peak at 0.50 V in the initial scan. As the voltammetric scan was continued, in addition, the voltammogram of the simultaneously co-adsorbed layer changed, while that of the sequentially co-adsorbed layer did not. These observations are discussed in terms of formation of a homogeneously mixed layer and a layer consisting of heterogeneously separated domains of Sb and Te. Also, the difference in the adsorption strength of Sb and Te was observed.

• Bulletin of the Korean Chemical Society
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• 제31권5호
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• pp.1123-1127
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• 2010

We report a simple and quick route for the preparation of high-quality, nearly monodisperse $Bi_2Te_3$, $Sb_2Te_3$, and $Bi_xSb_{2-x}-Te_3$ nanocrystallites. The reactions of bismuth acetate or antimony acetate with Te in oleic acid result in pure phase of $Bi_2Te_3$ or $Sb_2Te_3$ nanoparticles, respectively. Also, ternary $Bi_xSb_{2-x}Te_3$ nanoparticles were successfully synthesized using the same method. The size and morphology of the nanoparticles were controlled by varying the stabilizing agents. The as-prepared nanoparticles are characterized by X-ray diffraction, scanning electron microscope, and high-resolution transmission electron microscope using an energy dispersive spectroscopy.

• 한국광학회지
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• 제13권3호
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• pp.215-222
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• 2002

광기록매체용 Ge-Sb-Te다층박막 성장과정을 in-situ 타원계를 사용하여 실시간으로 모니터하여 각 층의 두께를 제어하고 성장된 Ge-Sb-Te 다층박막을 ex-site 분광타원법으로 확인하였다. 보호층인 ZnS-SiO$_2$와 기록층인 Ge$_2$Sb$_2$Te$_{5}$을 단결정실리콘 기층 위에 스퍼터링 방법으로 각각 성장시키면서 구한 타원상수 성장곡선을 분석하여 성장에 따르는 보호층의 균일성 및 기록 층의 밀도변화를 파악하고 이를 기초로 하여 Ge-Sb-Te광기록 다층박막의 두께를 정밀하게 제어하였다. Ge$_2$Sb$_2$Te$_{5}$ 단층박막 시료의 복소굴절율은 eX-Situ 분광타원분석을 통하여 구하였다. 제작된 다층구조는 설정된 다층구조인 ZnS-SiO$_2$(1400$\AA$)$\mid$ GST(200 $\AA$)$\mid$ZnS-SiO$_2$(200$\AA$)와 각 층의 두께 및 전체 두께에서 1.5% 이내에서 일치하는 정확도를 보여주었다.주었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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• pp.377-380
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• 2004

The phase transition between amorphous and crystalline states in chalcogenide semiconductor films can controlled by electric pulses or pulsed laser beam; hence some chalcogenide semiconductor films can be applied to electrically write/erase nonvolatile memory devices, where the low conductive amorphous state and the high conductive crystalline state are assigned to binary states. GeSbTe(GST), AsSbTe(AST), SeSbTe(SST) used to phase change materials by appling electrical pulses. Thickness of ternary chalcogenide thin films have about 100nm. Upper and lower electrode were made of Al. It is compared with I-V characteristics after impress the variable pulses.

• 마이크로전자및패키징학회지
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• 제17권4호
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• pp.77-82
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• 2010

증착공정 및 환원분위기 열처리가 p형 Sb-Te 박막의 열전특성에 미치는 영향을 연구하였다. $Sb_2Te_3$ 잉곳을 분쇄한 분말을 증착원으로 사용하여 형성한 박막은 $2.71{\times}10^{-4}W/m-K^2$, Sb와 Te 혼합분말을 증착원으로 사용하여 형성한 박막은 $0.12{\times}10^{-4}W/m-K^2$, Sb와 Te의 동시 증착으로 제조한 박막은 $0.73{\times}10^{-4}W/m-K^2$의 출력인자를 나타내었다. $300^{\circ}C$에서 2시간 유지하는 환원분위기 열처리에 의해 $Sb_2Te_3$ 잉곳을 분쇄한 분말을 증착원으로 사용하여 형성한 박막의 출력인자가 $24.1{\times}10^{-4}W/m-K^2$로 향상되었으며, Sb와 Te의 동시증착으로 제조한 박막의 출력인자는 $40.2{\times}10^{-4}W/m-K^2$로 크게 향상되었다.