• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.111-111
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• 1999

반도체 소자의 고집적화 및 고속화에 따라 다층 금속배선에서의 RC 지연이 전체 지연의 주된 요소로 되고 있다. 이런 RC 진연을 줄이기 위해서 현재 다층 금속배선의 층간 절연막으로 사용하고 있는 SiO2 박막(k~3.9)을 보다 낮은 유전상수(low-k)를 가지는 물질로 대체할 것이 요구된다. 층간 절연막으로서 가져야 할 가장 중요한 것은 낮은 유전상수와 높은 열적안정성($\geq$45$0^{\circ}C$)이다. 본 연구에서는 Toluene을 precursor로 사용한 PECVD방법으로 low-k 유사중합체 유기박막을 성장시켰으며 부동한 온도에서 성장된 박막의 특성을 비교하여 증착온도가 박막의 특성에 미치는 영향에 대하여 조사하였다. 유사중합체 유기박막은 platinum(Pt)기판과 silicon 기판위에 같이 증착되었다. Precursor는 4$0^{\circ}C$로 유지된 bubbler에 담겨지고 증발된 precursor molecules는 Argon(Ar:99.999%) carrier 가스에 의해 process reactor 내부로 유입된다. Plasma는 RF(13.56MHz generator로 연결된 susceptor 주위에 발생시켰다. Silicon 기판위에 증착한 시편으로 Fourier transform infrared (FTIR) spectra 및 열적 안정성을 측정하였고, Pt 기판위에 증착한 시편으로 Al/유기박막/Pt 구조의 capacitor를 만들어 열적안정성을 측정하였고, Pt 기판위에 증착한 시편으로는 Al/유기박막/Pt 구조의 capacitor를 만들어 K값 및 절연성을 측정하였다. Capacitance는 1MHz 주파수에서 측정하였다. 열적안정성은 30분동안 Ar 분위기에서 annealing하기 전후의 증착막의 두께의 변화를 측정함으로써 조사하였으며 유기박막의 두께는 surface profilometer로 측정하였다. 증착온도가 45$^{\circ}C$에서 15$0^{\circ}C$, 25$0^{\circ}C$로 높아짐에 따라 k값은 높아졌지만 대신 열적안정성은 좋아졌다. plasma power 30W인 경우 45$^{\circ}C$에서 증착했을 때 유전상수는 2.80으로 낮았지만 40$0^{\circ}C$에서 30분 동안 열처리한 후 두께가 49% 감소하였다. 그러나 25$0^{\circ}C$에서 증착했을 때 유전상수는 3.10으로 좀 높아졌지만 열적으로는 40$0^{\circ}C$까지 안정하였으며 45$0^{\circ}C$에서도 두께의 감소는 8%에 불과했다.

• Korean Journal of Materials Research
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• v.13 no.9
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• pp.587-592
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• 2003

The thin films of 316L stainless steel were made on glass and S45C substrate by Ion beam assisted deposition with reactive atmosphere of argon and nitrogen. The films were deposited at the various conditions of ion beam power and the ratios of Ar/$N_2$gas. Properties of these films were analyzed by glancing x-ray diffraction method(GXRD), AES, potentiodynamic test, and salt spray test. The results of GXRD showed that austenite phase could be appeared by $N_2$ion beam treatment and the amount of austenite phase increased with the amount of nitrogen gas. The films without plasma ion source treatment had the weak diffraction peak of ferrite phase. But under the Ar plasma ion beam treatment, the strong diffraction peaks of ferrite phase were appeared and the grain size was increased from 12 to 16 nm. Potentiodynamic polarization test and salt spray test indicated that the corrosion properties of the STS 316L films with nitrogen ion source treatment were better than bulk STS 316L steel and STS 316L films with Ar ion source treatment.

