• 한국진공학회지
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• 제9권3호
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• pp.207-215
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• 2000

진공증착 및 이온플레이팅 방법을 이용하여 냉간 압연된 강판상에 알루미늄피막을 형성시킨 후, 증발율 및 증기분포 변화를 측정하고 각 증착방법에서의 증발율에 따른 증기분포 변화를 비교 및 검토하였다. 본 실험에서의 이온플레이팅은 증발원 근처에 이온화 전극을 설치하는 방법으로 고전류 아크방전을 유도하여 $10^{-4}$ Torr 이하에서도 기존의 이온플레이팅에 비해 높은 이온화율을 얻을 수 있는 아크방전 유도형 이온플레이팅(Arc-induced ion Plating; AIIP) 방법을 이용하였다. 전자빔을 이용하면서 알루미나 크루시블을 사용하여 알루미늄을 증발시킬 경우 분당 2.0 $\mu\textrm{m}$이상의 높은 증발율을 얻을 수 있었으며, 이온플레이팅의 경우 이온화된 증기의 상호작용에 따른 산란 효과로 증발율이 다소 낮아짐을 알 수 있었다. $cos^{n/\phi}$로 이루어지는 증기분포의 결정인자(n)의 값이 진공증착의 경우는 1에 근접하는 것으로 나타났고 AIIP의 경우는 2 또는 그보다 더 큰 값으로 이루어지는 것을 확인하였다. 이로부터 이온플레이팅의 경우 이온화율 또는 기판 바이어스 전압의 효과가 다른 조건에 비해 증기분포에 더 크게 영향을 미치는 것을 확인할 수 있었다.

• 한국진공학회지
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• 제12권2호
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• pp.112-117
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• 2003

MgO 박막은 PDP(plasma display panels)분야에서 널리 사용되어 왔다. 본 연구에서는, 기존에 사용되고 있는 e-beam evaporation, reactive magnetron sputtering법과 arc deposition법으로 MgO 보호막을 증착하여 구조적 · 광학적 특성을 비교하였다. 반응 가스인 산소 가스의 유입량을 변화시켜 Mg metal target을 이용하여 vacuum arc deposition equipment 의해 유리 기판 위에 증착하였다. Ellipsometer를 이용하여 치밀도를 측정하고, MgO보호막의 마모율(erosion rate)를 측정하기 위해 가속 실험 방법을 도입, Ar+ 이온빔에 의한 erosion test를 시행하여 내마모성을 알아보았다. 또한, XPS와 UV test를 사용하여 MgO보호막의 광투과도에 미치는 수분의 영향을 조사한 결과, arc evaporation 법이 광투과도 90%이상을 유지하여 수분의 영향에 둔감한 것을 알 수 있었다. 한편, XRD와 AFM을 이용하여 MgO 박막의 구조와 표면 형상에 대해 조사하였다.

• 한국유체기계학회 논문집
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• 제11권4호
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• pp.7-13
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• 2008

The computational investigation is performed to find out the interaction of arc plasmas with surrounding materials and the thermal flow characteristics in a PASB (Puffer-Assisted Self-Blast) chamber, which is one of new breaking concepts in $SF_6$ switchgears. It is very important to define the flow and mass transfer happened during the full arcing history for further understanding complex physics inside the chamber. In this study, we have considered two diffusion processes by the hot arc plasma, one is PTFE nozzle ablation and the other is Cu electrode evaporation, simultaneously. It was found that the principle of the pressure-rise inside the chamber is confirmed by the computational results and the increase of the electrical conductivity of the residual gas near current zero is critical to the chamber design.

• Carbon letters
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• 제3권3호
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• pp.142-145
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• 2002

Multiwall carbon nanotubes (MWNT) were produced using the arc-discharge graphite evaporation technique. Composite films were developed using MWNT dispersed in polystirol polymer. In the present work, various properties of the polymeric thin film containing carbon nanotubes were investigated by optical absorption, electrical resistivity and the same have been discussed.

• 한국산업융합학회 논문집
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• 제24권6_2호
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• pp.909-917
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• 2021

This study was carried out experimentally on the production and properties of silicon nanopowders characteristics using a transferred type arc plasma apparatus. To investigate the properties of silicon nanopowder, the purity of argon gas(99.999%, 99.9%) and the partial pressure ratio of nitrogen gas(0~90%) were varied. The total pressure in chamber is 400Torr and the silicon chunk amount used as raw material is 300g. The power supplied to the cathode to generate arc plasma was 9~12kW/h, and the electrode was made of tungsten and graphite with a diameter of 13mm. The particle size, impurity elements and powder evaporation rate of the silicon powder were analyzed using the XRD, FE-SEM, TEM and electronic scale. According to the purity of argon gas, the silicon evaporation rate and the particle size were similar, and impurities were generated more in the case of 99.9% purity than 99.999%. When argon gas and nitrogen gas were mixed in the chamber, the silicon evaporation rate and particle size increased as the partial pressure ratio of nitrogen gas increased. In particular, when the partial pressure ratio of nitrogen gas was 80%, the silicon evaporation rate 80g/h, and the particle size was about 80~100nm.

