• Proceedings of the KIEE Conference
• /
• 2004.11a
• /
• pp.167-170
• /
• 2004

In recent, there have been several developments in lamp technology that promise savings in electrical power consumption and improved quality of the lighting space. The electrodeless fluorescent lamp is intended as a high efficacy replacement for the incandescent reflector lamp in many applications. In this paper, electron temperature and electron density were measured in a radio-frequency inductively coupled plasma using a Langmuir probe method for emission characteristics. Measurement was conducted in an Argon, Ne discharge for pressure from 1 [mTorr] and input RF power 10 [W] to 150 [W]. As for the electron density, a electron temperature was more distinguished for a emission characteristic. The results of ideal may contribute to systematic understanding of a electrodeless fluorescent lamps of emission characteristics.

• Textile Coloration and Finishing
• /
• v.16 no.5
• /
• pp.35-41
• /
• 2004

Poly(ethylene terephthalate), polyimide(Kapton), and polypropylene surfaces were modified with argon low temperature plasma by RF glow discharge at 240m Torr, 40W to investigate the surface morphological changes due to the plasma treatment using atomic force microscopy(AFM). Analysis of the AFM images and Ra(average roughness) revealed that the plasma treatment resulted in significant ablation on the surfaces. The morphological changes and surface roughness, however, were different depending on material characteristics such as heat stability, presence of amorphous region, swelling phenomenon, and molecular structure of repeating unit. It was assumed that polypropylene due to its tertiary hydrogen was ablated easily compared to poly(ethylene terephthalate), and that polyimide was more resistant to the ablation than PET due to rigid skeleton of imide and stable phenyl ring structure.

• The Transactions of The Korean Institute of Electrical Engineers
• /
• v.63 no.10
• /
• pp.1417-1422
• /
• 2014

Using a parallel plate DC plasma system was prepared. Using this equipment, we investigated the basic discharge characteristics of DC argon plasma in terms of electron density, temperature, voltage and current waveforms and plasma potential. The effects of the electrode gap distance, input voltage, ballast resistance and pressure were measured using electrostatic probe. Plasma simulation using fluid approximation has been performed. External circuit effects was included in the simulation. Measured and calculated current voltage characteristics show similar tendencies.

• Proceedings of the KIEE Conference
• /
• 1993.07b
• /
• pp.1183-1185
• /
• 1993

The plasma polymerized thin film of MMA+Sty was prepared using a capacitively coupled gas-flow-type reactor. This thin films were also delincated by the electron-beam apparatus with an acceleration voltage 30KV, and the pattern in the resist was developed with the gas-flow-type reactor using an argon as an etchant. The effect of discharge power on groth rate and etching rate of the thin film were studied. The molacular structure of the resist was investigated by ESCA and FT-IR.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2010.02a
• /
• pp.437-437
• /
• 2010

DC Hollow cathode 방전은 약 100여 년 전, Paschen에 의해 실험된 이후로 광원, 스퍼터링 공정, 이온빔 소스 등 다양한 분야에 이용되어 왔다. 최근 태양전지용 마이크로 결정질 실리콘 증착 시, RF CCP의 전극에 복수의 홀 혹은 트렌치 구조를 두어 Hollow cathode 방전 효과를 이용하여 향상된 공정 속도로 공정을 진행한다. 그러나 RF-MHCD (Multi hole cathode discharge) 공정을 위한 최적 규격의 홀 기에 관한 연구는 그 중요성과 응용성에도 불구하고 깊게 이루어지지 못한 바 있다. 그러므로 저자는 Capacitively Coupled Plasma (전극 간격 : 4cm, 전극 직경 : 14cm) 장비에서 평면 전극과 10mm 깊이와 각각 3.5mm, 5mm, 7mm, 10mm 직경의 홀이 있는 4개의 전극을 이용하여 Argon RF-MHCD 방전을 관찰하여 조건 별 최적의 홀 전극 디자인을 도출하였다. 실험 조건은 64.5mTorr ~ 645mTorr압력 범위/ 1A~9A이며, 플라즈마는 전극 사이 중앙에 설치한 RF-compensated Langmuir Probe와, 전극과 전기적으로 접촉하는 1000:1 Probe 와 Voltage-Current Probe를 이용하여 측정되었다. 실험 결과 압력 조건 별로, 최적의 전자 밀도를 유도하는 전극 상 홀의 직경이 달라짐을 확인하였다.

• Proceedings of the Optical Society of Korea Conference
• /
• 1989.02a
• /
• pp.65-69
• /
• 1989

Mather type dense plasma focus device was develooped for the feasibili쇼 study in its application to the x-ray lithography. To etermine the electrical characteristics,the temporal begavior of the discharge current and the voltage was measured by using the Rogowski coil and the high voltage probe respectively. The results are 9 $\mu\textrm{s}$ of the period, 18m$\Omega$ of resistance and 0.16$\mu$Η of inductance. The average current sheath velocity was measured by the light signal emitted at the moving plasma sheath. The light signal was detected through two fiber bundles. When the applied voltage was 13 kV and the initial jpressure of argon was 21.8 Pa, the best plasma focus was occurred. The x-ray emission characteristics from the plasma focus was determined by the x-ray pictures taken by pinhole camera. It is focus that the plasma was focused at 1.4 cm distant position above the center electrode and its diameter was about 1.0 m.