• Proceedings of the KIEE Conference
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• 1999.07e
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• pp.2007-2009
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• 1999

In this paper, discharge domain of wire-cylindrical plasma reactor was separated from a gas flow duct to avoid unstable discharge by aerosol particle deposited on discharge electrode and grounded electrode. The NOx, SOx removal was experimentally investigated by a reaction induced to ammonium nitrate, ammonium sulfate using a low price of aqueous NaOH solution and a small quantity of ammonia. Volume percentage of aqueous NaOH solution used was 20% and $N_2$ flow rate was 2.5[$\ell$/min] for bubbling aqueous NaOH solution. Ammonia gas(14.82%) balanced by argon was diluted by air and was introduced to a main simulated flue gas duct through $NH_3$ injection system which was in downstream of reactor. The $NH_3$ molecular ratio[MR] was determined based on $NH_3$ to [NO+$SO_2$]. MR is 1.5. The NOx removal rates increased in the order of DC, AC and pulse, but SOx removal rates was not significantly effected by source of electricity. The NOx removal rate slightly decreased with increasing initial concentration but SOx removal rate was not significantly effect by initial concentration, and NOx, SOx removal rates decreased with increasing gas flow rate.

• Macromolecular Research
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• v.13 no.5
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• pp.446-452
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• 2005

The interactions between the surface of scaffolds and specific cells play an important role in tissue engineering applications. Some cell adhesive ligand peptides including Arg-Gly-Asp (RGD) have been grafted into polymeric scaffolds to improve specific cell attachment. In order to make cell adhesive scaffolds for tissue regeneration, biodegradable nonporous poly(L-lactic acid) (PLLA) films were prepared by using a solvent casting technique with chloroform. The hydrophobic PLLA films were surface-modified by Argon plasma treatment and in situ direct acrylic acid (AA) grafting to get hydrophilic PLLA-g-PAA. The obtained carboxylic groups of PLLA-g-PAA were coupled with the amine groups of Gly-Arg-Asp-Gly (GRDG, control) and GRGD as a ligand peptide to get PLLA-g-GRDG and PLLA-g-GRGD, respectively. The surface properties of the modified PLLA films were examined by various surface analyses. The surface structures of the PLLA films were confirmed by ATR-FTIR and ESCA, whereas the immobilized amounts of the ligand peptides were 138-145 pmol/$cm^2$. The PLLA surfaces were more hydrophilic after AA and/or RGD grafting but their surface morphologies showed still relatively smoothness. Fibroblast adhesion to the PLLA surfaces was improved in the order of PLLA control

• Journal of Korean Society of Environmental Engineers
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• v.22 no.2
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• pp.211-216
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• 2000

In this paper, experimental investigations were carried out to remove NOx, SOx simultaneously from a simulated combustion flue gas [$NO(0.02%)-SO_2(0.08%)-CO_2-Air-N_2$] by using a pulse corona induced plasma chemical processing. Discharge domain of wire-cylindrical plasma reactor was separated from a gas flow duct to avoid unstable discharge by aerosol particle deposited on discharge electrode and grounded electrode. The NOx, SOx removal was experimentally investigated by a reaction induced to ammonium nitrate, ammonium sulfate using a low price of aqueous NaOH solution and a small quantity of ammonia. Volume percentage of aqueous NaOH solution used was 20% and $N_2$ flow rate was $2.5{\ell}/min$ for bubbling aqueous NaOH solution. Ammonia gas(l4.82%) balanced by argon was diluted by air and was introduced to a main simulated flue gas duct through $NH_3$ injection system which was in downstream of reactor. The $NH_3$ molecular ratio(MR) was determined based on [$NH_3$] and [$NO+SO_2$]. MR is 1.5. The NOx removal rates increased in the order of DC, AC and pulse, but SOx removal rates was not significantly effected by source of electricity. The NOx removal rate slightly decreased with increasing initial concentration. but SOx removal rate was not significantly affected by initial concentration. The NOx, SOx removal rates decreased with increasing gas flow rate.