• 한국분말재료학회지
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• 제20권6호
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• pp.411-424
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• 2013

In this study, the synthesis of nickel nanoparticles and copper nanospheres for the potential applications of MLCC electrode materials has been studied by plasma arc evaporation method. The change in the broad distribution of the size of nickel and copper nanopowders is successfully controlled by manifesting proper mixture of gas ambiance for plasma generation in the size range of 20 to 200 nm in diameter. The factors affecting the mean diameter of the nanopowder was studied by changing the composition of reactive gases, indicating that nitrogen enhances the formation of larger particles compared to hydrogen gas. The morphologies and particle sizes of the metal nanoparticles were observed by SEM, and ultrathin oxide layers on the powder surface generated during passivation step have been confirmed using TEM. The metallic FCC structure of the nanoparticles was confirmed using powder X-ray diffraction method.

• 한국표면공학회지
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• 제54권3호
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• pp.133-138
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• 2021

Ternary Ti-X-N coatings, where X = Al, Si, Cr, O, etc., have been widely used for machining tools and cutting tools such as inserts, end-mills, and etc. Ti-Al-N-O coatings were deposited onto silicon wafer and WC-Co substrates by a cathodic arc evaporation (CAE) technique at various negative substrate bias voltages. In this study, the influence of substrate bias voltages during deposition on the microstructure and mechanical properties of Ti-Al-N-O coatings were systematically investigated to optimize the CAE deposition condition. Based on results from various analyses, the Ti-Al-N-O coatings prepared at substrate bias voltage of -80 V in the process exhibited excellent mechanical properties with a higher compressive residual stress. The Ti-Al-N-O (-80 V) coating exhibited the highest hardness around 30 GPa and elastic modulus around 303 GPa. The improvement of mechanical properties with optimized bias voltage of -80 V can be explained with the diminution of macroparticles, film densification and residual stress induced by ion bombardment effect. However, the increasing bias voltage above -80 V caused reduction in film deposition rate in the Ti-Al-N-O coatings due to re-sputtering and ion bombardment phenomenon.

• 한국표면공학회지
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• 제54권3호
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• pp.139-143
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• 2021

Cr-Al-N coatings were deposited onto WC-Co substrates using a cathodic arc evaporation (CAE) system. CAE technique is recognized to be a very useful process for hard coatings because it has many advantages such as high packing density and good adhesion to metallic substrates. In this study, the influence of deposition temperature as a key process parameter on film growth behavior and mechanical properties of Cr-Al-N coatings were systematically investigated and correlated with microstructural changes. From various analyses, the Cr-Al-N coatings prepared at deposition temperature of 450℃ in the CAE process showed excellent mechanical properties with higher deposition rate. The Cr-Al-N coatings with deposition temperature around 450℃ exhibited the highest hardness of about 35 GPa and elastic modulus of 442 GPa. The resistance to elastic strain to failure (H/E ratio) and the index of plastic deformation (H³/E² ratio) were also good values of 0.079 and 0.221 GPa, respectively, at the deposition temperature of 450℃. Based on the XRD, SEM and TEM analyses, the Cr-Al-N coatings exhibited a dense columnar structure with f.c.c. (Cr,Al)N multi-oriented phases in which crystallites showed irregular shapes (50~100nm in size) with many edge dislocations and lattice mismatches.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회B
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• pp.2506-2511
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• 2007

The coupled simulation is performed to find out the interaction of arc plasmas with surrounding materials in a thermal puffer plasma chamber. In order to be more realistic, PTFE nozzle ablation and Cu electrode evaporation, which are caused by high temperature of arc plasmas, are considered together. Pressure rise and temperature inside the chamber generated during the whole arcing history are investigated with the applied currents. It is very important to define how thermal flow and mass transfer are processing between the arc plasma and surrounding materials for further understanding complex physics inside the chamber. It is concluded that the result might be very useful to understand the mechanism happened inside and to design thermal puffer plasma chambers, but further experimental studies are required to verify the results for the more practical applications.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.565-565
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• 2013

Free burning arcs where the work piece acts as an anode are frequently used for a number of applications. Our investigation is exclusively concerned with a simplified unified model of arcs and anode under steady state conditions at atmospheric pressure. The model is used to make predictions of arc and anode temperatures and arc voltage for a 200 A arc in argon. The computed temperatures along the axis between the cathode tip and the anode surface compare well the measured data. This knowledge of free burning arcfeatures can play a role in developing the atmospheric plasma systems, however, further investigation should include the modelling of Cu evaporation from anode and non-LTE situation near electrodes for more realistic calculations.