• Journal of Environmental Science International
• /
• v.22 no.12
• /
• pp.1561-1569
• /
• 2013

This study carried out a laboratory scale plasma reactor about the characteristics of chemically oxidative species (${\cdot}OH$, $H_2O_2$ and $O_3$) produced in dielectric barrier discharge plasma. It was studied the influence of various parameters such as gas type, $1^{st}$ voltage, oxygen flow rate, electric conductivity and pH of solution for the generation of the oxidant. $H_2O_2$ and $O_3$.) $H_2O_2$ and $O_3$ was measured by direct assay using absorption spectrophotometry. OH radical was measured indirectly by measuring the degradation of the RNO (N-Dimethyl-4-nitrosoaniline, indicator of the generation of OH radical). The experimental results showed that the effect of influent gases on RNO degradation was ranked in the following order: oxygen > air >> argon. The optimum $1^{st}$ voltage for RNO degradation were 90 V. As the increased of $1^{st}$ voltage, generated $H_2O_2$ and $O_3$ concentration were increased. The intensity of the UV light emitted from oxygen-plasma discharge was lower than that of the sun light. The generated hydrogen peroxide concentration and ozone concentration was not high. Therefore it is suggested that the main mechanism of oxidation of the oxygen-plasma process is OH radical. The conductivity of the solution did not affected the generation of oxidative species. The higher pH, the lower $H_2O_2$ and $O_3$ generation were observed. However, RNO degradation was not varied with the change of the solution pH.

• Journal of Energy Engineering
• /
• v.15 no.1 s.45
• /
• pp.52-59
• /
• 2006

This paper examined the conversion of methane to hydrogen and other higher hydrocarbons using dielectric barrier discharge with AC pulse power. Two metal electrodes of a coaxial-type plasma reactor were separated by gas gap and an alumina tube. The inner electrode was located inside the alumina tube. The alumina tube was located inside the stainless steel tube, which was used as the outer electrode. Effect of feed gas composition (methane, oxygen, argon, water and helium), flow rate, applied frequency, input volt-age on methane conversion and product distribution were studied. The major products of plasma chemical reactions were ethylene, ethane, propane, buthane, hydrogen, carbon monoxide and carbon dioxide. The increment of applied voltage and the usage of inert gas as the background (helium and argon) enhanced the selectivity of hydrocarbons and methane conversion. The addition of water in the feed stream enhanced the conversion of methane and yield of hydrogen. Higher voltage leads to higher yield of $C_2H_6,\;C_3H_8,\;C_4H_{10}$ and yield or $C_2H_2\;and\;C_2H_4$ appeared highly in lower voltage.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
• /
• v.16 no.6
• /
• pp.95-101
• /
• 2002

There are many effective parameters to high concentration ozone generation. These parameters became very important elements should be considered before designing ozone generator. After designing, there are many peripheral parameters to greatly affect to high concentration ozone generation also. In this study, of many effective peripheral parameters on high concentration ozone generation, the effects of flow rate of inlet oxygen gas and some kinds of additional gases on ozone concentration were investigated As a result, when inlet oxygen gas was introduced at the range of 0.75［LPM］～2.00［LPM］ the highest ozone concentration of 71145［ppm］ was obtained at 1.25［LPM］. When the additional nitrogen gas was mixed to oxygen gas at the range of 0.0［vol%]～6.4［vol%］ the highest ozone concentration of 73135［ppm］ was obtained at 0.8［vol%］ of nitrogen gas. This showed 3［%］ increasing compared to the case of pure oxygen gas inlet. When the additional argon gas was mixed to oxygen gas at the range of 0.0［vol%］～6.4［vol%］ the highest concentration of 67288［ppm］was obtained at 0.8［vol%］of argon gas. This is decreased value compared to that of introducing the pure oxygen.

• Journal of the Korean Electrochemical Society
• /
• v.8 no.4
• /
• pp.181-185
• /
• 2005

Lithium cobalt oxide thin film cathode, having thickness of $2.9{\mu}m$ with area of $4cm^2$, was deposited on platinum patterned alumina substrate by radio frequency magnetron sputtering. Li/Co molar ratio, which is an important factor for battery performance, was measured as a function of argon working pressure and applied R.F. power. Constant current charge and discharge performances were characterized with high rate discharge and cycling behavior. Using AC impedance analysis, internal resistance of the thin film battery was measured and simulated by proposed equivalent circuit model.