• Polymer(Korea)
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• v.30 no.2
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• pp.168-174
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• 2006

To utilize as highly functional scaffolds for tissue engineering by improving hydrophobicity and cell compatibility of the exist polymer scaffolds, the biodegradable poly(L-lactic acid) (PLLA) films and scaffolds having the optimal hydrophilicity were prepared by in situ plasma treatment and grafting of a carboxyl acid-containing monomer, acrylic acid (AA) in the chamber. From the results of surface analyses, surface-modified nonporous PLLA film and dual pore scaffold surfaces showed high hydrophilicity due to the decrease in contact angle and the increase in carboxylic groups as compared with untreated PLLA control. In particular, among various surface modification methods, Ar(argon)+AA+AA sample prepared by Ar plasma and then acrylic acid treatments displayed lower contact angle and more carboxylic groups thar Ar/AA and Ar+TP(thermal polymerization) samples, indicating that Ar+AA+AA sample was optimally treated for improving its hydrophilicity. In the cases of surface modified nonporous PLLA films and dual pore scaffolds, the adhesion and proliferation of chondrocytes increased with increasing their hydrophilicity.

• Nuclear Engineering and Technology
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• v.52 no.9
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• pp.2054-2063
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• 2020

The high-temperature oxidation behavior of ZrSi₂ used as a coating material for nuclear fuel cladding was investigated for developing accident-tolerant fuel cladding of light water reactors. Bulk ZrSi₂ samples were prepared by spark plasma sintering. In situ X-ray diffraction was conducted in air at 900, 1000, and 1100 ℃ for 20 h. The microstructures of the samples before and after oxidation were examined by scanning electron microscopy and transmission electron microscopy. The results showed that the oxide layer of zirconium silicide exhibited a layer-by-layer structure of crystalline ZrO₂ and amorphous SiO₂, and the high-temperature oxidation resistance was superior to that of Zircaloy-4 owing to the SiO₂ layer formed. ZrSi₂ was coated on the Zircaloy-4 tube surface using laser 3D printing, and the coated tube was oxidized for 2000 s at 1200 ℃ under a vapor/argon mixture atmosphere. The outer surface of the coated tube was hardly oxidized (10-30 ㎛), while the inner surface of the uncoated tube was significantly oxidized to approximately 300 ㎛.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.307.1-307.1
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• 2016

Amorphous zinc tin oxide (ZTO) thin films are being widely studied for a variety electronic applications such as the transparent conducting oxide (TCO) in the field of photoelectric elements and thin film transistors (TFTs). Thin film transistors (TFTs) with transparent amorphous oxide semiconductors (TAOS) represent a major advance in the field of thin film electronics. Examples of TAOS materials include zinc tin oxide (ZTO), indium gallium zinc oxide (IGZO), indium zinc oxide, and indium zinc tin oxide. Among them, ZTO has good optical and electrical properties (high transmittance and larger than 3eV band gap energy). Furthermore ZTO does not contain indium or gallium and is relatively inexpensive and non-toxic. In this study, ZTO thin films were formed by UHV RF magnetron co-sputter deposition on silicon substrates and sapphires. The films were deposited from ZnO and SnO2 target in an RF argon and oxygen plasma. The deposition condition of ZTO thin films were controlled by RF power and post anneal temperature using rapid thermal annealing (RTA). The deposited and annealed films were characterized by X-ray diffraction (XRD), atomic force microscope (AFM), ultraviolet and visible light (UV-VIS) spectrophotometer.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.5
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• pp.387-391
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• 2012

Graphene was fabricated onto Ni/Si substrate using a rapid-thermal pulse CVD and they were transferred onto the Ti/PES flexible substrate. For top electrode applications of the BMNO dielectric films, graphene was patterned using a argon plasma. Through an AFM image and a leakage current density of the BMNO films grown onto various bottom electrodes before and after bending test, BMNO films grown onto the graphene bottom electrode showed no change of the microstructure and the leakage current density after the bend.

• Proceedings of the Korea Contents Association Conference
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• 2009.05a
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• pp.807-809
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• 2009

Thin film deposition methods have been widely used and intensively investigated because high quality crystalline films enable to fabricate by sputtering. Especially rf magnetron sputtering deposition has advantages of being employ a relatively high deposition rate and also to achieve high crystalline films in low pressure because plasma density around target by magnetic is high. To apply ZnO thin film for SAW filter, it has highly flat surface, excellent c-axis preferred orientation and high resistivity value. As-deposited ZnO films showed the strong c-axis growth and excellent crystallinity. C-axis preferred orientation, resistivity and surface roughness highly depended on oxygen/argon gas ratio.